JPS60201336A - レジストパタ−ン形成法 - Google Patents

レジストパタ−ン形成法

Info

Publication number
JPS60201336A
JPS60201336A JP59057335A JP5733584A JPS60201336A JP S60201336 A JPS60201336 A JP S60201336A JP 59057335 A JP59057335 A JP 59057335A JP 5733584 A JP5733584 A JP 5733584A JP S60201336 A JPS60201336 A JP S60201336A
Authority
JP
Japan
Prior art keywords
polymer
resist material
formula
perfluoroalkyl
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59057335A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0513307B2 (fr
Inventor
Hideo Akeyama
朱山　秀雄
Yukihiro Tsutsumi
堤　幸弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Toyo Soda Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Soda Manufacturing Co Ltd filed Critical Toyo Soda Manufacturing Co Ltd
Priority to JP59057335A priority Critical patent/JPS60201336A/ja
Publication of JPS60201336A publication Critical patent/JPS60201336A/ja
Publication of JPH0513307B2 publication Critical patent/JPH0513307B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59057335A 1984-03-27 1984-03-27 レジストパタ−ン形成法 Granted JPS60201336A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59057335A JPS60201336A (ja) 1984-03-27 1984-03-27 レジストパタ−ン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59057335A JPS60201336A (ja) 1984-03-27 1984-03-27 レジストパタ−ン形成法

Publications (2)

Publication Number Publication Date
JPS60201336A true JPS60201336A (ja) 1985-10-11
JPH0513307B2 JPH0513307B2 (fr) 1993-02-22

Family

ID=13052696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59057335A Granted JPS60201336A (ja) 1984-03-27 1984-03-27 レジストパタ−ン形成法

Country Status (1)

Country Link
JP (1) JPS60201336A (fr)

Also Published As

Publication number Publication date
JPH0513307B2 (fr) 1993-02-22

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