JPS5867005A - Method for fine processing of magnetic body - Google Patents
Method for fine processing of magnetic bodyInfo
- Publication number
- JPS5867005A JPS5867005A JP56165357A JP16535781A JPS5867005A JP S5867005 A JPS5867005 A JP S5867005A JP 56165357 A JP56165357 A JP 56165357A JP 16535781 A JP16535781 A JP 16535781A JP S5867005 A JPS5867005 A JP S5867005A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic body
- magnetic
- temperature
- irradiated
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 11
- 230000001678 irradiating effect Effects 0.000 claims abstract description 7
- 239000000696 magnetic material Substances 0.000 claims description 20
- 230000005415 magnetization Effects 0.000 description 12
- 230000010287 polarization Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 241000220317 Rosa Species 0.000 description 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000036760 body temperature Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000004943 liquid phase epitaxy Methods 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
- H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Thin Magnetic Films (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は、磁性体の微細加工方法に関するものである。[Detailed description of the invention] The present invention relates to a method for microfabrication of magnetic materials.
磁気異方性の一部を或す、成長誘導磁気異方性は）磁性
体の作成時に発生するものであ）、成長誘導磁気異方性
を変化させることにより、磁気異方性を制御することは
、各種磁性体素子の構成に重要なものである〇
従来、磁性体の成長誘導磁気異方性を低下させる方法と
しては、主に高温度の炉の中で加熱する方法が用いられ
てきた。しかし、この方法では、磁性体全体の温度が一
様に上昇するため磁性体の一部分の成長誘導磁気異方性
を低下さ（ることは不可能であった。又レーザ光を用い
て、磁性体の温度を、非常に短い時間内ｃ〜ｌ０ｍ５）
に上昇・下降させ、急激な冷却効果によって、磁気的性
質の変化を得る方法も知られているが、この方法では、
磁気異方性の変化は、殆ど無視される程度の量であった
。Growth-induced magnetic anisotropy, which is a part of magnetic anisotropy, occurs during the creation of a magnetic material), and by changing the growth-induced magnetic anisotropy, magnetic anisotropy can be controlled. This is important in the construction of various magnetic elements. Conventionally, the method of reducing the growth-induced magnetic anisotropy of magnetic materials has mainly been to heat them in a high-temperature furnace. Ta. However, with this method, it was impossible to reduce the growth-induced magnetic anisotropy of a part of the magnetic material because the temperature of the entire magnetic material rose uniformly. body temperature within a very short period of time (c~l0m5)
There is also a known method of raising and lowering the magnetic properties to achieve a rapid cooling effect, but with this method,
The change in magnetic anisotropy was almost negligible.
本発明は、従来の方法の欠点を解消するためになされた
もので、磁性体にレーザ光を照射し希望する磁気異方性
の異なったパターンを簡単に形成する方法を提供するも
のである０本発明に至った技術的経緯を簡単に説明する
。The present invention was made to eliminate the drawbacks of conventional methods, and provides a method for easily forming patterns with different desired magnetic anisotropy by irradiating a magnetic material with laser light. The technical background that led to the present invention will be briefly explained.
本発明者は、磁性体にレーザ光を照射し、そ“の磁気的
性質の変化について種々研究を進めてきた結果レーサ゛
光を照射した部分の成長誘導磁気異方性が低下すること
を見出し、この方法を用いることによって、磁性体に磁
気異方性の異なったパターンを形成しうることが判明し
、本発明に至ったものである０
以下、本発明につ≠て説明する。第１図は本発明のため
の装置の原理図である０移動台１の上に置かれた炉２の
中に、磁性体８を置き、レーザ４の光をレンズ５で集光
し、磁性体８に照射する。移動台ｌは磁性体８に磁気異
方性の異なるパターンを形成する場合に用いられ、目的
によっては不要である。又炉２は、レーザ光の照射によ
り磁性体８の温度が局所的に上昇し１周囲との熱膨張の
差によって歪が生ずるのを防止するために、磁性体８の
全体の温度を適当な温度に保つために用いられるもので
あり、炉２自体は本質的なものではない。レーザ４／ｆ
ｉ、磁性体８の温度を上昇させるに十分な光出力のある
ものであれば、何でも良い。炉２の温度、レーザ４の光
出力およびレンズ５の磁性体８からの距離を変化させ、
磁性体８の光が照射されている部分の大きさと温度を適
当に選び、一定の時間レーザ光の照射を行なった後、磁
性体８の温度を下げる。温度が高いほど、一定量の磁気
異方性）変化を得るに必要な時間は短くなるので、磁性
体８の破損が起こる以下の適当な温度を選ぶ。上記の構
成に於て、磁性体８のレーザ光が照射された部分は、レ
ーザ光を吸収することにより、その温度を上昇させる。The present inventor has conducted various studies on changes in the magnetic properties of magnetic materials by irradiating them with laser light, and has discovered that the growth-induced magnetic anisotropy of the portion irradiated with laser light decreases. It has been found that by using this method, it is possible to form patterns with different magnetic anisotropy in a magnetic material, which led to the present invention.The present invention will be explained below. 1 is a principle diagram of the apparatus for the present invention. A magnetic body 8 is placed in a furnace 2 placed on a moving table 1, and the light of a laser 4 is focused by a lens 5, and the magnetic body 8 is The moving stage 1 is used when forming patterns with different magnetic anisotropy on the magnetic material 8, and is not necessary depending on the purpose.Furthermore, the furnace 2 is used to locally adjust the temperature of the magnetic material 8 by irradiating the laser beam. The furnace 2 is used to maintain the overall temperature of the magnetic material 8 at an appropriate temperature in order to prevent strain from occurring due to the difference in thermal expansion with the surrounding area. Not a thing. Laser 4/f
i. Any material may be used as long as it has sufficient light output to raise the temperature of the magnetic material 8. By changing the temperature of the furnace 2, the optical output of the laser 4, and the distance of the lens 5 from the magnetic body 8,
The size and temperature of the portion of the magnetic body 8 that is irradiated with light are appropriately selected, and after the laser beam irradiation is performed for a certain period of time, the temperature of the magnetic body 8 is lowered. The higher the temperature, the shorter the time required to obtain a certain amount of change in magnetic anisotropy. Therefore, an appropriate temperature below at which damage to the magnetic body 8 occurs is selected. In the above configuration, the portion of the magnetic body 8 irradiated with the laser beam absorbs the laser beam, thereby increasing its temperature.
その−ため、磁性体８の成長誘導磁気異方性は、温度お
よび磁性体δの種類、作成方法に依存した速度で減少す
る。よってレーザ４の光出力、炉２の温度、レンズ５の
磁性体８からの距離およびレーザ光の照射時間を適当に
選ぶことにより、希望する量の磁気異方性の変化を、希
望する大きさの部分に起こすことができる。更に移動台
１により、磁気異方性の異なるパターンを形成できる０
次に本発明による実施例について説明する。Therefore, the growth-induced magnetic anisotropy of the magnetic body 8 decreases at a rate that depends on the temperature, the type of the magnetic body δ, and the manufacturing method. Therefore, by appropriately selecting the optical output of the laser 4, the temperature of the furnace 2, the distance of the lens 5 from the magnetic body 8, and the laser beam irradiation time, the desired amount of change in magnetic anisotropy can be achieved. It can occur in the part of Furthermore, the movable table 1 allows patterns with different magnetic anisotropy to be formed.
Next, embodiments according to the present invention will be described.
本実施例で用いた磁性体は、 Ｇｄａ Ｇａｓ （ｈｓ
基板の両面に（ＹＢｉ）ｓ ｆｆｅＧａ） １１０１１
を液相エピタキシー成長させたものであり、成長誘導磁
気異方性に帰因する、基板面に垂直な一軸磁気異方性を
持つものである。磁性体を１ｏｏｏ″Ｃに保たれた炉・
２の中ＫＩき、アルゴンイオン・レーザの３Ｗの光を
、磁性体から２０！；’Ｘの距離に置いた焦点距離２０
０％ のレンズで集光し、２分間照射した。第２図は
、ファラデー効果を利用して求めた、磁性体の偏光能の
空間分布を、レーザ光が照射された部分を横断する直線
に沿って示したものである。レーザ光の照射された部分
６の偏光能は、レーザ光の照射されない部分７の偏光能
の振巾の中間にある。このことは、レーザ光の照射され
た部分の磁化が、レーザ光の照射されなかった部分の磁
化に比べ、大畠〈面内に傾いていることを示している。The magnetic material used in this example was Gda Gas (hs
(YBi)s ffeGa) 11011 on both sides of the board
is grown by liquid phase epitaxy, and has uniaxial magnetic anisotropy perpendicular to the substrate surface due to growth-induced magnetic anisotropy. Furnace where magnetic material is kept at 1ooo''C.
KI in the middle of 2, 3W light of argon ion laser is 20! ;'Focal length 20 placed at a distance of
The light was focused with a 0% lens and irradiated for 2 minutes. FIG. 2 shows the spatial distribution of polarization power of a magnetic material, determined using the Faraday effect, along a straight line that crosses the area irradiated with laser light. The polarization power of the portion 6 that is irradiated with the laser beam is in the middle of the amplitude of the polarization power of the portion 7 that is not irradiated with the laser beam. This indicates that the magnetization of the part irradiated with the laser beam is tilted in the Ohata plane compared to the magnetization of the part not irradiated with the laser beam.
第３図には、レーザ光の照射されなかった部分の磁化曲
線を、又第１図にはレーザ光の照射された部分の磁化曲
線を示した。飽和磁化の大きさく磁化曲線の縦軸の振巾
に比例する）は、レーザ光の照射された部分と、照射さ
れなかった部分とでは、殆ど変化がない。よって、レー
ザ光が照射された部分で、成長誘導異方性によ−る一軸
磁気異方性が変化し、その部分の磁化が面内方向に大き
く傾いたことがわかる。FIG. 3 shows the magnetization curve of the portion not irradiated with the laser beam, and FIG. 1 shows the magnetization curve of the portion irradiated with the laser beam. The magnitude of saturation magnetization (which is proportional to the amplitude of the vertical axis of the magnetization curve) hardly changes between the portion irradiated with laser light and the portion not irradiated. Therefore, it can be seen that the uniaxial magnetic anisotropy due to growth-induced anisotropy changes in the portion irradiated with the laser beam, and the magnetization of that portion is largely tilted in the in-plane direction.
第５図は７アテデ〜効果を利用してＩｌ！測したレーザ
光の照射された部分の磁気ドメインを示す顕微鏡写真で
ある。レーザ光の照射された部分がコントラストの弱い
スポット８として見られる。Figure 5 shows Il! using the 7 Atede~ effect! It is a micrograph showing the magnetic domain of the part irradiated with the measured laser beam. The portion irradiated with the laser beam is seen as a spot 8 with weak contrast.
以上述べたように、本発明は磁性体にレーザ光を照射す
ることにより、希望する量の磁気異方性の変化を、希望
する大きさの部分に起こすことができるものであり、こ
れまでに知られていない、全く新しい技術である。本発
明は、光アイソレータ、磁気バブル、磁気メモリなどの
各種素子の構成に大きく貢献するものである。As described above, the present invention enables a desired amount of change in magnetic anisotropy to be caused in a desired size portion by irradiating a magnetic material with laser light. This is an unknown, completely new technology. The present invention greatly contributes to the construction of various elements such as optical isolators, magnetic bubbles, and magnetic memories.
ｌＩ１図は、本発明のための装置の原理図、第２図は、
本発明の方法により得られた成長誘導磁気異方性の低下
した部分の偏光能を、レーザ光が照射されなかった部分
と共に示す図、第３図は、レーザ光を照射していない部
分の磁化曲線、第１／−図は、本発明の方法により得ら
れた、成長誘導磁気異方性の低下した部分の磁化曲線、
Ｃ第３７１Ｊと第１図の磁化＃１線の縦軸のスケールは
同一である）、第５図は、第２図に示した偏光能の空間
分布に対応する顕ｇ１鏡写真である〇図中、１ｔＩ′ｉ
移動台、２は炉、８は磁性体、会はレーザ、５はレンズ
、６はレーザ光の照射された部分、７はレーザ光の照射
されなかった部分、８は成長誘導磁気異方性の低下のた
めに、磁化が、その周囲の磁化に較べ、大きく面内方向
に傾いた領域である。
カ２図
７３図
第４図Figure lI1 is a principle diagram of the device for the present invention, and Figure 2 is a diagram showing the principle of the device for the present invention.
A diagram showing the polarization ability of a portion with reduced growth-induced magnetic anisotropy obtained by the method of the present invention together with a portion that was not irradiated with laser light. Figure 3 shows the magnetization of the portion that was not irradiated with laser light. The curve, Figure 1/- is the magnetization curve of the part where the growth-induced magnetic anisotropy is reduced, obtained by the method of the present invention.
(The scale of the vertical axis of C371J and the magnetization #1 line in Figure 1 is the same), Figure 5 is a microscopic g1 mirror photograph corresponding to the spatial distribution of polarization power shown in Figure 2. Medium, 1tI'i
A moving stage, 2 a furnace, 8 a magnetic material, a laser 5, a lens, 6 a part irradiated with laser light, 7 a part not irradiated with laser light, 8 a growth-induced magnetic anisotropy This is a region where the magnetization is largely tilted in the in-plane direction compared to the surrounding magnetization due to the decrease. Figure 2 Figure 73 Figure 4
Claims (1)
成長誘導磁気異方性を低下せしめることを特徴とする磁
性体の微細加工方法０A method for microfabrication of a magnetic material 0, characterized in that irradiating the magnetic material with laser light reduces the growth-induced magnetic anisotropy of the magnetic material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56165357A JPS5867005A (en) | 1981-10-16 | 1981-10-16 | Method for fine processing of magnetic body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56165357A JPS5867005A (en) | 1981-10-16 | 1981-10-16 | Method for fine processing of magnetic body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5867005A true JPS5867005A (en) | 1983-04-21 |
| JPS6222243B2 JPS6222243B2 (en) | 1987-05-16 |
Family
ID=15810824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56165357A Granted JPS5867005A (en) | 1981-10-16 | 1981-10-16 | Method for fine processing of magnetic body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5867005A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2611970A1 (en) * | 1987-03-06 | 1988-09-09 | Thomson Csf | METHOD FOR MAKING A THIN-FILM MAGNETIC HEAD AND APPLICATION TO A RECOVERY / READING HEAD |
| US5601662A (en) * | 1989-06-30 | 1997-02-11 | Kabushiki Kaisha Toshiba | Method of introducing magnetic anisotropy into magnetic material |
-
1981
- 1981-10-16 JP JP56165357A patent/JPS5867005A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2611970A1 (en) * | 1987-03-06 | 1988-09-09 | Thomson Csf | METHOD FOR MAKING A THIN-FILM MAGNETIC HEAD AND APPLICATION TO A RECOVERY / READING HEAD |
| US5601662A (en) * | 1989-06-30 | 1997-02-11 | Kabushiki Kaisha Toshiba | Method of introducing magnetic anisotropy into magnetic material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6222243B2 (en) | 1987-05-16 |
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