JPS58201732A - Post-treatment method of fluorination reaction solution - Google Patents
Post-treatment method of fluorination reaction solutionInfo
- Publication number
- JPS58201732A JPS58201732A JP8403682A JP8403682A JPS58201732A JP S58201732 A JPS58201732 A JP S58201732A JP 8403682 A JP8403682 A JP 8403682A JP 8403682 A JP8403682 A JP 8403682A JP S58201732 A JPS58201732 A JP S58201732A
- Authority
- JP
- Japan
- Prior art keywords
- reaction solution
- silica gel
- fluorination reaction
- contact
- derivative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、フッ素化反応液とシリカゲルとを接触させる
ことKよって該反応液中の無機フッ素化合物を除去する
極め【工業的価値の高いフッ素化反応液の処理方法に関
する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a highly industrially valuable method for treating a fluorinated reaction solution, which removes inorganic fluorine compounds from the reaction solution by bringing the fluorination reaction solution into contact with silica gel. .
医業、農薬および染料中間体として有用なトリフルオロ
メチルベンゼン誘導体は、工業的には、トリクロロメチ
ルベンゼン誘導体と無水フッ化水素ff(以下HFと略
称)とを、ルイス酸触媒存在下に反応させ製造されるが
、その際フッ素化反応液中に溶存しているHPおよび触
媒に使用したルイス酸のフッ素化合物が、後処理の操作
上の障害となるばかりでな□く装置材質の腐蝕を来たす
等のために、これらを完全に除去する必要がある。一般
にフッ素化反応液の後処理方法と゛しては1次の方法が
行な□われている。′すなわち、反応液中め溶存HFは
窒素または乾燥空気を通気して、大部分を除去し、次−
一で水または無機酸の水溶液を添加し抽出除去するか、
あるいは無機アルカリ金属塩の水溶液を添加し、中和処
理することによってフッ素化反応液から除去する方法が
取られている。Trifluoromethylbenzene derivatives, which are useful in medicine, as agricultural chemicals, and as dye intermediates, are produced industrially by reacting trichloromethylbenzene derivatives with anhydrous hydrogen fluoride FF (hereinafter abbreviated as HF) in the presence of a Lewis acid catalyst. However, at this time, the HP dissolved in the fluorination reaction solution and the fluorine compound of the Lewis acid used as a catalyst not only become a hindrance to the operation of the post-treatment, but also cause corrosion of the equipment material. Therefore, they need to be completely removed. Generally, the following method is used as a post-treatment method for the fluorination reaction solution. 'That is, most of the HF dissolved in the reaction solution is removed by bubbling nitrogen or dry air, and then -
Either add water or an aqueous solution of an inorganic acid and remove by extraction.
Alternatively, a method has been adopted in which the aqueous solution of an inorganic alkali metal salt is added and neutralized to remove it from the fluorination reaction solution.
しかしながら、抽出除去する方法では、強酸性条件下で
の処理jたはブッ素水溶液下での処理のため、装置材質
め腐蝕の問題が工業化の大きな障害となっている。However, in the extraction removal method, the problem of corrosion of the equipment material is a major obstacle to industrialization because the treatment is performed under strongly acidic conditions or under an aqueous fluorine solution.
゛中和処理の方法では、フッ素酸塩の生成と同時にルイ
ス酸触媒による金属水酸化物の微細な結晶が析出し、濾
過など゛による除去は非常に困難で操作が非常に煩維°
となる。In the neutralization method, fine crystals of metal hydroxide are precipitated by the Lewis acid catalyst at the same time as fluorate is produced, and removal by filtration or other means is extremely difficult and the operation is very complicated.
becomes.
また蒸留による方法では、ルイス酸のフッ素化物が飛末
同伴、あるいはフッ素化反応液の熱安定性の問題で好ま
しくない。 ゛ ′本発明者、等は、こ
れら種々の、問題点を解決するため鋭意検討した結果、
フッ素化反応液をシリカゲルと接触させること顛より容
易に無機フッ素化合物をはぼ完全に除去できることを見
い出し本発明を完成した。In addition, the method using distillation is not preferable because the fluorinated Lewis acid is entrained or the thermal stability of the fluorination reaction solution is affected.゛ ``As a result of intensive studies to solve these various problems, the present inventors and others have found that
The present invention was completed by discovering that inorganic fluorine compounds can be easily and completely removed by bringing the fluorination reaction solution into contact with silica gel.
即ち本1発明は、ルイス酸触媒の存在下に、トリク・・
□メチルべ・ゼン誘導体iフッ素化反応してトリフルオ
ロメチルベンゼン誘導体を製造する方法にお5゛て=該
り″素化反応液とどり”ゲとを接触させ、無機フッ素化
合物を除去することを特徴とするフッ素化反応液の後処
理方法である。That is, in the present invention, in the presence of a Lewis acid catalyst, tric...
□ Methylbenzene derivative i In the method of producing trifluoromethylbenzene derivative by fluorination reaction, the inorganic fluorine compound is removed by contacting the ``fluorination reaction liquid'' with the ``gel''. This is a method for post-treatment of a fluorination reaction solution, which is characterized by:
原料のトリクロロメチルベンゼン誘導体は、メ・チルベ
ンゼン−誘導体を側′画壇素化して得られるもので、た
とえば、トリクロロメチルベンゼン、2−クロロトリク
ロロメチルベンゼン、3−クロロトリクロロメチルベン
ゼン、4−10口) IJ クロロメチルベンゼン、2
.4−ジクロロ) IJ クロロメチルベンゼン、2−
ツク00メチルトリクロロメ4−二トロ゛トリクロロメ
チルベンゼン、ビス(4−トリクロロメチルフェニル)
カーボネート、ビ□ ス(2−クロロ−4−) IJ
クロロメールフェニル)カーボネート、などがあげられ
る。The trichloromethylbenzene derivative as a raw material is obtained by converting a methylbenzene derivative into a lateral element, such as trichloromethylbenzene, 2-chlorotrichloromethylbenzene, 3-chlorotrichloromethylbenzene, 4-10). IJ chloromethylbenzene, 2
.. 4-dichloro) IJ chloromethylbenzene, 2-
Tsuk00 Methyltrichloromethane 4-dichlorotrichloromethylbenzene, bis(4-trichloromethylphenyl)
Carbonate, bis(2-chloro-4-) IJ
Examples include chloromer phenyl) carbonate.
本発明に供し得るフタ素化反応液としては、上記トリク
ロロメチルベンゼン誘導体をフッ素化反□ ” 八
応に用いられる公知のルイス えばAtcts、F
eCLz 、 WCL@、TiC6l、TiCtイ8n
CL4、PCl5 、 TaCt6 、 Re
Cts、NdC45、MoC4,,8bF、など、の存
在下KHFと反応すること、によって対応するトリフル
オロメチルベンゼン誘導体を製造する際の反応液で、必
要によりテトラクロロエタンのような反応に不活性な有
機溶媒を用いた反応液、またルイス酸触媒と原料や反応
中゛間生成物等が錯体な形成しているような一応液□等
を挙げるとと゛ができr 。As the fluorination reaction solution that can be used in the present invention, the above-mentioned trichloromethylbenzene derivative can be mixed with known Lewis resins used in the fluorination reaction, such as Atcts, F.
eCLz, WCL@, TiC6l, TiCti8n
CL4, PCl5, TaCt6, Re
A reaction solution used to produce the corresponding trifluoromethylbenzene derivatives by reacting with KHF in the presence of Cts, NdC45, MoC4,,8bF, etc., and if necessary an inert organic compound such as tetrachloroethane. Reaction liquids using a solvent, and liquids in which a Lewis acid catalyst, raw materials, intermediate products, etc. form a complex, etc. can be listed as follows.
る。Ru.
その他、上記反応液と同様に処理可能な例として、不安
定なフッ素化合物が貯蔵中に分解し、脱3−
HFした場合の再精製処理等、その他のあらゆる酸性無
機フッ!化合物の除去処理に有効に適用できる。Other examples that can be treated in the same way as the above reaction solution include repurification treatment when unstable fluorine compounds decompose during storage and are removed from 3-HF, and all other acidic inorganic fluorine compounds. It can be effectively applied to compound removal treatment.
奎発明に使用す5るシリカゲルは、カラムクロマト用、
薄層クロマト用、乾燥出、農薬、肥料、飼料等の粉砕助
剤用および固結防止剤用、その他塗料の艶消削出などと
、して夏用される微粉末状から塊状までの各種市販品シ
リカゲルがあげられる。The silica gel used in the invention is for column chromatography,
Various types from fine powder to lumps used in summer for thin layer chromatography, drying, grinding aids and anti-caking agents for pesticides, fertilizers, feed, etc., and matte cutting of paints, etc. Commercially available silica gel can be used.
しかし価格および処理効、率などから10口以上の粉末
あるいは30〜200メツシユのビーズ状シリカゲルの
使用が好ましい。However, from the viewpoint of cost, processing efficiency, rate, etc., it is preferable to use powder of 10 mesh or more or bead-shaped silica gel of 30 to 200 mesh.
フッ素化反応液とシリカゲルとの接触方、法1は、フッ
素化反応液中に、シリカゲルを攪拌下に添加するか、シ
リカゲル充填塔中に連続的に通過させる。ことによって
行うことができる。Method 1 of contacting the fluorination reaction solution with silica gel is to add silica gel to the fluorination reaction solution under stirring or to continuously pass the silica gel into a silica gel packed column. This can be done by:
接触温度は0〜80℃で行われるが、好ましくは10〜
30℃である。接触時間はシリカゲル種のフッ素除去能
力によって一定しないが、通常は1〜6.0分である。The contact temperature is 0 to 80°C, preferably 10 to 80°C.
The temperature is 30°C. The contact time varies depending on the fluorine removal ability of the silica gel species, but is usually 1 to 6.0 minutes.
シリカゲルの使用量はフッ素化反応液中の無機フッ素化
合物の含有量によって4−
異なるが1通常フッ素化反応液量に対して1−20重量
%で良い。使用後のシリカゲルは回収し再生処理後再使
用することができる。The amount of silica gel used varies depending on the content of the inorganic fluorine compound in the fluorination reaction solution, but it is usually 1 to 20% by weight based on the amount of the fluorination reaction solution. The used silica gel can be collected and reused after being recycled.
本発明方法によって処理したフッ素化反応液は無機フッ
素化合物の含有量がS ppm以下となり、実質上無機
フッ素化合物による腐食を考慮した装置材質の選択の制
限を受′けることは皆無となる。The fluorination reaction solution treated by the method of the present invention has an inorganic fluorine compound content of S ppm or less, and there is virtually no restriction on the selection of equipment materials in consideration of corrosion caused by inorganic fluorine compounds.
以下本発明を下記実施例によって説明する。The present invention will now be explained with reference to the following examples.
実施例1 ・250−の80
8部反応器に195.5部のペンシトリクロライドと1
98部の5bct、とを仕込み。Example 1 ・250-80
In an 8-part reactor, 195.5 parts of pencitrichloride and 1
Prepared with 98 copies of 5bct.
かきまぜながら55℃まで昇温した。この温度を保って
、無水フッ化水素酸ガス66部を5時間を要し導入した
。反、応終了後50〜55℃でN、通気を約1時間行っ
た。この時の反応′液中の無機フッ案分は22 S O
ppmであった。その後室温まで冷却し、次いでジルト
ン−人(水沢化学製シリカゲル)を添加し、各時間毎に
フッ素化反応液中の無機フッ素含量をフッ素イ・オンメ
ーターにより定量・シた結果を表−1に示す0
・・表−1
実施例2
25C1dの8US製反応1K27115部の〇−)
リ/ a C1メチルベンザルクロライドと1.4部の
5bct、とを混合し60℃まで昇温した。同温度を7
−
保って、撹拌下に無水フッ化水素酸ガス66部を3時間
を要し導入した。反応終了後50〜60℃でN、通気を
1時間行った。この時の反応液中の無機フッ案分は20
′54ppmであった。次いで60℃に冷却後6.9部
のマイクロビーズシリカゲル(富士ディヴイソン社製)
を添加し、20分間かきまぜた後フッ素化反応液中′の
無機フッ案分をフッ素イオンメーターにより定量した結
果29部mであったO
実施例3.4,5.6
実施例2のフッ素化反応液に、シリカゲルの種類を代え
同様に処理した結果を表−2に示した。The temperature was raised to 55°C while stirring. While maintaining this temperature, 66 parts of anhydrous hydrofluoric acid gas was introduced over a period of 5 hours. After the reaction was completed, N gas was aerated at 50 to 55° C. for about 1 hour. At this time, the proportion of inorganic fluorine in the reaction solution was 22 SO
It was ppm. After that, it was cooled to room temperature, and then Jiruton-jin (silica gel manufactured by Mizusawa Chemical) was added, and the inorganic fluorine content in the fluorination reaction solution was determined every time using a fluoride ion meter.The results are shown in Table 1. Showing 0
...Table-1 Example 2 8US reaction of 25C1d 1K27115 parts 〇-)
Re/a C1 methylbenzal chloride and 1.4 parts of 5bct were mixed and heated to 60°C. same temperature 7
- While stirring, 66 parts of anhydrous hydrofluoric acid gas was introduced over a period of 3 hours. After the reaction was completed, aeration with nitrogen was carried out at 50 to 60° C. for 1 hour. The proportion of inorganic fluorine in the reaction solution at this time was 20
'54 ppm. Then, after cooling to 60°C, 6.9 parts of microbead silica gel (manufactured by Fuji Davison) was added.
After stirring for 20 minutes, the proportion of inorganic fluorine in the fluorination reaction solution was quantified using a fluorine ion meter and found to be 29 parts. Table 2 shows the results of the same treatment except for changing the type of silica gel in the reaction solution.
表−2 保土谷化学工業株式会社 8−Table-2 Hodogaya Chemical Industry Co., Ltd. 8-
Claims (1)
誘導体をフッ素化反応してトリフルオロメチルベンゼン
誘導体を製造する方法において、該フッ素化反応液とシ
リカゲルとを接触させ、核反応液中の無機フッ素化合物
な°除去することを特徴とするフッ素゛化反応液の後処
理方法。In a method for producing a trifluoromethylbenzene derivative by fluorinating a trichloromethylbenzene derivative in the presence of a Louis x acid catalyst, the fluorination reaction solution is brought into contact with silica gel, and the inorganic fluorine in the nuclear reaction solution is removed. A method for post-treatment of a fluorination reaction solution, characterized by removing compounds.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8403682A JPS58201732A (en) | 1982-05-20 | 1982-05-20 | Post-treatment method of fluorination reaction solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8403682A JPS58201732A (en) | 1982-05-20 | 1982-05-20 | Post-treatment method of fluorination reaction solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58201732A true JPS58201732A (en) | 1983-11-24 |
Family
ID=13819290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8403682A Pending JPS58201732A (en) | 1982-05-20 | 1982-05-20 | Post-treatment method of fluorination reaction solution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58201732A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1500641A4 (en) * | 2002-04-30 | 2006-05-31 | Mitsubishi Gas Chemical Co | High-purity (fluoroalkyl)benzene derivative and process for producing the same |
| WO2015111726A1 (en) * | 2014-01-27 | 2015-07-30 | 旭硝子株式会社 | Method for suppressing corrosion of glass |
-
1982
- 1982-05-20 JP JP8403682A patent/JPS58201732A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1500641A4 (en) * | 2002-04-30 | 2006-05-31 | Mitsubishi Gas Chemical Co | High-purity (fluoroalkyl)benzene derivative and process for producing the same |
| US7405331B2 (en) | 2002-04-30 | 2008-07-29 | Mitsubishi Gas Chemical Company, Inc. | High-purity (fluoroalkyl)benzene derivative and process for producing the same |
| WO2015111726A1 (en) * | 2014-01-27 | 2015-07-30 | 旭硝子株式会社 | Method for suppressing corrosion of glass |
| CN105980344A (en) * | 2014-01-27 | 2016-09-28 | 旭硝子株式会社 | Method For Suppressing Corrosion Of Glass |
| JPWO2015111726A1 (en) * | 2014-01-27 | 2017-03-23 | 旭硝子株式会社 | Method for inhibiting glass corrosion |
| US10017693B2 (en) | 2014-01-27 | 2018-07-10 | Asahi Glass Company, Limited | Method for suppressing corrosion of glass |
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