JPS596177B2 - Method for rapidly cooling an object after heating using an arch-image furnace - Google Patents
Method for rapidly cooling an object after heating using an arch-image furnaceInfo
- Publication number
- JPS596177B2 JPS596177B2 JP55164781A JP16478180A JPS596177B2 JP S596177 B2 JPS596177 B2 JP S596177B2 JP 55164781 A JP55164781 A JP 55164781A JP 16478180 A JP16478180 A JP 16478180A JP S596177 B2 JPS596177 B2 JP S596177B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- cooled copper
- heating
- heat
- image furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Control Of Resistance Heating (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【発明の詳細な説明】
最近の飛躍しつゝある技術革新の過程においては非晶質
の無機物質即ち非晶質の金属、合金、非金属無機物質、
或は此等の非晶質の複合材料の出現に負うところが大で
ある。[Detailed Description of the Invention] In the process of recent rapid technological innovation, amorphous inorganic substances, namely amorphous metals, alloys, non-metallic inorganic substances,
This is largely due to the emergence of such amorphous composite materials.
而して此等の非晶質材料即ちアモルファスの進歩は専ら
その製造の段階における加熱と急冷の技術の発展による
ものである。しかるに此の分野における従来技術は大別
して3種類存在した。即ちげ泪的物をルツボに入れプラ
ズマアークにより加熱することとドラムの内壁を利用し
た遠心急冷法又はガス銃又はピストンアンビル又は1〜
2個のロールの外面等による急冷法を組み合わせた方法
、(口泪的物をルツボに入れたもののハロゲンランプに
よる加熱と前記に)の方法中の急冷方法を組み合わせた
方法、←→高周波誘導加熱と前記げ)(口)における急
冷方法とを組み合わせた方法等があつた。しかしながら
に)の方法はその加熱の手段としてのプラズマアークは
不安定なので電極に炭素を加えるが、そのためにアーク
から発生した微粒の塵埃が反射鏡に付着するので光熱線
の反射率が悪くなりイメージが高温を保持し難いことに
加えて高温でルツボと反応するような目的物には使用で
きない。その上従来のルツボのノズルからの目的溶融物
の排出はそれ程高速には行なわれ得ず、また加熱湯所と
冷却場所が或程度離れざるを得ないから、種々の物質を
非晶質とするためにはその冷却速度は不充分である、等
等多くの欠点を有していた。また(口)の方法ではハロ
ゲンランプによる加熱は安定しているのであるがハロゲ
ン中の発光は比較的低温なのでイメージも比較的高温に
はなりにくく約1800℃止りであるからAl2O3或
は3AIl203・2Si02等の高融点の物質につい
ては溶融することができない。またその他に)の方法と
同様の多くの欠点を有する。また←→の方法では安定し
た高温は得られるが、導電性のない目的物については必
ず目的物を入れる容器或はルツボを必要とするので、ル
ツボと反応するような目的物には使用できない。またル
ツボを使用するため加熱湯所と冷却場所が離れているの
で冷却速度はあまり上らない等々の諸欠点があつた。従
つて従来の方法ではルツボを使用するため目的物との反
応を防止し得ない場合が多くまた一般に1800℃以上
の高融点物質から非晶質材料を製造することはできなか
つた。本発明者等は従来技術では得ることのできなかつ
た此等高融点物質のアモルフアスを製造することを目的
として種々研究を重ねた結果、従来の方法によつてはな
し得なかつた高融点物質を含む目的物の加熱溶融と超急
冷方法との組み合わせにより本発明を完成したものであ
る。The progress of these amorphous materials is due solely to the development of heating and rapid cooling techniques during their production. However, there are three types of conventional techniques in this field. In other words, the object is placed in a crucible and heated by a plasma arc, and a centrifugal quenching method using the inner wall of a drum, a gas gun or a piston anvil, or 1-
A method that combines the quenching method using the outer surface of two rolls, etc. A method that combines the quenching method of the above method (heating the object placed in the crucible with a halogen lamp and the method described above), ←→High frequency induction heating There was a method that combined the rapid cooling method and the above-mentioned quenching method. However, in the method (2), carbon is added to the electrode because the plasma arc used as a means of heating is unstable, but because of this, fine particles of dust generated from the arc adhere to the reflector, which deteriorates the reflectance of the light heat rays. In addition to being difficult to maintain high temperatures, it cannot be used for objects that react with crucibles at high temperatures. Furthermore, the desired molten material cannot be discharged from the nozzle of a conventional crucible at such a high speed, and the heating and cooling locations must be separated to some extent, making it difficult to make various materials amorphous. However, it has many drawbacks such as an insufficient cooling rate. In addition, in the method (mentioned), heating with a halogen lamp is stable, but since the light emitted in halogen is relatively low temperature, the image does not reach a relatively high temperature and only reaches about 1800℃, so Al2O3 or 3AIl203/2Si02 It is not possible to melt substances with high melting points such as. In addition, it has many drawbacks similar to the methods described above. In addition, although a stable high temperature can be obtained with the method ←→, it cannot be used for objects that will react with a crucible because it always requires a container or crucible to contain the object without conductivity. In addition, since the crucible was used, the heating and cooling locations were separated, so the cooling rate was not very high. Therefore, in the conventional method, since a crucible is used, it is often impossible to prevent reaction with the target substance, and it is generally not possible to produce an amorphous material from a substance with a high melting point of 1800° C. or higher. The present inventors have conducted various studies with the aim of producing amorphous amorphous substances with high melting points that could not be obtained using conventional methods. The present invention was completed by combining heating and melting of the target object with an ultra-rapid cooling method.
即ち希ガスランプ、例えばキセノンランプを横置した受
光鏡の第一焦点に備え第二焦点の外側に平面反射鏡を約
45焦上方に向けて設けその真上に下向きに放射鏡を設
けたアークイメージ炉を用い、該放射鏡の結像位置に、
内部に水冷銅ターゲツトと下部にガス銃を有し目的物を
載せた水冷銅基盤を嵌着した耐熱ガラス管を配置し、該
目的物に光熱線を集中照射して加熱溶融した後、ガス銃
で水冷銅ターゲツト内面に吹き付けて急冷する方法であ
る。In other words, a rare gas lamp, such as a xenon lamp, is placed horizontally at the first focal point of a light receiving mirror, and a flat reflecting mirror is placed outside the second focal point with the plane facing upward at about 45 points, and an emitting mirror is placed directly above the reflecting mirror facing downward. Using an image furnace, at the imaging position of the radiation mirror,
A heat-resistant glass tube with a water-cooled copper target inside, a gas gun at the bottom, and a water-cooled copper substrate with an object placed on it is placed, and after heating and melting the object by irradiating it with a concentrated beam of light, the gas gun This method involves spraying water onto the inner surface of a water-cooled copper target to rapidly cool it.
而して底部の水冷銅基盤は上面を半径大なる球内面の一
部に形成し中央にガス銃口を設けて外部の高圧ガス貯蔵
器より接続させまた冷水管を接続する。The top surface of the bottom water-cooled copper base is formed as part of a spherical inner surface with a large radius, and a gas muzzle is provided in the center to connect an external high-pressure gas storage device and a cold water pipe.
水冷銅ターゲツトは円筒形又は球形に近い形状の水ジヤ
ケツトとし下部は溶融目的物の入射並に冷却目的物の排
出のため適した大きさの開口部を設けておく。また該水
冷銅ターゲツトは上方から懸垂し冷水管を接続する。此
等配管は可撓性のものを用い水冷銅基盤上に目的物を配
置した後、目的物の性質に応じその高温時における蒸発
や酸化を防ぐため、圧力は目的物の性質で異るが、耐熱
ガラス管内に不活性ガス等を封入する。耐熱ガラス管と
水冷銅基盤或は上部蓋はパツキンを用いてねじ締め或は
ボルト締めできる構造とする。また連続操業を必要とす
る場合には該耐熱ガラス管は複数準備し台車に載せ、ミ
ニモーター又は手動によりレール上をワイヤで牽引し交
互に往復運動をさせて使用する。従つて配管類は可撓性
のものを前記往復運動の分だけ長く設ける。次に目的物
の位置をイメージの位置に正確に合致させるため、XY
Z軸方向の調整装置を設けておきダイヤルで微調整を行
う。かくして放射鏡より目的物に光熱線を集中照射すれ
ば希ガス放電ランプを熱源としイメージが耐熱ガラス管
内に生ずるため2000〜3500℃という非常な高温
を発生し従来は処理困難であつた高融点の目的物をも溶
融し得るに到る。The water-cooled copper target is a water jacket having a cylindrical or nearly spherical shape, and an opening of a suitable size is provided at the bottom for the entrance of the molten object and the discharge of the cooled object. The water-cooled copper target is suspended from above and connected to a cold water pipe. These pipings are flexible, and after placing the object on the water-cooled copper board, the pressure is adjusted depending on the nature of the object to prevent evaporation and oxidation at high temperatures. , an inert gas or the like is filled in a heat-resistant glass tube. The heat-resistant glass tube and the water-cooled copper base or upper cover have a structure that allows them to be tightened with screws or bolts using gaskets. If continuous operation is required, a plurality of heat-resistant glass tubes are prepared and placed on a trolley, and the tubes are pulled by a wire on a rail by a mini motor or manually, and are alternately reciprocated. Therefore, flexible piping is provided with a length corresponding to the reciprocating movement. Next, in order to accurately match the position of the object with the position of the image,
An adjustment device in the Z-axis direction is provided and fine adjustments are made using a dial. In this way, when the radiation mirror irradiates the object with a concentrated beam of light, an image is generated in the heat-resistant glass tube using the rare gas discharge lamp as the heat source, which generates an extremely high temperature of 2000 to 3500°C, which is difficult to process in the past. The target object can also be melted.
而して目的物は液状においては表面張力で略球形となり
凹状銅基盤の中央に位置する。その後耐熱ガラス管内に
圧力がか\つている場合はそれを抜いてからガス銃の元
栓を開き細いガス銃口より高圧ガスを噴射することによ
り目的物を水冷銅ターゲツトの内面に吹きつけると、目
的物は液状であるから該ターゲツト内面に薄く張りつい
た形となり急冷される。而して本発明の特徴としては非
常な高温より瞬時にして水冷銅ターゲツトの内面に、し
かも薄片となつて張りつくので目的物の単位重量当りの
伝熱面積が非常に大となるので、冷却速度は従来技術水
準を超え極めて大となることであり1060K/Sec
に達する。また導電性のない物質に対してもルツボを必
要としないので目的物がルツボからの汚染なしに溶融さ
れるという利点がある。本発明方法によれば以上の如く
してアークイメージ炉を用いて加熱後目的物をガス銃で
水冷銅ターゲツトの内面に吹きつける等して超急冷する
ことによつてアモルフアスを確実に製造することができ
る。実施例
第1図は本発明方法の一例としての実施に用いるアーク
イメージ炉の一部断面説明図である。Therefore, the object in liquid form becomes approximately spherical due to surface tension and is located at the center of the concave copper base. After that, if there is pressure inside the heat-resistant glass tube, release it, open the main valve of the gas gun, and inject high-pressure gas from the narrow gas muzzle to spray the target object onto the inner surface of the water-cooled copper target. Since it is in liquid form, it forms a thin layer that sticks to the inner surface of the target and is rapidly cooled. A feature of the present invention is that the water-cooled copper target instantly adheres to the inner surface of the water-cooled copper target in the form of flakes from very high temperatures, so the heat transfer area per unit weight of the target is extremely large. The speed is extremely high, exceeding the conventional technology level, and is 1060K/Sec.
reach. Furthermore, since a crucible is not required even for non-conductive substances, there is an advantage that the target object can be melted without contamination from the crucible. According to the method of the present invention, amorphous amorphous can be reliably produced by heating the object using an arc image furnace as described above and then ultra-quenching the object by blowing it onto the inner surface of a water-cooled copper target with a gas gun. I can do it. Embodiment FIG. 1 is a partially cross-sectional explanatory diagram of an arc image furnace used for carrying out an example of the method of the present invention.
先ずキセノンランプ1から出た光熱線は受光鏡2により
反射され、次に平面反射鏡3により凡そ上方に反射され
、更に放射鏡4によつてその結像位置5に集光する。耐
熱ガラス管6の中には予じめ、その下部にパツキン7を
用いねじで気密に嵌着した水冷銅基盤8の上面中央付近
に目的物9を配置した。本実施例では目的物はスピネル
系組成物を選んだ。該耐熱ガラス管6の上部は蓋10を
パツキン7を用いてねじで気密に嵌着し、蓋10の下方
に水冷銅ターゲツト11を開口部を真下に向けて懸垂固
着し、該水冷銅ターゲツトには蓋を貫通して入口冷水管
12と出口冷水管12′を取付けてある。水冷銅基盤8
には入口冷水管13と出口冷水管13′及び高圧入口ガ
ス管14と高圧出口ガス管14′並にガス銃用高圧ガス
管15を取付けてある。第2図は耐熱ガラス管並にその
取付け物等の拡大一部縦断面説明図である。而して耐熱
ガラス管6は台車16に載荷し、ミニモーター17及び
ワイヤー18によつてレール19上を牽引し、結像位置
5付近に運ぶ。然る後XYZ軸調整装置20によつて目
的物9の位置を正確に結像位置5に合致させるためにダ
イヤルで微調整を行なう。かくして光熱線を目的物9に
集光させれば、耐熱ガラス管内は高圧ガス雰囲気にして
あるので、目的物9は益々高温となり光高温計で測定し
たところ3050℃に達した。目的物9のスピネルは完
全に溶融して球状となり水冷銅基盤8の中央部に落ちつ
いた。次に高圧ガス排出管14′の先の弁を開いて常圧
とし直ちにガス銃用高圧ガス管15の元コツクを一度に
開き目的物9を吹き上げて水冷銅ターゲツト11の内面
上部に吹きつけて薄片となし急冷した。冷却速度は10
60K/Sec程度と推定された。また冷却後の該目的
物9のスピネル系物質をX線回折試験により検査したと
ころ、第3図に示すようになだらかなX線回折図となり
、第4図のスピネル系結晶質物の典型的X線回折図とは
全く異り殆んどがアモルフアスであることが認められた
のでスピネル系アモルフアスになつたことが確認された
。以上により本発明の効果は次の如くである。First, the photothermal rays emitted from the xenon lamp 1 are reflected by the light receiving mirror 2, then approximately upwardly reflected by the plane reflecting mirror 3, and then condensed by the emitting mirror 4 at its imaging position 5. In the heat-resistant glass tube 6, an object 9 was placed in advance near the center of the upper surface of a water-cooled copper substrate 8, which was airtightly fitted with a screw using a gasket 7 at the bottom thereof. In this example, a spinel-based composition was selected as the target material. A lid 10 is hermetically fitted to the upper part of the heat-resistant glass tube 6 with a screw using a gasket 7, and a water-cooled copper target 11 is suspended and fixed under the lid 10 with the opening facing straight down. An inlet cold water pipe 12 and an outlet cold water pipe 12' are installed through the lid. Water-cooled copper board 8
An inlet cold water pipe 13, an outlet cold water pipe 13', a high pressure inlet gas pipe 14, a high pressure outlet gas pipe 14', and a high pressure gas pipe 15 for a gas gun are attached to the. FIG. 2 is an enlarged partial vertical cross-sectional view of the heat-resistant glass tube and its attachments. The heat-resistant glass tube 6 is then loaded onto a cart 16, pulled on a rail 19 by a mini motor 17 and a wire 18, and transported to the vicinity of the imaging position 5. Thereafter, the XYZ axis adjusting device 20 performs fine adjustment using a dial in order to precisely align the position of the object 9 with the imaging position 5. When the photothermal rays are thus focused on the object 9, the temperature of the object 9 becomes even higher, reaching 3050° C. as measured by an optical pyrometer, since the inside of the heat-resistant glass tube is in a high-pressure gas atmosphere. The spinel object 9 was completely melted into a spherical shape and settled in the center of the water-cooled copper substrate 8. Next, open the valve at the end of the high-pressure gas discharge pipe 14' to bring it to normal pressure. Immediately open the base of the high-pressure gas pipe 15 for the gas gun at once and blow up the object 9 onto the upper inner surface of the water-cooled copper target 11. It was flaked and quenched. The cooling rate is 10
It was estimated to be about 60K/Sec. Further, when the spinel material of the object 9 after cooling was examined by an X-ray diffraction test, it showed a smooth X-ray diffraction pattern as shown in FIG. It was completely different from the diffraction diagram, and it was confirmed that most of the material was amorphous, so it was confirmed that it was spinel-based amorphous. Based on the above, the effects of the present invention are as follows.
1キセノンランプを用い結像点を耐熱ガラス管で覆つた
ので此の種アークイメージ炉としては従来技術では得ら
れなかつた高温で高融点の物質を溶融することができる
。Since a 1 xenon lamp was used and the imaging point was covered with a heat-resistant glass tube, this type of arc image furnace could melt high-melting-point substances at high temperatures that could not be obtained with the prior art.
2本発明方法によれば導電体から絶縁体まですべての材
料についてルツボなしに任意の雰囲気の下で加熱溶融す
ることができるので、従来技術のようなルツボによる目
的物の汚染の問題が解決される。2. According to the method of the present invention, all materials from conductors to insulators can be heated and melted in any atmosphere without a crucible, so the problem of contamination of objects due to crucibles as in the prior art is solved. Ru.
3従来技術方法では溶融目的物をルツボのノズル付近で
若干の時間を経て移動し冷却するから、冷却速度はせい
ぜい1030K/Sec程度止りであるが、本発明方法
ではガス銃により目的物を瞬間的に水冷銅ターゲツトの
内面に薄片として張りつけて了うので、冷却速度は従来
方法に比し格段に大きく1060K/Sec程度に達す
る。3. In the conventional method, the molten object is cooled by moving it around the nozzle of the crucible after a short period of time, so the cooling rate is no more than about 1030 K/Sec, but in the method of the present invention, the object is instantaneously moved with a gas gun. Since the thin film is attached to the inner surface of a water-cooled copper target, the cooling rate is much higher than that of the conventional method, reaching about 1060 K/Sec.
4本発明方法では従来技術を遥かに超えた速度で目的物
を超急冷することができるので、従来得られなかつた高
融点物質のアモルフアス或は準安定物質を得ることがで
き、従つて半導体其の他の電子材料或は光学機器用の材
料等の優れた素材の製法として最新の技術の進歩に大き
く貢献することができる。4. The method of the present invention can ultra-rapidly cool a target object at a rate far exceeding that of conventional techniques, so it is possible to obtain amorphous or metastable materials with high melting points, which were previously unobtainable. It can greatly contribute to the advancement of the latest technology as a method for producing excellent materials such as other electronic materials or materials for optical devices.
尚前記の実施例は本発明の実施の一例にすぎないから、
本発明の技術的範囲は前記実施例の範囲に限定されるも
のではない。It should be noted that the above-mentioned embodiment is only an example of implementing the present invention.
The technical scope of the present invention is not limited to the scope of the above embodiments.
第1図は本発明方法の一例としての実施に用いるアーク
イメージ炉の一部縦断面説明図である。
第2図は同じく耐熱ガラス管とその付属物等の拡大一部
縦断面説明図である。第3図は本発明方法により得られ
たスピネル系アモルフアスのX線回折図、第4図はスピ
ネル系結晶質物のX線回折図である。各図において1は
キセノンランプ、2は受光鏡、3は平面反射鏡、4は放
射鏡、5は放射鏡の結像位置、6は耐熱ガラス管、7は
パツキン、8は水冷銅基盤、9は目的物、10は蓋、1
1は水冷銅ターゲツト、12は水冷銅ターゲツトの入口
冷水管、12′は同じく出口冷水管、13は水冷銅基盤
の入口冷水管、13′は同じく出口冷水管、14は高圧
入口ガス管、14′は高圧出口ガス管、15はガス銃用
高圧ガス管、16は台車、17はミニモーター、18は
ワイヤー、19はレール、20はXYZ軸位置調整装置
、である。FIG. 1 is a partial vertical cross-sectional explanatory view of an arc image furnace used in carrying out an example of the method of the present invention. FIG. 2 is also an enlarged partial vertical cross-sectional view of the heat-resistant glass tube and its accessories. FIG. 3 is an X-ray diffraction diagram of spinel-based amorphous obtained by the method of the present invention, and FIG. 4 is an X-ray diffraction diagram of a spinel-based crystalline material. In each figure, 1 is a xenon lamp, 2 is a receiver mirror, 3 is a plane reflector, 4 is a radiation mirror, 5 is an imaging position of the radiation mirror, 6 is a heat-resistant glass tube, 7 is a packing, 8 is a water-cooled copper board, 9 is the object, 10 is the lid, 1
1 is the water-cooled copper target, 12 is the inlet cold water pipe of the water-cooled copper target, 12' is the same outlet cold water pipe, 13 is the inlet cold water pipe of the water-cooled copper base, 13' is the same outlet cold water pipe, 14 is the high pressure inlet gas pipe, 14 ' is a high-pressure outlet gas pipe, 15 is a high-pressure gas pipe for a gas gun, 16 is a trolley, 17 is a mini motor, 18 is a wire, 19 is a rail, and 20 is an XYZ axis position adjustment device.
Claims (1)
有蓋耐熱ガラス管をその底部に水冷銅基盤を気密に結合
して配置し、該耐熱ガラス管内部に下向きに開孔部を有
する水冷銅ターゲットを懸垂し、該水冷銅基盤の上面は
凹状に形成して、その中央部で上向きに設けたガス銃口
に接して目的物を配置し、該目的物の位置を該結像位置
に合致させ、該イメージ炉の光熱線を集中照射して該目
的物を加熱溶融させた後、ガス銃で該目的物を水冷銅タ
ーゲットの内面に吹きつけて急冷することを特徴とする
アークイメージ炉を用いた加熱後目的物急冷方法。1 Using an arc image furnace, near the imaging position,
A covered heat-resistant glass tube is airtightly bonded to a water-cooled copper substrate at the bottom thereof, a water-cooled copper target having a downward opening is suspended inside the heat-resistant glass tube, and the upper surface of the water-cooled copper substrate is formed in a concave shape. Then, place an object in contact with the gas muzzle that faces upward in the center, match the position of the object with the imaging position, and concentrate the photothermal rays of the image furnace to focus on the object. A method for rapidly cooling an object after heating using an arc image furnace, which comprises heating and melting the object, and then spraying the object onto the inner surface of a water-cooled copper target using a gas gun to rapidly cool the object.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55164781A JPS596177B2 (en) | 1980-11-22 | 1980-11-22 | Method for rapidly cooling an object after heating using an arch-image furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55164781A JPS596177B2 (en) | 1980-11-22 | 1980-11-22 | Method for rapidly cooling an object after heating using an arch-image furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5787833A JPS5787833A (en) | 1982-06-01 |
| JPS596177B2 true JPS596177B2 (en) | 1984-02-09 |
Family
ID=15799820
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55164781A Expired JPS596177B2 (en) | 1980-11-22 | 1980-11-22 | Method for rapidly cooling an object after heating using an arch-image furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS596177B2 (en) |
-
1980
- 1980-11-22 JP JP55164781A patent/JPS596177B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5787833A (en) | 1982-06-01 |
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