JPS60131995A - Continuous plating method of terminal part of printed wiring board - Google Patents
Continuous plating method of terminal part of printed wiring boardInfo
- Publication number
- JPS60131995A JPS60131995A JP23887183A JP23887183A JPS60131995A JP S60131995 A JPS60131995 A JP S60131995A JP 23887183 A JP23887183 A JP 23887183A JP 23887183 A JP23887183 A JP 23887183A JP S60131995 A JPS60131995 A JP S60131995A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- board
- liquid
- terminal part
- gates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing of the conductive pattern
- H05K3/241—Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
Landscapes
- Structure Of Printed Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はグリ/ト配線基板の端子部の連続めつき方法の
改良に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a continuous plating method for terminal portions of grid/grid wiring boards.
近年のめつき方法は、高速化が常であシ、その為には在
来の様に単にめっき処理液中に被処理物を懸垂浸゛演し
、環気分解によりめっき処理を行う方法では限界がある
ため、被めっき物音動揺させたり、有圧めつき処理液を
噴射してめっき部分表面の液撹拌(液父換)を行う等で
高速化が図られる事は周知の事実である。併し”乍ら噴
射方式は何れも吐出用の孔やスリットより被めつき物に
向けて有圧めつき液全液中、又は大気中で吐出接触させ
て処理する方法である。In recent years, plating methods have always required higher speeds, and for this purpose, the conventional method of simply suspending and immersing the object in a plating solution and plating using ring gas decomposition has become more difficult. It is a well-known fact that since there is a limit, speeding up can be achieved by agitating the plating object or spraying a pressurized plating treatment liquid to stir the liquid (liquid exchange) on the surface of the plated part. However, in all of the injection methods, treatment is carried out by discharging the plating liquid from a discharge hole or slit toward the object to be plated, either in the entire pressurized plating solution or in the atmosphere.
ところでグリント配線基板の端子(接栓)への貴釡極め
つき処理は、グリント配線基板製造の最終的処理工程で
あり、被ぬつき部分以外の配線回路は汚れ全許されない
ので、処理液の飛沫により障害を受け無いため、被めっ
き部分以外の配線回路部にグラスチック製の粘看保蝕シ
ートi貼り付けて保級葡しながら処理?しているのが一
般的であるが、出来nば商価で手間の掛る保護シートを
盛観としない処理方法が理想である。しかし前記有圧循
環めつき処理液を小さい孔、あるいはスリットより吐出
させる方法では、飛沫発生防止は出来ず保欣シートと合
せ、処理槽上部にシールバッキング等の仕切を設は処理
液の飛沫による影響の部間を少なくする様な対策を図っ
ているのが現状である。By the way, the process of plating the terminals (connections) of the glint wiring board is the final process in the manufacturing of the glint wiring board, and the wiring circuits other than the parts to be glued are not allowed to get dirty, so there is no risk of splashing the processing liquid. In order to avoid any damage, a glass-based anti-corrosion sheet is pasted on the wiring circuit area other than the part to be plated and treated while being protected. However, if possible, it would be ideal to have a treatment method that does not involve the use of commercially expensive and time-consuming protective sheets. However, the above-mentioned method of discharging the pressure-circulating plating processing liquid through a small hole or slit cannot prevent the generation of splashes. Currently, measures are being taken to reduce the number of departments affected.
本願はプリント配線基板の端子部へのめつき処理全目的
としたもので、従来法と全く異る画期的な高速めつき手
段で、其の要旨とするところは、めつき槽内に9’に設
けて、ちょうどダムを越えて水が曝布の如く流下する如
くにめっき液が流下する流下層に、プリント配線基板の
端子部を接しせしめることにより液又換を行いつつ基板
を搬送して連U【・めっき処理することを特徴とするも
のである。This application is for the purpose of plating the terminals of printed wiring boards, and is an innovative high-speed plating method that is completely different from conventional methods. The terminals of the printed wiring board are brought into contact with the flowing layer where the plating solution flows down, just as water flows down over a dam, and the board is transported while the solution is being exchanged. It is characterized by being plated.
以下図1を参照しながら実施例につき其の詳細全欧、明
する。第1図は本発明による改良前のプリント配線基板
の端子部連続めっき装置の要部で、プリント配線基板l
は図で背面側1より牛前正l側へ一シ送ベルト8により
一定速度にて送られて、被めっき処理部である端子部2
が液中噴射方式にてめっきされるもので、めっき液4は
図で下方より矢印に従い圧力室5に圧送され、ノズル7
よりめっき深手中に噴射して、端子部2をめっきしてい
る状態を示し、ている。そして噴射後のめつき液は無圧
めつき槽6に入り図で両側よりオーバーフローして以後
常法によりめっき液4は循甲するものである。本願は前
記の如き噴射によるめっき液の更新方式を打破して、第
2図の如く無圧のめつき槽11内に堰8を設けて流下循
環するめつき液に漬してめっき液の架新?行うものであ
る。The details of the embodiment will be explained below with reference to FIG. Figure 1 shows the main parts of a continuous plating device for printed wiring board terminals before the improvement according to the present invention.
In the figure, the terminal part 2, which is the part to be plated, is sent from the back side 1 to the front front side at a constant speed by the feeding belt 8.
The plating solution is plated using a submerged injection method, and the plating solution 4 is force-fed from below to the pressure chamber 5 according to the arrow in the figure, and is then passed through the nozzle 7.
This figure shows a state in which the terminal portion 2 is being plated by spraying the plating to a deeper depth. After the injection, the plating solution enters the pressureless plating tank 6 and overflows from both sides as shown in the figure, after which the plating solution 4 is circulated in a conventional manner. The present application breaks down the above-described method of renewing the plating solution by injection, and renews the plating solution by installing a weir 8 in the pressureless plating tank 11 as shown in Fig. 2 and immersing it in the plating solution flowing down and circulating. ? It is something to do.
実施例である誹λ図は本発明の要部を示すもので此の場
合プリント配線基板1(以下基板lという)の端子部2
は其の表裏共にめっき処理される。The λ diagram, which is an example, shows the main part of the present invention, and in this case, a terminal part 2 of a printed wiring board 1 (hereinafter referred to as board 1).
Both the front and back sides are plated.
基板lは、常法により左右一対の無端ベルトによ171
!¥1で背面側より正面細手n1tの方に水平に搬送さ
れ得る。なお搬送ベルト8の狭面側には給1.ワイヤー
9が埋没されている。そして搬送ベルトはパツクアツf
lfイド10によって支持されているので一定位It1
に常に保って水平に手前の方に基板lを挾持して搬送す
る。なお10’はノ寸ツクアッグフレームでエアシリン
ダー16と連結しガイド1o1ft押圧支承している。The board l is attached to the left and right pair of endless belts 171 by a conventional method.
! For ¥1, it can be transported horizontally from the back side to the front narrow side n1t. Note that there is a feeder 1 on the narrow side of the conveyor belt 8. Wire 9 is buried. And the conveyor belt is packed
Since it is supported by the lf id 10, the constant level It1
The substrate 1 is held horizontally toward the front while being held at all times. Note that 10' is a square frame connected to the air cylinder 16 and supported by pressing a guide 101 ft.
次に本願の壁部であるめっき処理室を説明すると11は
めつき檜で、槽底にL左右にそれぞれめっき液の管理槽
(貯液槽)より給液を受ける一口12かあり、矢印の如
く整流板1Bを経てメッキ室14内にめっき液は流入す
る。めっき室の長手方向はぼ中央には左右一対の堰8が
互に対向して設け、られて、めっき室は左右に仕切らn
ている。Next, to explain the plating processing chamber which is the wall of this application, number 11 is made of plated cypress, and there are 12 openings on the left and right sides of the tank that receive liquid from the plating solution management tank (liquid storage tank), as shown by the arrows. The plating solution flows into the plating chamber 14 through the current plate 1B. A pair of left and right weirs 8 are provided facing each other in the longitudinal center of the plating chamber, and the plating chamber is partitioned into left and right sides.
ing.
又めつきl1lif)、B板より下方に向けて陽極15
がめつき液中に垂下している。In addition, the anode 15 is placed downward from the B plate.
It is dripping into the liquid.
次に作動を説明すると、常法により図示を略したボンf
f稼動するとめつき液管′fjJ檜よりめっき液を吸引
し・母イf′9r介してめっき液4は矢印の如くめっき
室14内に流入し、流入量だけ堰8の上端8′を越流し
て澤布の如く一対の堰にて形成された狭い流路を流下し
て管理槽へ戻って以後めっき液4Vi伽JIIを繰り返
見す。他方1−りにて張設されてる一対の搬送ベル)8
1に!動させて、引続きめつき用鋤源を辿竜し、所定の
位置にて基板lの端子部全下方にして搬送ベルト3に挾
持せしめる。めつき槽11の入口出口の妻板には基板l
が通過するスリット状の切欠が設けられているので基板
lは搬送ベルト8にて移送されめっき室内に設けられた
左右の堰板間?!遇する。このとき端子部2は堰8を越
流して流下するめつき液層によってめっき処理が行われ
る。Next, to explain the operation, the bomb f (not shown) is
When f is activated, the plating liquid 4 is sucked from the plating liquid pipe 'fjJ and the plating liquid 4 flows into the plating chamber 14 as shown by the arrow through the mother pipe f'9r, and the amount of inflow exceeds the upper end 8' of the weir 8. It flows down a narrow flow path formed by a pair of weirs like Sawabu and returns to the control tank, after which the plating solution 4Vi KaJII is repeatedly viewed. A pair of conveyor bells (one on the other) 8
To 1! Then, continue to trace the plow source for plating, and at a predetermined position, place the terminal part of the board l completely below and clamp it on the conveyor belt 3. The board l is placed on the end plate of the inlet and outlet of the plating tank 11.
Since there is a slit-like notch through which the substrate 1 passes, the substrate l is transferred by the conveyor belt 8 between the left and right weir plates provided in the plating chamber. ! treat At this time, the terminal portion 2 is plated by the plating liquid layer flowing down over the weir 8.
上述の如く堰板部より越流流下する部分でめっき処理が
行わfLるので、被めっき部分での液攪拌(液父換)が
確実に行えて、現在実施されてる他の高速化と同等以上
で、且つ噴射方式と異り処理液間は静かで飛沫の発生は
皆無である。従って保@テーグ、マスキンダテーグの必
要は全く無い。As mentioned above, since the plating process is performed in the area where the flow overflows from the weir plate part, the liquid agitation (liquid exchange) in the part to be plated can be performed reliably, and the speed is equal to or higher than other speed-up processes currently being implemented. And, unlike the injection method, the space between the processing liquids is quiet and no splashes are generated. Therefore, there is no need for Ho@Teeg or Maskinda Teeg.
なお、高度の精密を要する基板端子部のときは際出しチ
ーブのみを付することで十分である。Note that in the case of a board terminal portion that requires a high degree of precision, it is sufficient to attach only the raised chives.
一対の堰板間隙全図示の如く狭くして設けたのは、若し
基板を通過させる隙間を広くすると、液面を保持する為
の循環液量が大となるからである。The reason why the gap between the pair of weir plates is narrowed as shown in the figure is that if the gap through which the substrate passes is widened, the amount of circulating liquid to maintain the liquid level will increase.
又堰板の上端8′の形状′t−11に+の歯状の切り込
みを入れるか、又は対薬品性の布状とすることにより、
電流的に堰板がマスキング効果を見学することを避ける
ことが出来る。Also, by making + tooth-shaped notches in the shape 't-11 of the upper end 8' of the weir plate, or by making it into a chemical-resistant cloth shape,
It is possible to avoid observing the masking effect of the weir plate in terms of current.
次に基板lの片面の端子部のみを前記実施例にてめっき
するときは、例へは右側の一方の給液を稼動しないでめ
つきすnは良い。Next, when plating only the terminal portion on one side of the substrate l in the above embodiment, it is possible to perform the plating without operating one of the liquid supplies on the right side.
以上説明したとおり本発明によれば、噴射方式の如くめ
っき液が飛散しないばかりで無く、ノズル、スリットを
細片しないので液中の異物によるノズル孔を塞ぐことも
なくメンテナンスが容易である。又噴射式の如く循環液
糸にエアーが巻き込み飛散が激しくなることも無く、逆
に越流部がエゼクタ−効果を発揮するため特別な排気等
の必要は無くメッキ室内の空気は槓めでクリーンである
。As explained above, according to the present invention, not only does the plating solution not scatter unlike the injection method, but the nozzle and slit are not broken into pieces, so the nozzle hole is not blocked by foreign matter in the solution, and maintenance is easy. In addition, there is no need for air to get caught up in the circulating liquid thread and result in severe scattering, as is the case with the injection type.On the contrary, the overflow section exerts an ejector effect, so there is no need for special exhaust, and the air inside the plating chamber is kept clean. be.
そして基板表面に保護シート、マスクキングを付する必
要もなく、飛沫が無いので汚れることも無く構造簡単で
管理も容易である。There is no need to attach a protective sheet or masking to the substrate surface, and there is no splash, so there is no dirt, and the structure is simple and easy to manage.
第1図は液中噴流めっき法による連続めっき装置の縦断
正面図で、館コ図は本発明にょる装置の縦断正面図であ
る。
l・・・グリント配線基板、2・・・端子部、3・・・
搬送ベルト、4・・・めっき液、8・・・堰板、9・・
・給電ワイヤ、11・・・めっき槽%1B・・・整流板
、14・・・めっき室、15・・・陽極。
特許出願人 東洋技研工業株式会社
代理人 弁理士 加 藤 正 門
弟1図
第2図FIG. 1 is a longitudinal sectional front view of a continuous plating apparatus using a submerged jet plating method, and the diagram is a longitudinal sectional front view of the apparatus according to the present invention. l...Glint wiring board, 2...Terminal section, 3...
Conveyor belt, 4... Plating solution, 8... Weir plate, 9...
- Power supply wire, 11... Plating tank %1B... Rectifier plate, 14... Plating chamber, 15... Anode. Patent Applicant Toyo Giken Kogyo Co., Ltd. Agent Patent Attorney Masaru Kato Disciple 1 Figure 2
Claims (2)
ルトに挾持されて移送され、基板の端子部をめつき檜に
て連続馳つきする方法に於て、めつき槽内に堰板を設け
、堰板を越えてめっき液が流下する垂直流下層を形成せ
しめ、他方前記基板の端子部會、前記めっき流下鳩に沿
って対面接触しつつ、基板倉移送してめっき処理するこ
とを特徴とする基板端子部の連続めっき方法。(1) In a method in which a glint wiring board is transported above a plating tank while being held by a conveyor belt, and the terminals of the board are continuously grouted using plating cypress, a weir plate is placed inside the plating tank. A vertical flow layer is formed in which the plating solution flows down over a weir plate, and the terminal portion of the board is in face-to-face contact along the plating flow pipe, and the board is transferred to the hold and plated. Continuous plating method for board terminals.
て、其の間隙をめっき液が流下する流路上端に於て、基
板端子部の表俣面をめっき処理する特許請求の範囲第0
1歩記載の基板端子部の連続めっき方法。(2) A patent for plating the surface of a board terminal at the upper end of a channel where a plating solution flows down through the gap between a pair of weir plates facing each other in a plating bath. Claim No. 0
Continuous plating method for board terminals described in step 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23887183A JPS60131995A (en) | 1983-12-20 | 1983-12-20 | Continuous plating method of terminal part of printed wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23887183A JPS60131995A (en) | 1983-12-20 | 1983-12-20 | Continuous plating method of terminal part of printed wiring board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60131995A true JPS60131995A (en) | 1985-07-13 |
Family
ID=17036494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23887183A Pending JPS60131995A (en) | 1983-12-20 | 1983-12-20 | Continuous plating method of terminal part of printed wiring board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60131995A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6453763U (en) * | 1987-09-29 | 1989-04-03 | ||
| JP2006118019A (en) * | 2004-10-25 | 2006-05-11 | Almex Inc | Surface treatment method and surface treatment apparatus for flat plate shaped object |
| JP2011058098A (en) * | 2010-12-27 | 2011-03-24 | Almex Pe Inc | Surface treatment apparatus of flat plate shape object |
| US20160284571A1 (en) * | 2015-03-24 | 2016-09-29 | Ebara Corporation | Substrate processing apparatus |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS501348A (en) * | 1973-05-10 | 1975-01-08 | ||
| JPS5612295U (en) * | 1979-07-03 | 1981-02-02 | ||
| JPS56136977A (en) * | 1980-03-28 | 1981-10-26 | Sawa Hyomen Giken Kk | Plating and etching apparatus |
-
1983
- 1983-12-20 JP JP23887183A patent/JPS60131995A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS501348A (en) * | 1973-05-10 | 1975-01-08 | ||
| JPS5612295U (en) * | 1979-07-03 | 1981-02-02 | ||
| JPS56136977A (en) * | 1980-03-28 | 1981-10-26 | Sawa Hyomen Giken Kk | Plating and etching apparatus |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6453763U (en) * | 1987-09-29 | 1989-04-03 | ||
| JP2006118019A (en) * | 2004-10-25 | 2006-05-11 | Almex Inc | Surface treatment method and surface treatment apparatus for flat plate shaped object |
| JP2011058098A (en) * | 2010-12-27 | 2011-03-24 | Almex Pe Inc | Surface treatment apparatus of flat plate shape object |
| US20160284571A1 (en) * | 2015-03-24 | 2016-09-29 | Ebara Corporation | Substrate processing apparatus |
| US10468274B2 (en) | 2015-03-24 | 2019-11-05 | Ebara Corporation | Substrate processing apparatus |
| US11024520B2 (en) | 2015-03-24 | 2021-06-01 | Ebara Corporation | Substrate processing apparatus |
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