JPS5866330A - 電子ビ−ム描画系の位置補正方法 - Google Patents

電子ビ−ム描画系の位置補正方法

Info

Publication number
JPS5866330A
JPS5866330A JP56165133A JP16513381A JPS5866330A JP S5866330 A JPS5866330 A JP S5866330A JP 56165133 A JP56165133 A JP 56165133A JP 16513381 A JP16513381 A JP 16513381A JP S5866330 A JPS5866330 A JP S5866330A
Authority
JP
Japan
Prior art keywords
electron beam
substrate
mark
drawn
length measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56165133A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0336298B2 (mo
Inventor
Tsukasa Sawaki
澤木　司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP56165133A priority Critical patent/JPS5866330A/ja
Publication of JPS5866330A publication Critical patent/JPS5866330A/ja
Publication of JPH0336298B2 publication Critical patent/JPH0336298B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP56165133A 1981-10-15 1981-10-15 電子ビ−ム描画系の位置補正方法 Granted JPS5866330A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56165133A JPS5866330A (ja) 1981-10-15 1981-10-15 電子ビ−ム描画系の位置補正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56165133A JPS5866330A (ja) 1981-10-15 1981-10-15 電子ビ−ム描画系の位置補正方法

Publications (2)

Publication Number Publication Date
JPS5866330A true JPS5866330A (ja) 1983-04-20
JPH0336298B2 JPH0336298B2 (mo) 1991-05-31

Family

ID=15806522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56165133A Granted JPS5866330A (ja) 1981-10-15 1981-10-15 電子ビ−ム描画系の位置補正方法

Country Status (1)

Country Link
JP (1) JPS5866330A (mo)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254615A (ja) * 1984-05-30 1985-12-16 Toshiba Mach Co Ltd 電子ビーム露光における温度測定方法
JPS62173714A (ja) * 1986-01-27 1987-07-30 Toshiba Mach Co Ltd 電子ビ−ム描画装置
JPS62217686A (ja) * 1986-03-19 1987-09-25 Toshiba Mach Co Ltd レ−ザミラ−の位置変位補正方法
JP2000252204A (ja) * 1999-03-03 2000-09-14 Nikon Corp 基準マーク構造体、その製造方法及びそれを用いた荷電粒子線露光装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60254615A (ja) * 1984-05-30 1985-12-16 Toshiba Mach Co Ltd 電子ビーム露光における温度測定方法
JPS62173714A (ja) * 1986-01-27 1987-07-30 Toshiba Mach Co Ltd 電子ビ−ム描画装置
JPS62217686A (ja) * 1986-03-19 1987-09-25 Toshiba Mach Co Ltd レ−ザミラ−の位置変位補正方法
JP2000252204A (ja) * 1999-03-03 2000-09-14 Nikon Corp 基準マーク構造体、その製造方法及びそれを用いた荷電粒子線露光装置

Also Published As

Publication number Publication date
JPH0336298B2 (mo) 1991-05-31

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