JPS5896777A - Solar battery - Google Patents

Solar battery

Info

Publication number
JPS5896777A
JPS5896777A JP56195408A JP19540881A JPS5896777A JP S5896777 A JPS5896777 A JP S5896777A JP 56195408 A JP56195408 A JP 56195408A JP 19540881 A JP19540881 A JP 19540881A JP S5896777 A JPS5896777 A JP S5896777A
Authority
JP
Japan
Prior art keywords
light
solar battery
layer
receiving surface
paste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56195408A
Other languages
Japanese (ja)
Other versions
JPS628039B2 (en
Inventor
Toshihiro Nakajima
中嶋 利廣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP56195408A priority Critical patent/JPS5896777A/en
Publication of JPS5896777A publication Critical patent/JPS5896777A/en
Publication of JPS628039B2 publication Critical patent/JPS628039B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells

Landscapes

  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To improve the V-I characteristics and the photoelectric conversion coefficient of the titled solar battery by a method wherein the solar battery having an P-N junction is formed by thinly diffusing a conductive layer which is different from that of the surface layer part of a semiconductor substrate, and an Ag paste, whereon 5-10% of Ni paste was added as an electrode material, is used when a grid electrode is provided on the light-receiving surface of the solar battery. CONSTITUTION:A P-N junction is grown by forming a shallow N type layer 2 on the surface layer part of a P type Si substrate 1 by diffusion and the surface of the layer 2 is used as a light-receiving surface. Then, a grid electrode 3a is formed on the light-receiving surface, and at this time, excellent ohmic characteristics are maintained between the grid electrode 3a and the layer 2. Subsequently, a light-reflection preventing film 5 is provided in the intervals of the electrodes 3a, and a back face electrode 4 is coated on the whole surface of the back side of the substrate 1. Thus, the characteristics of the solar battery is increased and the cost of its manufacture is also cut down.

Description

【発明の詳細な説明】 この発明は太陽電池に関するものである。[Detailed description of the invention] This invention relates to solar cells.

従来のシリコン単結晶太陽電池の構成例を第1図に示し
である。すなわち、この第1図において、(1)はP形
シリコン半導体基板、e2)はこの基板(1)の一方の
主面上にn形不純物を浅く拡散して形成したn形層であ
って受光面を形成しており、また(3)は仁の受光面よ
シマイナス電位を取シ出すグリッド電極、(4)は基板
α)の他方の主面上に設けられてプラス電位を取シ出す
裏面電極、(5)は受光面での光反射防止膜である。
An example of the structure of a conventional silicon single crystal solar cell is shown in FIG. That is, in FIG. 1, (1) is a P-type silicon semiconductor substrate, e2) is an n-type layer formed by shallowly diffusing n-type impurities on one main surface of this substrate (1), and is a light-receiving layer. In addition, (3) is a grid electrode that extracts negative potential from the light-receiving surface of the substrate, and (4) is a back surface that is provided on the other main surface of the substrate α) and that extracts positive potential. The electrode (5) is an antireflection film on the light receiving surface.

このように従来構成によるこの種の太陽電池は、具体的
には500μm程度の厚さのP形単結晶シリコン基板(
1)の表面に0.3〜0.5μm程度のn形拡散領域(
2)を形成して受光面とし、この受光面側に30θμ、
程度の幅のグリッド電極<:jノを4〜5簡間隔のもと
に、例えばエンゲルハード社製Agペーストをスクリー
ン印刷して形成させ、さらに基板裏面には全面にAg−
Atペーストを同様にスクリーン印刷して形成させ、ま
た基板は大気中、600〜620°Cで10〜15分程
度焼成し、さらに受光面側にTies、 Si@N4.
 TBmOaなどの反射防止膜(5)を形成しているの
である。
In this way, this type of solar cell with the conventional configuration is manufactured using a P-type single-crystal silicon substrate (
1) An n-type diffusion region (about 0.3 to 0.5 μm) is formed on the surface of
2) to form a light-receiving surface, and 30θμ,
Grid electrodes with a width of approximately 4 to 5 times apart are formed by screen printing, for example, Ag paste manufactured by Engelhard, and furthermore, Ag paste is applied to the entire back surface of the substrate.
The At paste was formed by screen printing in the same manner, and the substrate was baked in the air at 600 to 620°C for about 10 to 15 minutes, and Ties, Si@N4.
An antireflection film (5) such as TBmOa is formed.

こ\でこのような従来の太陽電池にあって、グリッド電
極(3)は大気中で焼成するために、n形層(2)との
オーミック性が悪<、v−r特性、光変換効率が悪いも
のであった。
In such conventional solar cells, since the grid electrode (3) is fired in the atmosphere, the ohmic relationship with the n-type layer (2) is poor, v-r characteristics, and light conversion efficiency. was bad.

この発り]は従来のこのような欠点に鑑み、グリッド電
極の材料としてAgペーストにNiペーストを5〜10
%程度添加混合したものを用いることによ如才−ミック
性を良好にしてv−ト特性および光変換効率を大巾に改
善したものである。
In view of the above drawbacks of the conventional method, this invention was developed by adding 5 to 10% of Ni paste to Ag paste as the material for the grid electrode.
By using an additive mixture of about 10%, the light-mixing properties are improved and the V-total characteristics and light conversion efficiency are greatly improved.

以下、この発明に係わる太陽電池の一実施例につき、第
2図および第3図を参照して詳細に説明する。
Hereinafter, one embodiment of the solar cell according to the present invention will be described in detail with reference to FIGS. 2 and 3.

第2図はこの実施例構成を示す断面である。この第2図
において前記第1図と同一符号は同一または相当部分を
示しておシ、この実施例では受光面側に形成するグリッ
ド電極(3a)を、従来のAgベース)(fil、tハ
エンゲルハー)”社製A−4162)に、5〜10%程
度のNiペースト(例えばエンゲルハード社製A−41
07)を添加混合した材料によシ形成させて、n形層0
)とのオーミック性を良好にしたものである。。
FIG. 2 is a cross section showing the configuration of this embodiment. In this FIG. 2, the same reference numerals as those in FIG. 1 indicate the same or corresponding parts. )'' A-4162) and about 5 to 10% Ni paste (for example, Engelhard A-41).
07) is added and mixed to form an n-type layer 0.
) with good ohmic properties. .

また第3図は従来例とこの実施例の太陽電池のv−4特
性を示し、受光面にAMI  相当の光を当てた場合で
ある。すなわち、曲線(イ)、←)は従来例における暗
電流時、光照射時でのV−I特性、曲線(ハ)、に)は
この実施例における暗電流時、光照射時でのV−I特性
である。
Further, FIG. 3 shows the V-4 characteristics of the conventional solar cells and the solar cells of this example, when the light-receiving surface is irradiated with light equivalent to AMI. That is, the curve (a), ←) is the V-I characteristic during dark current and during light irradiation in the conventional example, and the curve (c), ←) is the V-I characteristic during dark current and during light irradiation in this embodiment. This is an I characteristic.

この第3図から明らかなとおシ、この実施例の如くグリ
ッド電極(3a)にAgペーストと5〜10%のNiペ
ーストを混合した材料を用いることで、順方向バイアス
の電圧降下が大幅に小さくなシ、かつ同電極のオーミッ
ク性が大幅に改善されて、光照射時のV−1特性が良好
となり、光変換効率を飛躍的に向上し得るのである。こ
\でこの実施例での電極材料を使用したのちの焼成条件
は、610℃、10分程度で充分でアシ、これによって
前記のようにオーミック性、光変換効率の向上を図シ得
たものである。
As is clear from FIG. 3, by using a material mixed with Ag paste and 5 to 10% Ni paste for the grid electrode (3a) as in this example, the forward bias voltage drop is significantly reduced. Moreover, the ohmic properties of the electrode are significantly improved, the V-1 characteristics during light irradiation are improved, and the light conversion efficiency can be dramatically improved. After using the electrode material in this example, the firing conditions at 610°C for about 10 minutes were sufficient, and as a result, the ohmic properties and light conversion efficiency were improved as described above. It is.

なお、前記実施例はシリコン単結晶太陽電池について述
べたが、他の太陽電池であっても同様の効果を得られる
Although the above embodiments have been described with respect to silicon single crystal solar cells, similar effects can be obtained with other solar cells.

以上詳述したようにこの発明によれば、シリコン半導体
基板上にこれとは異なる導電層を薄く拡散して形成した
受光面のグリッド電極として、Niを含むA、ペースト
材料を用いたので、そのオーミック性を改善でき、光変
換効率を向上し得ると共に、併せて製造歩留ルの向上、
ならびに原価低減に役立つなどの特長がある。
As detailed above, according to the present invention, A paste material containing Ni is used as the grid electrode of the light receiving surface formed by thinly diffusing a different conductive layer on the silicon semiconductor substrate. Ohmic properties can be improved, light conversion efficiency can be improved, and manufacturing yields can also be improved.
It also has the advantage of helping to reduce costs.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来例による太陽電池の概要構成を示す断面図
、第2図はこの発明の一実施例による太陽電池の概要構
成を示す断面図、第3図は従来例とこの実施例での太陽
電池の光照射時のV−I特性を示す説明図である。 (1)・・・・P形単結晶シリコン基板、(2)−・・
−n形層、(3)、  (3a)・m−・グリッド電極
、(4)・・・・裏面電極、(5)・・・・光反射防止
膜。 代理人 葛野信−(外1名) 第1図 第2図 第3図
FIG. 1 is a cross-sectional view showing the general structure of a solar cell according to a conventional example, FIG. 2 is a cross-sectional view showing a general structure of a solar cell according to an embodiment of the present invention, and FIG. FIG. 2 is an explanatory diagram showing the VI characteristics of a solar cell when irradiated with light. (1)...P-type single crystal silicon substrate, (2)-...
-n-type layer, (3), (3a), m-, grid electrode, (4), back electrode, (5), anti-reflection film. Agent Makoto Kuzuno (1 other person) Figure 1 Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] 半導体基板上にこれとは異なる導電層を薄く拡散形成し
て、受光面の近くにPn接合を形成した太陽電池におい
て、少なくとも受光面側の電極にNiを含むAgペース
ト材料を用いたことを特徴とする太陽電池。
A solar cell in which a thin conductive layer different from the above is diffused on a semiconductor substrate to form a Pn junction near the light-receiving surface, characterized in that an Ag paste material containing Ni is used at least for the electrode on the light-receiving surface side. solar cells.
JP56195408A 1981-12-03 1981-12-03 Solar battery Granted JPS5896777A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56195408A JPS5896777A (en) 1981-12-03 1981-12-03 Solar battery

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56195408A JPS5896777A (en) 1981-12-03 1981-12-03 Solar battery

Publications (2)

Publication Number Publication Date
JPS5896777A true JPS5896777A (en) 1983-06-08
JPS628039B2 JPS628039B2 (en) 1987-02-20

Family

ID=16340601

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56195408A Granted JPS5896777A (en) 1981-12-03 1981-12-03 Solar battery

Country Status (1)

Country Link
JP (1) JPS5896777A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0715022A (en) * 1993-06-16 1995-01-17 Hokuriku Toryo Kk Electrode for solar cell
JP2002373995A (en) * 2001-06-15 2002-12-26 Honda Motor Co Ltd Solar cell manufacturing method
JP2014229904A (en) * 2013-05-20 2014-12-08 エルジー エレクトロニクス インコーポレイティド Solar cell and method for manufacturing the same
JP2015523707A (en) * 2012-04-18 2015-08-13 ヘレウス プレシャス メタルズ ノース アメリカ コンショホーケン エルエルシー Printing method for solar cell contacts

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52129293A (en) * 1976-04-23 1977-10-29 Agency Of Ind Science & Technol Electrode of semiconductror device and its formation
JPS5333752A (en) * 1976-09-09 1978-03-29 Matsushita Electric Works Ltd Electric toothbrush

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52129293A (en) * 1976-04-23 1977-10-29 Agency Of Ind Science & Technol Electrode of semiconductror device and its formation
JPS5333752A (en) * 1976-09-09 1978-03-29 Matsushita Electric Works Ltd Electric toothbrush

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0715022A (en) * 1993-06-16 1995-01-17 Hokuriku Toryo Kk Electrode for solar cell
JP2002373995A (en) * 2001-06-15 2002-12-26 Honda Motor Co Ltd Solar cell manufacturing method
JP2015523707A (en) * 2012-04-18 2015-08-13 ヘレウス プレシャス メタルズ ノース アメリカ コンショホーケン エルエルシー Printing method for solar cell contacts
JP2014229904A (en) * 2013-05-20 2014-12-08 エルジー エレクトロニクス インコーポレイティド Solar cell and method for manufacturing the same
US11004988B2 (en) 2013-05-20 2021-05-11 Lg Electronics Inc. Solar cell and method for manufacturing the same

Also Published As

Publication number Publication date
JPS628039B2 (en) 1987-02-20

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