JPS5857776A - Method of producing adhesive coated insulating substrate - Google Patents
Method of producing adhesive coated insulating substrateInfo
- Publication number
- JPS5857776A JPS5857776A JP15639181A JP15639181A JPS5857776A JP S5857776 A JPS5857776 A JP S5857776A JP 15639181 A JP15639181 A JP 15639181A JP 15639181 A JP15639181 A JP 15639181A JP S5857776 A JPS5857776 A JP S5857776A
- Authority
- JP
- Japan
- Prior art keywords
- acrylonitrile
- epoxy resin
- agent
- insulating substrate
- butadiene copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000853 adhesive Substances 0.000 title claims description 20
- 230000001070 adhesive effect Effects 0.000 title claims description 20
- 239000000758 substrate Substances 0.000 title claims description 8
- 238000000034 method Methods 0.000 title claims description 5
- 239000003822 epoxy resin Substances 0.000 claims description 20
- 229920000647 polyepoxide Polymers 0.000 claims description 20
- 229920001577 copolymer Polymers 0.000 claims description 17
- 239000003795 chemical substances by application Substances 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 8
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 claims description 6
- 239000011368 organic material Substances 0.000 claims description 6
- 125000000524 functional group Chemical group 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 239000003960 organic solvent Substances 0.000 claims description 3
- 229920001187 thermosetting polymer Polymers 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 239000007767 bonding agent Substances 0.000 claims 2
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 claims 1
- 229920006026 co-polymeric resin Polymers 0.000 claims 1
- 238000007747 plating Methods 0.000 description 9
- 238000007788 roughening Methods 0.000 description 8
- 229920001971 elastomer Polymers 0.000 description 7
- 239000005060 rubber Substances 0.000 description 7
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 6
- JESXATFQYMPTNL-UHFFFAOYSA-N 2-ethenylphenol Chemical compound OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 239000005011 phenolic resin Substances 0.000 description 5
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 3
- 229920000459 Nitrile rubber Polymers 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910000019 calcium carbonate Inorganic materials 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005191 phase separation Methods 0.000 description 3
- 229920001568 phenolic resin Polymers 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Natural products CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000378 calcium silicate Substances 0.000 description 2
- 229910052918 calcium silicate Inorganic materials 0.000 description 2
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000010680 novolac-type phenolic resin Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920003987 resole Polymers 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000004073 vulcanization Methods 0.000 description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- CFRNDJFRRKMHTL-UHFFFAOYSA-N [3-octanoyloxy-2,2-bis(octanoyloxymethyl)propyl] octanoate Chemical compound CCCCCCCC(=O)OCC(COC(=O)CCCCCCC)(COC(=O)CCCCCCC)COC(=O)CCCCCCC CFRNDJFRRKMHTL-UHFFFAOYSA-N 0.000 description 1
- VKADNWSKNBWCNT-UHFFFAOYSA-M [Cl+].CC([O-])=O Chemical compound [Cl+].CC([O-])=O VKADNWSKNBWCNT-UHFFFAOYSA-M 0.000 description 1
- -1 acrylonitrile-butadiene compound Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 239000013040 bath agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 238000007688 edging Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005520 electrodynamics Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- JYGXADMDTFJGBT-VWUMJDOOSA-N hydrocortisone Chemical compound O=C1CC[C@]2(C)[C@H]3[C@@H](O)C[C@](C)([C@@](CC4)(O)C(=O)CO)[C@@H]4[C@@H]3CCC2=C1 JYGXADMDTFJGBT-VWUMJDOOSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Insulating Bodies (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Organic Insulating Materials (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
不発txr!、化学メッキ、又は、化学メツ中と電気メ
ッキを併用してFIT賛の回路を形成して印刷配線板と
するために使用さn、る接看剤僅積絶縁板の製造法に関
する。[Detailed description of the invention] Unexploded TXR! The present invention relates to a method of manufacturing an insulating board with a small amount of adhesive used to form a printed wiring board by using chemical plating or a combination of chemical plating and electroplating to form a FIT supporting circuit.
化学メッキ、又は%−化学メツキと電気メッキを併用し
て炭景の同jil”形成して印刷配線板r製造する方法
としては、
(1)絶縁基板の回路が形成ざnる部分以外にメツキレ
ジスl形成し化学メッキにLり回路を形成し印刷配線板
を製造する方法0
(2)絶縁1k41の全面に化学メツ11?を施し1回
路か形成さn、る部分以外に電気メツキレシストを形成
し、電気メツ中により回路を形成し、電気メツキレシス
ト剥離5回路か形成さn、てい、IVh部分の化学メッ
キ層tクイックエツチングにより除去して印刷配線板を
製造する万法Q
か行なわn、ている。The method of manufacturing a printed circuit board by forming a carbon layer using chemical plating or a combination of chemical plating and electroplating is as follows: Method of manufacturing a printed wiring board by forming a circuit and forming a circuit on chemical plating 0 (2) Applying a chemical layer 11 on the entire surface of the insulation layer 1k41 and forming an electric layer resist on the area other than the part where one circuit is formed. , a circuit is formed in an electrometallurgical process, and a circuit is formed by electroplating resist peeling. .
従来絶縁基板の表面に化学メッキを行う場曾絶縁基板表
面に接層剤を塗布し乾燥硬化後酸化性粗化液等で表向に
処理し、メッキ金属との良好なIIj!層性を保ってい
る。この目的の接着剤としては通常、アクリロニトリル
・ブタジェン共J[合体を生成分にし、こj、にフェノ
ール樹脂。Conventionally, when chemical plating is performed on the surface of an insulating substrate, a layering agent is applied to the surface of the insulating substrate, dried and hardened, and then the surface is treated with an oxidizing roughening liquid, etc., to achieve good bonding with the plated metal! Maintains layeredness. Adhesives for this purpose are usually acrylonitrile and butadiene (combined as a product component, and phenolic resin as the product component).
エポキシ樹脂などの熱硬化性側脂成分tmえ、更に必要
により硬化促進剤、ゴム加硫剤、加硫促進剤、充填剤、
顔料、メッキ触媒令か冷711J便用キn、ているか、
共通していることは、アクリロニトリル・ブタジェン共
重合体か浴剤を除く有機材料成分中の30重ii%以上
を占めていることである。Thermosetting side fat components such as epoxy resins, and if necessary, curing accelerators, rubber vulcanizing agents, vulcanization accelerators, fillers,
Pigment, plating catalyst, cold 711J toilet, etc.
What they have in common is that the acrylonitrile-butadiene copolymer accounts for 30% or more by weight of the organic material components excluding bath additives.
アクリロニトリル・ブタジェン共重合体は、(リ 酸化
性粗化液等での処理で、二1MI曾部分か切断し、低分
子量化と官能基発生により溶解量か増し、接着剤表面に
凹凸を生じ、メッキ金属の投錨効果が増し、接着力が増
大丁ゐ〇(2)分子中にあ、6極性の大きなアクリロニ
トリル基と、(1)で発生した官能基のt有量と共に接
着力か増大する◎
などの効果を有し、規格である1、 2 kg / c
m以上の接着力を南する配線板を安建して得るため、必
然的に301菫%以上のアクリロニトリル・ブタジェン
ゴム童を必要としている@
−万、配線板は尚密度化か貴ぶさjlその用途から接層
剤にも電気絶縁抵抗や紡電率、酵電正輸咎の高周波特性
など、電気物性の向上か望1nてきた◎接着剤組成中の
アクリロニトリル・ブタジェン共に甘体に、各檀高分子
の中で加硫後でも上記電気臀性の8%悪い材料に属し、
スチレン・ブタジェンゴム、ポリブタジェン等に浚える
と良くなるはずであるか、接着力か低く実用化でI!な
い。When the acrylonitrile-butadiene copolymer is treated with an oxidizing roughening solution, the 21MI portion is cut off, the amount of solubility increases due to lower molecular weight and generation of functional groups, and unevenness occurs on the surface of the adhesive. The anchoring effect of the plated metal increases and the adhesive strength increases. (2) The adhesive strength increases with the large hexapolar acrylonitrile group in the molecule and the amount of functional groups generated in (1). It has the following effects, and the standard 1.2 kg/c
In order to safely obtain a wiring board with an adhesive force of more than m, it is necessary to use acrylonitrile-butadiene rubber with a content of 301% or more. Since then, there has been a desire to improve the electrical properties of adhesives, such as electrical insulation resistance, spinning rate, and high-frequency properties of Kakudensho. Among the molecules, it belongs to the material with 8% poor electrical properties even after vulcanization,
It should be better if it is dredged with styrene-butadiene rubber, polybutadiene, etc., or the adhesive strength is low and it is difficult to put it into practical use! do not have.
−tcr、7クリロニトリル・ブタジェン共重合体含有
率を下げる検討【行った虐
(リ 共IIL曾俸合体率を下けて、エポキシ11脂含
有率を上けると、有嶺浴剤泗敵中で相分離を生ずる◇
(2ン エポキシ街脂硬化智の耐衝撃性同上剤として
用いらn、ている官能i&(カルボキシル属。- Study of lowering the content of tcr, 7-acrylonitrile-butadiene copolymer [conducted] By lowering the co-IIL copolymer content and increasing the epoxy 11-fat content, Phase separation occurs in ◇ (2) It is used as an impact-resistant agent for hardening of epoxy resin.
アミン基等)を有する液状のアクリロニトリル・ブタジ
ェン共重合体に通常の7クリロニトリル・ブタジェン共
宜せ体r貧えても有機溶剤溶液中で相分離を生ずる@
(3) 低ゴム含有′#層剤では必然的にエポキシ樹
脂を有半か増加し、エポキシ樹脂の硬化剤の81類が配
線板特性、轡ににんだ耐熱性に大きく影響する・
等の問題かある。A liquid acrylonitrile-butadiene copolymer containing amine groups, etc.) is mixed with a conventional 7-acrylonitrile-butadiene conjugate, which causes phase separation even in an organic solvent solution (3) Low rubber-containing layer agent In this case, the amount of epoxy resin is inevitably increased, and there are problems such as the epoxy resin curing agent, class 81, which greatly affects the characteristics of the wiring board and the heat resistance of the board.
本発明はこのような点に鑑みてなさn、たもので、熱硬
化性W脂の有機溶剤溶液に、官能基と二重M曾とt有す
るアクリレニトリル・ブタジェン共重合体とエポキシ樹
脂との反応生成物tアクリロニトリル・ブタジェン共重
合体成分か浴剤を除く有機材料中2〜201童%となる
工うに混曾すると共に、化学粗化液に溶解する無機充填
剤を溶剤を除くM機材料100重重稀に対し5〜50点
魚部混付した接層剤t%絶縁基8i表向に塗布すること
t臀値とするものである〇官能基と二車M台とt有する
アクリロニトリル・ブタジェン共Xせ体とエポキシ樹脂
とt予じめ反応させ/S礪甘せエポキシ樹脂の配せ削せ
はアクリロニトリル・ブタジェン共1曾体とエボキ−シ
樹脂の和に対して40〜95]Lit%内で行い。The present invention was made in view of these points, and involves adding an acrylonitrile-butadiene copolymer having a functional group and a double M and an epoxy resin to an organic solvent solution of a thermosetting W resin. The reaction product of the acrylonitrile-butadiene copolymer component is mixed in an amount of 2 to 201% in organic materials excluding bath additives, and the inorganic filler dissolved in the chemical roughening solution is mixed in the organic material excluding the solvent. 5 to 50 points per 100 parts of the material are mixed with a layer agent t% insulation group 8i It is to be applied on the surface to give a t value 〇Functional group and acrylonitrile with two wheels M unit and t. Butadiene co-X compound and epoxy resin are reacted in advance/S-sweetened epoxy resin arrangement and cutting is 40 to 95]Lit for the sum of acrylonitrile-butadiene compound and epoxy resin. Perform within %.
硬化剤としてはノボラックタイプフェノール樹脂あるい
はビニルフェノール債脂rエポキシ悄n=と硬化舜Jせ
耐iの15〜50][%添刀口する〇アクリロニトリル
・ブタジェン共に合体の割付か浴剤を除く有機材料中2
0m倉%を超すとゴムの減電による亀気轡性向土の幼米
がなくなり、2逮it%未満でに粗化液溶解性無機充填
剤を墳瀘して接層剤表面の粗化にLゐ凹凸の度付r大き
くしても接着力かj、2 kg / cn+以上になら
ない0官油革と二31[lti甘を有するアクリロニト
リル・ブタジェン共重合体とエポキシ俯脂混曾物中のエ
ポキシ樹脂の配付11J台會40貞童%以上にして、予
め加熱反工6シて用いると溶欲状捜で長期保管しても相
分離しなくなる。40311%未満では保管中分離する
ので接層剤を塗布する時、常時攪拌する必要からる。エ
ポキシ樹脂配付量が951it%を超すと、未反応の7
クリロニトリル・ブタジェン共重合体r追加して接層剤
を作る必要かあり、相分離ケ生じ不通白でるる・
なお、アクリロニトリル・ブタジェン共重合体とエポキ
シ樹脂を予め反応丁ゐ時b )I!I/il¥、浴剤’
rIIS加しないで5反応容器内で攪拌しながら加熱し
て行うか適当なエポキシ樹脂用硬化剤ン絵加して加熱温
度低下を図っても工い0′ビhニ基としてアイノ&’t
−導入したアクリロニトリル・ブタジェン共重合体も使
用できるか、エポキシ樹脂との予備反応時にグル化じや
すいこと、およびW!潰剤塗布硬化時のアンモニア臭気
からカルボキシル基含有共重合体の方か実用上通すゐ0
アクリロニトリル・ブタジェン共重合体の添加tvmら
し九場曾、粗化によって作成丁ゐ誉膚剤表面の凹凸が小
さくなりilf力か低下丁ゐか、粗化液浴解性の無磯光
積刑忙ム加丁ゐと向上する0無機尤項剤のamに4f機
材料100ム倉sVc対し、511[型部未満では接層
力増大に効果かなく、50重首部を超すとはんだ耐熱性
か悪化する0粗化ffi、#解性の無愼尤項剤として炭
酸カルシウム、硅酸カルシウムかftll5性、電気骨
性上用いうゐか、粒子の形状から戻緻カルシウムか好ま
しい。すなわち硅酸カルシウムは結晶か紬貴く接層剤表
面に存在した場合、租化挟、細長い凹みr生じ、メッキ
時に回路欠けt生r7)傾lOJかめる。その点、炭酸
力ルンウムは細長い粒子が宮ln、ないので1回路そ廣
の度付に応じた枝梗のものr選び混合便用で8る0印刷
配+1!1i8iは!![1,巌、部品取りつけ等のた
めに半田っけか行なわn、父、使用時の発熱の丸め高温
#巣力か必要でるる・
ゴム分の多いMi:層剤の動電にレゾールタイプのアル
キル7sノール働脂かアクリロニトリル・ブタジェンゴ
ムの衝脂加伽用に、又、ゴム分の全くないエポキシ樹脂
の場合は、ジシアンジアミドか一般に用−らn、ている
。As a hardening agent, use a novolac type phenolic resin or vinyl phenol resin or epoxy resin with a hardening resistance of 15 to 50%. 2nd year middle school
If it exceeds 0m%, there will be no young rice that is prone to rotting due to the reduction of electricity in the rubber, and if it is less than 2%, the roughening liquid soluble inorganic filler will be packed in and the surface of the adhesive will be roughened. Even if the degree of unevenness is increased, the adhesion strength will not exceed 2 kg/cn+. If the epoxy resin is used at a concentration of 40% or more and heated before use, it will not phase separate even if stored for a long time due to the solubility. If it is less than 40311%, it will separate during storage, so it will be necessary to constantly stir when applying the layering agent. If the amount of epoxy resin distributed exceeds 951 it%, unreacted 7
It may be necessary to add acrylonitrile-butadiene copolymer to make a layering agent, which may cause phase separation and result in an incommunicable color. I/il¥, bath salts'
It can also be carried out by heating while stirring in a reaction vessel without adding rIIS, or it can be applied with a suitable curing agent for epoxy resin to lower the heating temperature.
- Can the introduced acrylonitrile-butadiene copolymer be used? It is easy to glue during the preliminary reaction with the epoxy resin, and W! Due to the ammonia odor when applying the crusher and curing, it is practical to use a carboxyl group-containing copolymer.
Addition of acrylonitrile-butadiene copolymer to TVM, and by roughening, the unevenness of the surface of the skin agent created becomes smaller and the ILF strength decreases. The am of the 0 inorganic additive improves with the addition of 0 inorganic additives, and the 4f mechanical material 100 mukura sVc is less than 511[mold part, which has no effect on increasing the contact force, and if it exceeds 50 dwarf part, the soldering heat resistance deteriorates. Calcium carbonate, calcium silicate, or calcium carbonate is preferable as a zero-roughening ffi, #decomposable, uncontaminated agent due to its properties, electrolyte properties, or particle shape. In other words, if calcium silicate is present on the surface of the adhesive in the form of crystals, it will cause cracking, elongated depressions, and circuit chipping during plating. On that point, carbonic acid power runum does not have elongated particles, so choose one with a branch according to the prescription of 1 circuit width for mixed use. ! [1, Iwao, do soldering to attach parts, etc.n, father, rounding of heat generated during use #resulting force is required・Mi with a high rubber content: resol type for electrodynamic layer agent Dicyandiamide is generally used for the fattening of alkyl 7S alcohol or acrylonitrile-butadiene rubbers, and in the case of epoxy resins with no rubber content.
本発明の比較的少量のゴム含有接層剤中では。In the relatively small amount of rubber-containing adhesive of the present invention.
上記硬化系でも使用条件を選べば使用できるが。The above-mentioned curing system can also be used if the usage conditions are selected.
ノボ2ツク、フェノール樹脂およびビニルフェノール樹
脂を用いるとはんだ耐熱性か向上するOノボ2ツクタイ
プフェノール樹脂の時にエポキシ樹脂量(アクリロニト
リル・ブタジェン共重合体との予備反応寄中のエポキシ
樹脂分と未反応エポキシ樹脂の合計)に7エノール倒脂
を加えた首中の15〜50重ii%、望ましくは25〜
401童シか良い。15[111%未満でに硬化不足で
はんだ耐熱性か悪<、5oxit%を超丁と粗化さj、
にくくなシ接漕力かでない。Soldering heat resistance is improved when using Novo 2 Tsuku, phenolic resin, and vinyl phenol resin.OWhen using Novo 2 Tsuku type phenolic resin, the amount of epoxy resin (epoxy resin content during preliminary reaction with acrylonitrile-butadiene copolymer and unused amount) 15 to 50% by weight, preferably 25 to 25% by weight of the total amount of reacted epoxy resins) plus 7 enol fallen fat
401 Doushi is good. 15 [If less than 111%, the solder heat resistance is poor due to insufficient curing.
There is no difficult rowing force.
ビニル2エノール樹脂も15〜50重重%、殖1しくに
25〜40夏量%が良い。15.m1%未満では、はん
だ耐熱性か、50It%r超すと接層力かでないO
なお接着剤#を面の粗化はメチルエチルケトン、酢賊エ
テル、ジメチルホルムアンド等の有機浴剤でjl!潤さ
せたのち酸化性粗化液で溶解丁4)。Vinyl 2-enol resin is also preferably used at a concentration of 15 to 50% by weight, and for growth of 25 to 40% by weight. 15. If it is less than 1% m, the soldering heat resistance will be poor, and if it exceeds 50 It%r, the bonding strength will be poor.To roughen the surface of adhesive #, use an organic bath agent such as methyl ethyl ketone, acetic acid ether, dimethyl formand, etc. After moistening, dissolve in oxidizing roughening solution 4).
酸化性粗化液としては、elR化性V)クロム混酸。As the oxidizing roughening liquid, elR-forming V) chromium mixed acid is used.
クロA酸、はう弗化水素酸液等かめる。Contain chloroA acid, hydrofluoric acid solution, etc.
実hガ1
エピート1004(シェル化学展エポキシ樹脂)とカル
ボキシル基官有アクリロニトリル・ブタジェン共重合体
(ハイカーCTBN130θ×13)tNjIt比で5
対10割付でフラスコに人1180℃で3時開攪拌)J
D熱してプ17 リアクト共重合体を作成した。Actual hga 1 Epit 1004 (Shell Chemical Exhibition epoxy resin) and carboxyl group-functionalized acrylonitrile-butadiene copolymer (Hiker CTBN130θ x 13) tNjIt ratio is 5
Stir in a flask at 1180℃ with 10 portions open at 3 o'clock)J
D heating was carried out to prepare a P17 react copolymer.
ノリリアクト共貞七体+6nm部、エピコート 1c1
04 、 541ii$、 5b−6600(スケネ
クタディ・ケミカル社製ノボラックタイプフェノール樹
脂)3ohm部、炭酸カル7ウム15M鼠部、めっき触
媒(日立化成工業■製PEC−8)6電閂部、シリカ粉
(エロジール)5M讐都tセロンルプアセテートに箔層
分散させて接層剤kfj”W、した。この接層剤を紙基
材2エノール槓ノー板(日立化成工業■製147F)に
乾燥俊の接層剤厚さか40μになるように慮石、乾燥し
、170℃で60分jに〃σ熱硬化させた。この接層剤
被榎積層板tジメテルホルムアはドとインプロビルアル
コール1対1混曾解剤中K 2分間浸漬膨llI後酸化
性のクロム混酸でエッデング粗化し、化学メッキを行っ
て銅淳み30μの鋼メッキ積層板を作成した。用いた接
層剤中のアクリロニトリル・ブタジェンゴム含有率は溶
剤を除く有機材料干て4重t%である。NoriReact Kyotei Seven +6nm part, Epicort 1c1
04, 541ii$, 5b-6600 (novolac type phenolic resin manufactured by Schenectady Chemical Co.) 3 ohm parts, calcium carbonate 15M rod, plating catalyst (PEC-8 manufactured by Hitachi Chemical Co., Ltd.) 6 electric bar parts, silica powder ( A foil layer was prepared by dispersing a foil layer of 5M (Erosyl) 5M chlorine acetate to prepare a layer of adhesive. The adhesive was dried to a thickness of 40μ, and then heat-cured at 170°C for 60 minutes.The laminated laminate to which the adhesive was applied was dimethylformia mixed in a 1:1 mixture of 1:1 and Improvil alcohol. After swelling by immersion in K for 2 minutes in decomposition, it was roughened by edging with an oxidizing chromium mixed acid, and chemically plated to produce a steel plated laminate with a copper thickness of 30μ.Acrylonitrile-butadiene rubber content in the adhesive used is 4% by weight of organic materials excluding solvents.
実7M?IJ2
実施例1において、プリリアクト共重合体t40部とし
、その分未反応のエビコー) 1004?rfjFcら
し、その他に実施例1と同様にして印刷配線板を得た。Actually 7M? IJ2 In Example 1, the pre-react copolymer was t40 parts, and the unreacted Ebico) was 1004? A printed wiring board was obtained in the same manner as in Example 1 except that rfjFc was used.
ゴム含有率Fitoxt%で必る0笑m力6
実施例1においてsp〜6600’tレジ7M(丸善石
油KK製ビニルフェノール@脂)に代えて接看剤を作成
し他は実施例1と同様にして印刷配線板を作成した〇
実施例4
実施例1において、エビコー)+004’150.5部
にし、5p−660(l除き、ジシアンジアミドr1.
5m、ベンジルジメチルアミン2部’tmえ%接着剤r
作成し、他に実施例1と同様にして印刷配線板を作成し
た。0 m force required by rubber content Fitoxt% 6 In Example 1, sp ~ 6600't Resistance 7M (vinylphenol @ resin manufactured by Maruzen Sekiyu KK) was replaced with a dressing agent, and the rest was the same as in Example 1. 〇Example 4 In Example 1, 150.5 parts of dicyandiamide r1.
5m, benzyldimethylamine 2 parts 'tme% adhesive r
A printed wiring board was produced in the same manner as in Example 1.
比較例
アクリロニトリル・ブタジェンゴム(ハイカー1052
)45部% 5p−660010部、5p−126(ス
ケネクタディ・ケミカル社製レゾール形フェノール倒刀
¥1)20ffB、エビコー)1004. 25部、珪
酸ジルコニウム45都、7リ力籾3sメツ午触媒6部r
セロンルブアセテートVC浴屑分散させてw!麿剤を作
成し、実施例1と−」禄にして鋼メッキ積層板を作成し
次。Comparative example Acrylonitrile/butadiene rubber (Hiker 1052
) 45 parts% 5p-660010 parts, 5p-126 (Schenectady Chemical Co. resol type phenol folding sword ¥1) 20ffB, Ebiko) 1004. 25 parts, 45 parts of zirconium silicate, 3 parts of zirconium silicate, 6 parts of catalyst
Disperse Ceronlube Acetate VC bath waste lol! A steel plated laminate was prepared using the same method as in Example 1, and then a steel plated laminate was prepared.
なお工程中の溶剤浸漬も埋懺省略し上口こ11ら実施例
、比較例で得らn、た印刷配線板の特注1jr側足した
firs第1嶽の通シであった◇V、千ぶI]
第1嵌 骨性掬定M釆
口n1Fi謁電正談、 #は誘電率でああ。In addition, the solvent immersion during the process and the embedding were omitted, and the upper opening was the first through-hole of the firs 1, which was obtained in Examples and Comparative Examples. [Bu I] 1st fitting Bone extraction M button mouth n1Fi Audience transmission conversation, # is the dielectric constant.
以上親切したように、不発明に於てに時に誘電率、誘電
正接等高局波脣に丁ぐj8、かつはんだ耐熱性、接層力
のよい印刷配線板の製造に便用石1.る接滑剤被徨絶縁
基板を製造すること力i出来4゜As mentioned above, we have developed a convenient stone for manufacturing printed wiring boards that has high dielectric constant, dielectric loss tangent, etc., and has good solder heat resistance and bonding strength. It is possible to manufacture an insulating substrate coated with a lubricant.
Claims (1)
Ii曾とtVするアクリロニトリル・ブタジェン共重合
体とエポキシ樹脂との反応生成*tアクリpニトリル・
ブタジェン共夏せ庫成分が溶剤を除く有機材料中2〜2
01重%となるよりに混合すると共に、化学粗化類に溶
解するfl@機光横剤tm剤を除く有機材料10O]1
倉部に対し5〜50重量部混付した接増剤t1絶縁基板
表面に塗布子ゐことt%倣とする接層剤被蝋絶縁基板の
製造法。 2 アクリロニトリル・ブタジェン共重合体か。 カルボキシル基を有するアクリロニトリル・ブタジェン
共重合体である特許請求の範囲第1、!J記載の接着剤
*a絶緻基板の製造法〇& 7クリロニトリル・ブタジ
ェン共産4を体とエポキシ樹脂とを、両者の和に対し、
エポキシ樹脂か40〜95重量%と7!、6ようにして
反応させる特許請求の範囲第1331記載の接着剤41
1a!絶縁基板の製造法・[Scope of Claims] 1. Thermosetting 1m fat organic solvent solution containing a functional group and 21l
Reaction product of acrylonitrile-butadiene copolymer and epoxy resin
2 to 2 butadiene components in organic materials excluding solvents
01% by weight, and organic materials other than the fl@Kikkoyoko tm agent dissolved in the chemical coarsening agent 10O] 1
A method for manufacturing an insulating substrate to be coated with a bonding agent, in which 5 to 50 parts by weight of a bonding agent is added to the surface of the insulating substrate. 2 Is it an acrylonitrile-butadiene copolymer? Claim 1, which is an acrylonitrile-butadiene copolymer having a carboxyl group! Adhesive described in J *A Manufacturing method for extremely fine substrate
Epoxy resin or 40-95% by weight and 7! , 6, the adhesive 41 according to claim 1331, which is reacted in the manner
1a! Insulated substrate manufacturing method/
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15639181A JPS5857776A (en) | 1981-09-30 | 1981-09-30 | Method of producing adhesive coated insulating substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15639181A JPS5857776A (en) | 1981-09-30 | 1981-09-30 | Method of producing adhesive coated insulating substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5857776A true JPS5857776A (en) | 1983-04-06 |
| JPS6344821B2 JPS6344821B2 (en) | 1988-09-07 |
Family
ID=15626712
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15639181A Granted JPS5857776A (en) | 1981-09-30 | 1981-09-30 | Method of producing adhesive coated insulating substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5857776A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62199669A (en) * | 1986-02-28 | 1987-09-03 | Tomoegawa Paper Co Ltd | Paste for die bonding |
| US5532105A (en) * | 1992-08-07 | 1996-07-02 | Hitachi Chemical Company, Ltd. | Photolithographically viahole-forming photosensitive element comprising two photosensitive layers for the fabrication process of multilayer wiring board |
-
1981
- 1981-09-30 JP JP15639181A patent/JPS5857776A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62199669A (en) * | 1986-02-28 | 1987-09-03 | Tomoegawa Paper Co Ltd | Paste for die bonding |
| US5532105A (en) * | 1992-08-07 | 1996-07-02 | Hitachi Chemical Company, Ltd. | Photolithographically viahole-forming photosensitive element comprising two photosensitive layers for the fabrication process of multilayer wiring board |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6344821B2 (en) | 1988-09-07 |
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