JPS59143155A - Glass mask - Google Patents
Glass maskInfo
- Publication number
- JPS59143155A JPS59143155A JP58018448A JP1844883A JPS59143155A JP S59143155 A JPS59143155 A JP S59143155A JP 58018448 A JP58018448 A JP 58018448A JP 1844883 A JP1844883 A JP 1844883A JP S59143155 A JPS59143155 A JP S59143155A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- mask
- glass
- glass mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005530 etching Methods 0.000 claims description 8
- 230000002265 prevention Effects 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 10
- 239000010453 quartz Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 229910052804 chromium Inorganic materials 0.000 description 7
- 239000011651 chromium Substances 0.000 description 7
- 238000001312 dry etching Methods 0.000 description 3
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- -1 chlorine ions Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000855 fermentation Methods 0.000 description 1
- 230000004151 fermentation Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/80—Etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】 本発明は、ガラス・マスクの構造に関する。[Detailed description of the invention] The present invention relates to the structure of a glass mask.
従来、ガラス・マスクは、代表的な例として、石英基板
に、ｒ、ゐマスフケ示すと、第１図の如き構造の石英マ
スフケ用いていた。すなわち、石英基板１の一生面には
クロム膜２が図形状に形成されていた。該例はクロム膜
２を通酵のホト・リゾグラフィー技術により図形状にレ
ジストヲ残し、該レジスト會マスクとして下地クロム膜
Ｋｌ浴Ｍでウェット・エツチングし、クロム膜七図形状
に形成しｆｃものである。Conventionally, as a typical example of a glass mask, a quartz mask having a structure as shown in FIG. 1 has been used on a quartz substrate. That is, the chromium film 2 was formed in the shape of a figure on the whole surface of the quartz substrate 1. In this example, a resist is left in the shape of a figure using fermentation photolithography technology, and the resist is wet-etched with a base chrome film Kl bath M as a mask to form a chrome film in the shape of a figure. be.
し〃為し、上記私へ１図の別の場合には、ウェット・エ
ツチング時のエツチングのバラツキが大きく、クロム膜
のエツチング後の巾寸法がバラツクという欠点があり、
最近は、第２図に示す如く、活性塩素イオン素をクロム
膜に当てて、エツチングする、いわゆるドライ・エツチ
ングに＝９マスク製這會行なう方法により、石英基板１
１の一生面に図形状にクロム膜１２全形戊する方法が用
いられているが、該方法によれば、クロム膜１２のエツ
チングによる巾寸法のバラツキは小さくなるが、塩素イ
オン等の衝突により、基板１１がエツチングされ、基板
１１のサイド・エッチ都１３が形成され、該サイド・エ
ッチ都１５に於て、露光時に光の散乱が緬９、図形の精
度良い転写が行なえないという欠点があった。However, in the other case shown in Figure 1 above, there is a drawback that there is a large variation in etching during wet etching, and the width dimension of the chromium film after etching varies.
Recently, as shown in Fig. 2, a quartz substrate 1
A method is used in which the entire chromium film 12 is etched in the shape of a pattern on the entire surface of the chromium film 1. Although this method reduces the variation in width due to etching of the chromium film 12, it also reduces the variation in width due to collisions with chlorine ions, etc. , the substrate 11 is etched to form the side etched areas 13 of the substrate 11, and the side etched areas 15 suffer from scattering of light during exposure, making it difficult to accurately transfer the figure. Ta.
本発明は、か刀）る従来技術の欠点葡なくし、図形状膜
の巾寸法ノ１）バラツキの少ない、刀・つ、露光時の光
散乱に、ｒ、ゐ転写図形の鞘度劣化のないガラス・マス
クを提供することを目的とする。The present invention eliminates the drawbacks of the prior art, and has the following advantages: (1) less variation in the width dimension of the graphic film; (1) less variation in light scattering during exposure; The purpose is to provide glass masks.
上記目的を達成するための、不発明の基本的な構成に、
カラス・マスクに於て、ガラス平板基体上の一王面に、
基体エツチング阻止能を有する、Ａ区、ｏ３等の膜が形
成され、該膜上に図形状膜が形成されて成ゐことを特徴
とすな。In order to achieve the above purpose, the basic structure of the invention,
In the crow mask, one king face on the glass flat substrate,
It is characterized in that a film such as area A, o3, etc., having a substrate etching inhibiting ability is formed, and a patterned film is formed on the film.
以下、実施例により不発明全詳述する。Hereinafter, the invention will be fully described in detail with reference to Examples.
第６は、本発明の一爽施ｖｕを示す、石英マスクの−ｒ
面図である。The sixth is -r of the quartz mask, which shows the refreshing application of the present invention.
It is a front view.
石英平板基板２１の一生向上にエリ、化学蒸着法等によ
りＡｆｌｚＯｓ膜２６が１ミクロン厚程髪形成され、該
ＡＲ２０３膜２６上に図形状にクロム膜２２が形成され
て成る。クロム膜は真空蒸着法により形成され通′帛の
ホトリゾ・グラフィ技術と、ドライ・エツチング法にＪ
、９図形状に形成さｆゐ。An AflzOs film 26 with a thickness of about 1 micron is formed on the quartz flat substrate 21 by chemical vapor deposition or the like, and a chromium film 22 is formed in the shape of a figure on the AR203 film 26. The chromium film is formed by vacuum evaporation using conventional photolithography technology and dry etching.
, 9 is formed in the shape of figure f.
上記の如く、Ａμ２０３膜が形成された石英マスク基板
上に図形状膜が形成されゐことにＬ！７、図形状クロム
族のドライ・エツチング時に、ＡＥ□０３膜がドライ・
エツチングに対する阻止能全頁し、基板石英にサイド・
エッチ部全形ＦＪＸ、することが無く、露光時の光の散
乱も発生せず、刀）つ図形状膜がドライ・エツチングで
形成されるため、極めてバラツキが少なく、鞘伎の高い
転写図形が得られるという効果がある。As mentioned above, L! 7. During dry etching of geometric chromium group, AE□03 film is dry etched.
The blocking ability against etching is completely suppressed, and the side surface of the substrate is quartz.
There is no need to remove the entire etch area, there is no light scattering during exposure, and the two-dimensional pattern film is formed by dry etching, so there is extremely little variation and the transferred pattern has a high sheath. There is an effect that can be obtained.
本発明は石英マスクのみならず、他のカラス・マスクに
適用されることはいう葦でもない。The present invention is applicable not only to quartz masks, but also to other crow masks.
第１図及び第２図は従来のガラス・マスクの実施例？示
すマスクの断面図２．第３図は不発明によるガラス・マ
スクの一実施例を示すマスクの断面図であり。
１．１１．２１・・・平板ガラス基体、２．１２．２２
・・・図形状膜
１６・・・サイド・エッチ部
２６・・・エツチング阻止膜
出願人 株式会社諏訪精工舎
代理人 弁理士最上 啓Are Figures 1 and 2 examples of conventional glass masks? Cross-sectional view of the mask shown in FIG. FIG. 3 is a sectional view of a mask showing an embodiment of the glass mask according to the invention. 1.11.21...Flat glass substrate, 2.12.22
...Graphic film 16...Side etched portion 26...Etching prevention film Applicant Suwa Seikosha Co., Ltd. Agent Patent attorney Kei Mogami
Claims (2)
阻止龍ケＭすゐｊ換が形成され、該膜上に図形状膜が形
成されて成ることを特徴とするガラス・マスク。(1) A glass mask characterized in that a substrate etching prevention dragon film is formed on the entire surface of a glass flat substrate, and a graphic film is formed on the film.
３膜會肩する特許請求範囲第１項記載のガラス・マスク
。(2) AR20 as a film with substrate etching prevention ability
A glass mask according to claim 1, comprising three films.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58018448A JPS59143155A (en) | 1983-02-07 | 1983-02-07 | Glass mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58018448A JPS59143155A (en) | 1983-02-07 | 1983-02-07 | Glass mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59143155A true JPS59143155A (en) | 1984-08-16 |
Family
ID=11971902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58018448A Pending JPS59143155A (en) | 1983-02-07 | 1983-02-07 | Glass mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59143155A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009291259A (en) * | 2008-06-03 | 2009-12-17 | Micron:Kk | Dental handpiece inspection apparatus |
-
1983
- 1983-02-07 JP JP58018448A patent/JPS59143155A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009291259A (en) * | 2008-06-03 | 2009-12-17 | Micron:Kk | Dental handpiece inspection apparatus |
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