JPS60168043A - Field effect type sensor - Google Patents

Field effect type sensor

Info

Publication number
JPS60168043A
JPS60168043A JP59023598A JP2359884A JPS60168043A JP S60168043 A JPS60168043 A JP S60168043A JP 59023598 A JP59023598 A JP 59023598A JP 2359884 A JP2359884 A JP 2359884A JP S60168043 A JPS60168043 A JP S60168043A
Authority
JP
Japan
Prior art keywords
film
humidity
fet
sensitive body
fet element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59023598A
Other languages
Japanese (ja)
Other versions
JPH0415902B2 (en
Inventor
Masanori Watanabe
昌規 渡辺
Masaya Masukawa
正也 枅川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP59023598A priority Critical patent/JPS60168043A/en
Priority to US06/697,640 priority patent/US4698657A/en
Priority to GB08503061A priority patent/GB2156150B/en
Priority to DE19853504401 priority patent/DE3504401A1/en
Publication of JPS60168043A publication Critical patent/JPS60168043A/en
Publication of JPH0415902B2 publication Critical patent/JPH0415902B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403Cells and electrode assemblies
    • G01N27/414Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
    • G01N27/4141Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS specially adapted for gases

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  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To suppress an influence exerted on an FET element by impurities and an ion, and to obtain a stable output characteristic for a long period of time by coupling as one body an induction body and the FET element, and providing an auxiliary electrode on an interface of the induction body and the FET element. CONSTITUTION:An n channel FET of a MOS type consists of a p type silicon substrate 1, a source 2, a drain 3, an SiO2 film 5, an electrode use electric conductor film 6, and an Si3N4 film 7, and between an induction body consisting of a humidity sensible body 9 and a gate electrode 10 having a humidity transmitting property on the gate insulating films 5, 7, and the FET element, a conductive blocking film 8 is provided in order to obtain a humidity sensor which is stable for a long period of time. An electrostatic capacity of the humidity sensible body 9 is varied in accordance with humidity in an open atmosphere, therefore, humidity is detected as a variation of a drain current under a constant voltage impressed to the electrode film 10. Since the film 8 is provided, it is obstructed theat impurities and an ion are diffused to the gate insulating films 5, 7, and a stable output characteristic is obtained for a long period of time.

Description

【発明の詳細な説明】 く技術分野〉 本発明は、MOS型或はMIS型等の電界効果トランジ
ヌター(以下単にFETと略ス)の/7’−1・絶縁膜
上に外的安置によって電気的特性の変化する感応体を形
成し、該感応体で外的要因の変化をFETのゲート作用
変化として把えるいわゆるFET5センサに関するもの
である。
Detailed Description of the Invention [Technical Field] The present invention relates to a field effect transistor (hereinafter simply abbreviated as FET) such as a MOS type or MIS type. The present invention relates to a so-called FET5 sensor, which forms a sensitive body whose external characteristics change, and uses the sensitive body to detect changes in external factors as changes in the gate action of an FET.

〈発明の背景〉 検出しようとする物理量との化学的或は物理的相互作用
によって静電容量や電気伝導度或は静電電位寺の°11
i、気的変化を生ずる感応体とF E T素子とを組み
合せて、検出しようとする物理量をFET素子のゲート
作用変化として把えるいわゆるFET型センサは、FE
T素子の有する高い入力インピーダンスとその増幅作用
を巧みに利用することにより高出力でかつ小形のセンサ
となるものであり、実用上好ましいセンサである。特に
、FET素子のゲート部の上に感応体を形成した構造か
らなるFET型センサは、素子寸法も小さく設定するこ
とができかつ同一基板上に極めて多くの素子を形成する
ことが可能であるため、犬用上も、コスト面でも好まし
い形態である。しかしこの場合通常の単体FET素子の
場合以上にFET素子の動作安定性ひいてはF E T
型センサとしての出力の安定性や特性の再現性の確保に
留意する必要がある。即ち、目的とするセンサの種類に
よって、感応体の材料は勿論作製方法も大きく異なるた
めに、通常の単体F E T素子の形体とは追った配慮
が必要であシ、FET素子の動作特性も感応体材料及び
その作製方法によって大幅に変化する。特に、感応体材
料によっては、多量の不純物やイオン含有していること
あるいはFET素子上KPi応体を形成する工程におい
て感応体とゲート絶縁膜等の界面に不純物やイオンを混
入する可能性が通常の単体FET素子を形成する場合に
比べて(hイめで高いことなどが原因となって、FET
素子の動作特性更にはFET型センサの出力特性が不安
定となり易い。更に、ガスセンサや湿度センサ等のいわ
ゆる雰囲気センサをFET型センサとして構成する場合
には、外界囲気に直接センサ素子がさらされることから
、外界囲気からの不純物の混入や拡散によっても、FE
T特性の変動や劣化を招く。このように感応体材料中の
不純物やイオン或は作製工程中もしくは使用中に混入す
る不純物やイオンがFET素子の動作特性やセンサ出力
に与える影響を抑制し、長期間安定した出力特性を呈す
るFET型センサとすることは、ガスセンサ、湿度セン
サ、イオンセンサ、バイオセンサまたは赤外線センサ等
々の各種センサのFET化における共通課題である。特
に、FET型のガスセンサ、湿度センサ、イオンセンサ
及びバイオセンサにおいでは、感応体との直接的な相互
作用が必要であるためパンケージ等によってセンサ素子
を覆うことができないだけに、上記問題の解決は極めて
重゛次である。上記問題の解決策の1つとしてイオンや
水分の拡散係数の小さい鼠化シリコン膜をゲート絶縁膜
として使用したりFET素子表面を窒化シリコン膜で被
覆する等の素子構造が開発されているが、長期間の安定
性の点で問題があり、必ずしも充分ではない。
<Background of the Invention> The degree of capacitance, electrical conductivity, or electrostatic potential is increased by chemical or physical interaction with the physical quantity to be detected.
i. The so-called FET type sensor, which combines a sensitive body that causes a gaseous change and an FET element, and grasps the physical quantity to be detected as a change in the gate action of the FET element, is
By skillfully utilizing the high input impedance of the T-element and its amplification effect, a high-output and small-sized sensor can be obtained, making it a practically preferable sensor. In particular, FET type sensors, which have a structure in which a sensitive body is formed on the gate part of an FET element, allow the element size to be set small, and it is possible to form an extremely large number of elements on the same substrate. This is a preferable form both for dogs and in terms of cost. However, in this case, the operational stability of the FET element, and hence the FET
It is necessary to pay attention to ensuring the stability of the output and the reproducibility of the characteristics as a type sensor. In other words, since the material of the sensitive body and the manufacturing method vary greatly depending on the type of sensor intended, special consideration must be given to the shape of a normal single FET element, and the operating characteristics of the FET element also vary. It varies greatly depending on the susceptor material and its manufacturing method. In particular, depending on the sensitive material, there is a possibility that it may contain a large amount of impurities or ions, or that impurities or ions may be mixed into the interface between the sensitive material and the gate insulating film during the process of forming the KPi reactive material on the FET element. Compared to the case of forming a single FET element, the FET
The operating characteristics of the element and the output characteristics of the FET type sensor tend to become unstable. Furthermore, when a so-called atmosphere sensor such as a gas sensor or a humidity sensor is configured as an FET type sensor, the sensor element is directly exposed to the outside environment, so the FE
This causes fluctuations and deterioration of T characteristics. In this way, the influence of impurities and ions in the sensor material, or impurities and ions mixed during the manufacturing process or during use, on the operating characteristics and sensor output of the FET element is suppressed, and the FET exhibits stable output characteristics over a long period of time. The use of FET type sensors is a common problem in converting various sensors such as gas sensors, humidity sensors, ion sensors, biosensors, or infrared sensors into FETs. In particular, FET-type gas sensors, humidity sensors, ion sensors, and biosensors require direct interaction with the sensing body, so it is not possible to cover the sensor element with a pancage, etc., so it is difficult to solve the above problem. It is extremely important. As one solution to the above problems, device structures have been developed in which a silicon nitride film with a small diffusion coefficient for ions and moisture is used as a gate insulating film, and the surface of the FET element is covered with a silicon nitride film. There are problems with long-term stability, and it is not always sufficient.

〈発明の目的〉 本発明は、以上のような背景に基づいてなされたもので
あり、感応体や感応体とFET素子との界面に含有され
る不純物やイオンあるいは使用中に素子外部から混入す
る不純物やイオンがFET素子の動作や出力に与える影
豐を抑制し、長期間安定した出力特性が得られるFET
型センサを提供することを目的とするものである。
<Objective of the Invention> The present invention has been made based on the above background, and is aimed at preventing impurities and ions contained in the sensing body or the interface between the sensing body and the FET element, or mixed in from outside the element during use. FET that suppresses the influence of impurities and ions on FET element operation and output, and provides stable output characteristics over a long period of time.
The purpose of the present invention is to provide a type sensor.

〈実施例〉 第1図は本発明の1実施例を示すFET型湿度センサの
構造断面図である。第2図は同センザの動作原理を説明
するための等価回路図である。
<Embodiment> FIG. 1 is a structural sectional view of an FET type humidity sensor showing one embodiment of the present invention. FIG. 2 is an equivalent circuit diagram for explaining the operating principle of the sensor.

本実施例におけるFET素子は、MOS型のnチャンネ
zlz F E Tで、p型のシリコン基板1表面付近
に燐を拡散することによってn型のソース2とドレイン
3を並設して形成している。シリコン基板1上にはソー
ス2及びドレイン3でスルホールを有する二酸化シリコ
ン膜5が被覆されている。
The FET element in this embodiment is a MOS type n-channel zlz FET, and an n-type source 2 and drain 3 are formed in parallel by diffusing phosphorus near the surface of a p-type silicon substrate 1. There is. A silicon substrate 1 is covered with a silicon dioxide film 5 having a through hole with a source 2 and a drain 3 .

ゲート絶縁11ラキは、ソース2とドレイン3を結ぶシ
リコン基板1」二に堆積された二酸化シリコン膜(51
02)5と窒化シリコン膜(SiaN4)7との2重積
層膜からなシ、窒化シリコン膜7は更にソース2及びド
レイン3に片端が接触してシリコン基板1及び二酸化シ
リコン膜5上に堆積されたt[tk用導体膜6の上面を
も被覆し、FET素子の保護膜としての機能も兼ねてい
る。ゲート絶縁膜5.7上には感湿体9と透湿性のゲー
ト電極膜1゜が積層されるか、ここで感湿体9と屋化シ
リコン膜7との界面には導電性膜から成るブロッキング
膜8を挿入した構造となっている。ブロッキング膜8は
感湿体9に対して後述するドリフト解除用の電圧を印加
する補助ITJMとなるものである。本実施例に於いて
は感湿体9を熱焼成によって結晶化したポリビニルアル
コ−/l/膜又はアセチノにセルロース膜で形成したが
有機若しくは無機の固体電解質膜まだは酸化アルミニウ
ム等の金属酸化膜をJ#」いてもよい。また透湿性ゲー
ト電極膜1oとしては厚さ約100λの金蒸着膜を、ま
たブロッキング膜8としては厚さ約2.oooAの金又
はアルミニウム蒸着膜を用いた。但し、これらの素子構
成材料は必ずしも上述のものに限定されるものではなく
、その他の適当な材料に代替することは当然に可能であ
る。また感湿体9以外にも感ガス体、感イオン体、その
他化学物質や熱・光等に感応するものを使用できFET
素子はMO8型以外のMIs型等を使用することもでき
る。
The gate insulator 11 consists of a silicon dioxide film (51
02) 5 and a silicon nitride film (SiaN4) 7, the silicon nitride film 7 is further deposited on the silicon substrate 1 and the silicon dioxide film 5 with one end in contact with the source 2 and drain 3. It also covers the upper surface of the conductive film 6 for t[tk, and also functions as a protective film for the FET element. A moisture sensitive body 9 and a moisture permeable gate electrode film 1° are laminated on the gate insulating film 5.7, or a conductive film is formed at the interface between the moisture sensitive body 9 and the silicon oxide film 7. It has a structure in which a blocking film 8 is inserted. The blocking film 8 serves as an auxiliary ITJM for applying a voltage for canceling drift, which will be described later, to the moisture sensitive element 9. In this embodiment, the moisture sensitive body 9 is formed of a polyvinyl alcohol/l/film crystallized by thermal calcination or a cellulose film on acetate, but an organic or inorganic solid electrolyte film or a metal oxide film such as aluminum oxide is used. J#" may be used. The moisture-permeable gate electrode film 1o is a gold vapor deposited film with a thickness of about 100λ, and the blocking film 8 is a gold vapor-deposited film with a thickness of about 2. oooA gold or aluminum vapor deposited film was used. However, these element constituent materials are not necessarily limited to those mentioned above, and it is naturally possible to substitute other suitable materials. In addition to the moisture-sensitive body 9, gas-sensitive bodies, ion-sensitive bodies, and other substances sensitive to chemical substances, heat, light, etc. can be used.
As the element, an MIs type other than the MO8 type can also be used.

次に第2図の等価回路図に従って上記構成を有するFE
T型湿度センサの動作原理と特徴を説明する。等価回路
図に於いて、容量Cs及びCiは夫4第1図に於ける感
湿体9と2層ゲート絶縁膜5.7の静電容量を示す。又
、RLはドレイン電極6と直列に結合したロード抵抗を
示し、RBはブロッキング膜8と直列に結合した抵抗を
示す。
Next, the FE having the above configuration according to the equivalent circuit diagram in FIG.
The operating principle and features of the T-type humidity sensor will be explained. In the equivalent circuit diagram, capacitances Cs and Ci represent the capacitances of the moisture sensitive element 9 and the two-layer gate insulating film 5.7 in FIG. Further, RL indicates a load resistance coupled in series with the drain electrode 6, and RB indicates a resistance coupled in series with the blocking film 8.

まず、FET型湿度センサの基本動作に関する説明を容
易にするために、ブロッキング膜8が無く感湿体9が直
接ゲート絶縁膜5,7に接して形成されている場合、即
ち等価回路図に於いて抵抗体RBがない場合について述
べる。
First, in order to facilitate the explanation of the basic operation of the FET type humidity sensor, we will explain the case in which there is no blocking film 8 and the moisture sensitive element 9 is formed in direct contact with the gate insulating films 5 and 7, that is, in the equivalent circuit diagram. The case where there is no resistor RB will be described.

透湿性のゲート′IE極膜10に印加する電圧をVAと
し、FET素子の閾値電圧をvthとすると、ドレイン
電流IDは次式によって与えられる。
When the voltage applied to the moisture permeable gate electrode film 10 is VA and the threshold voltage of the FET element is vth, the drain current ID is given by the following equation.

但し、(1)式に於いてμmはキャリア移動度、L及び
Wは夫々FETのチャンネル長及びチャンネル幅を示す
。また、Cはゲート絶縁膜の静電容量Ciと感湿体9の
静電容量Csを直列結合した場合の静電容量であり、 と書き表わされる。従って、感湿体9の静電容量Csが
外界囲気中の湿度に応じて変化することによって、■い
一定の条件下で、ドレイン電流ID変化として湿度を検
知することができる。
However, in equation (1), μm represents carrier mobility, and L and W represent the channel length and channel width of the FET, respectively. Further, C is the capacitance when the capacitance Ci of the gate insulating film and the capacitance Cs of the moisture sensitive element 9 are coupled in series, and is expressed as follows. Therefore, by changing the capacitance Cs of the humidity sensing element 9 in accordance with the humidity in the surrounding air, humidity can be detected as a change in the drain current ID under certain conditions.

以上がFET型湿度センサの基本的な動作原理である。The above is the basic operating principle of the FET type humidity sensor.

しかしながら、上述の動作に於いては当然のことながら
感湿体90両面に直流的な電位差が存在するために、特
に感湿体9中になんらかの不純物イオンが存在している
場合には、電界によってこれら不純物イオンの移動、再
配列並びに局在化が生じる。その結果、FET素子のチ
ャンネル部に素子特性面で顕著な影響を与え、閾値電圧
Vt11の変動を引き起し、FET素子の動作特性ひい
ては湿度センサとしての出力信号の経時変化(ドリフト
)の大きな原因となる。感湿体9と透湿性ゲート′市極
膜10との界面及びゲート絶縁膜5.7との界面に不純
物イオンが存在する場合に於いても同様な現象が生じる
。しかも、先に述べた様に、外界囲気からの不純物イオ
ンの混入も避けることが困難であり、従って上記問題を
解決することはF E T型温度センサに於いては極め
て重要な課題である。
However, in the above-mentioned operation, as a matter of course, there is a direct current potential difference between both sides of the moisture sensitive element 90, so if some impurity ions are present in the moisture sensitive element 9, the electric field may Movement, rearrangement and localization of these impurity ions occur. As a result, this has a significant effect on the channel section of the FET element in terms of element characteristics, causing fluctuations in the threshold voltage Vt11, and is a major cause of changes over time (drift) in the operating characteristics of the FET element and the output signal as a humidity sensor. becomes. A similar phenomenon occurs when impurity ions are present at the interface between the moisture sensitive body 9 and the moisture permeable gate electrode film 10 and at the interface with the gate insulating film 5.7. Moreover, as mentioned above, it is difficult to avoid the contamination of impurity ions from the external atmosphere, and therefore, solving the above problem is an extremely important issue in FET type temperature sensors.

上述した問題を基本的に解決し、長期間安定したFET
型湿度センサを得るために、本実施例のFET型湿度セ
ンサの構造的な特徴は第1図に示した様に、感湿体9と
ゲート絶縁膜5,7との間に導電性ブロッキング膜8を
介設したことにある。
A FET that basically solves the above problems and is stable for a long time.
In order to obtain a type humidity sensor, the structural feature of the FET type humidity sensor of this embodiment is as shown in FIG. This is due to the intervention of 8.

そして第2図の等価回路図に示すようにブロッキング膜
8と感湿体9の表面に被7i’7した透湿性ゲート電極
膜10とを抵抗RBを介して結合し、印加電圧VAを直
流電圧VA(DC)とこれに重畳する周波数fの交流電
圧VA(AC)とすることによって、FET素子の駆動
を行なう。直流の印加電圧VA(t)C)がゲート絶縁
膜の耐圧より充分小さく、ゲート絶縁膜によるリーク電
流かない場合には、フロンキング膜8にかかる実効的な
ゲートtに、圧■Gの直流成分VG(DC)はVA(D
C)と等しくなって感湿体9の両面に直流的な電位差は
生じない。
Then, as shown in the equivalent circuit diagram of FIG. 2, the blocking film 8 and the moisture permeable gate electrode film 10 coated on the surface of the moisture sensitive element 9 are coupled via a resistor RB, and the applied voltage VA is changed to a DC voltage. The FET element is driven by VA (DC) and an alternating current voltage VA (AC) of frequency f superimposed thereon. If the applied DC voltage VA(t)C) is sufficiently smaller than the withstand voltage of the gate insulating film and there is no leakage current from the gate insulating film, the direct current component of the pressure G will be applied to the effective gate t applied to the fronting film 8. VG(DC) is VA(D
C), and no direct current potential difference occurs on both sides of the humidity sensitive element 9.

このために先に述べた不純物イオンの移動、再配列、局
在化等の現象は抑止され更にフロンキング膜8の存在に
よってこれら不純物イオンのゲート絶縁膜中への拡散が
阻止される。しかしこの場合、常にVG(DC)はvA
(DC)に等しいため、VA(DC)のみによっては湿
度センサとして動作しないことは勿論である。直流印加
電圧VA(DC)は、F E T素子のI D−VG特
性において最適バイアス電圧を与える機能を果す。湿度
センサとして、駆動するため即ち感湿体の静電界[iC
sの湿度による変化を検知するためには交流の印加電圧
VA(AC)を必要とする。
Therefore, the above-mentioned phenomena such as movement, rearrangement, and localization of impurity ions are suppressed, and furthermore, the presence of the fronting film 8 prevents these impurity ions from diffusing into the gate insulating film. However, in this case, VG(DC) is always vA
(DC), it goes without saying that the humidity sensor cannot be operated only by VA (DC). The DC applied voltage VA (DC) functions to provide the optimum bias voltage in the ID-VG characteristics of the FET element. As a humidity sensor, in order to drive it, that is, the electrostatic field [iC
In order to detect changes in s due to humidity, an alternating current applied voltage VA (AC) is required.

周波数fにおける感湿体のインピーダンス;(27If
Cs) ’に比べて充分大きな抵抗値を有する抵抗RB
をブロッキング膜8と透湿性ゲート電極膜10との間に
結合した場合には、RBは無視することができ、VGの
交流成分VG(AC)は次式によって与えられる。
Impedance of the humidity sensitive body at frequency f; (27If
Cs) 'Resistor RB having a sufficiently large resistance value compared to '
is coupled between the blocking film 8 and the moisture permeable gate electrode film 10, RB can be ignored and the alternating current component VG(AC) of VG is given by the following equation.

即ち、一定の振幅をもったVA(AC)の印加条件下に
於いて、VG(AC)は、感湿体の静電界量Csの値に
よって変化するため、湿度センサとしての出力信号をド
レイン電流IDの交流振幅として取り出すことができる
That is, under the condition of applying VA (AC) with a constant amplitude, VG (AC) changes depending on the value of the electrostatic field Cs of the humidity sensor, so the output signal as a humidity sensor is It can be extracted as the AC amplitude of ID.

第3図に上記実施例のFET型湿度センサの出力対相対
湿度特性を示す。尚、第3図は感湿体9として熱焼成し
たアセチルセルロース膜を用い、固定抵抗RB及びRL
を夫々IOMΩ、IKΩとし、VA(DC)=5V、V
A(AC)=100mVrms(10KHz )で駆動
した時の室温での出力対相対湿度特性の実測例である。
FIG. 3 shows the output versus relative humidity characteristics of the FET type humidity sensor of the above embodiment. In addition, in FIG. 3, a heat-sintered acetyl cellulose film is used as the moisture sensitive element 9, and fixed resistors RB and RL are used.
are IOMΩ and IKΩ, respectively, and VA (DC) = 5V, V
This is an actual measurement example of output versus relative humidity characteristics at room temperature when driven at A(AC)=100 mVrms (10 KHz).

次に、本実施例になるF E T型湿度センサの出力安
定性を示す実験例として室内放置した素子の放置時間と
相対湿度60%におけるセンサ出力との関係を実測し第
4図に示す。尚、第4図には比較のためにブロッキング
膜8を用いた場合(A)とブロッキング膜8を用いずに
感湿体(アセチルセルロース膜)9を直接ゲート絶縁膜
7の上に形成した場合(B)の夫々について放置時間対
出力の関係を示した。イ旧−画素子の駆動条件及び測定
条件は同一とし、夫々のセンサ出力は、初期値を規準と
した。第4図に見られる如く、ブロッキング膜8の効果
は極めて大きく、センサ出力は長期間安定に保たれるこ
とが実証された。又FET素子の特性、例えばドレイン
電流(ID)対ドレイン電圧(VD5)特性やドレイン
電流(ID)対ゲート電圧(VG)特性についても、経
時変化がなく特性の再現性も極めて優れていることが確
認された。一方、ブロッキング膜8を用いない場合、即
ち第4図の(B)の場合にはF’ET素子のID vo
s特性及びID−■G特性共に大きな経時変化を生じ、
特性の再現性も極めて悪いものであった。しかも、v6
の0N−OFF或はVGの極性をいったん逆に印加する
などの操作を行うことによってもF ETのID VD
S特性或はID−V6特性は、初期特性と大幅に異なる
現象が観測されることから、感湿体中或は感湿体とゲー
ト絶縁膜界面に存在律る不純物イオンの電界による移動
や再分布(再配列)の効果がF E T素子の特性に顕
著な影響を与えているものと解釈される。
Next, as an experimental example showing the output stability of the FET type humidity sensor according to this embodiment, the relationship between the leaving time of the element left indoors and the sensor output at a relative humidity of 60% was actually measured and shown in FIG. For comparison, FIG. 4 shows a case (A) in which a blocking film 8 is used and a case in which a moisture sensitive body (acetylcellulose film) 9 is formed directly on the gate insulating film 7 without using a blocking film 8. The relationship between the standing time and the output is shown for each of (B). (a) Old: The driving conditions and measurement conditions of the pixel elements were the same, and each sensor output was based on the initial value. As seen in FIG. 4, it was demonstrated that the effect of the blocking film 8 was extremely large and that the sensor output was kept stable for a long period of time. In addition, the characteristics of FET elements, such as drain current (ID) vs. drain voltage (VD5) characteristics and drain current (ID) vs. gate voltage (VG) characteristics, do not change over time and have extremely excellent reproducibility. confirmed. On the other hand, when the blocking film 8 is not used, that is, in the case of (B) in FIG. 4, the ID vo of the F'ET element is
Both the s characteristic and the ID-■G characteristic undergo large changes over time,
The reproducibility of characteristics was also extremely poor. Moreover, v6
The ID VD of FET can also be changed by applying operations such as turning 0N-OFF or reversing the polarity of VG.
Since the S characteristics or ID-V6 characteristics are observed to exhibit phenomena that are significantly different from the initial characteristics, it is possible that the impurity ions present in the moisture sensitive body or at the interface between the moisture sensitive body and the gate insulating film are moved or regenerated by the electric field. It is interpreted that the effect of distribution (rearrangement) has a significant influence on the characteristics of the FET element.

〈発明の効果〉 以上実施例にて詳説した々11<、本発明は感応体中或
は感応体とFET素子との界面に存在する不純物やイオ
ン及び使用中に外界囲気から混入する不純物やイオンが
FET素子並びにFET型センサとしての出力特性に与
える影響を顕著に抑制する効果を有するため、湿度検知
の場合のみならずガスやイオンの検知更には有機物検知
を対象とするバイオセンサ々どの各種のFET型センサ
の動作特性及び出力特性の長期安定性並びに特性再現性
に多大な効果音もたらすものである。
<Effects of the Invention> As explained in detail in Examples 11 above, the present invention eliminates impurities and ions existing in the sensitive body or at the interface between the sensitive body and the FET element, and impurities and ions mixed in from the surrounding air during use. Because it has the effect of significantly suppressing the influence that it has on the output characteristics of FET elements and FET-type sensors, it is suitable for various types of biosensors, not only for humidity detection, but also for gas and ion detection, as well as organic substance detection. This brings great sound effects to the long-term stability and characteristic reproducibility of the operating characteristics and output characteristics of the FET type sensor.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は夫々本発明の実施例を示すF E 
T型jli!度センサの構造W[面図と等価回路図であ
る。 第3図は第1図に示す湿度センサの出力対相対湿度特性
図、第4図は出力の経時変化を示す特性図である。図中
の曲線Aは第1図のFET型湿度センサについての実測
値を示し、曲線Bは比較のために、ブロッキング膜を用
いない場合のFET型湿度センサの実測値を示す。 ■ ・シ) コアTrF板2−・・ソース 3・・・ド
レイン 5・・・二酸化シリコン膜 7・・・窒化シリ
コン膜 8・・・プロンキング膜 9・・・感湿体 1
0・・・ゲート電極膜 代理人 弁理士 福 士 愛 彦(他2名)b W;1図 0 20 40 60 80 100 a苅簸 (%RH)
FIG. 1 and FIG. 2 show embodiments of the present invention, respectively.
T-type jli! Structure W of the degree sensor (top view and equivalent circuit diagram). FIG. 3 is a characteristic diagram of the output versus relative humidity of the humidity sensor shown in FIG. 1, and FIG. 4 is a characteristic diagram showing the change in output over time. Curve A in the figure shows actual measured values for the FET type humidity sensor in FIG. 1, and curve B shows actual measured values for the FET type humidity sensor when no blocking film is used for comparison. ■ ・C) Core TrF plate 2 - Source 3 Drain 5 Silicon dioxide film 7 Silicon nitride film 8 Pronking film 9 Moisture sensitive element 1
0...Gate electrode membrane agent Patent attorney Aihiko Fukushi (and 2 others) b W; 1 Figure 0 20 40 60 80 100 a.

Claims (1)

【特許請求の範囲】 1 被検知体との物理的或は化学的相互作用によって電
気的変化を生ずる感応体と、電界効果型素子と、を−外
的に結合させてなる電界効果型センサにおいて、前記感
応体のドリフト解除用電圧を印加する補助電極を前記感
応体にイ」役したことを特徴とする電界効果型センサ。 2、補助電極を電界効果型素子のゲート絶縁膜と感応体
の界面に介設し、感応体の他方の面にゲート電極を配設
した特許請求の範囲第1項記載の電界効果型センサ。 3 水蒸気或は水分の吸脱着によって静電容量または電
気伝導度が変化する感湿体を感応体とした特許請求の範
囲第1項又は第2項記載の電界効果型センサ。 4、 感湿体としてセルロース系膜、ビニル系(換。 有機もしくは無機の固体電解質膜または釡属酸化膜を用
いた特許請求の範囲第3項記載の電界効果型センサ。
[Claims] 1. A field-effect sensor in which a field-effect element is externally coupled to a sensitive body that causes an electrical change through physical or chemical interaction with a detected object. . A field effect sensor, characterized in that an auxiliary electrode for applying a voltage for canceling the drift of the sensitive body acts as an auxiliary electrode to the sensitive body. 2. The field effect sensor according to claim 1, wherein an auxiliary electrode is interposed at the interface between the gate insulating film of the field effect element and the sensitive body, and the gate electrode is disposed on the other surface of the sensitive body. 3. The field effect sensor according to claim 1 or 2, wherein the sensing body is a moisture sensitive body whose capacitance or electrical conductivity changes due to adsorption and desorption of water vapor or moisture. 4. The field-effect sensor according to claim 3, which uses a cellulose-based membrane, a vinyl-based (e.g. organic or inorganic) solid electrolyte membrane, or a metal oxide film as the moisture sensitive body.
JP59023598A 1984-02-10 1984-02-10 Field effect type sensor Granted JPS60168043A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP59023598A JPS60168043A (en) 1984-02-10 1984-02-10 Field effect type sensor
US06/697,640 US4698657A (en) 1984-02-10 1985-02-04 FET type sensor and a method for driving the same
GB08503061A GB2156150B (en) 1984-02-10 1985-02-07 Fet with an auxiliary electrode at a sensitive layer
DE19853504401 DE3504401A1 (en) 1984-02-10 1985-02-08 FIELD EFFECT TRANSISTOR TYPE SENSOR AND METHOD FOR OPERATING IT

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59023598A JPS60168043A (en) 1984-02-10 1984-02-10 Field effect type sensor

Publications (2)

Publication Number Publication Date
JPS60168043A true JPS60168043A (en) 1985-08-31
JPH0415902B2 JPH0415902B2 (en) 1992-03-19

Family

ID=12115033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59023598A Granted JPS60168043A (en) 1984-02-10 1984-02-10 Field effect type sensor

Country Status (1)

Country Link
JP (1) JPS60168043A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007533988A (en) * 2004-04-22 2007-11-22 マイクロナス ゲーエムベーハー Method for measuring gas and / or reducing lateral sensitivity in TFT type gas sensor
JP2013525808A (en) * 2010-05-06 2013-06-20 ソウル・ナショナル・ユニバーシティ・アール・アンド・ディ・ファウンデイション Capacitive element sensor and manufacturing method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141699A (en) * 1978-04-26 1979-11-05 Olympus Optical Co Ltd Chemically responding element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54141699A (en) * 1978-04-26 1979-11-05 Olympus Optical Co Ltd Chemically responding element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007533988A (en) * 2004-04-22 2007-11-22 マイクロナス ゲーエムベーハー Method for measuring gas and / or reducing lateral sensitivity in TFT type gas sensor
JP2013525808A (en) * 2010-05-06 2013-06-20 ソウル・ナショナル・ユニバーシティ・アール・アンド・ディ・ファウンデイション Capacitive element sensor and manufacturing method thereof

Also Published As

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