JPS60247643A - optical device - Google Patents
optical deviceInfo
- Publication number
- JPS60247643A JPS60247643A JP59103742A JP10374284A JPS60247643A JP S60247643 A JPS60247643 A JP S60247643A JP 59103742 A JP59103742 A JP 59103742A JP 10374284 A JP10374284 A JP 10374284A JP S60247643 A JPS60247643 A JP S60247643A
- Authority
- JP
- Japan
- Prior art keywords
- optical
- optical device
- light
- laser
- optical path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
- G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔技術分野〕
本発明は可干渉性の光を用いて微細パターンを焼き付け
る場合等に、干渉による悪影響を軽減する光学装置に関
する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an optical device that reduces the adverse effects of interference when printing fine patterns using coherent light.
従来LSI等の微細パター、ンな光リングラフィの手法
で焼き付ける半導体露光装置の光源として、主に超高圧
水鍜ランプあるいは超高圧Xe−Hgランプが使われて
いた。ところが近時、光リングラフィの使用波長である
紫外域の光を高出力で発振するレーザー(エキシマレー
ザ−等)が開発され、半導体露光装置の新しい光源とし
て注目されている。一般にレーザー光は高い輝度と指向
性を有するので、光源として使用すると集光光学系の高
効率化が達成されるが、レーザー光特有の強い干渉性が
欠点となる。すなわちレーザー光が干渉することにより
マスク面及び像面においてスペックルが発生し、微細パ
ターン像の再現性が損なわれる。Conventionally, ultra-high-pressure water lamps or ultra-high-pressure Xe-Hg lamps have been mainly used as light sources for semiconductor exposure equipment that prints fine patterns such as LSIs using optical phosphorography techniques. However, recently, lasers (such as excimer lasers) that emit light at high output in the ultraviolet region, which is the wavelength used in photophosphorography, have been developed and are attracting attention as new light sources for semiconductor exposure equipment. Laser light generally has high brightness and directivity, so when used as a light source, high efficiency of a condensing optical system can be achieved, but the strong coherence characteristic of laser light is a drawback. That is, speckles occur on the mask surface and the image surface due to the interference of the laser beams, impairing the reproducibility of fine pattern images.
本発明の目的は上記欠点を除去して光線束の可干渉性を
弱めることにより、レーザー光等を用いて微細パターン
を焼き付けてもスペックルが発生しない光学装置を提供
することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide an optical device in which speckles do not occur even when a fine pattern is printed using a laser beam or the like by eliminating the above drawbacks and weakening the coherence of a beam of light.
以下、本発明の実施例について図面を参照して説明する
。まず本発明の基本概念を第1図に示す。Embodiments of the present invention will be described below with reference to the drawings. First, the basic concept of the present invention is shown in FIG.
lはレーザーである。2は集積回路パターンを有するマ
スクで、マスク2の後方に極近接にもしくは投影系をは
さんでウェハーが配される。3から4までは光線束制御
用光学系である。レーザーlから発したレーザー光は、
光学系3を経てA点でn個の光線束に分岐され、これら
の光線束はそれぞれ点P、 IF5.・・、pnを通過
したのち8点で再び1つになり、多光束発生部材とコリ
メータから成る光学系4を経てマスク2を照射する。と
ころでAP、 B間、AP2B間、・・・・・・、AP
nB間の互いの光路長の差がレーザー光の可干渉距離を
越えるようにしておくと、B点以降では可干渉性が弱め
られ、従ってスペックルの発生を低減することができる
。l is a laser. Reference numeral 2 denotes a mask having an integrated circuit pattern, and a wafer is placed behind the mask 2 in close proximity or with a projection system in between. 3 to 4 are optical systems for controlling the beam flux. The laser light emitted from the laser l is
It passes through the optical system 3 and is branched into n ray bundles at point A, and these ray bundles respectively reach points P, IF5. After passing through . By the way, between AP and B, between AP2B..., AP
If the difference in optical path length between nB is set to exceed the coherence distance of the laser beam, the coherence will be weakened after point B, and the occurrence of speckles can therefore be reduced.
次に本発明の一実施例として第2図にオプティカルファ
イバーを用いた光学装置の構成図を示す。Next, as an embodiment of the present invention, FIG. 2 shows a configuration diagram of an optical device using optical fibers.
図中の1.2は第1図の同番号の構成要素に等しく、3
aはビームエキスパンダー、4aはレンズアレイ、4b
はコンデンサレンズである。さらにFl。1.2 in the figure is equivalent to the component with the same number in Figure 1, and 3
a is a beam expander, 4a is a lens array, 4b
is a condenser lens. Furthermore, Fl.
F2.・・・、Fnはオプティカルファイバーを示し、
順次オプティカルファイバーの光路長にレーザー光の可
干渉距離以上の差を持たせている。なお本図ではオプテ
ィカルファイバーを1次元的に配しているが、面状物体
を一括照射する装置では2次元的に配するものとする。F2. ..., Fn indicates optical fiber,
The optical path lengths of the sequential optical fibers are made to have a difference greater than the coherence length of the laser beams. In this figure, the optical fibers are arranged one-dimensionally, but in a device that irradiates a planar object all at once, they are arranged two-dimensionally.
エキスパンダー3aにより径が拡げられてオプティカル
ファイバーの束に入射し、n本の光線束に分岐する。各
光線束はそれぞれオプティカルファイバーを通過したの
ち、レンズアレイ4a及びコンデンサレンズ4bによっ
て再び一つに重なり合い、マスク2を照射する。ところ
が、すでに各光線束間の光路差が可干渉距離を越えてい
るので、マスク20面上で干渉し得るのは一本のオプテ
ィカルファイバー内を通る複数の光線のみである。The beam is expanded in diameter by the expander 3a, enters the bundle of optical fibers, and is branched into n bundles of light rays. After each of the light beams passes through an optical fiber, they are combined again by the lens array 4a and the condenser lens 4b, and the mask 2 is irradiated. However, since the optical path difference between each bundle of light rays has already exceeded the coherence distance, only the plurality of light rays passing through one optical fiber can interfere on the surface of the mask 20.
従ってマスク2の面上におけるスペックルの発生が低減
される。さらにオプティカルファイバーの本数nが大き
いほどこの効果が顕著になることは明らかである。Therefore, the occurrence of speckles on the surface of the mask 2 is reduced. Furthermore, it is clear that this effect becomes more pronounced as the number n of optical fibers increases.
以上説明したように本発明によれば、光線束の可干渉性
を弱めることによりスペックルの発生を防ぐことができ
る。従ってLSI等の微細パターン焼き付は装置に本発
明による光学装置を適用することによって、レーザー等
、輝度の高い光源の使用が可能となり、装置の高効率化
が達成される。As explained above, according to the present invention, the occurrence of speckles can be prevented by weakening the coherence of the light beam. Therefore, by applying the optical device according to the present invention to an apparatus for printing fine patterns on LSIs, etc., it becomes possible to use a high-brightness light source such as a laser, and high efficiency of the apparatus can be achieved.
第1図は本発明による光学装置の基本概念を示す説明図
、第2図は本発明の一実施例に係るオプティカルファイ
バー使用の光学装置の構成図である。
■・・・・・・・・・・・・レーf−、2°旧°°マス
ク雫3.4・・・・・・光線束制御用光学系。
3a・・・・・・・・・ビームエキスパンダー。
4a・・・・・・・・・レンズアレイ。
4b・・・・・・・・・コンデンサレンズ。
P、〜Pn−旧・・分岐光路。
F1〜Fn ・・・オプティカルファイバー。
第1図
第2図FIG. 1 is an explanatory diagram showing the basic concept of an optical device according to the present invention, and FIG. 2 is a configuration diagram of an optical device using optical fibers according to an embodiment of the present invention. ■・・・・・・・・・Ref f-, 2° old °° mask drop 3.4・・・・Optical system for controlling the beam flux. 3a・・・・・・Beam expander. 4a......Lens array. 4b・・・・・・Condenser lens. P, ~Pn-old... Branch optical path. F1~Fn...Optical fiber. Figure 1 Figure 2
Claims (1)
複数の光線束をそれぞれ分岐光路に導き、さらに該分岐
光路中で各光線束間に可干渉距離以上の光路差を持たせ
たのち、該各光線束を再び重ね合わせる光学装置。The incident light having a long coherence length is branched into a plurality of beam bundles, each of the plurality of beam bundles is guided to a branched optical path, and an optical path difference greater than the coherence length is provided between each beam bundle in the branched optical path. An optical device that then superimposes each of the beam bundles again.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59103742A JPS60247643A (en) | 1984-05-24 | 1984-05-24 | optical device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59103742A JPS60247643A (en) | 1984-05-24 | 1984-05-24 | optical device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60247643A true JPS60247643A (en) | 1985-12-07 |
Family
ID=14362059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59103742A Pending JPS60247643A (en) | 1984-05-24 | 1984-05-24 | optical device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60247643A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6427362A (en) * | 1987-07-22 | 1989-01-30 | Dainippon Screen Mfg | Laser exposure method for picture scanning recorder |
| US4819033A (en) * | 1986-10-29 | 1989-04-04 | Hitachi, Ltd. | Illumination apparatus for exposure |
| JPH01152411A (en) * | 1987-09-17 | 1989-06-14 | Olympus Optical Co Ltd | Illuminating optical system for semiconductor exposing device |
| DE4301716A1 (en) * | 1992-02-04 | 1993-08-05 | Hitachi Ltd | |
| EP1102058A1 (en) * | 1999-11-17 | 2001-05-23 | Applied Materials, Inc. | Method and apparatus for inspecting articles |
| KR100747573B1 (en) * | 2005-01-06 | 2007-08-08 | 엘지전자 주식회사 | Projection display device using laser |
| WO2007132508A1 (en) * | 2006-05-12 | 2007-11-22 | Dainippon Screen Mfg. Co., Ltd. | Illumination device |
| EP3538948B1 (en) * | 2016-11-09 | 2024-07-31 | The University of Hong Kong | Spatio-temporally incremental fiber swept source |
-
1984
- 1984-05-24 JP JP59103742A patent/JPS60247643A/en active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4819033A (en) * | 1986-10-29 | 1989-04-04 | Hitachi, Ltd. | Illumination apparatus for exposure |
| JPS6427362A (en) * | 1987-07-22 | 1989-01-30 | Dainippon Screen Mfg | Laser exposure method for picture scanning recorder |
| JPH01152411A (en) * | 1987-09-17 | 1989-06-14 | Olympus Optical Co Ltd | Illuminating optical system for semiconductor exposing device |
| DE4301716A1 (en) * | 1992-02-04 | 1993-08-05 | Hitachi Ltd | |
| DE4301716C2 (en) * | 1992-02-04 | 1999-08-12 | Hitachi Ltd | Projection exposure device and method |
| EP1102058A1 (en) * | 1999-11-17 | 2001-05-23 | Applied Materials, Inc. | Method and apparatus for inspecting articles |
| KR100747573B1 (en) * | 2005-01-06 | 2007-08-08 | 엘지전자 주식회사 | Projection display device using laser |
| WO2007132508A1 (en) * | 2006-05-12 | 2007-11-22 | Dainippon Screen Mfg. Co., Ltd. | Illumination device |
| JP4841624B2 (en) * | 2006-05-12 | 2011-12-21 | 大日本スクリーン製造株式会社 | Lighting device |
| EP3538948B1 (en) * | 2016-11-09 | 2024-07-31 | The University of Hong Kong | Spatio-temporally incremental fiber swept source |
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