JPS5928524A - Manufacture of cube-on-edge oriented silicon steel - Google Patents
Manufacture of cube-on-edge oriented silicon steelInfo
- Publication number
- JPS5928524A JPS5928524A JP9332483A JP9332483A JPS5928524A JP S5928524 A JPS5928524 A JP S5928524A JP 9332483 A JP9332483 A JP 9332483A JP 9332483 A JP9332483 A JP 9332483A JP S5928524 A JPS5928524 A JP S5928524A
- Authority
- JP
- Japan
- Prior art keywords
- annealing
- steel
- cube
- oriented silicon
- silicon steel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
- H01F1/147—Alloys characterised by their composition
- H01F1/14766—Fe-Si based alloys
- H01F1/14775—Fe-Si based alloys in the form of sheets
- H01F1/14783—Fe-Si based alloys in the form of sheets with insulating coating
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/68—Temporary coatings or embedding materials applied before or during heat treatment
- C21D1/70—Temporary coatings or embedding materials applied before or during heat treatment while heating or quenching
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D8/00—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
- C21D8/1277—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties involving a particular surface treatment
- C21D8/1283—Application of a separating or insulating coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D8/00—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
- C21D8/1294—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties involving a localised treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thermal Sciences (AREA)
- Electromagnetism (AREA)
- Dispersion Chemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
- Heat Treatment Of Sheet Steel (AREA)
- Metal Rolling (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
この発明はキューブ・オン・エツジ方向性ケイ素鋼の製
造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing cube-on-edge grain-oriented silicon steel.
シートの形状をしたキューブ・オン・エツジ（ｃｕ、ｂ
ｅ−ｏｎ−ｅｄｇｅ ） 方向性ケイ素鋼は変圧器コア
を含めて色々な電気機器用に知られている。キューブ・
オン・エツジケイ素鋼についてこの合金は（１１０）（
００１）の位置に二次再結晶の特徴があり、この位置は
キューブ・オン・エツジ位置と称される。シート状のこ
の材料は圧延の方向に磁化容易の方向を有する。この材
料の用途、特に変圧器コアの製造に用いた場合には、鉄
ロスが減少するにつれて電気的エネルギー消費が減少す
るからこの材料には低減したワットロスを持つことが要
求される。低減したワットロスは組織焼なまし中に二次
結晶の大きさを微細にすることによって促進できる。Cube-on-edge (cu, b) in the shape of a sheet
(e-on-edge) Grain-oriented silicon steels are known for use in a variety of electrical equipment, including transformer cores. Cube·
For on-edge silicon steel, this alloy is (110) (
There is a feature of secondary recrystallization at the position 001), and this position is called the cube-on-edge position. This material in sheet form has a direction of easy magnetization in the direction of rolling. Applications of this material, particularly when used in the manufacture of transformer cores, require the material to have reduced watt losses, since electrical energy consumption is reduced as iron losses are reduced. Reduced Watt loss can be promoted by refining the size of secondary crystals during tissue annealing.
したがって、本発明の目的はキューブ・オン・エツジケ
イ素中の組織焼なまし中に二次結晶の成長が抑制され組
織焼なまし後比較的微細な結晶材料に低減したワットロ
スを与へる方法を提供することである。Therefore, it is an object of the present invention to provide a method in which the growth of secondary crystals during texture annealing in cube-on-edge silicon is suppressed, resulting in a relatively fine crystalline material with reduced watt loss after the texture annealing. It is to provide.
本発明のこの目的及び他の目的は以下の説明および具体
例によって十分理解される。This and other objects of the invention will be better understood from the following description and specific examples.
概して云えば、本発明の実施においては、従来通りの冷
間圧延および中間焼なましをともなう冷間圧延によって
処理されるケイ素鋼が組社規なましに先立ってマンガン
ケ含む材料で表面を被覆され、表面に該マンガンを含む
材料馨もって従来通りの組社規なましされる。特に本発
明に使用するのに適したマンガンを含む材料はＭｎ（Ｎ
○３ン２ である。焼なまし中にマンガンを含有する化
合物が存在すると二次結晶の成長を抑制し、したがって
ワットロスを低減することが判明した。このことはもし
、鋼が組社規なまし以前にセレー） （ｓｅｒｒａｔｅ
）されるとさらに助長される。本発明の方法はキューブ
・オン・エツジ方向性ケイ素鋼一般に実用されるが、重
量％で以下の組成範囲内にあるこの型の鋼に特に適して
いる：
マンガンを含有している化合物で鋼を被覆し、銅の上に
存在しているこの化合物とともに、ｌ＋旧哉焼なましす
るこの方法によって、−次結晶の粗大化を助長するマン
ガンを焼なまし中に鋼の中に拡散する目的ｉｃ対して、
鋼にｍ解した卸黄（硫黄は結晶成長を抑制する傾向があ
る）との相ＩＬ作用によって、該方法は有効であると考
えらＪｌろ。それ故に、−次結晶成長が生じる領域が与
えられ、この領域にわたって二次結晶成長が制限される
。もし処理された領域の巾が二次結晶に対して障壁とし
て十分作用するならば、糾＠焼なまし後二次結晶粒の微
細化の程度はマンガンを含有する材料を適用した領域に
おける一次結晶成長の領域の間隔に依存するように見え
る。この効果は、鋼にセレーション（ｓｅｒｒａｔｉｏ
ｎ）または似た方法を行って同様な障壁を創ることによ
って補うことができる。Generally speaking, in the practice of the present invention, silicon steel processed by conventional cold rolling and cold rolling with intermediate annealing is surface coated with a manganese-containing material prior to roughening. The material containing the manganese is used on the surface to comply with conventional company regulations. Manganese-containing materials particularly suitable for use in the present invention include Mn (N
○3 n 2. It has been found that the presence of manganese-containing compounds during annealing inhibits the growth of secondary crystals and thus reduces watt losses. This is true if the steel industry was in a state of serrate before the company regulations were revised.
), it is further encouraged. Although the method of the invention is practiced for cube-on-edge grain-oriented silicon steels in general, it is particularly suitable for this type of steel with compositions within the following composition ranges in weight percent: This method of annealing, along with this compound present on the copper, has the purpose of diffusing manganese into the steel during annealing, which promotes the coarsening of the crystals. for,
It is believed that the method is effective due to the phase IL action of sulfur dissolved in the steel (sulfur tends to inhibit crystal growth). Therefore, a region is provided in which negative crystal growth occurs and secondary crystal growth is restricted over this region. If the width of the treated area acts as a sufficient barrier to secondary crystals, the degree of refinement of secondary grains after annealing will be significantly reduced by the primary crystals in the area where the manganese-containing material is applied. It appears to depend on the spacing of the regions of growth. This effect is caused by serrations in the steel.
n) or can be supplemented by similar methods to create similar barriers.
５Ｘ−１４と標示され実施例に使用されたケイ素鋼組成
は重量％で以下の公称組成のものであった。The silicon steel composition designated 5X-14 and used in the examples had the following nominal composition in weight percent:
Ｍｎ Ｓ ＣＳｉ Ｂ ＦｅＯ，０３
５０，０１６０，０３０３，１５０，００１０残部ヒー
ト番号１５４６８４として標示の仕上げ焼なましされた
５Ｘ−１４４組成エプスタイン（Ｅｐｓｔｅｉｎ）パン
クが水３００ＣＣ，Ｍｇ０４６ｇ−１およびＨ３Ｂ０３
２Ｊからなるスラリー水で被覆された。表面を被覆され
たこの材料は次いで従来法通り水素雰囲気中で組社規な
ましされた。具体的には、この組社規なましば、７６０
°Ｇ（１４００°Ｆ）の温度の炉Ｇて旧料を装入し、１
時間当り２８℃（５０°Ｆ）の割合で１１７７°Ｃ（２
１５０°Ｆ）の温度まで加熱し、この温度に１２時間保
持し、次いで６４９℃（１２０，０’Ｆ ）まで冷却し
た時材料を炉から取り出すことからなる。上記スラリー
被覆に先立って、１組のエプスタインパックにはろ［］
ｃｃの５０％”（Ｎ０３）２と不活性増粘剤の混合物を
塗布し、それはシートの圧延方向に直角に１ ｍｍの線
を１０ｙ＋ｍの間隔で塗布した；この塗布被覆は次いで
空気乾燥された。Mn S CSi B FeO,03
50,0160,0303,150,0010 Remainder Heat Number 154684 Marked as Finish Annealed 5X-144 Composition Epstein Puncture Water 300CC, Mg046g-1 and H3B03
The slurry was coated with water consisting of 2J. The coated material was then tempered in a hydrogen atmosphere in a conventional manner. Specifically, this company regulation Namashiba, 760
The old charge was charged into the furnace G at a temperature of 1400°F and 1
1177°C (28°C) at a rate of 28°C (50°F) per hour
The method consisted of heating to a temperature of 150°F (150°F), holding at this temperature for 12 hours, and then removing the material from the furnace when cooled to 649°C (120,0°F). Prior to the above slurry coating, pour into a set of Epstein packs []
A mixture of 50% of cc'' (N03)2 and an inert thickener was applied, which was applied in 1 mm lines perpendicular to the rolling direction of the sheet at intervals of 10y+m; this applied coating was then air-dried. .
このエプスタインパックは本発明の方法によって処理さ
れたものである；これに反して、第２のパックは比較例
および従来法を代表するものとして用（・もれた。上述
のような組社規なましの手順のあと、従来方法による比
較パック試料の／−トの圧延方向における二次結晶の平
均直１線寸法は１３ｍｍであつｆこ。対照して、本発明
の方法に従ってＭｎ （ＮＯ３）２で処理された試料の
二次結晶の平均直線寸法は７Ｈであった；観察されたこ
ハ、らの結晶粒は、正常な結晶成長がマンガンを含んで
いろ化合物の適用Ｏてよって刺激された場所では前述の
小さい一次結晶のバンドシこよってしばしば分ｊ〜１ｔ
されていた。This Epstein pack was processed according to the method of the present invention; on the other hand, the second pack was used as a comparative example and representative of the conventional method. After the annealing procedure, the average linear dimension of the secondary crystals in the rolling direction of the comparative pack sample according to the conventional method was 13 mm.In contrast, according to the method of the present invention, the Mn (NO3) The average linear dimension of the secondary crystals of the sample treated with 2 was 7H; these grains were observed to indicate that normal crystal growth was stimulated by the application of the manganese-containing compound. In some places, due to the band of small primary crystals mentioned above, it is often
It had been.
第２の実施例において、前述の実施例１と同じヒートか
らの仕上げ焼なましされたＳＸ−１４組成の単一エゾス
クィンストリッゾが圧延方向に直角に１０ｍｍ間隔でス
トリップにセレーション（ｓｅｒｒａｔ］ｏｎ）をつく
るために金属スクライブ（ｓｃｒｉｂｅ） でけい引
きされた。けい引き操作のあと、実施例１について上に
述べｆこ状態のもとでストリップがスラリー塗布され組
社規なましされた。この組社規なましのあとでは、けい
引きしたストリップにおける二次結晶のシート圧延方向
における平均直線寸法は９．５ ｒｙｍであった。In a second example, a finish annealed single eso-squint strip of SX-14 composition from the same heat as in Example 1 above is serrated into strips at 10 mm intervals perpendicular to the rolling direction. on) was scribed with a metal scribe to create a After the draw operation, the strips were slurried and smoothed under the conditions described above for Example 1. After this standard smoothing, the average linear dimension of the secondary crystals in the drawn strip in the sheet rolling direction was 9.5 rym.
Claims (3)
び最終組社規なましの諸工程を含んで、ワットロスを低
減したキューブ・オン・エツジ方向性ケイ素鋼の製造法
において、組織焼なまし前にマンガンを含有する材料で
鉄鋼の表面を被覆し、該被覆をもつ鉄鋼の組織焼なまし
を行い、それによって組織焼なまし中に二次結晶成長が
抑制されることを特徴とする方向性ケイ素鋼の製造方法
。(1) In the manufacturing method of cube-on-edge grain-oriented silicon steel with reduced watt loss, which includes the steps of hot rolling, cold rolling with intermediate annealing, and final assembling standard annealing, It is characterized by coating the surface of the steel with a material containing manganese before annealing, and annealing the structure of the steel with the coating, thereby suppressing secondary crystal growth during the annealing of the structure. A method for producing grain-oriented silicon steel.
２である、特許請求の範囲第（１）項に記載の方法。(2) The material containing manganese is Mn (No3)
2. The method according to claim (1).
許請求の範囲第（１）項または第（２）項に記載の方法
。(3) The method according to claim (1) or (2), wherein the steel is serrated before structure annealing.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39968082A | 1982-07-19 | 1982-07-19 | |
| US399680 | 1982-07-19 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5928524A true JPS5928524A (en) | 1984-02-15 |
| JPH0515765B2 JPH0515765B2 (en) | 1993-03-02 |
Family
ID=23580545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9332483A Granted JPS5928524A (en) | 1982-07-19 | 1983-05-26 | Manufacture of cube-on-edge oriented silicon steel |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP0099619A3 (en) |
| JP (1) | JPS5928524A (en) |
| KR (1) | KR890000126B1 (en) |
| BR (1) | BR8301545A (en) |
| CA (1) | CA1194386A (en) |
| PL (1) | PL242750A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6196080A (en) * | 1986-04-03 | 1986-05-14 | Nippon Steel Corp | Separating agent for annealing for grain-oriented electrical steel sheet |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3689703T2 (en) * | 1985-12-06 | 1994-06-23 | Nippon Steel Corp | Grain-oriented electrical steel sheet with glass film properties and low wattage and its production. |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5021928A (en) * | 1973-06-28 | 1975-03-08 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1249049B (en) * | 1959-03-05 | |||
| JPS5112450B1 (en) * | 1966-03-18 | 1976-04-20 | ||
| JPS4837193B1 (en) * | 1969-07-07 | 1973-11-09 | ||
| JPS5423647B2 (en) * | 1974-04-25 | 1979-08-15 | ||
| US4160681A (en) * | 1977-12-27 | 1979-07-10 | Allegheny Ludlum Industries, Inc. | Silicon steel and processing therefore |
-
1983
- 1983-02-25 CA CA000422372A patent/CA1194386A/en not_active Expired
- 1983-03-04 KR KR1019830000879A patent/KR890000126B1/en not_active Expired
- 1983-03-25 BR BR8301545A patent/BR8301545A/en unknown
- 1983-04-11 EP EP83302013A patent/EP0099619A3/en not_active Withdrawn
- 1983-05-26 JP JP9332483A patent/JPS5928524A/en active Granted
- 1983-06-29 PL PL24275083A patent/PL242750A1/en unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5021928A (en) * | 1973-06-28 | 1975-03-08 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6196080A (en) * | 1986-04-03 | 1986-05-14 | Nippon Steel Corp | Separating agent for annealing for grain-oriented electrical steel sheet |
Also Published As
| Publication number | Publication date |
|---|---|
| PL242750A1 (en) | 1984-03-12 |
| KR840004174A (en) | 1984-10-10 |
| CA1194386A (en) | 1985-10-01 |
| JPH0515765B2 (en) | 1993-03-02 |
| EP0099619A3 (en) | 1984-07-25 |
| EP0099619A2 (en) | 1984-02-01 |
| BR8301545A (en) | 1984-04-17 |
| KR890000126B1 (en) | 1989-03-08 |
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