JPS5884404A - thin film thermistor - Google Patents
thin film thermistorInfo
- Publication number
- JPS5884404A JPS5884404A JP56182066A JP18206681A JPS5884404A JP S5884404 A JPS5884404 A JP S5884404A JP 56182066 A JP56182066 A JP 56182066A JP 18206681 A JP18206681 A JP 18206681A JP S5884404 A JPS5884404 A JP S5884404A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film thermistor
- temperature
- shielding plate
- support container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Thermistors And Varistors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明は、温度を検出すべき対象物と機械的に接触して
温度を検出するサーミスタ、たとえば鍋 、物調理をす
る際・鍋底を通して鍋内部4理物の 2 ページ
温度を検出するサーミスタに関するものである。[Detailed Description of the Invention] The present invention relates to a thermistor that detects temperature by mechanically contacting an object whose temperature is to be detected, such as a pot, when cooking food, and through the bottom of the pot.Page 2 This relates to a thermistor that detects temperature.
従来、この種温度検出は第1図に示す如く鍋底1に高速
応答性薄膜サーミスタを機械的に接触させることによっ
てなされてきた。この高速応答性薄膜サーミスタは平板
状セラミック絶縁基板2の一方の表面に電極膜3と感温
抵抗体膜4とを形成して成る薄膜サーミスタチップと支
持容器6とをチタニウム(Ti)箔6もしくはジルコニ
ウム(Zr)箔6を介してロウ材層7で接続し、さらに
絶縁性被覆剤8で薄膜サーミスタチップを被覆して構成
される。なセ、リード線11は電極膜3と接続されてい
る。この高速応答性薄膜サーミスタは、熱容量の小さな
薄膜サーミスタチップと支持容器6とをロウ付接続して
いるので、鍋底1から感温抵抗体膜4に至る熱抵抗が小
さい。この結果1.高速応答性が得られる。通常、鍋物
調理の際に求められる応答性は、90チ応答時間(室温
T1℃に保たれたサーミスタに温度T′2℃の鍋底1が
突然機械的に接触したときを起点にして、サーミスタ温
度がT、 + o、e (T2−丁、)℃に到達するに
必要3 ベー)
な時間)にして約8秒以下であることが要求される。こ
の高速応答性薄膜サーミスタの9o%応答時間は、絶縁
性被覆剤8がない場合3〜6秒であった。しかし、絶縁
性被覆剤8を形成した場合、90俤応答時間は相対的に
遅く、かつそのばらつきも大きくなり、4〜10秒にな
るという欠点があった。90チ応答時間が相対的に遅く
なることは絶縁性・被覆剤8の熱容量に起因するので、
技術的に避けられない。他方9o%応答時間の大小は絶
縁性被覆剤8の塗布量の大小、すなわち、熱容量の大小
に対応するので、絶縁性被覆剤8の塗布量を一定量に制
御することにより、そのばらつきを小さくすることが可
能である。しかし、従来の高速応答性薄膜サーミスタで
は、構造上絶縁性被覆剤8の塗布量を一定量に制御する
ことは困難であった。すなわち、この種絶縁性被覆剤8
は、通常、一定粘度の流動体、たとえば硝子粉末と有機
バインダーを混合したスラリーを塗布したのち硬化する
という過程を経て形成されるが、流動体が流れるために
薄膜サーミスタチップを完全に被覆し、かつその塗布量
を一定量に制御することは困難であった。Conventionally, this type of temperature detection has been carried out by mechanically bringing a fast-responsive thin film thermistor into contact with the pot bottom 1, as shown in FIG. This fast-responsive thin-film thermistor consists of a thin-film thermistor chip formed by forming an electrode film 3 and a temperature-sensitive resistor film 4 on one surface of a flat ceramic insulating substrate 2, and a support container 6 made of titanium (Ti) foil 6 or The thin film thermistor chip is connected with a brazing material layer 7 via a zirconium (Zr) foil 6, and further coated with an insulating coating material 8. Furthermore, the lead wire 11 is connected to the electrode film 3. In this fast-response thin-film thermistor, the thin-film thermistor chip with a small heat capacity and the support container 6 are connected by brazing, so that the thermal resistance from the pot bottom 1 to the temperature-sensitive resistor film 4 is small. This result 1. Provides high-speed response. Normally, the response required when cooking hotpot dishes is the 90-chi response time (starting from the time when the bottom 1 of the pot at temperature T'2°C suddenly mechanically contacts the thermistor maintained at room temperature T1°C), and the thermistor temperature is required to be approximately 8 seconds or less in terms of the time required to reach T,+o,e (T2-d,)°C. The 90% response time of this fast-responsive thin film thermistor was 3 to 6 seconds without the insulating coating 8. However, when the insulating coating material 8 is formed, the 90-meter response time is relatively slow and its variation is large, resulting in a disadvantage of 4 to 10 seconds. The relative slowness of the 90-chi response time is due to the heat capacity of the insulation/coating material 8, so
Technically unavoidable. On the other hand, the magnitude of the 9o% response time corresponds to the magnitude of the applied amount of the insulating coating material 8, that is, the magnitude of the heat capacity, so by controlling the applied amount of the insulating coating material 8 to a constant amount, the variation can be reduced. It is possible to do so. However, in the conventional fast-response thin film thermistor, it is difficult to control the amount of applied insulating coating material 8 to a constant amount due to its structure. That is, this type of insulating coating 8
is usually formed through a process in which a fluid with a constant viscosity, such as a slurry of glass powder and an organic binder, is applied and then cured. Moreover, it was difficult to control the amount of coating to a constant level.
90チ応答時間が8秒以上になると鍋物調理の温度制御
には使用できないので、絶縁性被覆剤8の塗布量の大き
いものは歩留りの低下、価格の上昇などの欠点も派生し
た。If the 90-chip response time is 8 seconds or more, it cannot be used for temperature control in pot cooking, so those with a large coating amount of the insulating coating 8 also have disadvantages such as a decrease in yield and an increase in price.
本発明はこれら従来の欠点を解消するもので、温度応答
硅のバラツキの低減化を図ることを目的とする。The present invention eliminates these conventional drawbacks and aims to reduce the variation in temperature responsive silicon.
本発明は、この目的を達成するために、平板状セラミッ
ク絶縁基板の一方の表面に電極膜と感温抵抗体膜とを形
成して成る薄膜サーミスタチップと支持容器とをT1箔
もしくはZr箔を介在させて両者をロウ材層でロウ付接
続し、前記薄膜サーミスタチップの周辺を取り囲む如く
遮へい板を前記支持容器に設けるとともに、この取り囲
まれた領域内において前記薄膜サーミスタを絶縁性被覆
剤で被覆したものである。このように構成しているので
、絶縁性被覆剤を形成する際、一定粘度の流動体を塗布
しても遮へい板に妨げられて、流動体5 べ−
が遮へい板を越えて流れないようにでき、塗布量を一定
量に制御できるようにしたものである。In order to achieve this object, the present invention provides a thin film thermistor chip having an electrode film and a temperature sensitive resistor film formed on one surface of a flat ceramic insulating substrate, and a support container made of T1 foil or Zr foil. A shielding plate is provided in the supporting container so as to surround the periphery of the thin film thermistor chip, and the thin film thermistor is coated with an insulating coating material in the surrounded area. This is what I did. With this structure, when forming an insulating coating, even if a fluid with a constant viscosity is applied, it will be blocked by the shielding plate and the fluid will not flow beyond the shielding plate. The coating amount can be controlled to a constant amount.
以下本発明の一実施例について第2図により説明する。An embodiment of the present invention will be described below with reference to FIG.
第2図において前述と同番号は同部材を示し、9は遮へ
い板で、この遮へい板9は薄膜サーミスタチップの周辺
を取り囲む如く支持容器6に設けられ、かつ、この取り
囲まれた領域内において薄膜サーミスタチップが絶縁性
被覆剤8で被覆されている。In FIG. 2, the same numbers as mentioned above indicate the same members, and 9 is a shielding plate, and this shielding plate 9 is provided in the support container 6 so as to surround the periphery of the thin film thermistor chip. The thermistor chip is coated with an insulating coating 8.
この構成による温度応答性について説明すると応答時間
の大小は絶縁性被覆剤8の塗布量の大小に対応してほぼ
決まり、薄膜サーミスタチップの表面上より約1襲の厚
さに絶縁性被覆剤8を形成したとき、90%応答時間に
して約4〜7秒であった。このとき薄膜サーミスタチッ
プには、アルミナ基板2 (1,8111WX6.5f
iLX0.5語t)の一方の表面にAu −Pt厚膜電
極膜3とSiこ、感温抵抗体膜4を形成したものが用い
られ、また支持容器6と遮へい板9の材質は5US−4
30板(厚さo、4m’)で、遮へい板9は支持容器5
にスポラ6 ・・ ゛
ト溶接で固定されている。薄膜サーミスタチップと支持
容器6とはTi箔7を介して銀ロウ材層7によりロウ付
接続されている。絶縁性被覆剤8には、低融点硝子、た
とえば軟化点636℃のZnO−B、、03−5in2
系硝子、あるいはアルミナ質系被覆剤、たとえば
液性加熱硬化型のアルミナを主成分とするペースト、な
どが用いられる。このようにして構成したサーミスタは
、前述の如く4〜7秒の90係応答時間が得られるとと
もに優れた安定性が得られた。すなわち、空気中sso
℃で1oOo時間放置後、あるいは空気中360℃、1
6分←室温、15分のヒートサイクルを3000サイク
ル印加後、空気中70℃で相対湿度eo%以上の雰囲気
中に1000時間放置後、抵抗値変化率は±3チ以下で
あった。To explain the temperature response of this configuration, the magnitude of the response time is approximately determined depending on the amount of the insulating coating 8 applied. 90% response time was about 4 to 7 seconds. At this time, the thin film thermistor chip has an alumina substrate 2 (1,8111W x 6.5f
An Au-Pt thick film electrode film 3 and a Si temperature sensitive resistor film 4 are formed on one surface of the iLX0.5 layer (t), and the material of the support container 6 and shielding plate 9 is 5US- 4
30 plates (thickness o, 4 m'), the shielding plate 9 is the support container 5
Spora 6... is fixed by welding. The thin film thermistor chip and the support container 6 are connected by brazing with a silver brazing material layer 7 via a Ti foil 7. The insulating coating 8 is made of low melting point glass such as ZnO-B with a softening point of 636°C.
glass or alumina coating, e.g.
A liquid heat-curable alumina-based paste is used. The thermistor constructed in this way had a 90-90 response time of 4 to 7 seconds as described above, and had excellent stability. That is, sso in air
℃ for 100 hours or in air at 360℃ for 1 hour.
After applying 3000 cycles of heat cycles of 6 minutes←room temperature and 15 minutes, and after being left in the air at 70°C and a relative humidity of eo% or more for 1000 hours, the rate of change in resistance value was ±3 inches or less.
なお、遮へい板9と支持容器6とは同一材質でTi 、
Zr 、 5US−430の郡から選ばれた一種であ
ることが望ましい。この理由は、遮へい板9は薄膜サー
ミスタチップの周辺を取り囲む如く支持容器6に固定さ
れるとき、溶接法で固定されるこ7ノN−
とが最っとも容易であるが、溶接には両者とも同一材質
であることが溶接性の点で優れているからである。また
薄膜サーミスタチップの平板状セラミック基板2には、
アルミナ基板がよく用いられる。支持容器6の熱膨張係
数は、平板状セラミック基板2、すなわちアルミナ基板
の熱膨張係数と類似の値であることが望ましく、この点
で支持容器6の材質はTi 、 Zr 、 5US−4
30の郡から選ばれた1種が望ましい。The shielding plate 9 and the support container 6 are made of the same material and are made of Ti,
Preferably, it is a type selected from the group Zr, 5US-430. The reason for this is that when the shielding plate 9 is fixed to the support container 6 so as to surround the periphery of the thin film thermistor chip, it is easiest to fix it by welding. This is because both are made of the same material, which is superior in terms of weldability. In addition, the flat ceramic substrate 2 of the thin film thermistor chip includes:
Alumina substrates are often used. It is desirable that the thermal expansion coefficient of the support container 6 is similar to that of the flat ceramic substrate 2, that is, the alumina substrate, and in this respect, the material of the support container 6 is Ti, Zr, 5US-4.
One type selected from 30 counties is desirable.
以上の説明から明らかなように本発明の薄膜サーミスタ
によれば次の効果が得られる。As is clear from the above description, the thin film thermistor of the present invention provides the following effects.
(1)薄膜サーミスタチップの周辺を取り囲む如く遮へ
い板を支持容器に設け、この取り囲まれた領域内におい
て薄膜サーミスタチップを絶縁性被覆剤で被覆している
ので、絶縁性被覆剤の塗布量を一定に維持することが容
易であり、温度応答性のバラツギの低減化が容易となる
。(1) A shielding plate is provided in the support container to surround the periphery of the thin film thermistor chip, and the thin film thermistor chip is coated with the insulating coating within this surrounded area, so the amount of the insulating coating applied is constant. It is easy to maintain the same temperature, and it is easy to reduce variations in temperature response.
(2)少量の絶縁性被覆剤でもって薄膜サーミスタチッ
プの水、はこシに対して、また外部応力に対する保護の
役目を十分に果す。(2) A small amount of insulating coating material can sufficiently protect the thin-film thermistor chip from water, dust, and external stress.
第1図は従来の高速応答性薄膜サーミスタを模式的に示
した断面図、第2図は本発明の高速応答性薄膜サーミス
タの一実施例を模式的に示す断面図である。FIG. 1 is a sectional view schematically showing a conventional fast-response thin-film thermistor, and FIG. 2 is a sectional view schematically showing an embodiment of the fast-response thin-film thermistor of the present invention.
1・・・・・・鍋底、2・・・・・・平板状セラミック
絶縁基板、3・・・・・・電極膜、4・・・・・・感温
抵抗体膜、6・・・・・・支持容器、6・・・・・・T
i箔もしくはZr箔、7r・・・・・ロウ材層、8・・
・・・・絶縁性被覆材、9・・・・・・遮へい板。11
・・・・・・リード線。DESCRIPTION OF SYMBOLS 1... Pot bottom, 2... Flat ceramic insulating substrate, 3... Electrode film, 4... Temperature sensitive resistor film, 6... ...Support container, 6...T
i foil or Zr foil, 7r...brazing material layer, 8...
...Insulating covering material, 9... Shielding plate. 11
······Lead.
代理人の氏名 弁理士 中 尾 敏 男 ほか1名lI
1図Name of agent: Patent attorney Toshio Nakao and one other person
Figure 1
Claims (1)
と感温抵抗体膜とを形成して成る薄膜サーミスタチップ
と支持容量とをチタニウム(Ti)箔もしくはジルコニ
ウム(Zr)箔を介在させて両者をロウ付接続し、前記
薄膜サーミスタチップの周辺を取り囲む如く遮へい板を
前記支持容器に設けるとともに、この取シ囲まれた領域
内(2)遮へい板と支持容器とは同一材質で、Ti。(1) A thin film thermistor chip consisting of an electrode film and a temperature-sensitive resistor film formed on one surface of a flat ceramic insulating substrate and a supporting capacitor are interposed with titanium (Ti) foil or zirconium (Zr) foil. Both are connected by brazing, and a shielding plate is provided in the support container so as to surround the periphery of the thin film thermistor chip, and within the enclosed area (2) the shielding plate and the support container are made of the same material, Ti.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56182066A JPS5884404A (en) | 1981-11-12 | 1981-11-12 | thin film thermistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56182066A JPS5884404A (en) | 1981-11-12 | 1981-11-12 | thin film thermistor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5884404A true JPS5884404A (en) | 1983-05-20 |
| JPS6252926B2 JPS6252926B2 (en) | 1987-11-07 |
Family
ID=16111747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56182066A Granted JPS5884404A (en) | 1981-11-12 | 1981-11-12 | thin film thermistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5884404A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62202501A (en) * | 1986-02-28 | 1987-09-07 | 松下電器産業株式会社 | thin film thermistor |
| JPS62219502A (en) * | 1986-03-19 | 1987-09-26 | 松下電器産業株式会社 | thin film thermistor |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01129411A (en) * | 1987-11-16 | 1989-05-22 | Fujitsu Ltd | Wafer treater |
| KR102455392B1 (en) | 2018-07-30 | 2022-10-14 | 삼성전자주식회사 | Cleaning water processing device, plasma reaction tank and cleaning water processing method |
-
1981
- 1981-11-12 JP JP56182066A patent/JPS5884404A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62202501A (en) * | 1986-02-28 | 1987-09-07 | 松下電器産業株式会社 | thin film thermistor |
| JPS62219502A (en) * | 1986-03-19 | 1987-09-26 | 松下電器産業株式会社 | thin film thermistor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6252926B2 (en) | 1987-11-07 |
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