JPS5927112B2 - semiconductor equipment - Google Patents

semiconductor equipment

Info

Publication number
JPS5927112B2
JPS5927112B2 JP50121606A JP12160675A JPS5927112B2 JP S5927112 B2 JPS5927112 B2 JP S5927112B2 JP 50121606 A JP50121606 A JP 50121606A JP 12160675 A JP12160675 A JP 12160675A JP S5927112 B2 JPS5927112 B2 JP S5927112B2
Authority
JP
Japan
Prior art keywords
current
conductivity type
type region
magnetic field
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP50121606A
Other languages
Japanese (ja)
Other versions
JPS5245294A (en
Inventor
正雄 加地
博 浅見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Home Electronics Ltd
Original Assignee
NEC Home Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Home Electronics Ltd filed Critical NEC Home Electronics Ltd
Priority to JP50121606A priority Critical patent/JPS5927112B2/en
Publication of JPS5245294A publication Critical patent/JPS5245294A/en
Publication of JPS5927112B2 publication Critical patent/JPS5927112B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 この発明は半導体装置に関するもので、その電流制御を
効率よく行うことを主な目的とする。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device, and its main object is to efficiently control the current of the semiconductor device.

一般に半導体の内部でのキャリアはその場に磁界が作用
すると磁界と垂直方向に力を受けて流札方向が変ること
が知られており、その利用として従来ではマグネットダ
イオードがある。このマグネットダイオードは半導体の
ペレットに対し、外部の上下方向にマグネットを配置し
たもので、このマグネットによる磁界をペレット内部に
作用させて電流制御を行つていた。ところがこのような
間接的なマグネットの利用ではかなり大きなマグネット
を必要としてあまり実用的とはいえなかつた。この発明
は上記したキャリアの磁界による影響を考慮してなした
もので、半導体のPN接合面に平行な磁界を効率よく発
生させてキャリアの流れ即ち電流をこの磁界による影響
で制御する新しい半導体装置を提供する。
It is generally known that when a magnetic field acts on carriers inside a semiconductor, the direction of the carrier changes due to a force perpendicular to the magnetic field, and a conventional method for this purpose is a magnet diode. This magnet diode is a semiconductor pellet with magnets arranged on the outside in the vertical direction, and the magnetic field from the magnet acts on the inside of the pellet to control current. However, such indirect use of magnets requires a fairly large magnet, which is not very practical. This invention was made in consideration of the influence of the magnetic field of carriers as described above, and is a new semiconductor device that efficiently generates a magnetic field parallel to the PN junction surface of a semiconductor and controls the flow of carriers, that is, the current, by the influence of this magnetic field. I will provide a.

以下本発明を各種実施例に於て説明すると次の通りであ
る。まずこの発明の動作原理であるが、これは2つの導
体に夫々の電圧を印加して電流を流すと、その各電流が
同一方向ならば導体間に引力が作用し、逆方向ならば反
撥力が作用することを利用したもので、つまりはこの磁
気的引力や反撥力を半導体でのキャリアに影響させるこ
とにある。
The present invention will be explained below with reference to various embodiments. First, the operating principle of this invention is that when voltages are applied to two conductors and current flows through them, if the currents are in the same direction, an attractive force acts between the conductors, and if the currents are in the opposite direction, a repulsive force acts between the conductors. This method takes advantage of the effect of magnetic attraction and repulsion on carriers in semiconductors.

この原理による本発明での基本的な各実施例を以下順を
追つて説明する。まず、第1図及ひ第2図の第1の実施
例に於て、1はP型(或はN型)の第1の導電型領域、
2はN型(或はP型)の第2の導電型領域で、この両者
で1つのPN接合面を有する、いわゆる半導体ペレット
を形成する。
Each basic embodiment of the present invention based on this principle will be explained in order below. First, in the first embodiment shown in FIGS. 1 and 2, 1 is a P type (or N type) first conductivity type region,
Reference numeral 2 denotes a second conductivity type region of N type (or P type), and both of them form a so-called semiconductor pellet having one PN junction surface.

次に3は第1の導電領域1の両端部に設けた第1の電極
、4は第2の導電型領域2に設けた第2の電極、5は第
1の導電型領域1の上面に固着した5102やU203
等の絶縁脆6は絶縁膜5上に設けた導電層であり、そし
て7は導電層6の両端に設けた制御用電極である。この
制御用電極Tの両端子は第1の電極3の両端子と同一方
向に配列され、そして両電極3、1の間を流れる電流は
同方向か逆方向となす。即ち、第1の電極3と匍脚用電
極Tに夫々の電圧を印加して、導電層6に流れる電流1
1と第1の導電型領域1に流れる電流12を同方向、又
は逆方向に流すと両電流11、12の方向により引力、
又は反撥力が作用する。
Next, 3 is a first electrode provided on both ends of the first conductive region 1, 4 is a second electrode provided on the second conductive type region 2, and 5 is a first electrode provided on the upper surface of the first conductive type region 1. Fixed 5102 or U203
The insulating brittle 6 is a conductive layer provided on the insulating film 5, and 7 is a control electrode provided at both ends of the conductive layer 6. Both terminals of this control electrode T are arranged in the same direction as both terminals of the first electrode 3, and currents flowing between the two electrodes 3 and 1 are in the same direction or in opposite directions. That is, by applying respective voltages to the first electrode 3 and the prong electrode T, the current 1 flowing through the conductive layer 6 is increased.
1 and the first conductivity type region 1 in the same direction or in opposite directions, an attractive force is generated due to the direction of both currents 11 and 12.
Or a repulsive force acts.

つまり、このとき第1と第2の導電型領域1,2のPN
接合面には平行な磁界が作用する。すると第1の導電型
領域1のキヤリヤが磁界によつて磁界の方向と直角方向
にローレンツカを受けて、移動せしめられる。今第1の
導電型領域1をP型とし、そこを流れる電流12と導電
層6に流れる電流11とが逆方向であるとすれば、第1
の導電型領域1のキヤリヤ(正孔)はPN接合の方向に
押しつけられる。しかしPN接合は一種の障壁を有する
ので、キヤリヤ(正孔)がこの障壁を越えて第2の導電
型領域2に移動するためには一定のエネルギーが必要で
ある。したがつて、もしキヤリヤ(正孔)に加わるロー
レンツカ、換言すれば導電層6に流れる電流11が小さ
いと、キヤリヤ(正孔)はPN接合を越えて第2の導電
型領域2に移動せず、第2の電極4には電流が流れない
、導電層6に流れる電流11を一定値以上に増大すると
、キヤリヤ(正孔)はPN接合を越えて第2の導電型領
域2に移動し、第2の電極4に電流3が流れる。電流1
を増大すると、第2の電極4に流れる電流13が増大す
る。すなわち第1の導電型領域1に流れる電流12のう
ちPN接合面を越えて第2の電電型領域2に分流する電
流3の量が上記磁界によるキヤリヤの反撥力の作用にて
制御される。要するに電流11,12にて接合面に平行
な磁界を発生させ、そして電流11や電流2の変化によ
る磁界の変化にて電流13を流れよくしたり、流れにく
くしたりする電流制御である。このことは第1の導電型
領域1や第2の導電型領域2のP型やN型の区別に関係
なく同様にいえることは当然で、これは以下同様である
。ただし、第1の導電型領域1がN型で第2の導電型領
域2がP型の場合は、第1の導電型領域1のキヤリヤは
ホールであるため、キヤリヤに吸引力が作用したとき電
流13が流れる。上記第1の実施例は電流だけによる磁
界発生で、電流制御を行うようにしたが、これを改良し
たのが次の第3図及び第4図に示す第2の実施例である
。
That is, at this time, the PN of the first and second conductivity type regions 1 and 2 is
A parallel magnetic field acts on the joint surfaces. The carrier of the first conductivity type region 1 is then subjected to a Lorentz force by the magnetic field in a direction perpendicular to the direction of the magnetic field and is moved. Now, if the first conductivity type region 1 is P type and the current 12 flowing there and the current 11 flowing through the conductive layer 6 are in opposite directions, then the first conductivity type region 1
The carriers (holes) in the conductivity type region 1 are pushed in the direction of the PN junction. However, since the PN junction has a kind of barrier, a certain amount of energy is required for carriers (holes) to cross this barrier and move to the second conductivity type region 2. Therefore, if the Lorentz force applied to the carrier (hole), in other words, the current 11 flowing through the conductive layer 6 is small, the carrier (hole) will not move beyond the PN junction to the second conductivity type region 2. First, no current flows through the second electrode 4. When the current 11 flowing through the conductive layer 6 is increased beyond a certain value, carriers (holes) move across the PN junction to the second conductivity type region 2. , a current 3 flows through the second electrode 4. current 1
As the current 13 increases, the current 13 flowing through the second electrode 4 increases. That is, the amount of current 3 that flows across the PN junction surface and is shunted into the second conductivity type region 2 out of the current 12 flowing through the first conductivity type region 1 is controlled by the repulsive force of the carrier caused by the magnetic field. In short, this is current control in which a magnetic field parallel to the bonding surface is generated using currents 11 and 12, and the current 13 is made to flow more or less easily by changing the magnetic field due to changes in current 11 and current 2. Naturally, this can be said similarly regardless of whether the first conductivity type region 1 or the second conductivity type region 2 is P type or N type, and the same applies hereinafter. However, if the first conductivity type region 1 is N type and the second conductivity type region 2 is P type, the carrier of the first conductivity type region 1 is a hole, so when an attractive force acts on the carrier A current 13 flows. In the first embodiment, the magnetic field is generated only by current, and the current is controlled, but this is improved in the second embodiment shown in FIGS. 3 and 4.

これは2つの絶縁膜5a,5bの間に強磁性体8を挟ん
だもので、後は第1の実施例と同様である。そしてこの
第2の実施例でのポイントは強磁性体8に少しの磁界を
作用させると、キヤリヤに作用する磁界を強める作用を
なすことにある。従つてごの強磁性体8によつて、第2
の実施例は電流1や電流12のより弱い変化でもつて電
流13を制御できることになる。即ち、電流制御効率は
より向上するメリツトがある。更にこの第2の実施例を
改良したのが次の第3の実施例で、第5図及び第6図に
示す。
In this embodiment, a ferromagnetic material 8 is sandwiched between two insulating films 5a and 5b, and the rest is the same as the first embodiment. The point of this second embodiment is that when a small magnetic field is applied to the ferromagnetic material 8, the magnetic field acting on the carrier is strengthened. Therefore, by the ferromagnetic material 8 of the lever, the second
In this embodiment, current 13 can be controlled even with weaker changes in current 1 and current 12. That is, there is an advantage that current control efficiency is further improved. The next third embodiment is a further improvement on the second embodiment, and is shown in FIGS. 5 and 6.

これは強磁性体8を用い、この強磁性体8の外周域での
絶縁膜5cの上にホトエツチング法等にて導電層6をコ
イル状に形成したことをポイントにする。このコ・イル
状導電層6は1回、或は複数回に捲回形成するもので、
別に強磁性体8の外周域でなく、強磁性体8上に絶縁し
て形成するようにしてもよい。またこの第3の実施例の
場合、コイル状導電層6による磁界方向が上記とは変る
ため、第1・第2の導電型領域1,2でのPN接合面は
第5図及び第6図に示すようにP型とN型を交互に組合
せて縦方向に構成し、而してこのPN接合面に、コイル
状導電層6を流れる電流1にて発生する磁界を平行に作
用させる。このとき各PN接合面の1組毎に絶縁層を設
けるようにしてもよい。この第3の実施例の動作原理は
第1 第2の実施例と同様であり、より効果的な点は導
電層6をコイル状にしたところにある。即ち、例えばこ
の導電層6を100回捲くとすると、流れる電流11が
第2の実施例と同じであるとするならば生じる磁界の強
さは第2の実施例の100倍程度になる。換言すれば、
第2の実施例の1/100の電流11で、第2の実施例
と同じ作用をなすわけである。つまり第3の実施例では
第2の実施例より、更により弱い電流Tl,T2で電流
13の制御が可能となる。いずれにせよ第1第2第3の
実施例で明らかな如く、接合面に流れる電流13は電流
11や電流12の変化にて制御できるわけであるが、
また電流13の変化にて電流12が電流11にて結果的
に制御されることにもなる。
The key point is that a ferromagnetic material 8 is used, and a conductive layer 6 is formed in a coil shape on the insulating film 5c in the outer peripheral region of the ferromagnetic material 8 by photoetching or the like. This coil-shaped conductive layer 6 is formed by winding once or multiple times.
Alternatively, it may be formed insulated on the ferromagnetic material 8 instead of in the outer peripheral region of the ferromagnetic material 8. In addition, in the case of this third embodiment, since the direction of the magnetic field due to the coiled conductive layer 6 is different from that described above, the PN junction surfaces in the first and second conductivity type regions 1 and 2 are as shown in FIGS. 5 and 6. As shown in the figure, P-type and N-type are alternately combined in a vertical direction, and a magnetic field generated by a current 1 flowing through the coiled conductive layer 6 is applied in parallel to this PN junction surface. At this time, an insulating layer may be provided for each pair of PN junction surfaces. The operating principle of this third embodiment is similar to that of the first and second embodiments, and its more effective point is that the conductive layer 6 is formed into a coil shape. That is, for example, if this conductive layer 6 is rolled 100 times, the strength of the generated magnetic field will be about 100 times that of the second embodiment, assuming that the flowing current 11 is the same as in the second embodiment. In other words,
The current 11 is 1/100 of that in the second embodiment, and the same effect as in the second embodiment is achieved. That is, in the third embodiment, it is possible to control the current 13 with even weaker currents Tl and T2 than in the second embodiment. In any case, as is clear from the first and second embodiments, the current 13 flowing through the joint surface can be controlled by changing the current 11 and the current 12.
Furthermore, the current 12 is eventually controlled by the current 11 due to the change in the current 13.

即ち電流11は電流2と電流3を制御するわけであり.
そして第2から第3の実施例になる程に電流11はより
微少変化でよいことが既に明らかである。またこのよう
な電流制御は上記実施に限らずトランジスタ等の構造に
於ても適用が可能であることは当然である。以上説明し
たようにこの発明によれば半導体の接合面に流れる電流
は半導体と一体化した制御用電極間の電流によつて発生
する磁界により制御でき、従つて電流制御の効率がよく
、より弱い制御電流で制御が可能となる。
In other words, current 11 controls current 2 and current 3.
It is already clear that the current 11 can be changed more minutely from the second to the third embodiment. Further, it goes without saying that such current control can be applied not only to the above implementation but also to structures such as transistors. As explained above, according to the present invention, the current flowing through the junction surface of the semiconductor can be controlled by the magnetic field generated by the current between the control electrodes integrated with the semiconductor, and therefore the current control is efficient and weak. Control is possible with control current.

またマグネツトのような部品を全く必要とせず、流れる
電流による磁界を直接に利用するから半導体装置の小型
化が容易に可能となり、その適用範囲は大である。
Further, since the magnetic field generated by the flowing current is directly utilized without requiring any components such as magnets, it is possible to easily miniaturize the semiconductor device, and its range of application is wide.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る半導体装置の第1の実施例を示す
平面図、第2図は第1図A−A線の側断面図、第3図は
第2の実施例を示す平面図、第4図は第3図B−B線の
側新面図、第5図は第3の実施例を示す平面図、第6図
は第5図のC−C線の側断面図である。 1・・・・・・第1の導電型領域、 領域、3・・・・・・第1の電極、 ・・・・・・絶縁膜、6・・・・・・導電層、2・・・
・・・第2の導電型4・・・・・・第2の電極、5 7・・・・・・制御用電極。
FIG. 1 is a plan view showing a first embodiment of a semiconductor device according to the present invention, FIG. 2 is a side sectional view taken along line A-A in FIG. 1, and FIG. 3 is a plan view showing a second embodiment. , FIG. 4 is a new side view taken along line B-B in FIG. 3, FIG. 5 is a plan view showing the third embodiment, and FIG. 6 is a side sectional view taken along line C-C in FIG. . DESCRIPTION OF SYMBOLS 1... First conductivity type region, region, 3... First electrode,... Insulating film, 6... Conductive layer, 2...・
... Second conductivity type 4 ... Second electrode, 5 7 ... Control electrode.

Claims (1)

【特許請求の範囲】[Claims] 1 第1の導電型領域とこれとは異なる第2の導電型領
域を有する半導体と、該半導体の第1の導電型領域の両
端部に設けた第1の電極と、前記第2の導電型領域に設
けた第2の電極と、前記第1の導電型領域及び、或いは
第2の導電型領域の表面に絶縁して設けた導電層と、該
導電層の両端に設けた制御用電極とからなり、前記制御
用電極間に流れる電流にて上記第1・第2の導電型領域
の接合面に平行な磁界を発生させ、第1の電極間若しく
は第1の電極と第2の電極間の電流を制御するようにな
したことを特徴とする半導体装置。
1. A semiconductor having a first conductivity type region and a second conductivity type region different from the first conductivity type region, a first electrode provided at both ends of the first conductivity type region of the semiconductor, and the second conductivity type region. a second electrode provided in the region, a conductive layer provided insulated on the surface of the first conductivity type region and/or the second conductivity type region, and control electrodes provided at both ends of the conductive layer; A magnetic field parallel to the junction surface of the first and second conductivity type regions is generated by a current flowing between the control electrodes, and a magnetic field is generated between the first electrodes or between the first electrode and the second electrode. A semiconductor device characterized in that the current of the semiconductor device is controlled.
JP50121606A 1975-10-07 1975-10-07 semiconductor equipment Expired JPS5927112B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50121606A JPS5927112B2 (en) 1975-10-07 1975-10-07 semiconductor equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50121606A JPS5927112B2 (en) 1975-10-07 1975-10-07 semiconductor equipment

Publications (2)

Publication Number Publication Date
JPS5245294A JPS5245294A (en) 1977-04-09
JPS5927112B2 true JPS5927112B2 (en) 1984-07-03

Family

ID=14815407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50121606A Expired JPS5927112B2 (en) 1975-10-07 1975-10-07 semiconductor equipment

Country Status (1)

Country Link
JP (1) JPS5927112B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6199616U (en) * 1984-12-05 1986-06-25

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748262A (en) * 1980-08-29 1982-03-19 Rohm Co Ltd Magnetic coupler
JPS59118257A (en) * 1982-12-24 1984-07-07 Nippon Steel Corp Continuous casting machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6199616U (en) * 1984-12-05 1986-06-25

Also Published As

Publication number Publication date
JPS5245294A (en) 1977-04-09

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