JPS5919912A - 液浸距離保持装置 - Google Patents
液浸距離保持装置Info
- Publication number
- JPS5919912A JPS5919912A JP57129065A JP12906582A JPS5919912A JP S5919912 A JPS5919912 A JP S5919912A JP 57129065 A JP57129065 A JP 57129065A JP 12906582 A JP12906582 A JP 12906582A JP S5919912 A JPS5919912 A JP S5919912A
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- Prior art keywords
- detector
- sample
- pressure
- liquid
- suction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
- Automatic Focus Adjustment (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
め要約のデータは記録されません。
Description
【発明の詳細な説明】
本発明は、液浸型光学装置における試料の位置決め・保
持を行なうための液浸距離保持装置に関するもので、特
に液中の試料にパターンを投影する露光装置の自動焦点
合わせに好適な距離保持装置に関するものである。
持を行なうための液浸距離保持装置に関するもので、特
に液中の試料にパターンを投影する露光装置の自動焦点
合わせに好適な距離保持装置に関するものである。
光学レンズを用いてパターンを観察したり、投影したり
する光学装置において、対物レンズの解像力を向上させ
る手法として、開口数ＮＡを高めることは公知である。
する光学装置において、対物レンズの解像力を向上させ
る手法として、開口数ＮＡを高めることは公知である。
その手法として対物レンズと試料との間の媒体物の屈折
率を高めるだめ、液体を介在させることが知られている
。乙の手法を用いた光学装置としては液浸型顕微鏡が製
品化されている。液浸型顕微鏡の試料に対する焦点合わ
せは、目視による調整が行彦われているにすぎず自動的
に合焦点する手段は確立されていない。
率を高めるだめ、液体を介在させることが知られている
。乙の手法を用いた光学装置としては液浸型顕微鏡が製
品化されている。液浸型顕微鏡の試料に対する焦点合わ
せは、目視による調整が行彦われているにすぎず自動的
に合焦点する手段は確立されていない。
顕微鏡の場合は、目視により調整することで支障をきた
さ々いが、露光装置、特に半導体集積回路等の製造工程
で用いられる露光装置（以下単に露光装置という。）で
は高速高精度に自動的に焦点合わせを行なうことが要求
されてくる。
さ々いが、露光装置、特に半導体集積回路等の製造工程
で用いられる露光装置（以下単に露光装置という。）で
は高速高精度に自動的に焦点合わせを行なうことが要求
されてくる。
また既存の液浸型顕微鏡では、対物レンズの先端に付着
した気ｌ（シな容易に除去することが難しく、光学系の
解像力な低下させてしまう欠点があった。
した気ｌ（シな容易に除去することが難しく、光学系の
解像力な低下させてしまう欠点があった。
本発明の目的シ１゛、液中にある試料を観察したり、試
料にパターンを膜形したりする光学装置において、その
焦点位置に試料を高精度に自動的に位置決め保持すると
ともに、対物レンズに付着した気泡を容易に除去するこ
とを可能ならしめた装置を提供することにある。
料にパターンを膜形したりする光学装置において、その
焦点位置に試料を高精度に自動的に位置決め保持すると
ともに、対物レンズに付着した気泡を容易に除去するこ
とを可能ならしめた装置を提供することにある。
本願の発明者らは、露光装置において、解像力をあげる
ため試料を液浸にする手段を開発しており、既に特許出
願（特願昭５６−３７９７７号）さねている。また、試
料上のパターンを検出する上での解像力を向上させる手
段が開発され、特許出願（特願昭５７−８４７８４号）
されている。これらの液浸型の露光装置に用いられてい
る大口径レンズ（対物レンズ）の焦点を自動的に合わせ
る装置が必要となっており、本発明はそれを解決するだ
めになされたものである。
ため試料を液浸にする手段を開発しており、既に特許出
願（特願昭５６−３７９７７号）さねている。また、試
料上のパターンを検出する上での解像力を向上させる手
段が開発され、特許出願（特願昭５７−８４７８４号）
されている。これらの液浸型の露光装置に用いられてい
る大口径レンズ（対物レンズ）の焦点を自動的に合わせ
る装置が必要となっており、本発明はそれを解決するだ
めになされたものである。
以下、本発明を実施例によって詳細に説明する。
第１図は本発明の装置の一実施例の構成説明図である。
図において、１は光学装置（露光装置）の光学部材（対
物レンズ）、２はレンズ鏡筒、乙はレンズ鏡筒２の下端
に設けられた検出器、４は液体の吸引孔、５は検出器６
に設けられた圧力検出孔、６は液浸用の液体、７は試料
、８は駆動装置を含む試料台、９は検出した圧力を電気
信号に変換して出力する圧電変換器、１０は増幅制御回
路、１１は液体の吸引源、１２． １３． １４は液体
の流量を調整する絞り、１５は液溜器、１６はフィルタ
、１７は液体乙の供給用吸引源、１８はフィルタ、１９
は検出器６の開口部である。
物レンズ）、２はレンズ鏡筒、乙はレンズ鏡筒２の下端
に設けられた検出器、４は液体の吸引孔、５は検出器６
に設けられた圧力検出孔、６は液浸用の液体、７は試料
、８は駆動装置を含む試料台、９は検出した圧力を電気
信号に変換して出力する圧電変換器、１０は増幅制御回
路、１１は液体の吸引源、１２． １３． １４は液体
の流量を調整する絞り、１５は液溜器、１６はフィルタ
、１７は液体乙の供給用吸引源、１８はフィルタ、１９
は検出器６の開口部である。
検出器５は露光装置の対物レンズあるいは光学部材１と
試料７との間の光路で形成される空間とほぼ同一形状に
作られ、し／ズ鏡筒２の下端に連結されている。なお、
検出器３の構造を光学系の光路とほぼ同一としている理
由は、試料台の位置を制御する際の応答特性を良くする
ためである。
試料７との間の光路で形成される空間とほぼ同一形状に
作られ、し／ズ鏡筒２の下端に連結されている。なお、
検出器３の構造を光学系の光路とほぼ同一としている理
由は、試料台の位置を制御する際の応答特性を良くする
ためである。
通常の露光装置に用いられる対物レンズは、開口径が３
［］ｍｍφ以上、結像面積が１５ｍｍφ以上と大きく、
この２つの径で形作られる円錐台状の空間が光路となり
、かなりの容積を占める。この容積を必要最小限とする
ことで応答特性が向上する。
［］ｍｍφ以上、結像面積が１５ｍｍφ以上と大きく、
この２つの径で形作られる円錐台状の空間が光路となり
、かなりの容積を占める。この容積を必要最小限とする
ことで応答特性が向上する。
試料７は光学系の光軸方向に可動な試料台８の上に固定
され、感光材の塗布された試料７の表面は液浸用の液体
６で被われている。
され、感光材の塗布された試料７の表面は液浸用の液体
６で被われている。
試料台８の構造は光軸方向に可動である公知の移動手段
を使用できる。
を使用できる。
検出器３の上方隅には吸引孔４が設けられ、管により流
量抵抗要素である絞り１２を経て、吸引源１１に接続し
ている。ここで吸引源１１を作動すると検出器乙の内部
が負の圧力となり、液体６が検出器の開口部１９より流
入する。流入した液体は、吸引源１１ とフィルタ１６
を経て液溜器１５に送られる。一定の圧力で吸引源１１
を作動させると、検出器乙の内部の圧力は、検出器６と
試料７との間隔１］の大きさに応じて変化する。例えば
間隔１１が小さくなると、検出器５内の負の圧力値の絶
対値が大きくなる。反対に間隔１１が大きくなると負の
圧力値の絶対値は小さくなる。このように検出器６の内
部の圧力は間隔１〕に見合ったものとなる。検出器６に
は圧力検出孔５が設けられ、管により圧電変換器９に接
続している。圧電変換器９は圧力を電気信号に変換して
増幅制御回路１０を経て、試料台８に付設されている駆
動系に接続されている。増幅制御回路１０は圧電変換器
９の出力が一定、すなわち検出器３内の圧力（すなわち
間隙ｈ）が一定値となるように試料台８を駆動させる。
量抵抗要素である絞り１２を経て、吸引源１１に接続し
ている。ここで吸引源１１を作動すると検出器乙の内部
が負の圧力となり、液体６が検出器の開口部１９より流
入する。流入した液体は、吸引源１１ とフィルタ１６
を経て液溜器１５に送られる。一定の圧力で吸引源１１
を作動させると、検出器乙の内部の圧力は、検出器６と
試料７との間隔１］の大きさに応じて変化する。例えば
間隔１１が小さくなると、検出器５内の負の圧力値の絶
対値が大きくなる。反対に間隔１１が大きくなると負の
圧力値の絶対値は小さくなる。このように検出器６の内
部の圧力は間隔１〕に見合ったものとなる。検出器６に
は圧力検出孔５が設けられ、管により圧電変換器９に接
続している。圧電変換器９は圧力を電気信号に変換して
増幅制御回路１０を経て、試料台８に付設されている駆
動系に接続されている。増幅制御回路１０は圧電変換器
９の出力が一定、すなわち検出器３内の圧力（すなわち
間隙ｈ）が一定値となるように試料台８を駆動させる。
一方、吸引源１１の吸引圧力が変動すると検出器６内の
検出圧力も変動し、見かけ上間隔りが変わったかのよう
に誤動作してしまう。このような吸引源の圧力変動を除
去するため、本実施例の制御系では参照器を設けである
。参照器は、検出器開口部１９と試料７との間隔で形成
される流量抵抗と同等の流量抵抗を有する絞り１４およ
び絞り１２と同等の絞り１６を備えて構成され、吸引源
１１に継がっている。絞り１４の一端は液溜器１５の液
中にその開１１部を浸しており、絞り１４の他端と絞り
１６との間の圧力は管により参照圧として圧電変換器９
につながっている。絞り１３の他端は吸引源１１に継が
っている。参照器と検出器は吸引源を同一とするため、
吸引源１１の圧力変動が同等に伝わるため、検出圧と参
照圧の圧力差に対する変動がなくなる。この場合圧電変
換器９はこの検出圧と参照圧の圧力差を電気変換するこ
とになる。また増幅制御回路１０は圧電変換器９からの
出力値す々わち上記圧力差が一定になるように試料台８
を駆動制御する。
検出圧力も変動し、見かけ上間隔りが変わったかのよう
に誤動作してしまう。このような吸引源の圧力変動を除
去するため、本実施例の制御系では参照器を設けである
。参照器は、検出器開口部１９と試料７との間隔で形成
される流量抵抗と同等の流量抵抗を有する絞り１４およ
び絞り１２と同等の絞り１６を備えて構成され、吸引源
１１に継がっている。絞り１４の一端は液溜器１５の液
中にその開１１部を浸しており、絞り１４の他端と絞り
１６との間の圧力は管により参照圧として圧電変換器９
につながっている。絞り１３の他端は吸引源１１に継が
っている。参照器と検出器は吸引源を同一とするため、
吸引源１１の圧力変動が同等に伝わるため、検出圧と参
照圧の圧力差に対する変動がなくなる。この場合圧電変
換器９はこの検出圧と参照圧の圧力差を電気変換するこ
とになる。また増幅制御回路１０は圧電変換器９からの
出力値す々わち上記圧力差が一定になるように試料台８
を駆動制御する。
検出圧と参照圧の一定の圧力差を零にするように制御さ
せる方式をとると、増幅制御回路１０のドリフトを補正
することが容易となる。すなわち吸引源１１を動作させ
ない状態で増幅制御回路１０の出力が零となるように回
路を補正すれば良いことになる。
せる方式をとると、増幅制御回路１０のドリフトを補正
することが容易となる。すなわち吸引源１１を動作させ
ない状態で増幅制御回路１０の出力が零となるように回
路を補正すれば良いことになる。
壕だ増幅制御回路１０に一定の電圧を外部回路によって
付加できるようにしておくと、試料台の位置に任意のオ
フセットを与えることもできる。
付加できるようにしておくと、試料台の位置に任意のオ
フセットを与えることもできる。
上記の２通りの回路の詳細については、例えば本願の発
明者らが出願している実願昭５６−１８１１６２号に述
べられており、本発明にも同様に適用することができる
。
明者らが出願している実願昭５６−１８１１６２号に述
べられており、本発明にも同様に適用することができる
。
試料７上の液体６は液溜器１５から適当な吸引源１７と
フィルタ１８を経て適量だけ供給され、検出器乙の先端
が浸る状態になされている。
フィルタ１８を経て適量だけ供給され、検出器乙の先端
が浸る状態になされている。
以上述べたように構成され動作する本発明の装置では、
液浸型露光装置の光学系の合焦点位置に試料面が来るよ
うに、一度だけ間隔りを設定することで、自動焦点合わ
せが可能となる。
液浸型露光装置の光学系の合焦点位置に試料面が来るよ
うに、一度だけ間隔りを設定することで、自動焦点合わ
せが可能となる。
本発明の実施にあたり、液体は検出器乙の開口部１９よ
り吸引することを特徴としている。これは、検出器６内
や光学部材１の下部に付着した気泡を除去するのに極め
て有効なだめである。吸引源１１を供給源と置きかえ、
検出器より液体を噴出する方法でも、間隙１］に見合っ
た圧力は検出できるが、検出器に生じた気泡を除去する
ためには吸引源を用いることが望ましい。従って光学部
材が実施例のように上方にある場合等、すなわち液中に
生じた気泡が閉じこめられてしまう構造の場合には気泡
による光路の乱れを除くため吸引することが必要となる
。
り吸引することを特徴としている。これは、検出器６内
や光学部材１の下部に付着した気泡を除去するのに極め
て有効なだめである。吸引源１１を供給源と置きかえ、
検出器より液体を噴出する方法でも、間隙１］に見合っ
た圧力は検出できるが、検出器に生じた気泡を除去する
ためには吸引源を用いることが望ましい。従って光学部
材が実施例のように上方にある場合等、すなわち液中に
生じた気泡が閉じこめられてしまう構造の場合には気泡
による光路の乱れを除くため吸引することが必要となる
。
本実施例において、検出器の開口部１９の径６ｍｍφ９
間隙ｈ２５０μｍの場合に、液体としてＨ２Ｏを用いて
、検出圧−１２００ｍｍ Ａｑ （ゲージ圧）、流量０
．６ ｅ／ｍｉｎ で、試料の位置の検出感度として
２．５ ｍｍ Ａｑ ７μｍが得られている。この検出
感度がある場合には±０．１μｍ程度の精度で試料の位
置決め保持が自動的にできることが認められている。
間隙ｈ２５０μｍの場合に、液体としてＨ２Ｏを用いて
、検出圧−１２００ｍｍ Ａｑ （ゲージ圧）、流量０
．６ ｅ／ｍｉｎ で、試料の位置の検出感度として
２．５ ｍｍ Ａｑ ７μｍが得られている。この検出
感度がある場合には±０．１μｍ程度の精度で試料の位
置決め保持が自動的にできることが認められている。
なお、上記実施例に示したデータ値は一例にすぎず、液
体の粘度、対物レンズの光路寸法等に応じて適宜変わり
うろことは容易に考えられる。
体の粘度、対物レンズの光路寸法等に応じて適宜変わり
うろことは容易に考えられる。
また、本発明の装置は、液浸用液体を循環させることが
できるため、液浸用液体のフィルタリングや温度調整さ
らには２種類以上の液体を切り換えて供給することも可
能である。
できるため、液浸用液体のフィルタリングや温度調整さ
らには２種類以上の液体を切り換えて供給することも可
能である。
また、本発明の装置は単に露光装置の・みならず９、液
中で距離を高精度に位置決め・保持することを必要とす
る装置に広く応用できることは言うまでもないことであ
る。
中で距離を高精度に位置決め・保持することを必要とす
る装置に広く応用できることは言うまでもないことであ
る。
以上説明したように、本発明の装置によれば、液浸型の
光学装置において、試料の位置を光学系の所定の合焦点
位置に自動的に高精度に位置決め・保持することが可能
に々す、しかも対物レンズに付着する気泡を容易に除去
することができるので、光学系の解像力低下を防止する
ことが可能になる。
光学装置において、試料の位置を光学系の所定の合焦点
位置に自動的に高精度に位置決め・保持することが可能
に々す、しかも対物レンズに付着する気泡を容易に除去
することができるので、光学系の解像力低下を防止する
ことが可能になる。
第１図は本発明の装置の一実施例の構成説明図である。
１・・光学部拐（交］物レンズ）
２・・レンズ鏡筒 ３・・検出器４・液体の吸引
孔 ５・・・圧力検出孔６・・・液浸用の液体
７・試料 ８・・試料台 ９・・・圧電変換器１０・増
幅制御回路 １１・・吸引源１２．１３．１４・・絞
り １５・・・液溜器１６・・・フィルタ １
７・・・液体供給用吸引源１８・・・フィルタ
１９・・・検出器の開口部代理人弁理士 中村純之助 第１ 図 国分寺市東恋ケ窪−丁目２８０番 地株式会社日立製作所中央研究 所内 ０発 明 者 寺澤恒男 国分寺市東恋ケ窪−丁目２８０番 地株式会社日立製作所中央研究 所内
孔 ５・・・圧力検出孔６・・・液浸用の液体
７・試料 ８・・試料台 ９・・・圧電変換器１０・増
幅制御回路 １１・・吸引源１２．１３．１４・・絞
り １５・・・液溜器１６・・・フィルタ １
７・・・液体供給用吸引源１８・・・フィルタ
１９・・・検出器の開口部代理人弁理士 中村純之助 第１ 図 国分寺市東恋ケ窪−丁目２８０番 地株式会社日立製作所中央研究 所内 ０発 明 者 寺澤恒男 国分寺市東恋ケ窪−丁目２８０番 地株式会社日立製作所中央研究 所内
Claims (2)
- （１）液体中の試才１を観察したりあるいは液体中の試
料に像を投影−１−る光学装置における光学系の合焦点
位置に」二記試旧を位置決め・保持するための液浸距離
保持装置であって、上記光学系のレンズ鏡筒下端部に該
光学系の部材と試料の間の光学光路とほぼ同一形状を有
する検出器と、該検出器の開口部より吸引源甘だは供給
源によって液体を吸引せたは供給する吸引系路捷たは供
給系路を備えた検出系を設け、がっ、上記検出器と試料
の間の距離に対応した検出器内の圧力を検出し電気信号
を出力する圧電変換器と、該圧電変換器の出方を用いて
試料を合焦点位置に位置決め・保持せしめる移動制御機
構を設けて構成したことを特徴とする液浸距離保持装置
。 - （２）前記検出系は、前記検出器の開口部と同等の流量
抵抗を有しかつ該検出器からの液体の吸引系路捷だは供
給系路と同等の流量抵抗の吸引、系路捷たは供給系路を
有する参照器を具備し、前記移動制御機構は、前記圧力
変換器の出力を入力する増幅制御回路を備え、」−記参
照器と検出器とを同一の吸引源に接続し、該参照器内の
参照圧力と該検出器内の検出圧力との圧力差が一定の値
と々るように上記移動制御機構を駆動制御するものであ
る特許請求の範囲第１項記載の液浸距離保持装置（ロ）
＾１１記増幅利御回路は、所定の電圧を外部回路か
ら付加することが可能な構成とし、該付加電圧により前
記移動制御機構を駆動せしめ試料を所望の位置に設定可
能ならしめたものである特許請求の範囲第２項記載の液
浸距離保持装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57129065A JPS5919912A (ja) | 1982-07-26 | 1982-07-26 | 液浸距離保持装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57129065A JPS5919912A (ja) | 1982-07-26 | 1982-07-26 | 液浸距離保持装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5919912A true JPS5919912A (ja) | 1984-02-01 |
Family
ID=15000212
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57129065A Pending JPS5919912A (ja) | 1982-07-26 | 1982-07-26 | 液浸距離保持装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5919912A (ja) |
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