JPH0513307B2 - - Google Patents

Info

Publication number
JPH0513307B2
JPH0513307B2 JP59057335A JP5733584A JPH0513307B2 JP H0513307 B2 JPH0513307 B2 JP H0513307B2 JP 59057335 A JP59057335 A JP 59057335A JP 5733584 A JP5733584 A JP 5733584A JP H0513307 B2 JPH0513307 B2 JP H0513307B2
Authority
JP
Japan
Prior art keywords
polymer
synthesis example
formula
value
methylstyrene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59057335A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60201336A (ja
Inventor
Hideo Shuyama
Yukihiro Tsutsumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Priority to JP59057335A priority Critical patent/JPS60201336A/ja
Publication of JPS60201336A publication Critical patent/JPS60201336A/ja
Publication of JPH0513307B2 publication Critical patent/JPH0513307B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59057335A 1984-03-27 1984-03-27 レジストパタ−ン形成法 Granted JPS60201336A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59057335A JPS60201336A (ja) 1984-03-27 1984-03-27 レジストパタ−ン形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59057335A JPS60201336A (ja) 1984-03-27 1984-03-27 レジストパタ−ン形成法

Publications (2)

Publication Number Publication Date
JPS60201336A JPS60201336A (ja) 1985-10-11
JPH0513307B2 true JPH0513307B2 (fr) 1993-02-22

Family

ID=13052696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59057335A Granted JPS60201336A (ja) 1984-03-27 1984-03-27 レジストパタ−ン形成法

Country Status (1)

Country Link
JP (1) JPS60201336A (fr)

Also Published As

Publication number Publication date
JPS60201336A (ja) 1985-10-11

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