JPS5963793A - Method of producing metal mask screen plate base material - Google Patents
Method of producing metal mask screen plate base materialInfo
- Publication number
- JPS5963793A JPS5963793A JP57173778A JP17377882A JPS5963793A JP S5963793 A JPS5963793 A JP S5963793A JP 57173778 A JP57173778 A JP 57173778A JP 17377882 A JP17377882 A JP 17377882A JP S5963793 A JPS5963793 A JP S5963793A
- Authority
- JP
- Japan
- Prior art keywords
- gauze
- cylinder
- metal film
- base material
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 35
- 239000002184 metal Substances 0.000 title claims description 35
- 239000000463 material Substances 0.000 title claims description 10
- 238000000034 method Methods 0.000 title claims description 8
- 238000007747 plating Methods 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000011888 foil Substances 0.000 claims description 2
- 238000001259 photo etching Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Printing Plates And Materials Therefor (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明は、電子部品の製造に用いるスフIJ +ン版の
製造に適したメタルマスクスクリーン版ノ、(利の製法
に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a metal mask screen plate suitable for producing a double-sided IJ+ plate used in the production of electronic components.
エレクトロニクス工業における電子部品製造工程に用い
るスクリーン版には、高密度、高精度の要求が益々強ま
っており、ポリエステル製又はステンレス製の紗にエマ
ルジョン感光剤を塗布したスクリーン版では、寸法精度
、解像力、パターン再現性、耐剛性の点で問題があり、
大きな改良が必要とされている。Screen plates used in the manufacturing process of electronic components in the electronics industry are increasingly required to have high density and high precision. Screen plates made of polyester or stainless steel gauze coated with emulsion photosensitizers have high dimensional accuracy, resolution, There are problems with pattern reproducibility and rigidity,
Major improvements are needed.
また、エレクトロニクス工業の市場に対する対応力とし
て、回路又は図形の設訂からスクリーン版の完成迄の時
間短縮化も、厳しく要求される。Furthermore, in order to respond to the market needs of the electronics industry, there is a strict requirement to shorten the time from designing a circuit or figure to completing a screen plate.
そこで、スクリーン版の質的改良のため、メタルマスク
の需要が増加しているが、金属箔にフォトエツチング等
を施し、パターンを形成した後に、紗と一体化する方法
では、図形設計からメタルマスクスクリーン版完成迄の
時間がかかり過ぎ、市場の要求に十分対応できなかった
。Therefore, the demand for metal masks is increasing in order to improve the quality of screen plates, but the method of photo-etching metal foil, forming a pattern, and then integrating it with gauze does not allow the metal mask to be fabricated from the graphic design. It took too long to complete the screen version, and it was not possible to fully meet market demands.
本発明は、このような欠点を解消し、フォト、エツチン
グによって、任意に作業性よくミメタルマスクスクリー
ン版を製造できる基材の製法を提供する。The present invention eliminates these drawbacks and provides a method for manufacturing a base material that can arbitrarily produce a mimetal mask screen plate with good workability by photo-etching.
本発明の方法は、シリンダーをメッキ浴に浸漬し、回転
しながらシリンダー表面にメッキし、金属膜を形成し、
その後金属製の紗(又はメツシュ)を、その片面が上記
金属膜と密着するように、シリンダー上に固定し、再び
シリンダーを回転しながらメッキすることによって、上
記金属膜と上記紗を析出した金属メッキ層で接合し、シ
リンダーから上記金属膜と一体化された紗を剥離するこ
とを特徴とする。The method of the present invention involves immersing a cylinder in a plating bath and plating the cylinder surface while rotating to form a metal film.
Thereafter, a metal gauze (or mesh) is fixed on the cylinder so that one side of the mesh is in close contact with the metal film, and the cylinder is plated while rotating again, so that the metal film and the metal on which the gauze has been deposited are plated. The method is characterized in that the gauze integrated with the metal film is peeled off from the cylinder by joining with a plating layer.
本発明では、第1図a及びbの如く、金属製、例えばス
テンレス製の紗(1)の片面に均一な金属膜(2)を有
する基材を非常に作業性よく製造でき、しかも金属膜(
2)を紗(1)のワイヤー(3)が交叉した頂部(4)
にのみ接着させることができる。According to the present invention, as shown in FIGS. 1a and 1b, it is possible to manufacture a base material having a uniform metal film (2) on one side of a metal gauze (1) made of metal, for example, stainless steel, with very good workability. (
The top (4) where the wire (3) of the gauze (1) intersects 2)
It can only be attached to
従って、本発明の基材は計画的に量産することができ、
所望時にフォトエツチング法で所定のパターン(5)に
金属膜(2)を開孔除去することによって、容易に第2
図の如きメタルマスクスクリーン版に作成できる。Therefore, the base material of the present invention can be mass-produced in a planned manner,
By opening and removing holes in the metal film (2) in a predetermined pattern (5) using a photoetching method when desired, the second layer can be easily formed.
It can be created on a metal mask screen plate as shown in the figure.
本発明の方法は、第3図の実施例で示されるように、シ
リンダー(7)をメッキ浴(8)に浸漬し、シリンダー
(7)を回転しながら、シリンダー表面に金属膜(2)
をメッキ形成するものであるが、このシリンダー(7)
表面は金属膜(2)を後に剥離できるようにステンレス
又はチタンから形成されるのが好ましい。The method of the present invention, as shown in the embodiment of FIG.
This cylinder (7) is formed by plating.
Preferably, the surface is made of stainless steel or titanium so that the metal film (2) can be peeled off later.
シリンダー(ア)は均一な金属膜(2)が形成されるよ
うに回転モータ(9)及びベルト00)又はギアなどで
回転される。化学メッキの際は不要であるが、電気メッ
キの際は陽極(11)にメンキする金属、例えばニッケ
ル、銅、クロームなどの電極をメッキ浴(8)中に置き
、これを直流電極に接続する。The cylinder (A) is rotated by a rotary motor (9) and a belt (00) or a gear so that a uniform metal film (2) is formed. Although it is not necessary during chemical plating, during electroplating, an electrode of the metal to be plated (11), such as nickel, copper, or chrome, is placed in the plating bath (8) and connected to a DC electrode. .
勿論、電気メッキに際しては、シリンダー(7)も電極
に接続し、メッキ浴(8)としては金属の硫酸塩又は有
酸溶液などを使用する。Of course, during electroplating, the cylinder (7) is also connected to an electrode, and a metal sulfate or an acidic solution is used as the plating bath (8).
次に、シリンダー(ア)上の金属膜(2)への紗(1)
の密着は、クランプ(I2)にてタガ張り力で達成でき
る。メッキによって、金属膜(2)と紗(1)は一体化
されるが、このメッキ層(6)の厚さは、メッキ浴の組
成、濃度、温度、電流密度、積算電流などを管理するこ
とによって制御できる。金属膜(2)と紗(1)を一体
化するためのメッキ層の厚さは、両者を安定して接着し
、しかも紗(1)のワイヤー(3)間の空隙、即ちメタ
ルマスクスクリーン版のパターンの開口率を十分保つよ
うに調節することが大切である。Next, gauze (1) is applied to the metal film (2) on the cylinder (A).
This close contact can be achieved by applying hoop tension with the clamp (I2). The metal film (2) and gauze (1) are integrated by plating, but the thickness of this plating layer (6) is determined by controlling the composition, concentration, temperature, current density, integrated current, etc. of the plating bath. can be controlled by The thickness of the plating layer for integrating the metal film (2) and the gauze (1) is such that it can stably bond them together, and the gap between the wires (3) of the gauze (1), i.e., the metal mask screen plate. It is important to adjust the pattern to maintain a sufficient aperture ratio.
シリンダー(7)の回転軸α3)は垂直でも水平でもよ
いが、メッキはシリンダー(7)両端部で厚く、中央部
で薄く形成され易いので・メッキの均一度を上げるため
にディストリビュータ−スクリーンを電流路に配したり
、電極とシリンダー表面の距離を変化させたり、循環ポ
ンプの使用によってメッキ浴を循環させたりするのが好
ましい。The rotation axis α3) of the cylinder (7) may be vertical or horizontal, but the plating tends to be thick at both ends of the cylinder (7) and thin at the center.In order to improve the uniformity of the plating, the distributor screen is It is preferable to circulate the plating bath by placing it in a channel, by varying the distance between the electrode and the cylinder surface, or by using a circulation pump.
本発明において、紗(1)を直接金属膜(2)とメツキ
接合した場合には、第1図の如く、紗(1)のワイヤー
(3)の周囲にメッキ層(6)が形成され、紗(1)の
開口率を低下させることを避けることはできず、非常に
微細なパターンのスクリーン版に形成した場合など、印
刷精度に欠ける場合も生ずるが、このような場合には、
紗(1)にメツキレシスト(1→を部分的に塗布して使
用するのが好ましい。In the present invention, when the gauze (1) is directly plated and bonded to the metal film (2), a plating layer (6) is formed around the wire (3) of the gauze (1) as shown in FIG. It is unavoidable to reduce the aperture ratio of the gauze (1), and there may be cases where printing accuracy is lacking, such as when forming on a screen plate with a very fine pattern, but in such cases,
It is preferable to use Metsuki Resist (1→) by partially applying it to the gauze (1).
例えば、紗(1)の表面のワイヤー(3)が交叉する頂
部(4)を除いてメツキレジス) (14)を塗布し、
メツキレジス) (14)が存在しないワイヤー頂部(
4)が金属膜(2)と密着するように、紗(1)をシリ
ンダー(7)上に固定し、メッキすることによって、メ
ッキ層を金属膜(2)と紗(1)の接合面にのみ形成し
、紗(1)の開口率を制限するワイヤー(3)側壁には
形成しないようにすることができる(第1図す参照)。For example, apply Metsuki Regis (14) on the surface of the gauze (1) except for the top (4) where the wires (3) intersect,
Metsuki Regis) (14) is not present at the top of the wire (
By fixing the gauze (1) on the cylinder (7) and plating so that the gauze (1) is in close contact with the metal film (2), the plating layer is applied to the joint surface of the metal film (2) and the gauze (1). It is possible to form only on the side wall of the wire (3) which limits the aperture ratio of the gauze (1) (see Figure 1).
メツキレシストθ→の部分的な塗着は、例えば紗(1)
全体に浸漬法などでメツキレシスト04)層を形成し、
バクロールなどで、ワイヤー頂m<4>のレジス) (
14)を剥離したり、又はキスロールコート方式などで
、紗(1)の厚さ方向でA程度をメツキレジストθ優で
塗布することによって簡単に達成される。Partial application of Metsuki Resist θ→ can be done, for example, with gauze (1).
Form a layer of Metsuki Resist 04) on the entire surface using a dipping method, etc.
With Bachlor etc., register the top of the wire m<4>) (
This can be easily achieved by peeling off 14) or by applying a plating resist θ of about A in the thickness direction of the gauze (1) using a kiss roll coating method or the like.
それぞれの具体例を図面に示す。第4図では、全体にレ
ジス) (1→を塗布した紗(1)がバックロール(1
5)上にロールθ6)で圧着導入され、捲取りロール(
17)により張力を保ちながら捲取られるが、その間に
円板状フェルトの中心に軸孔を設け、シャフトを通し、
締何けたバクロールα8)の高速回転の作用を受け、第
5図の如くワイヤーが交叉する頂部(4)のレジスト0
4)が除去される。Specific examples of each are shown in the drawings. In Figure 4, the gauze (1) coated with Regis (1→) is back roll (1
5) Pressure is introduced onto the top with a roll θ6), and a winding roll (
17), it is rolled up while maintaining tension, but in the meantime, a shaft hole is provided in the center of the disc-shaped felt, and the shaft is passed through it.
Under the action of the high-speed rotation of the tightened Vacrol α8), the resist 0 at the top (4) where the wires intersect as shown in Figure 5
4) is removed.
第6図の例では、正確な回転をするコーティングロール
(19)に耐着して上るレジス) (+4) ヲナイフ
(財)でカウトし、紗(1)にレジストθ→を付着させ
、乾燥ゾーン■υで熱風乾燥すると同時にワイヤー(3
)間のレジスト(1→を吹き飛ばし、第5図同様の部分
的にレジスト塗着した紗(1)を得ることができる。In the example shown in Fig. 6, the coating roll (19) that rotates accurately is coated with a resist (+4) knife, and the resist θ→ is deposited on the gauze (1). ■While drying with hot air using υ, wire (3
By blowing off the resist (1→) between ), it is possible to obtain a partially coated gauze (1) similar to that shown in FIG. 5.
レジスト(1→としては、通常プリント基板製造に使用
されるアルカリ剥離型レジスト、環化ゴ 1ム糸塗料
などを用いることができる。As the resist (1→), an alkaline peelable resist, a cyclized rubber thread paint, etc., which are usually used in the manufacture of printed circuit boards, can be used.
なお、本発明で得られるメタルマスクスクリーン版基材
は、シリンダー(7)から剥離したシート状基材をその
まま平板状スクリーンに適用しても、また端縁を接合し
て円筒状スクリーンに適用してもよい。いずれにしても
、エマルジョンタイプの感光剤を用いた通常のスクリー
ン版では得られない精度なる印刷が可能となる。In addition, the metal mask screen plate base material obtained in the present invention can be applied to a flat screen as it is as a sheet-like base material peeled from the cylinder (7), or applied to a cylindrical screen by joining the edges. It's okay. In any case, it becomes possible to print with precision that cannot be obtained with ordinary screen plates using emulsion type photosensitizers.
第1図は本発明の基材の断面図、第2図は本発明の基材
を用いて作成したスクリーン版の斜視図、第3図は本発
明の実施例で使用する装置の説明図、第4図及び第6図
はそれぞれ紗にレジストを塗着する装置の説明図、第5
図はレジシストを部分塗着した紗の斜視図である。
(1)−・・・・・・・・・・・・・・紗(2)・・・
・・・・・・・・・・・・金属性(3)・・・・・・・
冊・・・ワイヤー(4)・・・・・・・・・・・・・・
・頂部(5)・・・・・・・・・・・曲パターン(6)
・・・・・・・・・・・・・・・メッキ層(7)・・
・・・・・・曲・・・シリンダー(8)−・・・・・・
・・曲・・メッキ浴(9)・・・・・・・・・・・・・
・・モータ00)・・・・・・・・・・・・・・・ベル
ト(1υ・・・・・・・・・・・曲陽極
(ロ)・・曲・・・・・曲クランプ
03)・・・・・・・・・・・・・・・回転軸(14)
−ニー・・・・・・・・・・・レジスト特許用に’J′
1人 中沼アートスクリーン株式会社
代 理 人 新 実 健 部外1名FIG. 1 is a sectional view of the base material of the present invention, FIG. 2 is a perspective view of a screen plate made using the base material of the present invention, and FIG. 3 is an explanatory diagram of the apparatus used in the embodiment of the present invention. Figures 4 and 6 are explanatory diagrams of a device for applying resist to gauze, respectively.
The figure is a perspective view of gauze partially coated with resist. (1)-・・・・・・・・・・・・・・・Gas (2)・・・
・・・・・・・・・・・・Metallicity (3)・・・・・・・
Book...Wire (4)...
・Top (5)... Song pattern (6)
・・・・・・・・・・・・・・・Plating layer (7)・・
・・・・・・Song...Cylinder (8)-・・・・・・
・・Song・・Plating bath (9)・・・・・・・・・・・・・・・
・・Motor 00)・・・・・・・・・・・・・Belt (1υ・・・・・・・・Curved anode (B)・・Curved・・・Curved clamp 03 )・・・・・・・・・・・・Rotation axis (14)
- Knee・・・・・・・・・'J' for resist patent
1 person Representative of Nakanuma Art Screen Co., Ltd. Ken Arata 1 external person
Claims (2)
らシリンダー表面にメッキし、・金属膜を彫成し、その
後、金属性の紗を、その片面が上記金属膜と密スqする
ように、シリンダー上に固定し、再びシリンダーを回転
しながらメッキすることによって、上記金属膜と上記紗
を析出した金属メッキ層で接合し、シリンダーから上記
金属膜と一体化された紗を剥離することを特徴とするメ
タS全3リーン版基材の製法。(1) Immerse the cylinder in a plating bath, plate the cylinder surface while rotating, carve a metal film, and then apply a metallic gauze so that one side of the cylinder is in close contact with the metal film. The metal film and the gauze are joined by the precipitated metal plating layer by being fixed on a cylinder and plated while rotating the cylinder again, and the gauze integrated with the metal film is peeled off from the cylinder. The manufacturing method of Meta S all 3 lean plate base materials.
る頂部を除いてメツキレシストで塗着されており、メツ
キレシストが存在しないワイヤー頂部が上記金属膜と密
着するように、シリンダー上に固定され、メッキされる
ことを特徴とする特許請求の範囲第1項記載のメタ゛ル
くで4!J−ン版基材の製法。(2) The metallic gauze is coated with metsukiresist on one side, except for the top where the wires intersect, and the wire is fixed on the cylinder so that the top of the wire, where there is no meshresist, is in close contact with the metal film. 4! The metal foil according to claim 1, characterized in that it is plated. Method for manufacturing J-n version base material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57173778A JPS5963793A (en) | 1982-10-02 | 1982-10-02 | Method of producing metal mask screen plate base material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57173778A JPS5963793A (en) | 1982-10-02 | 1982-10-02 | Method of producing metal mask screen plate base material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5963793A true JPS5963793A (en) | 1984-04-11 |
Family
ID=15966968
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57173778A Pending JPS5963793A (en) | 1982-10-02 | 1982-10-02 | Method of producing metal mask screen plate base material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5963793A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59169966U (en) * | 1983-04-27 | 1984-11-14 | ロ−ム株式会社 | printing screen |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54156880A (en) * | 1978-05-04 | 1979-12-11 | Kenseido Kagaku Kogyo Kk | Production of sleeve for rotary screen printing |
-
1982
- 1982-10-02 JP JP57173778A patent/JPS5963793A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54156880A (en) * | 1978-05-04 | 1979-12-11 | Kenseido Kagaku Kogyo Kk | Production of sleeve for rotary screen printing |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59169966U (en) * | 1983-04-27 | 1984-11-14 | ロ−ム株式会社 | printing screen |
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