JPS5917260A - 半導体ウエハの試験方法 - Google Patents

半導体ウエハの試験方法

Info

Publication number
JPS5917260A
JPS5917260A JP57128681A JP12868182A JPS5917260A JP S5917260 A JPS5917260 A JP S5917260A JP 57128681 A JP57128681 A JP 57128681A JP 12868182 A JP12868182 A JP 12868182A JP S5917260 A JPS5917260 A JP S5917260A
Authority
JP
Japan
Prior art keywords
probe
image
semiconductor wafer
semiconductor
chuck top
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57128681A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6231825B2 (2
Inventor
Yasumasa Nishimura
西村　安正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP57128681A priority Critical patent/JPS5917260A/ja
Publication of JPS5917260A publication Critical patent/JPS5917260A/ja
Publication of JPS6231825B2 publication Critical patent/JPS6231825B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices

Landscapes

  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP57128681A 1982-07-20 1982-07-20 半導体ウエハの試験方法 Granted JPS5917260A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57128681A JPS5917260A (ja) 1982-07-20 1982-07-20 半導体ウエハの試験方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57128681A JPS5917260A (ja) 1982-07-20 1982-07-20 半導体ウエハの試験方法

Publications (2)

Publication Number Publication Date
JPS5917260A true JPS5917260A (ja) 1984-01-28
JPS6231825B2 JPS6231825B2 (2) 1987-07-10

Family

ID=14990799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57128681A Granted JPS5917260A (ja) 1982-07-20 1982-07-20 半導体ウエハの試験方法

Country Status (1)

Country Link
JP (1) JPS5917260A (2)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60213040A (ja) * 1984-04-09 1985-10-25 Hitachi Ltd ウエ−ハプロ−バ装置
JPS622250U (2) * 1985-06-20 1987-01-08
JPH01121778A (ja) * 1987-11-04 1989-05-15 Tokyo Electron Ltd プローブ装置及び液晶パネル用プローブ装置
JPH0388349A (ja) * 1989-08-30 1991-04-12 Nec Yamagata Ltd プロービング装置
US6917698B2 (en) 2000-11-09 2005-07-12 Tokyo Electron Limited Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects
JP2007184538A (ja) * 2005-12-09 2007-07-19 Nec Electronics Corp プローブ検査装置
JP2008166806A (ja) * 2006-12-27 2008-07-17 Suss Microtec Test Systems Gmbh プロービング装置で焦点を合わせて多平面画像を取得する装置と方法
CN113053765A (zh) * 2021-03-08 2021-06-29 常州雷射激光设备有限公司 一种用于半导体二极管芯片的检测设备

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60213040A (ja) * 1984-04-09 1985-10-25 Hitachi Ltd ウエ−ハプロ−バ装置
JPS622250U (2) * 1985-06-20 1987-01-08
JPH01121778A (ja) * 1987-11-04 1989-05-15 Tokyo Electron Ltd プローブ装置及び液晶パネル用プローブ装置
JPH0388349A (ja) * 1989-08-30 1991-04-12 Nec Yamagata Ltd プロービング装置
US6917698B2 (en) 2000-11-09 2005-07-12 Tokyo Electron Limited Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects
US7382914B2 (en) 2000-11-09 2008-06-03 Tokyo Electron Limited Method for aligning two objects, method for detecting superimposing state of two objects, and apparatus for aligning two objects
JP2007184538A (ja) * 2005-12-09 2007-07-19 Nec Electronics Corp プローブ検査装置
JP2008166806A (ja) * 2006-12-27 2008-07-17 Suss Microtec Test Systems Gmbh プロービング装置で焦点を合わせて多平面画像を取得する装置と方法
CN113053765A (zh) * 2021-03-08 2021-06-29 常州雷射激光设备有限公司 一种用于半导体二极管芯片的检测设备

Also Published As

Publication number Publication date
JPS6231825B2 (2) 1987-07-10

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