JPS60262937A - Aluminum alloy for photosensitive drum having superior suitability to vapor deposition of amorphous silicon - Google Patents

Abstract

PURPOSE:To improve the suitability of the titled Al alloy to the vapor deposition of amorphous silicon and to surface finishing by precision machining by adding specified amounts of Si, Mg and Zn and restricting the amounts of Fe, Mn and Cr to the limited amt. or below. CONSTITUTION:The titled alloy consists of, by weight, >0.2-<1.0% Si, 0.1- <1.5% Mg, 0.05-<1.0% Zn, <=0.35% Fe, <=0.10% Mn, <=0.10% Cr and the balance Al. In order to make the grains of an ingot fine, <=0.03% Ti may be added besides said components.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field 1] The present invention relates to an aluminum alloy for photosensitive drums that has excellent amorphous silicon deposition properties, and more specifically,
Relating to an aluminum alloy for photosensitive drums in which regulations on impurity content can be loosened by containing a small amount of Zn in an Mg-Si alloy, and the surface finish during precision cutting and the deposition of amorphous silicon are improved. .

[Prior Art 1 Conventionally, photoconductive materials for electrophotographic photoreceptors include Se, CdS, Zn○, organic photoreceptor (OPC), etc.
Amorphous silicon has been used in consideration of its characteristics and uses, but in recent years, the use of amorphous silicon has been attracting attention.

The reason for this is that this amorphous silicon has superior properties such as heat resistance, wear resistance, and environmental pollution resistance compared to conventional materials.

However, due to the slow deposition rate of amorphous silicon, the evaporated film thickness is 15 to 20 μl, which is thinner than that of conventional Se, CdS, etc., which is 40 to 70.1711 μl, and the surface hardness of amorphous silicon is low. Due to its high height, it is easily affected by the substrate, and a surface with even higher precision than the conventional substrate is required.

That is, for example, geometric surface roughness requires a level of precision higher than that of conventional methods, and one goal is to set Rmax = 0.
A surface finish of 0.05μ- is required, and a process-affected layer formed on the substrate surface during cutting is also required to be of a low level since it affects the film properties. For this reason, it is not possible to obtain a satisfactory surface by ordinary cutting, so at present 11 surfaces are obtained using a special precision lathe using natural diamond sappers.

In addition, aluminum alloys have conventionally been generally used as base materials, mainly in accordance with JIS3003 and JIS.
ISA6063 alloy has been widely used, but these materials have a large number of finely dispersed intermetallic compounds in the matrix, making it difficult to achieve sufficient surface roughness during cutting. Ta.

Furthermore, as aluminum alloys for photosensitive drums for amorphous silicon deposition, Al-Mg-Si alloys with extremely restricted impurity content (for example, 99,9
JISA6063 alloy (based on 9wt% A1) was used, but it had the disadvantage that the material cost was extremely high due to the high purity metal.

[Problems to be Solved by the Invention] The present invention has been made to solve the above-mentioned drawbacks and problems of the conventionally used aluminum alloy for photosensitive drums. It is an object of the present invention to provide an aluminum alloy for photosensitive drums which has extremely excellent vapor deposition properties and excellent surface finishing properties, and is excellent in amorphous silicon vapor deposition properties.

1 Means for Solving Problem 1 The aluminum alloy for photosensitive drums having excellent amorphous silicon deposition properties according to the present invention is characterized by: Si 0.2-1.0 wt% (0.2 wt%, 1.0 wt%) 0w
t%), MgO, 1-1,5 wt% (1,5
(wt% not included), ZnO,05-1,0wt% (1
, 0 wt%), and the impurities are restricted to Fe 2 O, 35 wt% or less, Mn 0,0010 wt% or less, Cr 2 O, 10 wt% or less, and the remainder consists of A1.

The aluminum alloy for photosensitive drums having excellent amorphous silicon deposition properties according to the present invention will be described in detail.

First, the components and component ratios of the aluminum alloy for photosensitive drums having excellent amorphous silicon deposition properties according to the present invention will be explained.

Si and Mg are essential elements for improving strength, and they provide the strength necessary to prevent defects such as dimensional accuracy due to bending during cutting, and the Si content is 0.2wt.
%, Mg content is less than 0.1 wt%, this effect is not sufficient, and Sil, 0 wt%, MB 1.5
If the content exceeds each wt%, it becomes easy to form crystallized MB2Si, so the cutting area degree Rmax5/100μ-
All you have to do is satisfy the following. Therefore, the Si content is 0.2 to 1.0 wt% (not including 0.2 wL%, 1, Oat%), and the Mg content is 0.1 to 1.5 mt% (1°5
(wt% not included).

Zn is a low melting point metal that has a remarkable effect of improving surface finish through lubrication during cutting, and is an element that makes it difficult for tools to chip, with a content of 0.05wt.
If it is less than 1.0 wt%, this effect is not sufficient, and if it is less than 1.0 wt%
If the content exceeds this amount, corrosion resistance will deteriorate. Therefore, Z
The n content is 0.05 to 1.0 wt% (excluding 1.0 wt%).

Fe, Mn, and Cr may be included in one quantity to refine grains, but the content is FeO, 35wt%, Mn
When O, 10 wt% and Cr exceed 0.10 wt%, respectively, A I 7 Cr, Al-Fe system, A16 (MnFe)
Both the amount and size of crystallized substances increase, deteriorating the precision of the cut surface. Therefore, the Fe content is 0.35 wt% or less,
Mn content 0.10wt% or less, Cr content 0.10
It is necessary to regulate it below wt%.

In addition to the above-mentioned ingredients, T is added for grain refinement of the ingot.
It is permissible to contain 0.03 wt% or less of i.

[Example 1] Next, an example of an aluminum alloy for photosensitive drums having excellent amorphous silicon deposition properties according to the present invention will be described.

Example An aluminum alloy having the components and proportions shown in Table 1 was melted according to a conventional method, poured into a 200φ ingot, and
After performing a scorching treatment at a temperature of 20° C. for 4 hours, a tube with a diameter of 123 mm and a wall thickness of 4.8+ m was prepared by extrusion and drawing and used as a test material.

◎Cutting conditions are as follows.

(1) Rough cutting (NC lathe) Tool: Sintered diamond engineer (commercial product) Cutting speed: 6
00m/sin Depth of cut: 0.25u+ Feed 20.11II+1/rev (2) Finish cutting (ultra-precision lathe) Machining 14: Natural diamond engineer (commercial product) Cutting speed: 600+/win Depth of cut: 0.01 S-Transportation: 0.03 mm/rev Table 1 shows the maximum roughness (Rmax) determined by a surface roughness meter at the center of the cut product with a total length of 30011 Im.

After cutting, amorphous silicon was deposited, and the deposition properties were determined by a tape test. Table 1 shows the results.

From this Table 1, it is clear that the aluminum alloy for photosensitive drums according to the present invention, which has excellent amorphous silicon deposition properties, can easily obtain a cutting surface finish accuracy of Re+axO,05 μ- or less, and also has amorphous silicon deposition properties after cutting. Also, as a result of the tape test, excellent vapor deposition properties were obtained without peeling.

[Effect of the invention 1 As explained above, since the aluminum alloy for photosensitive drums according to the present invention which has excellent amorphous silicon deposition properties has the above-mentioned structure, the surface finish during precision cutting is extremely high. This is an aluminum alloy for photosensitive drums that has excellent amorphous silicon deposition properties.

Claims (1)

[Claims] SiO,2-1,0wt% (0,2wt%, 1.kt
%), Mg O, 1-1,5wt% (1,5w
(excluding t%), ZnO,05-1,ht% (1,O
Amorphous silicon vapor deposition property characterized by containing impurities FeO, 35wt% or less, MnO, 10wt% or less, CrO, 10wt% or less, and the balance being A1. Aluminum alloy for photosensitive drums with excellent properties.