JPS5883145U - 試料加熱機構 - Google Patents

試料加熱機構

Info

Publication number
JPS5883145U
JPS5883145U JP17933281U JP17933281U JPS5883145U JP S5883145 U JPS5883145 U JP S5883145U JP 17933281 U JP17933281 U JP 17933281U JP 17933281 U JP17933281 U JP 17933281U JP S5883145 U JPS5883145 U JP S5883145U
Authority
JP
Japan
Prior art keywords
heating mechanism
sample heating
sample
abstract
cloner
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17933281U
Other languages
English (en)
Inventor
渡辺 「巌」
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP17933281U priority Critical patent/JPS5883145U/ja
Publication of JPS5883145U publication Critical patent/JPS5883145U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Control Of Resistance Heating (AREA)
  • Thermotherapy And Cooling Therapy Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【図面の簡単な説明】
第1図は本考案の一実施例を示した試料の加熱機構、第
2図はその一部詳細図である。 1:基台、2:電熱線、3:絶縁性プレート、4:加熱
用電源、5:金属板、6:絶縁被膜、7:試料、8:高
電圧源。

Claims (1)

    【実用新案登録請求の範囲】
  1. 試料の下に絶縁材を介して電熱材と、前記試料とクロー
    ンカにより引き合う電極材とを配置した試料加熱機構。
JP17933281U 1981-12-01 1981-12-01 試料加熱機構 Pending JPS5883145U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17933281U JPS5883145U (ja) 1981-12-01 1981-12-01 試料加熱機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17933281U JPS5883145U (ja) 1981-12-01 1981-12-01 試料加熱機構

Publications (1)

Publication Number Publication Date
JPS5883145U true JPS5883145U (ja) 1983-06-06

Family

ID=29974931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17933281U Pending JPS5883145U (ja) 1981-12-01 1981-12-01 試料加熱機構

Country Status (1)

Country Link
JP (1) JPS5883145U (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3993509A (en) * 1973-11-07 1976-11-23 U.S. Philips Corporation Semiconductor device manufacture
JPS5483373A (en) * 1977-12-16 1979-07-03 Fujitsu Ltd Heating-up method of semiconductor substrate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3993509A (en) * 1973-11-07 1976-11-23 U.S. Philips Corporation Semiconductor device manufacture
JPS5483373A (en) * 1977-12-16 1979-07-03 Fujitsu Ltd Heating-up method of semiconductor substrate

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