JPS58690Y2 - Spacer for coil annealing - Google Patents
Spacer for coil annealingInfo
- Publication number
- JPS58690Y2 JPS58690Y2 JP1977141338U JP14133877U JPS58690Y2 JP S58690 Y2 JPS58690 Y2 JP S58690Y2 JP 1977141338 U JP1977141338 U JP 1977141338U JP 14133877 U JP14133877 U JP 14133877U JP S58690 Y2 JPS58690 Y2 JP S58690Y2
- Authority
- JP
- Japan
- Prior art keywords
- spacer
- coils
- coil
- temperature
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Heat Treatments In General, Especially Conveying And Cooling (AREA)
- Heat Treatment Of Articles (AREA)
Description
【考案の詳細な説明】
本考案は、各コイルを数段に積み重ねて焼鈍炉内で焼鈍
する際、各コイルの加熱温度を均一化するため各コイル
間に挿入して使用するスペーサに関する。[Detailed Description of the Invention] The present invention relates to a spacer that is inserted between each coil in order to equalize the heating temperature of each coil when the coils are stacked in several stages and annealed in an annealing furnace.
コイルを焼鈍する場合、従来においては第1図に示すよ
うにベース1上にコイル2,3.4及び5を積載し、こ
れら各コイル間に放射方向に同一ピッチW1の凹凸を形
成したドーナツ状スペーサ6を挿入し、各スペーサ6と
各コイル2,3.4及び5間に生じた空隙7に高温のガ
スを給送して行なっている。When annealing a coil, conventionally, as shown in Fig. 1, coils 2, 3, 4, and 5 are stacked on a base 1, and a donut-like shape is formed with unevenness of the same pitch W1 in the radial direction between each coil. This is done by inserting spacers 6 and supplying high-temperature gas to the gaps 7 created between each spacer 6 and each coil 2, 3, 4, and 5.
ところが、この方法によるとスペーサ表面に形成した凹
凸のピッチW1が同一ピッチで゛あるため、上下の各ス
ペーサ6が対称型になり、昇温中の各コイル2,3.4
及び5の加熱温度が均一、にならない
例えば、ベース1に最下端のコイル2と上端のコイル5
はほぼ同じ温度で昇温されるが、中間部のコイル3及び
4は前記コイル2及び5に比べかなり低い温度となる特
性をもつ焼鈍炉においては、コイル2及び5が650℃
のときコイル3及び4は約600℃となる。However, according to this method, since the pitch W1 of the unevenness formed on the spacer surface is the same, the upper and lower spacers 6 become symmetrical, and each coil 2, 3.4 during heating.
For example, if the bottom coil 2 and the top coil 5 are connected to the base 1, the heating temperature of the coils 2 and 5 is not uniform.
are heated at almost the same temperature, but in an annealing furnace where coils 3 and 4 in the middle part have a characteristic that the temperature is considerably lower than that of coils 2 and 5, coils 2 and 5 are heated to 650°C.
At this time, the temperature of coils 3 and 4 becomes approximately 600°C.
本考案はこの点に鑑みなされたものであり、以下その実
施例を示す第4図乃至第6図に基づいて説明する。The present invention has been devised in view of this point, and will be described below based on FIGS. 4 to 6 showing embodiments thereof.
本考案スペーサは図に示すように、ドーナツ状スペーサ
8の表面に広狭異なるピッチの凹凸を放射状に形成した
ものであり、実施例では面の如く凹部9のピッチW2を
凸部10のピッチW1の倍の大きさにしている。As shown in the figure, the spacer of the present invention has unevenness radially formed on the surface of a donut-shaped spacer 8 with different pitches, wide and narrow. It's twice the size.
そして前記の如くコイル3及び4が、コイル1及び5よ
りも低温となる特性をもつ焼鈍炉での使用に際しては、
第4図に示すように本考案スペーサ8をコイル2と3及
びコイル4と5との間に挿入し、コイル3及びコイル4
と各スペーサ8との間には大きな間隙11を、コイル2
及び5と各スペーサ8との間には小さな間隙12を形成
し、これら間隙11及び12中に高温のガスを給送して
焼鈍する。When used in an annealing furnace where coils 3 and 4 have a lower temperature than coils 1 and 5 as described above,
As shown in FIG. 4, the spacer 8 of the present invention is inserted between the coils 2 and 3 and the coils 4 and 5, and the spacer 8 is inserted between the coils 3 and 4.
A large gap 11 is provided between the coil 2 and each spacer 8.
A small gap 12 is formed between each of the spacers 8 and 5, and high-temperature gas is fed into these gaps 11 and 12 for annealing.
なお、コイル3と4との間には従来と同様のスペーサ6
を挿入し、各スペーサと各コイル間に形成される各間隙
に高温のガスを給送して焼鈍する。Note that a spacer 6 similar to the conventional one is provided between the coils 3 and 4.
are inserted, and high-temperature gas is supplied to each gap formed between each spacer and each coil to perform annealing.
本考案スペーサは、このようにして戒るので、コイルへ
の熱供給が主として高温ガスをコイルのエツジに接触さ
せることによって行なわれるコイル焼鈍においては、本
考案スペーサ8によりコイル2及び5は高温ガスとの接
触面積が小さくなり、コイル2及び5への熱供給が押え
られる。The spacer of the present invention prevents coils 2 and 5 from being exposed to high-temperature gas by the spacer 8 of the present invention during coil annealing where heat supply to the coil is performed mainly by bringing high-temperature gas into contact with the edges of the coil. The contact area with the coils 2 and 5 becomes smaller, and heat supply to the coils 2 and 5 is suppressed.
反対にコイル3及び4と本考案スペーサ8との間には大
きな間隙11が形成されるのでコイル3及び4と高温ガ
スとの接触面積は大きくなり、コイル3及び4への熱供
給は増大される。On the contrary, since a large gap 11 is formed between the coils 3 and 4 and the spacer 8 of the present invention, the contact area between the coils 3 and 4 and the high-temperature gas is increased, and the heat supply to the coils 3 and 4 is increased. Ru.
なお、コイル3及び40間には従来と同様のスペーサ6
を挿入しているのでスペーサ6による両コイル3及び4
−の熱供給は均等に配分される。Note that a spacer 6 similar to the conventional one is provided between the coils 3 and 40.
is inserted, both coils 3 and 4 are connected by spacer 6.
- the heat supply is evenly distributed.
このように本考案スペーサ8を使用すれば、上端及び下
端の比較的高温になり易いコイル2及び5への熱供給が
押えられ、コイル2及び5に比べて従来かなり低い温度
となっていた中間のコイル3及び4への熱供給が増大さ
れるので、これら各コイルの温度が均一化され、従来の
ように各コイルの温度が不均一になることなはい。In this way, by using the spacer 8 of the present invention, the heat supply to the coils 2 and 5 at the upper and lower ends, which tend to reach relatively high temperatures, can be suppressed, and the temperature in the middle, which has conventionally been considerably lower than that of the coils 2 and 5, can be suppressed. Since the heat supply to the coils 3 and 4 is increased, the temperature of each of these coils becomes uniform, and the temperature of each coil does not become non-uniform as in the conventional case.
なお、前記実施例はコイル3及び4がコイル1及び5よ
りも低温となる特性をもつ焼鈍炉に関するが、焼鈍炉の
特性に応じて低温となる部分へ高温ガスが多く送流され
るように本考案とスペーサを配置すべきことはいうまで
もない。The above embodiment relates to an annealing furnace in which the coils 3 and 4 have a temperature lower than that of the coils 1 and 5, but according to the characteristics of the annealing furnace, the present invention is designed so that more high-temperature gas is sent to the lower temperature part. Needless to say, some ideas and spacers should be placed.
また、本考案実施例においては凹部9のピンチW2と凸
部10のピッチW1との比を2:1にしたが、これに限
定されず、ガスの対流ファンの容量等、炉の状況に応じ
適当な比にすれば各コイルの温度を均一化することがで
きる。In addition, in the embodiment of the present invention, the ratio of the pinch W2 of the concave portion 9 to the pitch W1 of the convex portion 10 is set to 2:1, but the ratio is not limited to this, and may vary depending on the situation of the furnace such as the capacity of the gas convection fan, etc. By setting an appropriate ratio, the temperature of each coil can be made uniform.
更にW、=Oとした第6図の如きスペーサーも温度分布
が著しく不均一である焼鈍炉において有効である。Furthermore, a spacer with W and =O as shown in FIG. 6 is also effective in an annealing furnace where the temperature distribution is extremely uneven.
以上説明したように本考案スペーサはドーナツ状スペー
サの表面に異なるピッチの凹凸を放射状に形威し、コイ
ルの温度を均一にして焼鈍できるようにしたものであり
、極めて簡単な構造のものでありながら実用的効果大な
るものである。As explained above, the spacer of the present invention has an extremely simple structure in which the surface of the donut-shaped spacer is radially shaped with unevenness of different pitches, so that the temperature of the coil can be uniformized during annealing. However, it has great practical effects.
第1図は各コイルの間に挿入した従来のスペーサの展開
断面図、第2図は同斜視図、第3図は同一部拡大斜視図
、第4図は各コイル間に挿入した本考案スペーサの一実
施例を示す展開断面図、第5図は同一拡大斜視図、第6
図は他の実施例を示すスペーサの一部拡大斜視図である
。
2.3,4.5はコイル、8はスペーサ、9は凹部、1
0は凸部、Wl、W2はピッチ。Figure 1 is an exploded sectional view of a conventional spacer inserted between each coil, Figure 2 is a perspective view of the same, Figure 3 is an enlarged perspective view of a portion of the same, and Figure 4 is the spacer of the present invention inserted between each coil. FIG. 5 is an enlarged perspective view of the same, and FIG.
The figure is a partially enlarged perspective view of a spacer showing another embodiment. 2.3, 4.5 are coils, 8 is a spacer, 9 is a recess, 1
0 is the convex portion, Wl and W2 are the pitches.
Claims (2)
に挿入して使用するスペーサにおいて、ドーナツ状スペ
ーサの表面に広狭異なるピッチの凹凸を放射状に形成し
たことを特徴とするコイル焼鈍用スペーサ。(1) A spacer for coil annealing, which is used by inserting between coils when a plurality of coils are stacked and annealed, and is characterized in that the surface of the donut-shaped spacer is radially formed with unevenness of different pitches.
載のコイル焼鈍用スペーサ。(2) A spacer for coil annealing according to item 1 of the utility model registration, in which the narrower pitch is zero.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1977141338U JPS58690Y2 (en) | 1977-10-19 | 1977-10-19 | Spacer for coil annealing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1977141338U JPS58690Y2 (en) | 1977-10-19 | 1977-10-19 | Spacer for coil annealing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5465907U JPS5465907U (en) | 1979-05-10 |
| JPS58690Y2 true JPS58690Y2 (en) | 1983-01-07 |
Family
ID=29117063
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1977141338U Expired JPS58690Y2 (en) | 1977-10-19 | 1977-10-19 | Spacer for coil annealing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58690Y2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5242125B2 (en) * | 1973-04-17 | 1977-10-22 |
-
1977
- 1977-10-19 JP JP1977141338U patent/JPS58690Y2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5465907U (en) | 1979-05-10 |
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