JPS59201420A - Carrier rotating type water flow tank - Google Patents
Carrier rotating type water flow tankInfo
- Publication number
- JPS59201420A JPS59201420A JP58076412A JP7641283A JPS59201420A JP S59201420 A JPS59201420 A JP S59201420A JP 58076412 A JP58076412 A JP 58076412A JP 7641283 A JP7641283 A JP 7641283A JP S59201420 A JPS59201420 A JP S59201420A
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- water
- water tank
- water flow
- pure water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は半導体製造１穆において、半導体ウェハの水
洗いに使用されるキャリア回転形光水槽に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a carrier rotation type optical water bath used for washing semiconductor wafers in semiconductor manufacturing.
従来、半導体ウェハの水洗いは第１図に示すような流水
槽１により行われていた。この流水槽１は、底部に設け
られた純水供給口２，２・・・から純水を噴出し、第２
図乃至第４図に示すようにキャリア３に収納された複数
の半導体ウェハ４，４・・・の水洗いを行うものである
。Conventionally, semiconductor wafers have been washed with water using a running water tank 1 as shown in FIG. This flowing water tank 1 spouts pure water from pure water supply ports 2, 2, etc. provided at the bottom, and
As shown in FIGS. 4 to 4, a plurality of semiconductor wafers 4, 4, . . . housed in a carrier 3 are washed with water.
しかしながら、この従来の流水槽ｌＫあっては、純水供
給口２，２・・・から噴出した純水は決まった半導体ウ
ェハ４，４・・・間を通るため、キャリア３の溝部３ａ
、３ａ・・・の水洗効率が悪く、また各半導体ウェハ４
の全面を均一に水洗いすることができず、流水時間が長
くなり、純水供給流量が増大するという欠点があった。However, in this conventional running water tank lK, since the pure water spouted from the pure water supply ports 2, 2... passes between fixed semiconductor wafers 4, 4..., the groove 3a of the carrier 3
, 3a... have poor water washing efficiency, and each semiconductor wafer 4
It is not possible to uniformly wash the entire surface with water, and the water running time becomes long, resulting in an increase in the pure water supply flow rate.
この発明は上記冥情に禿みてなされたもので、その目面
（ｒ−１，手尋体ウェハの水洗効率を向上させることの
できるキャリア回転形光水槽を提供することにちる。The present invention was made in response to the above-mentioned circumstances, and its object is to provide a carrier rotating type optical water tank that can improve the efficiency of washing wafers with water.
この発明は、内部に向けて純水を噴出する流水槽と、複
数の半導体ウェハを収納したキャリアを前記流水槽内に
おいて回転させるキャリア回転機構とを具備し、半導体
ウーエハを回転ｔながら水洗いを行うものである。The present invention includes a running water tank that spouts pure water inward, and a carrier rotation mechanism that rotates a carrier containing a plurality of semiconductor wafers in the running water tank, and performs water washing while rotating the semiconductor wafers. It is something.
以下、図面を参照してこの発明の一実施例を説明する。 Hereinafter, one embodiment of the present invention will be described with reference to the drawings.
第５図は有底円筒状の流水槽１１を示すものである。こ
の流水槽１１の底部には第６図に平面状態で示すように
複数の純水供給口１２．１２・・・が設けられており、
純水管１３により送られてきた純水がこれら純水供給口
１２゜１２・・・から第７図に示すように垂直方向及び
斜め方向に噴出するようになっている。FIG. 5 shows a cylindrical running water tank 11 with a bottom. A plurality of pure water supply ports 12, 12, . . . are provided at the bottom of the running water tank 11, as shown in a plan view in FIG.
The pure water sent by the pure water pipe 13 is spouted from these pure water supply ports 12, 12, etc. in vertical and diagonal directions as shown in FIG.
第８図は上記流水槽１１にキャリア回転機構１−４と共
に、複数の半導体ウェハ１５，１．５・・・を収納した
キャリア１６を入れ、半導体ウェハ１５．１５・・・の
水洗いをしている状態を示すものである。FIG. 8 shows that the carrier rotation mechanism 1-4 and the carrier 16 containing a plurality of semiconductor wafers 15, 1.5... are placed in the running water tank 11, and the semiconductor wafers 15, 15... This indicates the state of being.
キャリア回転機構１４は、キャリア１６が載置されるキ
ャリア載置台ノアとこのキャリア載置台１７を水平に回
転させる水平駆動部１８により構成されている。キャリ
ア載置台１７は、懸吊板１９の四隅にそれぞれ固定され
た細長い支持棒２０・・・により載置部材２１を支持し
てなる。また、水平駆動部１８は、基端部において上記
懸吊板１９に固定されると共に頭部に拡幅部２２を有し
、吊し台２３に設けられた孔２４から吊り下げられた軸
２５と、この軸２５の外周部に設けられたギヤ２６と、
駆動モータ（図示せず。）と、この駆動モータとギヤ２
６との間を連結するベルト２７により構成されている。The carrier rotation mechanism 14 includes a carrier mounting base noah on which the carrier 16 is placed, and a horizontal drive unit 18 that horizontally rotates the carrier mounting base 17. The carrier mounting table 17 supports the mounting member 21 by elongated support rods 20 fixed to each of the four corners of the suspension plate 19. The horizontal drive unit 18 is fixed to the suspension plate 19 at the base end, has a widened part 22 at the head, and has a shaft 25 suspended from a hole 24 provided in the suspension base 23. , a gear 26 provided on the outer periphery of this shaft 25;
A drive motor (not shown), this drive motor and gear 2
6 and a belt 27 connecting the two.
なお、２８は軸２５と吊し台２３との間を封止するシー
ルでおる。Note that 28 is a seal that seals between the shaft 25 and the hanging stand 23.
すなわち、この流水槽１ノにおいては、図示しない駆動
モータを駆動させると、その回転力がベルト２７により
ギヤ２６に伝達され、キャリア載置台１７と共にキャリ
ア１６が所定の速度で回転する。しかして、純水供給口
１２．１２・・・から純水カ噴出され、回転中の半導体
ウェハ１−５．１５・・・の水洗いを行うものである。That is, in this running water tank 1, when a drive motor (not shown) is driven, its rotational force is transmitted to the gear 26 by the belt 27, and the carrier 16 together with the carrier mounting table 17 rotates at a predetermined speed. Thus, pure water is jetted out from the pure water supply ports 12, 12, and washes the rotating semiconductor wafers 1-5, 15, and so on.
このようにこの流水槽１１においては、半導体ウェハ１
５，１５・・・を回転させながら水洗いを行うものであ
り、キャリア１６の溝部も充分に水洗いすることができ
、また各半導体ウェハ１５の全面を均一に水洗いするこ
とができる。In this way, in this running water tank 11, the semiconductor wafer 1
5, 15, . . ., the grooves of the carrier 16 can be sufficiently washed with water, and the entire surface of each semiconductor wafer 15 can be uniformly washed with water.
従って、水洗効率が向上し、その結果流水時間が短かく
て済み、純水供給流量をも減少させることができる。Therefore, the water washing efficiency is improved, and as a result, the water flow time can be shortened, and the pure water supply flow rate can also be reduced.
尚、上記実施例においては、キャリア回転機構１４の水
平駆動部１８を流水槽１１の上方部に設けるようにした
が、流水槽１１の底部に軸挿通用の孔を設け、水平駆動
部１８を流水槽１１の下部に設けるようにしてもよい。In the above embodiment, the horizontal drive section 18 of the carrier rotation mechanism 14 is provided above the running water tank 11, but a hole for shaft insertion is provided at the bottom of the running water tank 11, and the horizontal drive section 18 is provided at the bottom of the running water tank 11. It may also be provided at the bottom of the running water tank 11.
以上のようにこの発明によれば、キャリア内の半導体ウ
ェハを回転させながら水洗いを行うようにしたので、水
洗効率が向上する。′As described above, according to the present invention, since the semiconductor wafer in the carrier is washed with water while being rotated, the washing efficiency is improved. ′
第１図は従来の流水槽の構成を示′を斜視図、第２図は
第１図の流水槽にキャリアを収容し、た状態を示す平面
図、第３図は同じく側面図、第４図は同じく正面図、第
５図はこの兄明の一実施例に係る流水槽の構成を示す斜
視図、第６図は第５図の流水槽における純水供給口の配
置を示す図、第７図は同じく純水の噴出状態を示す図、
第８図は第５図の流水槽にキャリア回転機構を収容した
状態を示す斜視図である。
１１・・・流水槽、１２・・・純水供給口、１３・・・
純水管、１−４・・・キャリア回転機構、１５・・・半
導体ウェハ、１６・・・キャリア。
出願人代即人 弁理９士 鈴 江 武 彦第５図
第６図Fig. 1 is a perspective view showing the configuration of a conventional running water tank, Fig. 2 is a plan view showing a state in which the carrier is accommodated in the running water tank of Fig. 1, and Fig. 3 is a side view of the same; The figure is a front view, FIG. 5 is a perspective view showing the configuration of a flowing water tank according to an embodiment of this invention, FIG. 6 is a diagram showing the arrangement of the pure water supply port in the flowing water tank of FIG. Figure 7 is a diagram showing the pure water spouting state as well.
FIG. 8 is a perspective view showing a state in which the carrier rotation mechanism is accommodated in the running water tank of FIG. 5. 11... Running water tank, 12... Pure water supply port, 13...
Pure water pipe, 1-4...Carrier rotation mechanism, 15...Semiconductor wafer, 16...Carrier. Takehiko Suzue, 9th patent attorney, on behalf of the applicant Figure 5
Figure 6
Claims (1)
ェハを収納したキャリアを前記流水槽内において回転さ
せるキャリア回転機構とを具備したことを特徴とするキ
ャリア回転形光水槽。A carrier rotation type optical water tank comprising: a running water tank that spouts pure water toward the inside; and a carrier rotation mechanism that rotates a carrier containing a plurality of semiconductor wafers in the running water tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58076412A JPS59201420A (en) | 1983-04-30 | 1983-04-30 | Carrier rotating type water flow tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58076412A JPS59201420A (en) | 1983-04-30 | 1983-04-30 | Carrier rotating type water flow tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59201420A true JPS59201420A (en) | 1984-11-15 |
Family
ID=13604514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58076412A Pending JPS59201420A (en) | 1983-04-30 | 1983-04-30 | Carrier rotating type water flow tank |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59201420A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0325936A (en) * | 1989-06-16 | 1991-02-04 | American Teleph & Telegr Co <Att> | Cleaning of semiconductor wafer and device therefor |
-
1983
- 1983-04-30 JP JP58076412A patent/JPS59201420A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0325936A (en) * | 1989-06-16 | 1991-02-04 | American Teleph & Telegr Co <Att> | Cleaning of semiconductor wafer and device therefor |
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