JPS5928331B2 - Method for producing new polymeric substances - Google Patents
Method for producing new polymeric substancesInfo
- Publication number
- JPS5928331B2 JPS5928331B2 JP14898778A JP14898778A JPS5928331B2 JP S5928331 B2 JPS5928331 B2 JP S5928331B2 JP 14898778 A JP14898778 A JP 14898778A JP 14898778 A JP14898778 A JP 14898778A JP S5928331 B2 JPS5928331 B2 JP S5928331B2
- Authority
- JP
- Japan
- Prior art keywords
- polymeric substances
- urethane
- acid residue
- tables
- formulas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000126 substance Substances 0.000 title claims description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000178 monomer Substances 0.000 claims description 13
- 229920000642 polymer Polymers 0.000 claims description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 150000001732 carboxylic acid derivatives Chemical group 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 3
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 claims description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 2
- 125000000779 carbonic acid monoester group Chemical group 0.000 claims description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 25
- 238000006243 chemical reaction Methods 0.000 description 17
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 229920001577 copolymer Polymers 0.000 description 9
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 125000004185 ester group Chemical group 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 4
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000005396 acrylic acid ester group Chemical group 0.000 description 4
- LQIHFGJIROIECY-UHFFFAOYSA-N butan-2-yl n,n-dichlorocarbamate Chemical compound CCC(C)OC(=O)N(Cl)Cl LQIHFGJIROIECY-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000005062 Polybutadiene Substances 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- -1 amide compound Chemical class 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920002857 polybutadiene Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 2
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 150000003613 toluenes Chemical class 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RPIASGZWMYYFSW-UHFFFAOYSA-N 1-phenylethyl n,n-dichlorocarbamate Chemical compound ClN(Cl)C(=O)OC(C)C1=CC=CC=C1 RPIASGZWMYYFSW-UHFFFAOYSA-N 0.000 description 1
- YIVBHISFBAZKNU-UHFFFAOYSA-N 1-phenylpropan-2-yl n,n-dichlorocarbamate Chemical compound ClN(Cl)C(=O)OC(C)CC1=CC=CC=C1 YIVBHISFBAZKNU-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- CAAJTQVECNUECE-UHFFFAOYSA-N 3-methylbutan-2-yl n,n-dichlorocarbamate Chemical compound CC(C)C(C)OC(=O)N(Cl)Cl CAAJTQVECNUECE-UHFFFAOYSA-N 0.000 description 1
- SJADWSRDNDUTAU-UHFFFAOYSA-N 3-methylpentan-2-yl n,n-dichlorocarbamate Chemical compound CCC(C)C(C)OC(=O)N(Cl)Cl SJADWSRDNDUTAU-UHFFFAOYSA-N 0.000 description 1
- ITFSYKWXFSXNHN-UHFFFAOYSA-N 4-bromo-n,n-dichlorobenzenesulfonamide Chemical compound ClN(Cl)S(=O)(=O)C1=CC=C(Br)C=C1 ITFSYKWXFSXNHN-UHFFFAOYSA-N 0.000 description 1
- FBRYDVGQRXJNQI-UHFFFAOYSA-N BrCN(CBr)S(=O)=O Chemical compound BrCN(CBr)S(=O)=O FBRYDVGQRXJNQI-UHFFFAOYSA-N 0.000 description 1
- OQUWYDMAUGVJHA-UHFFFAOYSA-N ClCN(CCl)S(=O)=O Chemical compound ClCN(CCl)S(=O)=O OQUWYDMAUGVJHA-UHFFFAOYSA-N 0.000 description 1
- 101150029544 Crem gene Proteins 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 101100230601 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) HBT1 gene Proteins 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000012661 block copolymerization Methods 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- FIDOSFRAADWOFS-UHFFFAOYSA-N ethyl n,n-bis(bromomethyl)carbamate Chemical compound CCOC(=O)N(CBr)CBr FIDOSFRAADWOFS-UHFFFAOYSA-N 0.000 description 1
- LRPGHXZIQALNRZ-UHFFFAOYSA-N ethyl n,n-bis(chloromethyl)carbamate Chemical compound CCOC(=O)N(CCl)CCl LRPGHXZIQALNRZ-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- IHYBFGUWKAMPHO-UHFFFAOYSA-N heptan-2-yl n,n-dibromocarbamate Chemical compound CCCCCC(C)OC(=O)N(Br)Br IHYBFGUWKAMPHO-UHFFFAOYSA-N 0.000 description 1
- WPPZZECLWMOVFC-UHFFFAOYSA-N heptan-2-yl n,n-dichlorocarbamate Chemical compound CCCCCC(C)OC(=O)N(Cl)Cl WPPZZECLWMOVFC-UHFFFAOYSA-N 0.000 description 1
- AHPXUGIMQRQTOF-UHFFFAOYSA-N hexan-2-yl n,n-dibromocarbamate Chemical compound CCCCC(C)OC(=O)N(Br)Br AHPXUGIMQRQTOF-UHFFFAOYSA-N 0.000 description 1
- KLZZCOJGZYVSFJ-UHFFFAOYSA-N hexan-2-yl n,n-dichlorocarbamate Chemical compound CCCCC(C)OC(=O)N(Cl)Cl KLZZCOJGZYVSFJ-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- CEINJCKCEIQLCO-UHFFFAOYSA-N n,n,4-tribromobenzenesulfonamide Chemical compound BrN(Br)S(=O)(=O)C1=CC=C(Br)C=C1 CEINJCKCEIQLCO-UHFFFAOYSA-N 0.000 description 1
- YQFIHIHRQSCFMO-UHFFFAOYSA-N n,n,4-trichlorobenzenesulfonamide Chemical compound ClN(Cl)S(=O)(=O)C1=CC=C(Cl)C=C1 YQFIHIHRQSCFMO-UHFFFAOYSA-N 0.000 description 1
- JOJJNTHOKFGMET-UHFFFAOYSA-N n,n-dibromo-4-chlorobenzenesulfonamide Chemical compound ClC1=CC=C(S(=O)(=O)N(Br)Br)C=C1 JOJJNTHOKFGMET-UHFFFAOYSA-N 0.000 description 1
- VHIWPADFPZUSDN-UHFFFAOYSA-N n,n-dibromo-4-iodobenzenesulfonamide Chemical compound BrN(Br)S(=O)(=O)C1=CC=C(I)C=C1 VHIWPADFPZUSDN-UHFFFAOYSA-N 0.000 description 1
- BEJBLYLRWIFFBD-UHFFFAOYSA-N n,n-dibromo-4-methylbenzenesulfonamide Chemical compound CC1=CC=C(S(=O)(=O)N(Br)Br)C=C1 BEJBLYLRWIFFBD-UHFFFAOYSA-N 0.000 description 1
- VEPFCNZDHXEDCW-UHFFFAOYSA-N n,n-dibromoacetamide Chemical compound CC(=O)N(Br)Br VEPFCNZDHXEDCW-UHFFFAOYSA-N 0.000 description 1
- OTVPURYEWXIAKH-UHFFFAOYSA-N n,n-dibromobenzenesulfonamide Chemical compound BrN(Br)S(=O)(=O)C1=CC=CC=C1 OTVPURYEWXIAKH-UHFFFAOYSA-N 0.000 description 1
- JPYFWQNJEVENKY-UHFFFAOYSA-N n,n-dibromobutane-1-sulfonamide Chemical compound CCCCS(=O)(=O)N(Br)Br JPYFWQNJEVENKY-UHFFFAOYSA-N 0.000 description 1
- VSNICTJLDVNVKX-UHFFFAOYSA-N n,n-dibromohexane-1-sulfonamide Chemical compound CCCCCCS(=O)(=O)N(Br)Br VSNICTJLDVNVKX-UHFFFAOYSA-N 0.000 description 1
- GGGSBOVBAAXBAS-UHFFFAOYSA-N n,n-dibromopropane-1-sulfonamide Chemical compound CCCS(=O)(=O)N(Br)Br GGGSBOVBAAXBAS-UHFFFAOYSA-N 0.000 description 1
- FWPQTIYBQZKGLY-UHFFFAOYSA-N n,n-dichloro-1-phenylmethanesulfonamide Chemical compound ClN(Cl)S(=O)(=O)CC1=CC=CC=C1 FWPQTIYBQZKGLY-UHFFFAOYSA-N 0.000 description 1
- SALMTRZCQWSDRB-UHFFFAOYSA-N n,n-dichloro-4-iodobenzenesulfonamide Chemical compound ClN(Cl)S(=O)(=O)C1=CC=C(I)C=C1 SALMTRZCQWSDRB-UHFFFAOYSA-N 0.000 description 1
- ARGDYOIRHYLIMT-UHFFFAOYSA-N n,n-dichloro-4-methylbenzenesulfonamide Chemical compound CC1=CC=C(S(=O)(=O)N(Cl)Cl)C=C1 ARGDYOIRHYLIMT-UHFFFAOYSA-N 0.000 description 1
- ROVVHEKSEBLOOM-UHFFFAOYSA-N n,n-dichloroacetamide Chemical compound CC(=O)N(Cl)Cl ROVVHEKSEBLOOM-UHFFFAOYSA-N 0.000 description 1
- PJBJJXCZRAHMCK-UHFFFAOYSA-N n,n-dichlorobenzenesulfonamide Chemical compound ClN(Cl)S(=O)(=O)C1=CC=CC=C1 PJBJJXCZRAHMCK-UHFFFAOYSA-N 0.000 description 1
- XRTRZFNJONJFFF-UHFFFAOYSA-N n,n-dichloroethanesulfonamide Chemical compound CCS(=O)(=O)N(Cl)Cl XRTRZFNJONJFFF-UHFFFAOYSA-N 0.000 description 1
- OGYZDSAWHSDZHM-UHFFFAOYSA-N n,n-dichlorohexane-1-sulfonamide Chemical compound CCCCCCS(=O)(=O)N(Cl)Cl OGYZDSAWHSDZHM-UHFFFAOYSA-N 0.000 description 1
- CFPBBKLZBQATLI-UHFFFAOYSA-N n,n-dichloropentane-1-sulfonamide Chemical compound CCCCCS(=O)(=O)N(Cl)Cl CFPBBKLZBQATLI-UHFFFAOYSA-N 0.000 description 1
- BDWBFVNWAHXNRX-UHFFFAOYSA-N n,n-dichloropropane-1-sulfonamide Chemical compound CCCS(=O)(=O)N(Cl)Cl BDWBFVNWAHXNRX-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- YPPWCRWEXOQDAG-UHFFFAOYSA-N octan-2-yl n,n-dibromocarbamate Chemical compound CCCCCCC(C)OC(=O)N(Br)Br YPPWCRWEXOQDAG-UHFFFAOYSA-N 0.000 description 1
- YKTFQEAOQFUSGL-UHFFFAOYSA-N octan-2-yl n,n-dichlorocarbamate Chemical compound CCCCCCC(C)OC(=O)N(Cl)Cl YKTFQEAOQFUSGL-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- PUXOVNZJVXQFBO-UHFFFAOYSA-N pentan-2-yl n,n-dibromocarbamate Chemical compound CCCC(C)OC(=O)N(Br)Br PUXOVNZJVXQFBO-UHFFFAOYSA-N 0.000 description 1
- ACAVCPDLJLYGIJ-UHFFFAOYSA-N pentan-2-yl n,n-dichlorocarbamate Chemical compound CCCC(C)OC(=O)N(Cl)Cl ACAVCPDLJLYGIJ-UHFFFAOYSA-N 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000009777 vacuum freeze-drying Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
【発明の詳細な説明】
本発明は分子内にアクリルエステル基を有する新規高分
子物質の製造方法に関し、更に詳しくは不飽和高分子物
質と重合性不飽和モノマーとをN−・・口アミド化合物
の存在下で反応させることからなる分子内にアクリル酸
エステル基を有する、原料の高分子物質とは異なつた高
反応性を有する高分子物質を製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a novel polymeric substance having an acrylic ester group in the molecule, and more specifically, to a method for producing a novel polymeric substance having an acrylic ester group in the molecule, and more specifically, to form an unsaturated polymeric substance and a polymerizable unsaturated monomer into an N-... The present invention relates to a method for producing a polymeric substance having an acrylic acid ester group in its molecule and having a high reactivity different from that of the raw polymeric substance.
近年、公知高分子物質を改質することにより原料の高分
子物質とは異なつた性質を具備した高分子物質を得るこ
とは、各種技術分野でその用途に適した性能を有する高
分子材料を供給するための有利な手段として積極的に行
なわれている。In recent years, it has become possible to obtain polymeric substances with properties different from those of the raw material by modifying known polymeric substances, which provides polymeric materials with performance suitable for their uses in various technical fields. It is being actively implemented as an advantageous means to achieve this goal.
例えば高分子物質を改質し新規な高分子物質を製造する
方法としては、従来よりグラフト共重合、ブロック共重
合、ポリマーブレンド、或いは化学反応による誘導体の
生成などが知られている〔竹材、化学」旦(3)9(1
971)、CARL、etal、、J、Am、Cれem
、Soc、、五 858(1941)、wINKLER
9etal・、J−org、Chem″9に、に183
5(1960)〕。本発明者らは更に新規高分子誘導体
を製造すべく種々検討した結果、当該技術分野で全く未
知であり、しかも公知技術から何ら想到することのでき
ない性質を具備した高分子誘導体の製造に成功した〜
A
即ち本発明は一般式X−N″(ここでXはハ\pロゲン
原子を表わし、Aはカルボン酸残基、スルホン酸残基、
または炭酸モノエステル残基を表わし、Bは水素原子、
・・ロゲン原子、またはカルボン酸残基を表わす)で示
されるN−・・口アミド化合物の存在下で、液状の、も
しくは溶液状にした炭素一炭素不飽和二重結合を有する
高分子物質と下記一般式COO+(CH2)m−0〕I
H(ここでRは水素原子またはメチル基を表わし、nは
2〜5から選ばれる整数を、mは1〜4から選ばれる整
数を、lは1〜30から選ばれる整数をそれぞれ表わす
)で示される重合性不飽和モノマーの少なくとも1つと
を反応させることを特徴とする新規高分子物質の製造方
法である。For example, graft copolymerization, block copolymerization, polymer blending, and the production of derivatives through chemical reactions have been known as methods for modifying polymeric substances to produce new polymeric substances. ”dan(3)9(1
971),CARL,etal,,J,Am,Crem
, Soc, 5 858 (1941), wINKLER
9etal・, J-org, Chem″9, ni183
5 (1960)]. The present inventors further conducted various studies to produce a new polymer derivative, and as a result, succeeded in producing a polymer derivative that is completely unknown in the technical field and has properties that cannot be imagined from known techniques. ~ A That is, the present invention is based on the general formula
or represents a carbonate monoester residue, B is a hydrogen atom,
...representing a rogene atom or a carboxylic acid residue) In the presence of an amide compound, a polymer substance having a carbon-carbon unsaturated double bond in a liquid state or in a solution state. The following general formula COO+(CH2)m-0]I
H (where R represents a hydrogen atom or a methyl group, n represents an integer selected from 2 to 5, m represents an integer selected from 1 to 4, and l represents an integer selected from 1 to 30). This is a method for producing a novel polymeric substance, characterized by reacting it with at least one of the polymerizable unsaturated monomers shown below.
本発明方法に従えば広汎な不飽和高分子物質中にアクリ
ル酸エステル基を導入することが出来、原料の不飽和高
分子物質とは異なつた、極めて反皿i富む高分子物質を
製造することが出来る。According to the method of the present invention, it is possible to introduce acrylic acid ester groups into a wide range of unsaturated polymeric substances, and to produce a polymeric substance with an extremely high anti-dispersion content, which is different from the raw material unsaturated polymeric substance. I can do it.
例えばその代表的な一例として、N−ハロアミド化合物
としてN,N−ジクロロエチルウレタンの存在下で、ベ
ンゼン溶媒中、1,4型のポリブタジエンに対し重合性
不飽和モノマーとしてアクリル酸またはその誘導体を反
応させた場合、その反応機構は次のように示すことがで
きる。(ここでmは1〜4から選ばれる整数を、lは1
〜30から選ばれる整数をそれぞれ表わし、Rは水素原
子またはメチル基を表わす)この反応においては反応助
剤として用いたN,N−ジクロロエチルウレタンがアク
リル酸誘導体の二重結合に反応したり、カルボキシル基
が他のアクリル酸誘導体の二重結合に付加したりするこ
とはない。For example, as a typical example, 1,4-type polybutadiene is reacted with acrylic acid or its derivative as a polymerizable unsaturated monomer in a benzene solvent in the presence of N,N-dichloroethyl urethane as an N-haloamide compound. The reaction mechanism can be shown as follows. (Here, m is an integer selected from 1 to 4, l is 1
(each represents an integer selected from ~30, R represents a hydrogen atom or a methyl group) In this reaction, N,N-dichloroethyl urethane used as a reaction aid reacts with the double bond of the acrylic acid derivative, Carboxyl groups are not added to double bonds of other acrylic acid derivatives.
このことは他の反応助剤を使用した場合(・でつ(・て
も同様であり、本発明によつて得られた新事実である。
本発明によれば、分子内にアクリル酸エステル基が導入
された新規高分子物質を製造することができる。This is true even when other reaction aids are used, and is a new fact obtained by the present invention.
According to the present invention, a novel polymeric substance having an acrylic acid ester group introduced into its molecule can be produced.
この得られた新規高分子物質をアクリル酸エステル基に
基づく顕著な反応性を有し、例え−ブタジエンースチレ
ン共重合体、イソブチレン−イソプレン共重合体、アク
リル酸−ブタジエン共重合体、メタクリル酸−ブタジエ
ン共重合体、メチルアクリレートーブタジエン共重合体
、メチルメタクリレートーブタジエン共重合体、エチレ
ンープロピレンーシクロペンタジエン共重合体、エチレ
ンープロピレン−5−エチリデン−2−ノルボルネン共
重合体、エチレンープロピレンー1,4−ヘキサジエン
共重合体など分子中に不飽和二重結合を有する広汎な高
分子物質であり更には分子末端に不飽和二重結合を有す
るポリブテンなども使用することが出来る。これら高分
子物質の分子量は何ら限定されるものではなく、その使
用目的、用途により適宜選択して用いられるが、分子量
約500以上のものを用いるのが好ましい。本発明にお
いては上述した高分子物質は多くの場合適当な溶媒に溶
解させー(溶液状で用いられるが、常態で液状もしくは
粘稠物として得られる高分子物質は、そのままの状態で
反応に用いることができることは云うまでもない。使用
される溶媒は用いる高分子物質に対して溶解性の良いも
の、且つN−ハロアミドおよび自己重合性不飽和モノマ
ーを安定に溶解するものが選択され単一のままあるいは
混合溶媒として用いられる。溶媒の具体例を挙げるなら
ば、ペンタン、ヘキサン、ヘプタン、オクタンなどの脂
肪族系溶媒、シクロヘキサンなどの脂環族系溶媒、ベン
ゼン、ニトロベンゼン、ハロゲン化ベンゼン、トルエン
、キシレンなどの芳香族系溶媒、ジオキサン、テトラヒ
ド狛フランなどのエーテル系溶媒、酢酸エチル、酢酸メ
チルなどのエステル系溶媒、メチルエチケトン、シクロ
ヘキサノン、アセトン、メチルイソブチルケトンなどの
ケトン系溶媒、塩化メチレン、クロロホルム、四塩化炭
素などのハロゲン化炭化水素溶媒などであり、中でも好
ましくはトルエン、ベンゼン テトラヒドロフラン ア
セトン ジクロ)1)ルメタン、ヘプタン、酢酸エチル
、メチルエチルケトンである。The resulting new polymeric substances have remarkable reactivity based on acrylic acid ester groups, such as butadiene-styrene copolymers, isobutylene-isoprene copolymers, acrylic acid-butadiene copolymers, methacrylic acid- Butadiene copolymer, methyl acrylate-butadiene copolymer, methyl methacrylate-butadiene copolymer, ethylene-propylene-cyclopentadiene copolymer, ethylene-propylene-5-ethylidene-2-norbornene copolymer, ethylene-propylene- A wide variety of polymeric substances having unsaturated double bonds in the molecule, such as 1,4-hexadiene copolymers, and polybutene having unsaturated double bonds at the end of the molecule can also be used. The molecular weight of these polymeric substances is not limited in any way and can be selected as appropriate depending on the intended use and use, but it is preferable to use one with a molecular weight of about 500 or more. In the present invention, the above-mentioned polymeric substances are often dissolved in an appropriate solvent (used in the form of a solution, but polymeric substances normally obtained as a liquid or viscous substance are used in the reaction as they are). Needless to say, the solvent used should be one that has good solubility for the polymeric substance used and one that can stably dissolve the N-haloamide and the self-polymerizable unsaturated monomer. It can be used as such or as a mixed solvent. Specific examples of solvents include aliphatic solvents such as pentane, hexane, heptane, and octane, alicyclic solvents such as cyclohexane, benzene, nitrobenzene, halogenated benzene, toluene, Aromatic solvents such as xylene, ether solvents such as dioxane and tetrahydrofuran, ester solvents such as ethyl acetate and methyl acetate, ketone solvents such as methyl ethiketone, cyclohexanone, acetone, and methyl isobutyl ketone, methylene chloride, Examples include halogenated hydrocarbon solvents such as chloroform and carbon tetrachloride, among which preferred are toluene, benzene, tetrahydrofuran, acetone, dichloromethane, heptane, ethyl acetate, and methyl ethyl ketone.
本発明において使用される重合性不飽和モノマーは下記
一般式で示されるような、分子内にカルボキシル基もし
くはヒドロキシル基を有するアクリル酸またはアクリル
酸誘導体である。The polymerizable unsaturated monomer used in the present invention is acrylic acid or an acrylic acid derivative having a carboxyl group or a hydroxyl group in the molecule, as shown by the following general formula.
(ここでRは水素原子またはメチル基を表わし、nは2
〜5から選ばれる整数を、mは1〜4から選ばれる整数
を、lは1〜30から選ばれる整数をそれそれ表わす)
具体例としてはアクリル酸、メタアクリル酸、2−ヒド
ロキシエチルアクリレート、2−ヒドロキシエチルメタ
アクリレート、N−メチロールアクリルアミド、N−メ
チロールメタアクリルアミド、ポリエチレングリコール
モノアクリレート、ポリエチレングリコールモノメタア
クリレート、ポリテトラメチレングリコールモノメタア
クリレートなどが挙げられる。(Here, R represents a hydrogen atom or a methyl group, and n is 2
m represents an integer selected from 1 to 4, l represents an integer selected from 1 to 30)
Specific examples include acrylic acid, methacrylic acid, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, N-methylol acrylamide, N-methylol methacrylamide, polyethylene glycol monoacrylate, polyethylene glycol monomethacrylate, and polytetramethylene glycol. Examples include monomethacrylate.
この重合性不飽和モノマーは不飽和高分子物質中に含有
される二重結合1モルに対し1モル以下の量で広く選択
、使用される本発明にお(・て使用される反応助剤は下
記一般式で示されるN−ハロアミドである。This polymerizable unsaturated monomer is widely selected and used in an amount of 1 mol or less per 1 mol of double bonds contained in the unsaturated polymeric substance.The reaction aid used in the present invention is It is an N-haloamide represented by the following general formula.
(ここでXはハロゲン原子を表わし、Aはカルボン酸残
基、スルホン酸残基、もしくは炭酸モノエステル残基を
表わし、Bは水素原子、ハロゲン原子、もしくはカルボ
ン酸残基を表わす)具体例としては炭酸モノエステル残
基を持つものとして、N,N−ジクロロエチルウレタン
、N,N−ジクロロメチルウレタン、N,N−ジクロロ
プロピルウレタン、N,N−ジクロロブチルウレタン、
N,N−ジクロロペンチルウレタン、N,N−ジクロロ
ヘキシルウレタン、N,N−ジブロモメチルウレタン、
N,N−ジブロモエチルウジタン、N,N−ジブロモプ
ロピルウレタン、N,N−ジブロモブチルウレタン、N
,N−ジブロモペンチルウレタン、N,N−ジブロモヘ
キシルウレタン、N,N−ジクロロアリルウレタン、N
,N−ジクロロイソブロピルウレタン、N,N−ジクロ
ロ−sec−ブチルウレタン、N,N−ジクロロベンジ
ルウレタン、N,N−ジクロロフエニルウレタン、N,
N−ジクロロメタリルウレタンなどがあるが、この他に
もN,N,N′,N/−テトラクロロエチレングリコー
ルビスカルバメート、N,N,N′,N/−テトラブロ
モエチレングリコールビスカルバメートも使用する′S
:とが出来る。(Here, X represents a halogen atom, A represents a carboxylic acid residue, a sulfonic acid residue, or a carbonic acid monoester residue, and B represents a hydrogen atom, a halogen atom, or a carboxylic acid residue) As a specific example: N,N-dichloroethyl urethane, N,N-dichloromethyl urethane, N,N-dichloropropyl urethane, N,N-dichlorobutyl urethane,
N,N-dichloropentyl urethane, N,N-dichlorohexyl urethane, N,N-dibromomethyl urethane,
N,N-dibromoethyl uditane, N,N-dibromopropyl urethane, N,N-dibromobutyl urethane, N
, N-dibromopentyl urethane, N,N-dibromohexyl urethane, N,N-dichloroallyl urethane, N
, N-dichloroisopropylurethane, N,N-dichloro-sec-butylurethane, N,N-dichlorobenzylurethane, N,N-dichlorophenylurethane, N,
N-dichloromethallylurethane, etc., but also N,N,N',N/-tetrachloroethylene glycol biscarbamate, N,N,N',N/-tetrabromoethylene glycol biscarbamate' S
: I can do it.
またスルホン酸残基を有するものとしては代表的なもの
としてN,N−ジクロロベンゼンスルホンアミド、N,
N−ジブロモベンゼンスルホンアミドがある。その他の
N,N−ジハロスルホンアミド基を有する化合物として
はN,N−ジクロロメチルスルホンアミド、N,N−ジ
ブロモメチルスルホンアミド、N,N−ジクロロエチル
スルホンアミド、N,N−ジブロモエチルスルホンアミ
ド、N,N−ジクロロプロピルスルホンアミド、N,N
−ジブロモプロピルスルホンアミド、N,N−ジクロロ
フチルスルホンアミド、N,N−ジブロモブチルスルホ
ンアミド、N,N−ジクロロペンチルスルホンアミド、
N,N−ジフロムペンチルスルホンアミド、N,N−ジ
クロロヘキシルスルホンアミド、N,N−ジブロモヘキ
シルスルホンアミド、N,N−ジクロロ−p−トルエン
スルホンアミド、N,N−ジブロモ−pトルエンスルホ
ンアミド、N,N−ジクロロ−0−トルエンスルホンア
ミド、N,N−ジブロモ−0−トルエンスルホンアミド
、N,N−ジクロロ−p−クロロベンゼンスルホンアミ
ド、N,N−ジブロモ−p−クロロベンゼンスルホンア
ミド、N,N−ジクロロ−p−ブロモベンゼンスルホン
アミド、N,N−ジブロモ−p−ブロモベンゼンスルモ
ンアミド、N,N−ジクロロ−p−ヨードベンゼンスル
ホンアミド、N,Nジブロモ−p−ヨードベンゼンスル
ホンアミドがあり、更にN,N,NZN′,−テトラク
ロロ−1,3−ベンゼンジスルホンアミド、N,N,N
ZN′ーテトラブロモ−1 3−ベンゼンジスルホンア
ミド、N,N,N′.,N′−テトラブロモ−1,5−
ナフタリンジスルホンアミド、N,N,N′,N/テト
ラクロロ−1,5−ナフタリンジスルホンアミド、N,
N,N′,N/−テトラクロローオキシビス(ベンゼン
スルホンアミド)、N,N,N/,N′テトラブロモー
オキシビス(ベンゼンスルホンアミド)、N,N,N/
,マーテトラクロロ−4,4−ビフエニルジスルホンア
ミド、N,N,NZマーテトラブロモ−4,4−ビフエ
ニルジスルホンアミド、N,N,N/,N′,マ,N〃
−ヘキサクロロ−1,3,5−トリスルホンアミドなど
も用いることが出来る。またカルボン酸残基を有するも
のとしては、N,N−ジクロロアセタミド、N,N−ジ
ブロモアセタミド、N−クロルコハク酸イミド、N−ブ
ロモコハク酸イミドなどがある。本発明を実施するにあ
たり、上記反応助剤は重合性不飽和モノマーに対しモル
比にして1:1で使用されるが、この比率は本発明にお
ける決定的な因子ではなく、目的に応じ決定することが
できる。また反応温度も重要な因子とはなり得ないが生
成物の安定性を考慮して、例えば−4『C〜80℃、中
でも−10°C〜400Cの範囲が適当である。本発明
を実施するにあたり反応助剤、N−ハロアミド化合物の
添加は重合性不飽和モノマーと同時か、それより後に行
なうのが好ましい。Typical examples of compounds containing sulfonic acid residues include N,N-dichlorobenzenesulfonamide, N,
N-dibromobenzenesulfonamide. Other compounds having N,N-dihalosulfonamide groups include N,N-dichloromethylsulfonamide, N,N-dibromomethylsulfonamide, N,N-dichloroethylsulfonamide, and N,N-dibromoethylsulfone. Amide, N,N-dichloropropylsulfonamide, N,N
-dibromopropylsulfonamide, N,N-dichlorophthylsulfonamide, N,N-dibromobutylsulfonamide, N,N-dichloropentylsulfonamide,
N,N-difuromopentylsulfonamide, N,N-dichlorohexylsulfonamide, N,N-dibromohexylsulfonamide, N,N-dichloro-p-toluenesulfonamide, N,N-dibromo-p-toluenesulfonamide , N,N-dichloro-0-toluenesulfonamide, N,N-dibromo-0-toluenesulfonamide, N,N-dichloro-p-chlorobenzenesulfonamide, N,N-dibromo-p-chlorobenzenesulfonamide, N , N-dichloro-p-bromobenzenesulfonamide, N,N-dibromo-p-bromobenzenesulfonamide, N,N-dichloro-p-iodobenzenesulfonamide, N,N-dibromo-p-iodobenzenesulfonamide and N,N,NZN',-tetrachloro-1,3-benzenedisulfonamide, N,N,N
ZN'-tetrabromo-1 3-benzenedisulfonamide, N,N,N'. ,N'-tetrabromo-1,5-
Naphthalene disulfonamide, N, N, N', N/tetrachloro-1,5-naphthalene disulfonamide, N,
N,N',N/-tetrachlorooxybis(benzenesulfonamide), N,N,N/,N'tetrabromooxybis(benzenesulfonamide), N,N,N/
, mertetrachloro-4,4-biphenyldisulfonamide, N,N,NZ mertetrabromo-4,4-biphenyldisulfonamide, N,N,N/,N',ma,N〃
-Hexachloro-1,3,5-trisulfonamide and the like can also be used. Examples of those having a carboxylic acid residue include N,N-dichloroacetamide, N,N-dibromoacetamide, N-chlorosuccinimide, and N-bromosuccinimide. In carrying out the present invention, the above reaction aid is used in a molar ratio of 1:1 to the polymerizable unsaturated monomer, but this ratio is not a decisive factor in the present invention and is determined depending on the purpose. be able to. Although the reaction temperature cannot be an important factor, in consideration of the stability of the product, a range of, for example, -4°C to 80°C, particularly -10°C to 400°C, is suitable. In carrying out the present invention, it is preferable to add the reaction aid, the N-haloamide compound, at the same time as or after adding the polymerizable unsaturated monomer.
なぜならばN−・・ロアミドはそれ自体不飽和高分子物
質の二重結合に対し反応性を有するからである。しかし
反応助剤としてアルキルハイポハライトを使用する場合
には、この添加順序は特に重要な因子とならない。従つ
て本発明は通常次のように、即ち不飽和高分子物質を溶
解した溶解中に予め重合性不飽和モノマーを添加してお
き、この混合物に対して反応助剤のN−ハロアミド化合
物を溶解した溶液を添加するか、或いは不飽和高分子物
質を溶解した溶液中に重合性不飽和モノマーと反応助剤
とを溶解した溶液を添加するかして実施される。This is because N-...roamide itself has reactivity with the double bonds of unsaturated polymeric substances. However, when an alkyl hypohalite is used as a reaction aid, the order of addition is not a particularly important factor. Therefore, the present invention is usually carried out as follows: a polymerizable unsaturated monomer is added in advance to the unsaturated polymeric substance dissolved, and an N-haloamide compound as a reaction aid is dissolved in this mixture. This is carried out by adding a solution obtained by dissolving a polymerizable unsaturated monomer and a reaction aid into a solution containing an unsaturated polymeric substance.
反応は緩和に進行し、数分から数時間で完結する。The reaction proceeds slowly and is completed in minutes to hours.
反応後、得られた生成物は通常の方法、即ち非溶媒の添
加による沈澱法、減圧蒸留法、凍結乾燥法などにより精
製分離される。尚、精製は生成物の安定性を考慮し室温
以下で実施するのが好ましい本発明は以上述べたような
構成からなり、本発明方法においては原料不飽和高分子
物質の種類、分子量および該不飽和高分子物質に対し反
応、置換させられる重合性不飽和モノマーの種類や置換
の程度を変化させることによりエラストマー状物質から
樹脂状物質に到るまで様々な性状、性質を有する生成物
を得ることができる。After the reaction, the resulting product is purified and separated by conventional methods, such as precipitation by adding a nonsolvent, vacuum distillation, and freeze-drying. It should be noted that purification is preferably carried out at room temperature or below in consideration of the stability of the product.The present invention has the configuration described above, and in the method of the present invention, the type, molecular weight, and unsaturated polymer material of the raw material are determined. By changing the type and degree of substitution of polymerizable unsaturated monomers that react with and substitute saturated polymeric substances, products with various properties and properties ranging from elastomer-like substances to resin-like substances can be obtained. I can do it.
しかも得られた生成物は、その分子内に導入されたアク
リル酸エステル基に基づく顕著なラジカル反応性を有す
るものであり、例えば酸素を遮断することによりアクリ
ル酸エステル基が架橋反応を起こして硬化する所謂嫌気
性の硬化性能を示す。また、この生成物はラジカル発生
剤の添加または加熱、紫外線照射などによつても同様の
硬化性能を発揮するものであり、そのままで、または他
のビニルモノマーと混合し、接着剤、塗料、配合剤、充
填剤として、また感光性能を生かして感光性材料として
幅広く工業材料となり得るものである。次に本発明を実
施例により具体的に説明するが本発明は以下の実施例に
より何ら限定されるものではない。Moreover, the obtained product has remarkable radical reactivity due to the acrylic ester group introduced into the molecule. For example, by blocking oxygen, the acrylic ester group causes a crosslinking reaction and is cured. It exhibits so-called anaerobic curing performance. In addition, this product exhibits similar curing performance by adding radical generators, heating, UV irradiation, etc., and can be used as is or mixed with other vinyl monomers to be used in adhesives, paints, and formulations. It can be used as a wide range of industrial materials, such as as agents and fillers, and as a photosensitive material by taking advantage of its photosensitivity. EXAMPLES Next, the present invention will be specifically explained with reference to examples, but the present invention is not limited to the following examples.
更に、本発明の意図または範囲から逸脱することなしに
各種の変更並びに修正がなされ得ることは当業界の技術
に精通する者には明らかである。実施例 1
液状ポリブタジエンR−45HT(出光石油化学(株)
社製、液状ポリブタジエン)509をトルエン509に
溶解したものを3つ用意し、それぞれにメタクリル酸8
9を添加した。Furthermore, it will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit or scope of the invention. Example 1 Liquid polybutadiene R-45HT (Idemitsu Petrochemical Co., Ltd.)
Prepare three solutions of liquid polybutadiene) 509 (manufactured by Co., Ltd.) dissolved in toluene 509, and dissolve 8 8 methacrylic acid in each.
9 was added.
この混合物を攪拌しながら、N,N−ジクロロエチルウ
レタン14.49(メタクリル酸に対し約等モノ(ハ)
をトルエン109に希釈した溶液、N,N−ジクロロト
ルエンスルホンアミド22.29(メタクリル酸に対し
約等モル)を同じくトルエン209に希釈した溶液及び
N−ブロモコハク酸イミド16.49(メタクリル酸に
対し約等モル)をトルエン209に希釈した溶液をそれ
ぞれ滴下した。滴下終了後5時間で反応が終了した。こ
の後、大量のメタノール中にこの反応混合物を注ぎ析出
したポリマーを取り出し乾燥した後、トルエンに溶解し
た。このトルエン溶液の赤外吸収スペクトルはカルボニ
ル基に基づく1710m−1およびエステル基(C−0
−C−)に基づく1160m−1の吸収を示した。また
、このトルエン溶液を密栓つきの三角フラスコ4個に分
け、その内2つには触媒としてメチルエチルケトンパー
オキシド(MEKPO)の50(f)フタル酸ジメチル
溶液を重合体分に対して2重量%添加した。この2組の
試料につき、それぞれ一方は窒素置換をした後密栓した
。その結果を表1に示す。この結果より、得られた重合
体は嫌気性の硬化性能を有するものであることがわかる
。While stirring this mixture, 14.49% of N,N-dichloroethyl urethane (approximately equivalent mono(c) to methacrylic acid) was added.
A solution of 22.29 N,N-dichlorotoluenesulfonamide (approximately equimolar to methacrylic acid) diluted in 209 toluene, and a solution of N-bromosuccinimide 16.49 (approximately equimolar to methacrylic acid) diluted in 209 toluene. A solution prepared by diluting about 209 molar portions of each in toluene was added dropwise. The reaction was completed 5 hours after the completion of the dropwise addition. Thereafter, the reaction mixture was poured into a large amount of methanol, and the precipitated polymer was taken out, dried, and then dissolved in toluene. The infrared absorption spectrum of this toluene solution is 1710 m-1 based on carbonyl group and ester group (C-0
-C-) showed an absorption of 1160 m-1. In addition, this toluene solution was divided into four Erlenmeyer flasks with airtight stoppers, and to two of them, a 50(f) dimethyl phthalate solution of methyl ethyl ketone peroxide (MEKPO) was added as a catalyst in an amount of 2% by weight based on the polymer content. . One of these two sets of samples was replaced with nitrogen and then sealed tightly. The results are shown in Table 1. This result shows that the obtained polymer has anaerobic curing performance.
次に前記精製し、取出したポリマーを乾燥した後、その
ままガラス板の上に一滴落としその上から他のガラス板
で挟み押えて固定したところ一日後に硬化しガラス板は
ずれなくなつた。Next, after drying the purified and taken out polymer, a drop of it was directly placed on a glass plate and then clamped and fixed with another glass plate.After one day, the polymer hardened and the glass plate could no longer be moved.
Claims (1)
Xはハロゲン原子を表わし、Aはカルボン酸残基、スル
ホン酸残基、または炭酸モノエステル残基を表わし、B
は水素原子、ハロゲン原子、またはカルボン酸残基を表
わす)で示されるN−ハロアミド化合物の存在下で、液
状の、もしくは溶液状にした炭素−炭素不飽和二重結合
を有する高分子物質と下記一般式( I )▲数式、化学
式、表等があります▼、(II)▲数式、化学式、表等が
あります▼(III)▲数式、化学式、表等があります▼
(ここでRは水素原子またはメチル基を表わし、nは2
〜5から選ばれる整数を、mは1〜4から選ばれる整数
を、lは1〜30から選ばれる整数をそれぞれ表わす)
で示される重合性不飽和モノマーの少なくとも1つとを
反応させることを特徴とする新規高分子物質の製造方法
。1 General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (Here, X represents a halogen atom, A represents a carboxylic acid residue, sulfonic acid residue, or carbonic acid monoester residue, B
represents a hydrogen atom, a halogen atom, or a carboxylic acid residue), a liquid or solution-formed polymer substance having a carbon-carbon unsaturated double bond and the following General formula (I) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, (II) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (III) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
(Here, R represents a hydrogen atom or a methyl group, and n is 2
m represents an integer selected from 1 to 4, l represents an integer selected from 1 to 30)
A method for producing a novel polymeric substance, which comprises reacting with at least one polymerizable unsaturated monomer represented by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14898778A JPS5928331B2 (en) | 1978-12-04 | 1978-12-04 | Method for producing new polymeric substances |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14898778A JPS5928331B2 (en) | 1978-12-04 | 1978-12-04 | Method for producing new polymeric substances |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50143767A Division JPS5271590A (en) | 1975-12-01 | 1975-12-01 | Production of novel high polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5490288A JPS5490288A (en) | 1979-07-17 |
| JPS5928331B2 true JPS5928331B2 (en) | 1984-07-12 |
Family
ID=15465157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14898778A Expired JPS5928331B2 (en) | 1978-12-04 | 1978-12-04 | Method for producing new polymeric substances |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5928331B2 (en) |
-
1978
- 1978-12-04 JP JP14898778A patent/JPS5928331B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5490288A (en) | 1979-07-17 |
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