JPS5918445U - Multilayer structure semiconductor device - Google Patents
Multilayer structure semiconductor deviceInfo
- Publication number
- JPS5918445U JPS5918445U JP1983074898U JP7489883U JPS5918445U JP S5918445 U JPS5918445 U JP S5918445U JP 1983074898 U JP1983074898 U JP 1983074898U JP 7489883 U JP7489883 U JP 7489883U JP S5918445 U JPS5918445 U JP S5918445U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- multilayer structure
- structure semiconductor
- semiconductor substrate
- film formed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
Landscapes
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Element Separation (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図乃至第3図は本考案の一実施例を説明する為の工
程要所に於ける半導体装置の要部側断面説明図及び要部
平面説明図、第4図及び第5図は本考案のそれぞれ異な
る実施例を説明する為の工程要所に於ける半導体装置の
要部側断面説明図である。 。
図に於いて、1,1′は半導体基板、2は燐珪酸ガラス
膜である。1 to 3 are side cross-sectional views and plan views of main parts of a semiconductor device at key process points for explaining an embodiment of the present invention, and FIGS. 4 and 5 are main part explanatory views FIG. 2 is an explanatory side cross-sectional view of a main part of a semiconductor device at key points in the process for explaining different embodiments of the invention. . In the figure, 1 and 1' are semiconductor substrates, and 2 is a phosphosilicate glass film.
Claims (1)
された軟質ガラス膜を有する半導体基板と、一方の表面
上に形成された軟質ガラス膜を有する他の半導体基板と
を該ガラス膜を対向させて貼合せてなることを特徴とす
る多層構造半導体装置。A semiconductor substrate having a soft glass film formed on one surface excluding scribe lines and another semiconductor substrate having a soft glass film formed on one surface are placed so that the glass films face each other. A multilayer structure semiconductor device characterized in that it is formed by laminating two layers together.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983074898U JPS5918445U (en) | 1983-05-19 | 1983-05-19 | Multilayer structure semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1983074898U JPS5918445U (en) | 1983-05-19 | 1983-05-19 | Multilayer structure semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5918445U true JPS5918445U (en) | 1984-02-04 |
| JPS6218055Y2 JPS6218055Y2 (en) | 1987-05-09 |
Family
ID=30204980
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1983074898U Granted JPS5918445U (en) | 1983-05-19 | 1983-05-19 | Multilayer structure semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5918445U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010153799A (en) * | 2008-12-24 | 2010-07-08 | Internatl Business Mach Corp <Ibm> | Junction type semiconductor structure including cooling mechanism and method of forming the same |
| JP2012069585A (en) * | 2010-09-21 | 2012-04-05 | Hitachi Ltd | Semiconductor device and manufacturing method therefor |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5387163A (en) * | 1977-01-12 | 1978-08-01 | Hitachi Ltd | Production of semiconductor device |
-
1983
- 1983-05-19 JP JP1983074898U patent/JPS5918445U/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5387163A (en) * | 1977-01-12 | 1978-08-01 | Hitachi Ltd | Production of semiconductor device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010153799A (en) * | 2008-12-24 | 2010-07-08 | Internatl Business Mach Corp <Ibm> | Junction type semiconductor structure including cooling mechanism and method of forming the same |
| JP2012069585A (en) * | 2010-09-21 | 2012-04-05 | Hitachi Ltd | Semiconductor device and manufacturing method therefor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6218055Y2 (en) | 1987-05-09 |
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