JPS589981A - 真空蒸着装置 - Google Patents

真空蒸着装置

Info

Publication number
JPS589981A
JPS589981A JP11263982A JP11263982A JPS589981A JP S589981 A JPS589981 A JP S589981A JP 11263982 A JP11263982 A JP 11263982A JP 11263982 A JP11263982 A JP 11263982A JP S589981 A JPS589981 A JP S589981A
Authority
JP
Japan
Prior art keywords
crucible
cathode
plasma
magnetic field
hollow cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11263982A
Other languages
English (en)
Japanese (ja)
Inventor
エツクハルト・ゲルニツツ
アヒム・ルンク
フランク・シユラ−デ
リユ−デイゲル・ウイルベルク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BEBU HOOHIBAAKUUMU DORESUDEN
HOOHIBAAKUUMU DORESUDEN VEB
Original Assignee
BEBU HOOHIBAAKUUMU DORESUDEN
HOOHIBAAKUUMU DORESUDEN VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BEBU HOOHIBAAKUUMU DORESUDEN, HOOHIBAAKUUMU DORESUDEN VEB filed Critical BEBU HOOHIBAAKUUMU DORESUDEN
Publication of JPS589981A publication Critical patent/JPS589981A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/36—Gas-filled discharge tubes for cleaning surfaces while plating with ions of materials introduced into the discharge, e.g. introduced by evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
JP11263982A 1981-07-01 1982-07-01 真空蒸着装置 Pending JPS589981A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD23135881A DD201359A1 (de) 1981-07-01 1981-07-01 Einrichtung zur vakuumbedampfung
DD01J/23135 1981-07-01

Publications (1)

Publication Number Publication Date
JPS589981A true JPS589981A (ja) 1983-01-20

Family

ID=5532036

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11263982A Pending JPS589981A (ja) 1981-07-01 1982-07-01 真空蒸着装置

Country Status (3)

Country Link
JP (1) JPS589981A (de)
DD (1) DD201359A1 (de)
DE (1) DE3222327A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63274762A (ja) * 1987-05-01 1988-11-11 Ulvac Corp 反応蒸着膜の形成装置
DE4421045C2 (de) * 1994-06-17 1997-01-23 Dresden Vakuumtech Gmbh Einrichtung zur plamagestützten Beschichtung von Substraten, insbesondere mit elektrisch isolierendem Material
DE19546827C2 (de) * 1995-12-15 1999-03-25 Fraunhofer Ges Forschung Einrichtung zur Erzeugung dichter Plasmen in Vakuumprozessen

Also Published As

Publication number Publication date
DE3222327A1 (de) 1983-01-27
DD201359A1 (de) 1983-07-13

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