JPS6036376A - Silicon carbide-based resistance material and its manufacturing method - Google Patents

Silicon carbide-based resistance material and its manufacturing method

Info

Publication number
JPS6036376A
JPS6036376A JP58145425A JP14542583A JPS6036376A JP S6036376 A JPS6036376 A JP S6036376A JP 58145425 A JP58145425 A JP 58145425A JP 14542583 A JP14542583 A JP 14542583A JP S6036376 A JPS6036376 A JP S6036376A
Authority
JP
Japan
Prior art keywords
silicon carbide
resistivity
resistance material
based resistance
sic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58145425A
Other languages
Japanese (ja)
Inventor
松下 安男
神保 龍太郎
研 高橋
誠一 山田
小杉 哲夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58145425A priority Critical patent/JPS6036376A/en
Publication of JPS6036376A publication Critical patent/JPS6036376A/en
Pending legal-status Critical Current

Links

Landscapes

  • Ceramic Products (AREA)
  • Non-Adjustable Resistors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、広い範囲にわたって抵抗車側(財)が可能な
新規の炭化ケイ素系抵抗材料並びにその製造方法に関す
る。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a novel silicon carbide-based resistance material that can be used in a wide range of resistance vehicles, and a method for manufacturing the same.

〔発明の背景〕[Background of the invention]

炭化ケイ素(以下SiCと略記)は耐熱温度が高く、高
温強度や耐酸化性等に浸れるだめ高温構造材への応用が
検討されている。
Silicon carbide (hereinafter abbreviated as SiC) has a high heat resistance, and its application to high-temperature structural materials due to its high-temperature strength and oxidation resistance is being considered.

一方、SiCは電気的には半導体に属するためその抵抗
特性を利用して従来から発熱体、バリスタ、抵抗体等に
使用されてきた。最近では高温構造材用に開発された多
くの浸れた特性をもつ高密度SiC焼結体を電子部品あ
るいは大電力用の送変電機器の抵抗体材料として利用す
ることが検討されている。上記SIC焼結体を多くの用
途に供するには種々の抵抗率をもつSiC抵抗材料が必
要である。しかしながら同一組成物でし力為も耐熱襟度
や機械的強度等の特性を低下させずに、抵抗率だけを1
02〜1010Ω副の広範囲にわたって自由に変えるこ
とのできる材料あるいは技術は知られていない。
On the other hand, since SiC electrically belongs to a semiconductor, it has been conventionally used in heating elements, varistors, resistors, etc. by utilizing its resistance characteristics. Recently, consideration has been given to using high-density SiC sintered bodies, which have been developed for high-temperature structural materials and have many unique characteristics, as resistor materials for electronic components or high-power power transmission and transformation equipment. In order to use the above-mentioned SIC sintered body for many purposes, SiC resistance materials having various resistivities are required. However, even if the same composition is subjected to force, only the resistivity will be reduced to 1 without reducing properties such as heat resistance and mechanical strength.
There is no known material or technology that can freely change the resistance over a wide range of 02 to 1010 ohms.

従来、SiC焼結体の抵抗率を広範囲に変えるには、主
成分のSiCに、焼結助剤となる特定成分を添加する方
法が知られている。例えば、特公昭58−31755 
に見られる如(SiCに酸化ベリリウム(Bed)ある
いは窒化ホウ素(BN)を約2%添加した焼結体は室温
の抵抗率が10I0Ωm以上になるが、添加量に対する
抵抗率の変化が非常に急峻とあシ、助剤添加針によって
所望の抵抗率を得ることは事実上不可能に近い。一方、
ホウ素(B)、アルミニウム(At)の単体または化合
物を添加すると、成分によって特定した値の抵抗率が得
られるが、この場合には広範囲に抵抗率を変化させるこ
とは難かしい。また他の方法としては、SiC粉末と絶
縁性粉体を複合化し、絶縁性粉体量を調整して高抵抗率
を得ること75にできるが、SiCの優れた特性を損う
ので好ましくない。
Conventionally, in order to vary the resistivity of a SiC sintered body over a wide range, a method has been known in which a specific component serving as a sintering aid is added to SiC, which is the main component. For example, Tokuko Sho 58-31755
As seen in (SiC with approximately 2% beryllium oxide (BED) or boron nitride (BN) added, the resistivity at room temperature is more than 10I0Ωm, but the change in resistivity with respect to the amount of addition is very steep. It is virtually impossible to obtain the desired resistivity using an auxiliary additive needle.On the other hand,
When boron (B) or aluminum (At) is added alone or as a compound, a resistivity of a value specified depending on the component can be obtained, but in this case, it is difficult to vary the resistivity over a wide range. Another method is to combine SiC powder and insulating powder and adjust the amount of insulating powder to obtain high resistivity75, but this is not preferred because it impairs the excellent properties of SiC.

〔発明の目的〕[Purpose of the invention]

本発明は、上記した従来の問題点を解消するためになさ
れたもので、抵抗率を広範囲に変化することができる3
iC系抵抗材料並びにその製造方法を提供するものであ
る。
The present invention was made to solve the above-mentioned conventional problems, and it is possible to vary the resistivity over a wide range.
The present invention provides an iC-based resistance material and a method for manufacturing the same.

〔発明の概要〕[Summary of the invention]

本発明の特徴は、SICと酸化アルミニウム(A/ao
a )の2成分からなる組成物を加圧不活性ガス中でホ
ットプレス焼結することにより、室温で102Ωα以上
の任意の値の抵抗率を得ることができる。すなわち本発
明では、StCとA403の組成比並びにホットプレス
時の雰囲気である不活性ガスの圧力を適宜組合せること
により室温に102〜1010Ω鋸の抵抗率を有するS
iC系抵抗材料が得られる。
The characteristics of the present invention are that SIC and aluminum oxide (A/ao
By hot-press sintering the composition consisting of the two components a) in a pressurized inert gas, a resistivity of any value of 102 Ωα or more can be obtained at room temperature. That is, in the present invention, by appropriately combining the composition ratio of StC and A403 and the pressure of the inert gas that is the atmosphere during hot pressing, S having a resistivity of 102 to 1010 Ω at room temperature is produced.
An iC-based resistance material is obtained.

本発明においてはSiCに添加するA t20gの量を
限定したのは、次の理由による。A403は抵抗率制御
以外KSiCの焼結助剤としての役割を(つが、その量
が0.2重量%よりも少ないと充分躬密化せず(相対密
度90%以下)また抵抗率のp現性が悪く好ましくなく
、10重量%よりも多くなると高温高強度、低熱膨張性
というSiCの坤質を低減せしめることから好ましくな
い。まだ?発明で焼結雰囲気をアルゴン、< A r 
) 、、窒素(Nzまたはへリリウム(He)等の不活
性ガスに限父したのは、酸化雰囲気ではSiC粉末の表
面力i化して酸化ケイ素(Si02)が形成すると緻密
に・結せず好ましくない。さらに不活性ガスの圧力31
気圧から50気圧に限定したのは、1気圧よ・も低い場
合は抵抗率の増大効果が少ないためで2す、50気圧以
上では抵抗率の増大が飽和するf向にある他に耐圧容器
等の設備費が著しく高価(なるためである。
The reason why the amount of At added to SiC is limited to 20 g in the present invention is as follows. A403 plays a role as a sintering aid for KSiC other than resistivity control (However, if the amount is less than 0.2% by weight, it will not be sufficiently densified (relative density 90% or less), and it will also affect the resistivity p-value. If the amount exceeds 10% by weight, it reduces the properties of SiC, which are high strength at high temperatures and low thermal expansion.
), The reason for using an inert gas such as nitrogen (Nz) or helium (He) is that in an oxidizing atmosphere, the surface strength of SiC powder is increased to form silicon oxide (Si02), which is preferable because it does not become dense and aggregate. No. In addition, the pressure of inert gas 31
The reason for limiting the atmospheric pressure to 50 atm is that if it is lower than 1 atm, the effect of increasing resistivity will be small2.At 50 atm or higher, the increase in resistivity will be saturated, in addition to pressure vessels, etc. This is because the equipment costs are extremely high.

〔発明の実施例〕[Embodiments of the invention]

取下、本発明を実施例によって詳細に説明す。 The present invention will now be explained in detail by way of examples.

(実施例1) SiC粉末は市販の純度98%、平均粒径3μmのもの
を、またA40g 粉末は純度99.9%以タ 上で平
均粒径0.5μmのものを用いた。SiC粉1 末92
重量%とAt203扮末8重量%から成る組成物を混合
した後、直径60間の円板に仮成形した。
(Example 1) A commercially available SiC powder with a purity of 98% and an average particle size of 3 μm was used, and an A40g powder with a purity of 99.9% or more and an average particle size of 0.5 μm was used. SiC powder 1 powder 92
After mixing a composition consisting of % by weight and 8% by weight of At203 powder, it was preformed into a disk with a diameter of 60 mm.

t 次いで仮成形体を黒鉛型に入れ、高圧気中ホットプ
レス装置を用いて加圧Arガス中で荷重300) Kり
/C1r12、温度2000C,時間1hの条件でホッ
トプレス焼結した。こうして得られた焼結体の特紀 性
とArガス圧力との関係を第1表に示した。表尭 中、
曲げ強さ及び抵抗率の値 【 ・ 1 1 頁 1 ・ 1 [ 5゜)I − 第1表の結果から明らかなように、Arガス圧力が高く
なるにつれて焼結体の抵抗率は増大する。
Next, the temporary formed body was placed in a graphite mold, and hot press sintered in pressurized Ar gas using a high-pressure in-air hot press device under the conditions of a load of 300 K/C1r12, a temperature of 2000 C, and a time of 1 h. Table 1 shows the relationship between the specificity of the sintered body thus obtained and the Ar gas pressure. Omoteya middle school,
Bending strength and resistivity values [ ・ 1 1 Page 1 ・ 1 [ 5°) I − As is clear from the results in Table 1, the resistivity of the sintered body increases as the Ar gas pressure increases.

したがってA rガス圧力を1〜50気圧に変えること
によって、抵抗率を103〜10′。9mの広い範囲に
わたって制(財)できることが分る。しかしガス圧力が
40気圧以上になると抵抗率の増大が飽和する傾向にあ
る。また0、5気圧では後述する比較例と対比してみて
抵抗率の増大が少なく、加圧ガス中焼結の効果はみられ
ない。以上の結果から、好ましいArガスの圧力は1〜
50気圧である。相対密度並びに曲げ強さはガス圧力が
変ってもほぼ一定の値であシ、両特性に対するガス圧力
の影響は認められない。
Therefore, by changing the Ar gas pressure from 1 to 50 atm, the resistivity can be reduced from 103 to 10'. It can be seen that it is possible to control (goods) over a wide area of 9 meters. However, when the gas pressure exceeds 40 atmospheres, the increase in resistivity tends to reach saturation. Further, at 0.5 atm, the increase in resistivity is small compared to the comparative example described later, and no effect of sintering in pressurized gas is observed. From the above results, the preferred pressure of Ar gas is 1~
The pressure is 50 atm. The relative density and bending strength remain approximately constant even when the gas pressure changes, and no influence of gas pressure on both properties is observed.

(実施例2) 実施例1と同じSiC扮末及びA403粉末を吏って、
実施例1と同じ割合である5iC92重計%、A720
s 8’t t%に混合し、直径60流に仮成形した後
、これを加圧N2ガス中で荷重300Kq/c7n2、
温e2000T:):、時間1ht7)条件下テホット
プレス焼結した。得られた焼結体の特性とN2ガス圧力
との関係を第2表に示した。
(Example 2) The same SiC powder and A403 powder as in Example 1 were tasted,
5iC92 weight %, which is the same proportion as Example 1, A720
After mixing to 8't t% and preforming to a diameter of 60, this was heated in pressurized N2 gas under a load of 300Kq/c7n2.
Hot press sintering was carried out under the following conditions: 2000 T: ), 1 h 7). Table 2 shows the relationship between the characteristics of the obtained sintered body and the N2 gas pressure.

第2表の結果から、N2 ガスの場合もA「ガス中焼結
と同様に、N2 ガス圧力を1〜50気圧に変えること
により102〜10109mの広い範囲にわたって抵抗
率を制御することができる。しかし抵抗率の値は、Ar
ガスの場合に比べて、全体に約1桁小さい。相対密度及
び曲げ強さはガス圧力によらずほぼ一定値である。
From the results in Table 2, it is clear that in the case of N2 gas as well, resistivity can be controlled over a wide range of 102 to 10109 m by changing the N2 gas pressure to 1 to 50 atm, similar to the case of sintering in gas. However, the resistivity value is Ar
Overall, it is about one order of magnitude smaller than in the case of gas. The relative density and bending strength are approximately constant values regardless of gas pressure.

(比較例) 実施例1及び2と同一組成の成形体について、雰囲気を
ArあるいはN2ガスから真空(io−’’porr)
に代えて、実施例1,2と同じく荷重−300Kg /
 cm” 、温度20001Z’ %時間1hの条件下
でホットプレス焼結した。得られた焼結体は相対密度が
98%、室温の抵抗率が約80Ω口であった。この抵抗
率の1直は第1表に示した加圧Arガス、第2表に示し
た加圧N2ガス中焼結晶の抵抗率に比べると、1/4以
下(1気圧)〜約1/10’ (50気圧)であった。
(Comparative Example) Regarding molded bodies having the same composition as Examples 1 and 2, the atmosphere was changed from Ar or N2 gas to vacuum (io-''porr).
Instead, the load -300Kg/ as in Examples 1 and 2.
cm'', temperature 20001Z'% for 1 hour.The obtained sintered body had a relative density of 98% and a resistivity at room temperature of about 80Ω. is less than 1/4 (1 atm) to about 1/10' (50 atm) compared to the resistivity of the pressurized Ar gas shown in Table 1 and the pressurized N2 gas annealed crystal shown in Table 2. Met.

(実権例3) 実施例1と同じSiC及びkkos粉末を用いて、A 
k 03 ばか異なる組成物を1気圧及び50気圧のA
rガス中で、300に一9/cm” 、2000C,1
hの条件下でポットプレス焼結した。得られた焼結体の
相対H度並びに室温時の抵抗率を第3表に示した。
(Example 3) Using the same SiC and kkos powder as in Example 1, A
k 03 different compositions at 1 atm and 50 atm A
In r gas, 300 to 9/cm", 2000C, 1
Pot press sintering was carried out under the conditions of h. Table 3 shows the relative H degree and resistivity at room temperature of the obtained sintered body.

第3表の結果から、A、Lz 03itが多く、かつガ
ス圧力が高くなるほど抵抗率が増大することが分る。
From the results in Table 3, it can be seen that the resistivity increases as the amount of A and Lz 03it increases and the gas pressure increases.

しかし、klz Oa 世が0.5重量%より少ないと
相対密度が90%以下となり十分に1故密化せず、また
10重量%以上になると抵抗率は増大するが曲げ強さが
低下(第3表には記入せず)する傾向があり好ましくな
い。
However, if klz Oa is less than 0.5% by weight, the relative density will be less than 90% and sufficient densification will not occur, and if it is more than 10% by weight, the resistivity will increase but the bending strength will decrease (the 3), which is not desirable.

〔発明の効果〕〔Effect of the invention〕

上記したように本発明によれば、SiCとA403から
なる組成物を加圧不活性ガス中でホットプレス焼結する
ことによって、緻密でしかも抵抗率が102〜1010
Ω鋸の範囲にあるSiC系の材料が得られる。またこの
材料は、金属抵抗あるいは従来のセラミック抵抗材に比
べて耐熱温度が高く、低熱膨張性で機械的強度が大きく
、耐熱衝撃性にも暖れるなどの特性があるため、この特
質を生かした各種抵抗体、例えば高部サーミスタ用感温
抵抗体、特別高圧送変電系統における電圧計測装置用の
高抵抗体、サイリスタ保護用の無誘導抵抗体、遮断器用
抵抗体あるいは自動唯のディストリビュータ用放電電極
材等への適用が期待され第1頁の続き @発明者小杉 哲夫 日立市幸町3丁目1番1号 株式会社日立製作所日立研
究所内
As described above, according to the present invention, a composition made of SiC and A403 is hot-press sintered in a pressurized inert gas, so that it is dense and has a resistivity of 102 to 1010.
A SiC-based material in the Ω-saw range is obtained. In addition, this material has characteristics such as higher heat resistance, lower thermal expansion, greater mechanical strength, and thermal shock resistance than that of conventional ceramic resistance materials. Various resistors, such as temperature-sensitive resistors for high part thermistors, high-resistance elements for voltage measuring devices in special high-voltage transmission and substation systems, non-inductive resistors for thyristor protection, resistors for circuit breakers, or discharge electrodes for automatic distributors. Expected to be applied to materials, etc.Continued from page 1 @ Inventor Tetsuo Kosugi 3-1-1 Saiwaimachi, Hitachi City Hitachi Research Laboratory, Hitachi, Ltd.

Claims (1)

【特許請求の範囲】 1、酸化アルミニウム0.5〜10重量%、残部が炭化
ケイ素からなる組成物を不活性ガス中でホットプレス焼
結して得られた焼結体で、該焼結体は相対密度90%以
上の密度と室温で102Ωm以上の抵抗率を有すること
を特徴とする炭化タイ素糸抵抗材料。 2、酸化アルミニウム0.5〜10重址%、残部が炭化
ケイ素からなる組成物を不活性ガス中でホットプレス焼
結するに際し、不活性ガス圧力によって焼結体の室温の
抵抗率を102Ωm以上に制量することを特徴とする炭
化ケイ素系抵抗材料の製造方法。 3、前記不活1生ガスがアルゴン、窒素またはヘリウム
の少なくとも1種であることを特徴とする特許請求の範
囲第2項記載の炭化ケイ素系抵抗材料の製造方法。 4、前記不活性ガス圧力が1気圧以上50気圧以下であ
ることを特徴とする特許請求の範囲第2項又は第3項記
載の炭化ケイ素系抵抗材料の製造方法。
[Scope of Claims] 1. A sintered body obtained by hot press sintering a composition consisting of 0.5 to 10% by weight of aluminum oxide and the remainder silicon carbide in an inert gas; is a carbonized tie yarn resistance material characterized by having a relative density of 90% or more and a resistivity of 102 Ωm or more at room temperature. 2. When hot press sintering a composition consisting of 0.5 to 10% aluminum oxide and the balance silicon carbide in an inert gas, the room temperature resistivity of the sintered body is increased to 102 Ωm or more by inert gas pressure. 1. A method for producing a silicon carbide-based resistance material, characterized by controlling the amount of the silicon carbide-based resistance material. 3. The method for manufacturing a silicon carbide-based resistance material according to claim 2, wherein the inert raw gas is at least one of argon, nitrogen, and helium. 4. The method for manufacturing a silicon carbide-based resistance material according to claim 2 or 3, wherein the inert gas pressure is 1 atm or more and 50 atm or less.
JP58145425A 1983-08-08 1983-08-08 Silicon carbide-based resistance material and its manufacturing method Pending JPS6036376A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58145425A JPS6036376A (en) 1983-08-08 1983-08-08 Silicon carbide-based resistance material and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58145425A JPS6036376A (en) 1983-08-08 1983-08-08 Silicon carbide-based resistance material and its manufacturing method

Publications (1)

Publication Number Publication Date
JPS6036376A true JPS6036376A (en) 1985-02-25

Family

ID=15384949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58145425A Pending JPS6036376A (en) 1983-08-08 1983-08-08 Silicon carbide-based resistance material and its manufacturing method

Country Status (1)

Country Link
JP (1) JPS6036376A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61256658A (en) * 1985-05-08 1986-11-14 Shin Etsu Chem Co Ltd Electrically insulating substrate material
JPS63190758A (en) * 1987-01-30 1988-08-08 新日本製鐵株式会社 Silicon carbide-base ceramic sintered body
JPH0410512U (en) * 1990-05-11 1992-01-29
JP2001076902A (en) * 1999-09-03 2001-03-23 Sumitomo Osaka Cement Co Ltd Snubber resistor and method of manufacturing the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61256658A (en) * 1985-05-08 1986-11-14 Shin Etsu Chem Co Ltd Electrically insulating substrate material
JPS63190758A (en) * 1987-01-30 1988-08-08 新日本製鐵株式会社 Silicon carbide-base ceramic sintered body
JPH0410512U (en) * 1990-05-11 1992-01-29
JP2001076902A (en) * 1999-09-03 2001-03-23 Sumitomo Osaka Cement Co Ltd Snubber resistor and method of manufacturing the same

Similar Documents

Publication Publication Date Title
JPS6138144B2 (en)
JPS6027653A (en) Ceramic resistor material
JPS6246512B2 (en)
JPS63295479A (en) Sintered aluminum nitride body and its production
JP2001114563A (en) Ceramic resistor and manufacturing method thereof
JP2778783B2 (en) Method for producing BN-AlN-based sintered body having anisotropy
JPS5815953B2 (en) Board for electrical equipment
JPH0522670B2 (en)
JPS6355162A (en) High heat conductivity sintered body and manufacture
JP2000128641A (en) Ceramic resistor and manufacturing method thereof
JPH04292467A (en) Bn-aln-based compound sintered compact and its production
JPS61251575A (en) Silicon carbide sintered body and manufacture
JPS62153170A (en) Silicon nitride ceramic sintered body and manufacture
JPH04182358A (en) Aluminum nitride sintered body
JPS6328871B2 (en)
JPH0335503A (en) Manufacturing method of PTC thermistor
JPS6236989B2 (en)
JPS6236988B2 (en)
JPH01138174A (en) Production of sintered aluminum nitride
JPS61183174A (en) Aluminum nitride aintered body
JPS6236066A (en) Silicon carbide base sintered body and manufacture
JPS61205665A (en) Electrically insulating substrate and manufacture
JPS6369761A (en) Manufacture of aluminum nitride base sintered body
JPH0535107B2 (en)
JPH0247856B2 (en)