JPS5936103A - Manufacture of chelate resin for mercury elimination - Google Patents
Manufacture of chelate resin for mercury eliminationInfo
- Publication number
- JPS5936103A JPS5936103A JP14498582A JP14498582A JPS5936103A JP S5936103 A JPS5936103 A JP S5936103A JP 14498582 A JP14498582 A JP 14498582A JP 14498582 A JP14498582 A JP 14498582A JP S5936103 A JPS5936103 A JP S5936103A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- mercury
- reaction
- halogen
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011347 resin Substances 0.000 title claims abstract description 49
- 229920005989 resin Polymers 0.000 title claims abstract description 49
- 239000013522 chelant Substances 0.000 title claims description 21
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 title claims description 16
- 229910052753 mercury Inorganic materials 0.000 title claims description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 230000008030 elimination Effects 0.000 title 1
- 238000003379 elimination reaction Methods 0.000 title 1
- KPRZOPQOBJRYSW-UHFFFAOYSA-N o-hydroxybenzylamine Natural products NCC1=CC=CC=C1O KPRZOPQOBJRYSW-UHFFFAOYSA-N 0.000 claims abstract description 8
- FKKJJPMGAWGYPN-UHFFFAOYSA-N thiophen-2-ylmethanamine Chemical compound NCC1=CC=CS1 FKKJJPMGAWGYPN-UHFFFAOYSA-N 0.000 claims abstract description 8
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 abstract description 11
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 abstract description 5
- 150000003839 salts Chemical class 0.000 abstract description 4
- 229910052801 chlorine Inorganic materials 0.000 abstract description 2
- 239000000460 chlorine Substances 0.000 abstract description 2
- BQPIGGFYSBELGY-UHFFFAOYSA-N mercury(2+) Chemical compound [Hg+2] BQPIGGFYSBELGY-UHFFFAOYSA-N 0.000 abstract description 2
- 239000002904 solvent Substances 0.000 abstract description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- 238000007265 chloromethylation reaction Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229920003053 polystyrene-divinylbenzene Polymers 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 12
- 238000001179 sorption measurement Methods 0.000 description 7
- -1 mercury ions Chemical class 0.000 description 6
- 235000002639 sodium chloride Nutrition 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- DKVNPHBNOWQYFE-UHFFFAOYSA-N carbamodithioic acid Chemical group NC(S)=S DKVNPHBNOWQYFE-UHFFFAOYSA-N 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910001385 heavy metal Inorganic materials 0.000 description 3
- 239000003446 ligand Substances 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- 241000196324 Embryophyta Species 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- RSWGJHLUYNHPMX-ONCXSQPRSA-N abietic acid Chemical compound C([C@@H]12)CC(C(C)C)=CC1=CC[C@@H]1[C@]2(C)CCC[C@@]1(C)C(O)=O RSWGJHLUYNHPMX-ONCXSQPRSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 239000012990 dithiocarbamate Substances 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N divinylbenzene Substances C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000005695 dehalogenation reaction Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 230000002140 halogenating effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002730 mercury Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は水銀イオンを選択的に吸着する新規なキレート
樹脂の製造方法に関するものである。更に詳細には、ハ
ロゲン原子を含有する樹脂と、サリチルアミン、または
、２−テニルアミンを反応させる事より成る水銀除去用
キレート樹脂の製造に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a novel chelate resin that selectively adsorbs mercury ions. More specifically, the present invention relates to the production of a chelate resin for removing mercury by reacting a resin containing a halogen atom with salicylamine or 2-thenylamine.
従来、水銀法会塩電解工場や金属精錬工場などから排出
される。ごく微量の水銀（Ｉｔ）イオンを含む廃水の処
理には、イオン交換樹脂、活性炭、ジチオカルバメート
基を有するキレート樹脂が用いられてきた。しかしなが
ら、イオン交換樹脂を用いる方法では、共存塩類のおよ
ぼす影響が大きく。Traditionally, it is emitted from mercury salt electrolysis plants and metal smelting plants. Ion exchange resins, activated carbon, and chelate resins having dithiocarbamate groups have been used to treat wastewater containing trace amounts of mercury (It) ions. However, in the method using an ion exchange resin, the influence of coexisting salts is large.
高濃度の食塩存在下では、水銀イオンの吸着性能が著し
く低下するという欠点をもつ。また、活性炭、ジチオカ
ルバメート型キレート樹脂では、水銀イオンのみならず
他の重金属イオンをも吸着し、選択性に乏しいという欠
点を有する。さらに。In the presence of a high concentration of common salt, the adsorption performance for mercury ions is significantly reduced. In addition, activated carbon and dithiocarbamate type chelate resins have the disadvantage that they adsorb not only mercury ions but also other heavy metal ions, resulting in poor selectivity. moreover.
ジチオカルバメート型キレート樹脂ではジチオカルバメ
ート基が酸化等に弱いという欠点をもつ。Dithiocarbamate type chelate resins have the disadvantage that the dithiocarbamate group is susceptible to oxidation.
本発明者らは、既に提案されている水銀吸着用材料と比
較し、共存塩類の影響を受けずに、水銀イオンのみを選
択的に吸着し、かつ化学的に安定なキレート樹脂を開発
すべく、鋭意研究を重ねた結果９本発明を見い出すにい
たった。The present inventors aimed to develop a chemically stable chelate resin that selectively adsorbs only mercury ions without being affected by coexisting salts, in comparison with already proposed mercury adsorption materials. As a result of extensive research, the present invention was discovered.
すなわち２本発明はハロゲン原子を含有する樹脂と、該
樹脂のハロゲン７ｇ原子に対し、／ｇ分子以上のサリチ
ルアミン、または、２−テニルアミンを含む溶液を、９
０〜／１０℃の温度で／時間以上反応せしめることを特
徴とする。水銀除去用キレート樹脂の製造方法である。In other words, the present invention uses a resin containing a halogen atom, and a solution containing salicylamine or 2-thenylamine in an amount of 9 g or more per 7 g of halogen atoms in the resin.
It is characterized in that the reaction is carried out at a temperature of 0 to 10°C for more than 1 hour. This is a method for producing a chelate resin for removing mercury.
本発明のキレート樹脂の製造に使用されるハロゲン原子
を含有する樹脂としては、ポリ塩化ビニル、ポリ塩化ビ
ニリデン等のハロゲン含有樹脂。Examples of the halogen-containing resin used for producing the chelate resin of the present invention include halogen-containing resins such as polyvinyl chloride and polyvinylidene chloride.
または、ポリスチレン等をハロゲン化せしめた樹脂があ
げられる。さちに上記樹脂成分と共重合し得る他のエチ
レン系不飽和単量体との共重合体であってもよい。特に
好ましくは、ゲル型もしくは巨大網目状（ＭＲ型）ポリ
スチレン−（７〜２０％）−ジビニルベンゼン共重合体
をクロルメチル化した樹脂が用いられる。Another example is a resin made by halogenating polystyrene or the like. It may also be a copolymer with another ethylenically unsaturated monomer that can be copolymerized with the resin component. Particularly preferably, a resin obtained by chloromethylating a gel type or giant reticulated (MR type) polystyrene-(7 to 20%)-divinylbenzene copolymer is used.
本発明においてハロゲン原子を含有する樹脂と反応させ
るアミンとしては、下図に示すサリチルアミン、２−テ
ニルアミンが用いられる。これらのアミンは分子内に水
銀イオンと安定な錯体を形成し得るフェノール性水酸基
やチオフェン基ならびにアミノ基を持つ２座配位子であ
る。In the present invention, salicylamine and 2-thenylamine shown in the figure below are used as the amine to be reacted with the resin containing a halogen atom. These amines are bidentate ligands having a phenolic hydroxyl group, a thiophene group, and an amino group that can form a stable complex with mercury ions in the molecule.
サリチルアミン ２−テニルアミンハロゲン原
子を含有する樹脂と上記アミンとの反応は、該樹脂のハ
ロゲン／ｇ原子に対して／ｇ分子以上のアミンを用いれ
ばよいが９反応で生成する塩酸を除去するために、好ま
しくは２〜５９分子のアミンが用いられる。Salicylamine 2-Thenylamine In the reaction between a resin containing a halogen atom and the above-mentioned amine, it is sufficient to use an amine in an amount of /g molecules or more per halogen /g atom of the resin, but the hydrochloric acid produced in the reaction must be removed. For this purpose, preferably 2 to 59 molecules of amine are used.
反応の溶媒としては、水、メチルアルコール。Water and methyl alcohol are used as solvents for the reaction.
エチルアルコール、テトラヒドロフラン、ジオキサン、
ベンゼン、トルエン等が用いられる。好ましくは反応温
度との関係でジオキサンが用いられる。Ethyl alcohol, tetrahydrofuran, dioxane,
Benzene, toluene, etc. are used. Preferably, dioxane is used depending on the reaction temperature.
反応温度はり０−１１０℃で行われる。上記温度以上で
はハロゲン含有樹脂の脱ハロゲン化反応が起り、また、
上記温度以下では反応率が低下し、いずれの場合も得ら
れた反応生成物の水銀イオン吸着能が低下するので好ま
しくない。The reaction temperature is 0-110°C. At temperatures above the above, dehalogenation reaction of halogen-containing resin occurs, and
Below the above temperature, the reaction rate decreases, and in either case, the mercury ion adsorption ability of the reaction product obtained decreases, which is not preferable.
反応時間は７時間以上でよいが２反応時間が短いと２反
応率が低下するので、好ましくは／、２〜ａｔ時間が適
当である。The reaction time may be 7 hours or more, but if the 2 reaction time is short, the 2 reaction rate will decrease, so preferably 2 to at time is appropriate.
以上のようにして製造した樹脂は、洗浄乾燥した後、キ
レート樹脂として使用することができる本発明のキレー
ト樹脂は、銅（■）、ニッケル（■）。After the resin produced as described above is washed and dried, it can be used as a chelate resin.The chelate resin of the present invention includes copper (■) and nickel (■).
亜鉛（■）、コバル） （ＩＩ）等通常の重金属イオン
とは安定な錯体をほとんど形成せず、これらの重金属イ
オン共存下においても９選択的に水銀（ｎ）イオンのみ
を捕集する。また、高濃度の共存塩類存在下においても
、吸着能力の低下が見られないという利点を有する。It hardly forms stable complexes with ordinary heavy metal ions such as zinc (■) and cobal (II), and even in the presence of these heavy metal ions, it selectively collects only mercury (n) ions. Furthermore, it has the advantage that no decrease in adsorption capacity is observed even in the presence of high concentrations of coexisting salts.
以下本キレート樹脂について実施例により、更に詳細に
説明する。反応に用いたサリチルアミンおよび２−テニ
ルアミンは、それぞれ公知の方法で合成した０ （Ｈ
，ＫａｎａｔＯｍｉ ａｎａ工、 Ｍｕｒａｓｅ、 Ｂ
ｕｌｌ＋Ｏｈｅｍ。The present chelate resin will be explained in more detail below using Examples. Salicylamine and 2-thenylamine used in the reaction were synthesized by known methods, respectively.
, KanatOmi ana engineering, Murase, B
ull+ohem.
Ｓｏｃ、 Ｊｐｎ＋、 ４３巻、２２６頁、１９７０年
およびＨｏＤ、 Ｈａｒｔｏｕｇｈ１９４８年
ａｎａ Ｓ、Ｌ、 Ｍｅｉａｅｌ 、 、ｒ、 Ａｍ、
Ｏｈｅｍ、 Ｂｏｏ、 、 ７０巻＋ ｉ片τひ「高
分子母体の樹脂は、スチレン−（７〜、２０％）−ジビ
ニルベンゼンのゲル型共重合体、もＬ＜ハ、ＭＲ型共重
合体であり、おのおの公知の方法で合成した。（Ｊ、
Ｒ，ＭＩ Ｌｉａｒ、 Ｄ、 Ｇ、 Ｓｍ１ｔｈ、 Ｗ
、 １． Ｍａｒｒ ａｎｄ Ｔ、 Ｒ。Soc, Jpn+, vol. 43, p. 226, 1970 and HoD, Hartough 1948 ana S, L, Meiael, , r, Am.
Ohem, Boo, 70 volumes + i piece τ ``The polymer matrix resin is a gel-type copolymer of styrene-(7~, 20%)-divinylbenzene, L<c, MR type copolymer. Each of them was synthesized by a known method. (J,
R, MI Liar, D, G, Sm1th, W
, 1. Marr and T, R.
ＩＣ，Ｋｒｅｓｓｍａｎ、 Ｊ、Ｏｈｅｍ、 Ｓｏａ、
、 ２１８頁、 １９６３年およびＲｏＫｕｎｉｎ、
Ｚ、 Ｆ、 Ｍｅｉｔｚｎｅｒ ａｎｄ Ｎ、 Ｍ、
Ｂｏｒｔｎｉｃｋ、 Ｊ、 Ａｍ、 Ｏｈｅｍ。I.C., Kressman, J., Ohem, Soa.
, p. 218, 1963 and RoKunin,
Z, F, Meitzner and N, M,
Bortnick, J. Am, Ohem.
Ｓｏｃ、、８４巻、３０５頁、 １９６２年）高分子母
体の粒度は３０〜りＯＯメツシュのものを使用した。ク
ロルメチルポリスチレンは公知の方法で合成した。（Ｘ
、 Ｗ。Soc, Vol. 84, p. 305, 1962) The particle size of the polymer matrix used was 30 to 000 mesh. Chlormethylpolystyrene was synthesized by a known method. (X
, W.
Ｐｅｐｐｅｒ、 Ｈ，Ｍ、 Ｐａ１ｓｉｅｙ ａｎｄ
Ｍ、 Ａ、 Ｙｏｕｎｇ、 、Ｔ、 Ｏｈｅｍ、 Ｓｏ
ｃ、 。Pepper, H.M., Pa1siey and
M, A, Young, , T, Ohem, So
c.
４０９７頁、 １９５３年） ２００〜１１００メツシ
ユのゲル型スチレンーコ％−ジビニルベンゼン共重合体
より得られた。クロルメチルポリスチレン樹脂の塩素含
有率は、２０．ざコ％（！；、１ ｍｍｏｌｅ／Ｑ−乾
燥樹脂）であった。この塩素含有率２０．ｒ、２％のゲ
ル型りロルメチルホリスチレンを出発原料として用いた
キレート樹脂の製造方法と性能試験の実施例を以下に述
べる。4,097 pages, 1953) was obtained from a gel type styrene-divinylbenzene copolymer of 200 to 1,100 meshes. The chlorine content of chloromethyl polystyrene resin is 20. % (!;, 1 mmole/Q-dry resin). This chlorine content is 20. An example of a method for producing a chelate resin and a performance test using 2% gel-formed lormethylfolystyrene as a starting material will be described below.
実施例／
２！；Ｏｗｌのジオキサン中に上記クロルメチルポリス
チレンＣ／７ＪのおよびサリチルアミンＣ１１９，２９
）を加え、 ｌｏＯ′ｃでｔざ時間加熱攪拌した。反応
生成物をン？過し、水、ジオキサンで充分洗浄し乾燥し
た。２／Ｊ９の淡黄色樹脂が得られた。（本樹脂をキレ
ート樹脂Ａと呼ぶ。）
元素分析値： ａｔ ｒｔｉＩ１％、Ｎ３．２％配位子
含有率： 、２２９＋ｎｍｏｌｅ／９−乾燥樹脂実施例
２
クロルメチルポリスチレン（／７３ｇ）および２−テニ
ルアミン（Ｉｔ！；、２９）より、実施例１と同様の方
法により２０３ｇの淡黄色樹脂が得られた。（本樹脂を
キレート樹脂Ｂと呼ぶ。）
元素分析値： ０１０．７％、Ｎ１１．０７％配位子含
有率：２ワ／ｍｍｏｌｅ／９−乾燥樹脂応用例１
実施例／および−で合成したキレート樹脂ＡＩまたはキ
レート樹脂Ｂ ！；０ＯＴＩＩを、 ０．０２Ｍの銅（
Ｉｔ）イオンを含む１００ｍ１の水溶液に加え、所定の
ｐＨに調整した。室温で３時間攪拌した後樹脂を分離し
、吸着された銅（ｎ）イオンを２Ｍ塩酸で溶出した。溶
出液中の銅（ＩＩ）イオンを定量し、吸着量を求めた。Example/2! ; Owl of the above chloromethyl polystyrene C/7J and salicylamine C119,29 in dioxane
) was added, and the mixture was heated and stirred at loO'c for t hours. What about reaction products? It was filtered, thoroughly washed with water and dioxane, and dried. A pale yellow resin of 2/J9 was obtained. (This resin is referred to as chelate resin A.) Elemental analysis values: at rtiI 1%, N 3.2% Ligand content: , 229+nmole/9-Dry resin Example 2 Chlormethylpolystyrene (/73g) and 2-thenylamine (It!;, 29), 203 g of pale yellow resin was obtained in the same manner as in Example 1. (This resin is called chelate resin B.) Elemental analysis value: 010.7%, N11.07% Ligand content: 2 w/mmole/9 - Dry resin application example 1 Synthesized in Example / and - Chelate resin AI or chelate resin B! ;0OTII, 0.02M copper (
It) was added to 100 ml of an aqueous solution containing ions and adjusted to a predetermined pH. After stirring for 3 hours at room temperature, the resin was separated and the adsorbed copper(n) ions were eluted with 2M hydrochloric acid. Copper (II) ions in the eluate were quantified to determine the amount of adsorption.
同様にしてニッケル（■）、亜鉛（■）、コバルト（Ｉ
Ｉ）イオンの吸着量を求めた。第−表に乾燥樹脂／ｇ当
りの最大吸着量（ｍｍｏｌｄ−乾燥樹脂）を示す。Similarly, nickel (■), zinc (■), cobalt (I)
I) The amount of ion adsorption was determined. Table 1 shows the maximum adsorption amount per gram of dry resin (mmold-dry resin).
第−表 応用例２ 実施例１およびコで合成したキレート樹脂Ａ。Table - Table Application example 2 Chelate resin A synthesized in Example 1 and co.
または、キレート樹脂Ｂ １００〜を１種々の−に調整
した１０００ｐｐｂの水銀（Ｉ［）イオンを含む溶液Ｊ
Ｏｍｌに加え、室温で３時間攪拌した。溶液中に残留す
る水銀（ＩＩ）イオンを定量し除去率を求めた。除去率
とｐＨの関係を第三衣に示す。キレート樹脂Ａ、Ｂトモ
Ｆ 強酸性ｐＨ領域できわめて高い除去率を示した。Alternatively, a solution J containing 1000 ppb of mercury (I[) ions prepared by adjusting chelate resin B from 100 to various -
0ml and stirred at room temperature for 3 hours. The mercury (II) ions remaining in the solution were quantified to determine the removal rate. The relationship between removal rate and pH is shown in the third column. Chelate resins A and B Tomo F showed extremely high removal rates in the strongly acidic pH region.
第三衣
応用例３
高濃度の塩化ナトリウム／Ｍを含む１０００ｐｐｂの水
銀（ｎ）イオンを含む溶液を用い、応用例２と同様の方
法で、溶液中に残留する水銀（ｎ）イオンを定量し除去
率を求めた。除去率とｐＨの関係を第三衣に示す。７Ｍ
の塩化ナトリウム共存化においても水銀（■）イオンの
除去率に著しい低下は見られなかった。Third Coat Application Example 3 Using a solution containing 1000 ppb of mercury (n) ions containing a high concentration of sodium chloride/M, the mercury (n) ions remaining in the solution were quantified in the same manner as in Application Example 2. The removal rate was determined. The relationship between removal rate and pH is shown in the third column. 7M
No significant decrease in the removal rate of mercury (■) ions was observed even in the coexistence of sodium chloride.
第三衣
指定代理人 工業技術院東北工業技術試験所長和泉
学Izumi Izumi, Director of Tohoku Industrial Technology Testing Institute, Agency of Industrial Science and Technology
studies
Claims (1)
原子に対し、／９分子以上のサリチルアミンまたは２−
テニルアミンを含む溶液を、９０〜／１０℃の温度で１
時間以上反応せしめることを特徴とする水銀除去用キレ
ート樹脂の製造方法。Resin containing halogen atoms and 1g of halogen in the resin
/9 or more molecules of salicylamine or 2-
A solution containing thenylamine was heated at a temperature of 90 to 10°C for 1
A method for producing a chelate resin for removing mercury, the method comprising reacting for a period of time or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14498582A JPS6052161B2 (en) | 1982-08-20 | 1982-08-20 | Method for producing chelate resin for mercury removal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14498582A JPS6052161B2 (en) | 1982-08-20 | 1982-08-20 | Method for producing chelate resin for mercury removal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5936103A true JPS5936103A (en) | 1984-02-28 |
| JPS6052161B2 JPS6052161B2 (en) | 1985-11-18 |
Family
ID=15374791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14498582A Expired JPS6052161B2 (en) | 1982-08-20 | 1982-08-20 | Method for producing chelate resin for mercury removal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6052161B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10182732A (en) * | 1996-12-24 | 1998-07-07 | Mitsubishi Chem Corp | Polymer having thiourea group and heavy metal scavenger comprising the same |
-
1982
- 1982-08-20 JP JP14498582A patent/JPS6052161B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10182732A (en) * | 1996-12-24 | 1998-07-07 | Mitsubishi Chem Corp | Polymer having thiourea group and heavy metal scavenger comprising the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6052161B2 (en) | 1985-11-18 |
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