JPS5983152A - フオトレジスト組成物 - Google Patents

フオトレジスト組成物

Info

Publication number
JPS5983152A
JPS5983152A JP57192525A JP19252582A JPS5983152A JP S5983152 A JPS5983152 A JP S5983152A JP 57192525 A JP57192525 A JP 57192525A JP 19252582 A JP19252582 A JP 19252582A JP S5983152 A JPS5983152 A JP S5983152A
Authority
JP
Japan
Prior art keywords
group
meth
acrylate
substituted
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57192525A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0437985B2 (de
Inventor
Makoto Asano
真 浅野
Kiyoharu Hasegawa
長谷川　清春
Kunio Nishihara
邦夫 西原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP57192525A priority Critical patent/JPS5983152A/ja
Publication of JPS5983152A publication Critical patent/JPS5983152A/ja
Publication of JPH0437985B2 publication Critical patent/JPH0437985B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP57192525A 1982-11-04 1982-11-04 フオトレジスト組成物 Granted JPS5983152A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57192525A JPS5983152A (ja) 1982-11-04 1982-11-04 フオトレジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57192525A JPS5983152A (ja) 1982-11-04 1982-11-04 フオトレジスト組成物

Publications (2)

Publication Number Publication Date
JPS5983152A true JPS5983152A (ja) 1984-05-14
JPH0437985B2 JPH0437985B2 (de) 1992-06-23

Family

ID=16292730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57192525A Granted JPS5983152A (ja) 1982-11-04 1982-11-04 フオトレジスト組成物

Country Status (1)

Country Link
JP (1) JPS5983152A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61226747A (ja) * 1985-03-29 1986-10-08 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン 有機シリコン・ポリマ組成物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130701A (en) * 1976-04-26 1977-11-02 Dynachem Corp Dye componds of new photootropy and photoosensitive composition containing same
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
JPS57107882A (en) * 1980-12-26 1982-07-05 Mitsui Toatsu Chem Inc Pressure sensitive reproduction recording unit
JPS57135191A (en) * 1981-02-16 1982-08-20 Mitsui Toatsu Chem Inc Dye-containing microcapsule liquid for recording material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130701A (en) * 1976-04-26 1977-11-02 Dynachem Corp Dye componds of new photootropy and photoosensitive composition containing same
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
JPS57107882A (en) * 1980-12-26 1982-07-05 Mitsui Toatsu Chem Inc Pressure sensitive reproduction recording unit
JPS57135191A (en) * 1981-02-16 1982-08-20 Mitsui Toatsu Chem Inc Dye-containing microcapsule liquid for recording material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61226747A (ja) * 1985-03-29 1986-10-08 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン 有機シリコン・ポリマ組成物

Also Published As

Publication number Publication date
JPH0437985B2 (de) 1992-06-23

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