JPS5984529A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS5984529A
JPS5984529A JP57195558A JP19555882A JPS5984529A JP S5984529 A JPS5984529 A JP S5984529A JP 57195558 A JP57195558 A JP 57195558A JP 19555882 A JP19555882 A JP 19555882A JP S5984529 A JPS5984529 A JP S5984529A
Authority
JP
Japan
Prior art keywords
film
photoresist
photorenost
processed
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57195558A
Other languages
English (en)
Japanese (ja)
Other versions
JPH045260B2 (2
Inventor
Toshio Sonobe
園部　俊夫
Masakazu Terada
雅一 寺田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP57195558A priority Critical patent/JPS5984529A/ja
Publication of JPS5984529A publication Critical patent/JPS5984529A/ja
Publication of JPH045260B2 publication Critical patent/JPH045260B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
JP57195558A 1982-11-08 1982-11-08 パタ−ン形成方法 Granted JPS5984529A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57195558A JPS5984529A (ja) 1982-11-08 1982-11-08 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57195558A JPS5984529A (ja) 1982-11-08 1982-11-08 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS5984529A true JPS5984529A (ja) 1984-05-16
JPH045260B2 JPH045260B2 (2) 1992-01-30

Family

ID=16343103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57195558A Granted JPS5984529A (ja) 1982-11-08 1982-11-08 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS5984529A (2)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63261836A (ja) * 1987-04-20 1988-10-28 Nec Corp 縮小投影露光法によるテ−パ−形成方法
JPH0228923A (ja) * 1988-07-18 1990-01-31 Sharp Corp 半導体装置の製造方法
JPH04348030A (ja) * 1990-07-31 1992-12-03 Gold Star Co Ltd 傾斜エッチング法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51117136A (en) * 1975-04-09 1976-10-15 Tokyo Shibaura Electric Co Plasma etching process
JPS5255867A (en) * 1975-11-04 1977-05-07 Toshiba Corp Exposure method
JPS5775431A (en) * 1980-10-28 1982-05-12 Fujitsu Ltd Formation of pattern

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51117136A (en) * 1975-04-09 1976-10-15 Tokyo Shibaura Electric Co Plasma etching process
JPS5255867A (en) * 1975-11-04 1977-05-07 Toshiba Corp Exposure method
JPS5775431A (en) * 1980-10-28 1982-05-12 Fujitsu Ltd Formation of pattern

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63261836A (ja) * 1987-04-20 1988-10-28 Nec Corp 縮小投影露光法によるテ−パ−形成方法
JPH0228923A (ja) * 1988-07-18 1990-01-31 Sharp Corp 半導体装置の製造方法
JPH04348030A (ja) * 1990-07-31 1992-12-03 Gold Star Co Ltd 傾斜エッチング法

Also Published As

Publication number Publication date
JPH045260B2 (2) 1992-01-30

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