JPS6036675A - Catalyst for electroless copper plating - Google Patents

Catalyst for electroless copper plating

Info

Publication number
JPS6036675A
JPS6036675A JP14463483A JP14463483A JPS6036675A JP S6036675 A JPS6036675 A JP S6036675A JP 14463483 A JP14463483 A JP 14463483A JP 14463483 A JP14463483 A JP 14463483A JP S6036675 A JPS6036675 A JP S6036675A
Authority
JP
Japan
Prior art keywords
palladium
compound
copper
bivalent
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14463483A
Other languages
Japanese (ja)
Inventor
Isao Matsuzaki
松崎 五三男
Haruki Yokono
春樹 横野
Takehiko Ishibashi
石橋 武彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP14463483A priority Critical patent/JPS6036675A/en
Publication of JPS6036675A publication Critical patent/JPS6036675A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper
    • C23C18/40Coating with copper using reducing agents
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/187Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating means therefor, e.g. baths, apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To improve the characteristics of the resulting electroless copper plating by adding a complex compound which is prepd. by reacting a bivalent palldium compound or a uni- or bivalent copper compound with amino acid and produces metallic Pd or Cu by heating. CONSTITUTION:To a catalyst for electroless copper plating is added a complex compound which is prepd. by reacting a bivalent palladium compound or a uni- or bivalent copper compound with amino acid and produces metallic Pd or Cu by heating. The amount of the complex compound added is <=1wt% when the compound is expressed in terms of Pd or Cu. Palladium (II) chloride, palladium IIfluoride, palladium (II) bromide, palladium (II) iodide or the like is used as the bivalent palladium compound. Copper ( I ) chloride, copper (II) chloride, copper (II) sulfate or a mixture thereof is used as the uni- or bivalent copper compound.

Description

【発明の詳細な説明】 本発明は、無電m銅めっさ用触媒に間型ゐ。[Detailed description of the invention] The present invention is applicable to a catalyst for electroless copper plating.

無電h¥銅めっきは、印刷配線板の分野″T:、槓層板
等の肥縁革板に回路?形成するためVc広(用いらnて
いゐ。
Electroless copper plating is used in the field of printed wiring boards to form circuits on thickened leather boards such as laminated boards.

この場合、杷縁循仮の無電解鋼めっきが嵐さtl、6而
は活性化、テなわち無電解鋼めっきのための触練核が形
成8才上々0この触媒核を中心にして、無41解銅めっ
@液中の銅イオンが析出し、成長して銅膜となり、回路
となる。
In this case, the electroless steel plating in the round cycle is activated, that is, the catalytic nucleus for electroless steel plating is formed around this catalyst nucleus, Copper ions in the 41-free copper plating solution precipitate and grow to form a copper film, forming a circuit.

杷縁屑似ケY占性化するために、無電解組めっきのため
の触媒となめ@−パラジウムr杷縁丞板表(川に形成さ
1τている。
In order to make the loquat edge similar to Y, it is used as a catalyst for electroless plating.

従来、この金稙パラジウムに HC7! PdC6,+5n(J、 Pd +SnC/!4の反応
でイ4jらtlて↓゛す、硅株止なとの担体に担付さz
11触媒作用會朱丁ように工夫式nていゐ。
Conventionally, this Kinten palladium was HC7! In the reaction of PdC6, +5n (J, Pd +SnC/!4, I4j et al ↓゛ is supported on a carrier with a silicon stock.
11 It has a devised formula like the catalytic function.

そのため@ Sn、(、jl 7i:との不利1?l紫
多く言むうえに、祖捧紫1史川丁ゐkめ、接庸剤混入し
、アティティブ印刷配線板用の接眉刑(触媒入り)付4
′IV層伍紮製危丁々場合、そり、ねじnが発生し、杷
杼性VC與iF点があり、父、絶縁m勝の杷紗層中に況
入丁心ことに困難であった0 応させて得らn1加熱により金桶パラジウムヶ生成丁ゐ
卸化−8−物紫宮む無電解鋼めっさ用触媒であめ。
Therefore, @Sn, (, jl 7i: disadvantage 1?l purple, and so on. ) with 4
'If the IV layer is in danger, warping and screws may occur, and there are VC and iF points in the loquat, and it was difficult to insert the insulation into the loquat layer. In addition, by heating, a gold-plated palladium compound was produced and a catalyst for electroless steel plating was obtained.

211IIIのパラジウム化合物としては、埴化パラジ
ウム(111、フッ化パラジウム(II)、J(化パラ
ジウム(iI) b ヨウ化パラジウム(rg 、硝酸
パラジウム(II)、硫Hパラジウム(■)、酸化パラ
ジウム(II)%鈍化バラジウム(川及びこ扛らの混合
物が使用さ7″1〜ゐ。
Palladium compounds of 211III include palladium chloride (111), palladium fluoride (II), palladium iodide (rg), palladium nitrate (II), palladium sulfate (■), palladium oxide ( II)% desensitized palladium (a mixture of 7" and 7" is used).

ハロゲン化物、%に塩化パラジウム(II)が好1]−
5い。1価、2価の銅化合物としては、塩化銅(r)。
Halide, preferably palladium(II) chloride in %1]-
5. Copper chloride (r) is an example of a monovalent or divalent copper compound.

塩化銅(■)、硫酸銅(II)及びこれらの混合物が1
す用さn/)。
Copper chloride (■), copper (II) sulfate and mixtures thereof are 1
Use n/).

アミノ酸としては、グルタミン酸、アスノくラギン1m
 s グリシン、アラニン、ノ(リン、フェニルアラニ
ン及びこnらの混合’jmが使用さfL/)。
As amino acids, glutamic acid, Asunoku Lagin 1m
Glycine, alanine, phosphorus, phenylalanine and mixtures thereof are used.

2価のパラジウム化合物tアミノ削と反jp、tさせて
錯化曾9勿tIi心には、例えに1、メタノール1.5
eeK、1.−グルタミンoa y gm 4化ノくラ
ジウム(II)0.1g’a=加え振とり丁0ことによ
り侍らt]る。この錯化合物は80℃の加熱で金楠ノく
ラジウム?生成する0侍らn、た錯化合物では、場化パ
ラジウム(ロ)はアミノ酸のアミン基に配位してJ、−
リ、アミノ基が結合する炭素に結合子ゐ分惚したA1素
により金鳩ノ(ラジウムか生成さn/)O 力ロ熱臨吸は、例えば50〜200℃が灯ましく、アミ
ノ酸の1!li類により遡御が次めら7″L々O本発明
の錯化合物の使用例ケ説明王心。使用(1)錯化合物會
宮む水浴液中に被めっき吻を浸漬し引さ上け、加熱丁ゐ
ことにより被めっき物表曲に金鵜パラジウムケ生成さぜ
ゐ0(2)錯化合物ケ、ゴム−フェノール系等の接層剤
中に分散し、この接着剤ケガラス布にエポキシを含浸し
た積層板等の表面に塗布し、加熱乾燥丁/l)段階で金
稿パラジウムケ生成させゐ0 (6)卸化合物葡、エポキシ樹脂のアセトン浴液中に分
散ざゼたワニスケガラス布等の基材に含浸させ、通常の
方法により積層板を製造丁ゐ。ブリグレグの乾燥時、積
層板の加熱加圧時の熱により金槁パラジウムが生成する
○(4)鉛化合物ケ、ポリエステル樹脂のM機溶剤的欣
中ば分散させ、流廷びでフィルム2つ(ゐ0有機瘉削の
加熱除去中の加熱により金網パラジウムか生成す/)0 (5)鉛化什9勿7%ポリイミドのテトラヒドロフシン
浴故中に分散さゼ、鋼肪ンζ破榎丁ゐ0焼き付は時の熱
により金檎バラジクムが生成し柵媒性r巾丁絶縁嵐籾が
侍ら71.ゐ0以」二祝明し1こよりに、本発明の無篭
屏鋼めっき用触媒は、次の利点が運せらnる0 (1)生成丁心金栖バシジウムの粒子か細かいため、得
らn、た無電解めっきの竹1生が徒n、々0(2)姓槻
土等の担体を使用しないで丁むので、俗敵中でのf史月
→か=Jfピでめ9、j句−混合が容易0 (5J Sn、C1等の不純物忙宮なないため、狗らn
For example, when divalent palladium compound is removed from amino acid and complexed with t, it is 1 and methanol is 1.5.
eeK, 1. - Glutamine oa y gm Radium(II) tetrachloride 0.1 g'a = Addition of 0.1 g'a = Addition of 0.0 g of radium (II). This complex compound is heated to 80 degrees Celsius to form radium? In the resulting complex compound, the chemical palladium (b) coordinates to the amine group of the amino acid to form J, -
The temperature of 50 to 200°C is bright, for example, and the temperature of 50 to 200°C is bright, ! Example of use of the complex compound of the present invention (explanation).Use (1) Immerse the proboscis to be plated in a water bath containing the complex compound and pull it up. By heating, palladium is formed on the surface of the object to be plated.The complex compound is dispersed in a rubber-phenolic adhesive, and the adhesive is coated with epoxy on a glass cloth. It is applied to the surface of the impregnated laminate, etc., and is heated and dried to form a metal palladium. The base material is impregnated, and a laminate is manufactured by a normal method. When the brigreg is dried, metal palladium is generated by the heat when the laminate is heated and pressed. (4) Lead compound, M of polyester resin. Disperse in a organic solvent, pour and form two films (wire mesh palladium is produced by heating during heat removal of organic shavings) 0 (5) Tetrahydro of 7% polyimide with 9% lead Dispersed in the fushin bath, the heat of the time will cause the formation of gold baladicum, and the insulation of the fence will become more than 71.00. In summary, the catalyst for plating non-screened steel of the present invention has the following advantages: (1) Because the particles of the produced basidium are fine, the catalyst for electroless plating of bamboo obtained is Since 1st grade is used without using carriers such as Tsun, 0 (2) name Tsukito, f Shigetsu → ka = Jf Pideme 9, j phrase - easy to mix 0 ( 5J Impurities such as Sn, C1, etc.
.

た無゛亀解めつきの杓性が良い。He has a good ability to understand things easily.

5− ]上 本ノー を市 −1E 店− 1、事1′1の表示 昭丁1158升1異1:願第144634号2、発明の
名称 無電解銅めっき用触媒 3、補正をする者 車外との関係 特許出願人 住所 東京都新宿区西新宿二丁目1番F号名称(445
)日立化成工業株式会社 代表汁横山亮次 4、 イ(JlL)、 ■160 居所 東京都新宿区西新宿二丁目1番1号日立化成工業
株式会社内 (電話 東京 346−3]11 (大代表)6、補正
の内容 別紙の通り。
5-] Above This No. -1E Store- 1. Display of matter 1'1 1158 sho 1 difference 1: Application No. 144634 2. Title of invention Catalyst for electroless copper plating 3. Person making the amendment outside the vehicle. Relationship with Patent applicant address No. F, 2-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo Name (445)
) Hitachi Chemical Co., Ltd. Representative Director Ryoji Yokoyama 4, Lee (JIL), ■160 Address Hitachi Chemical Co., Ltd., 2-1-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo (Tel: Tokyo 346-3) 11 (Main representative) ) 6. Details of the amendments are as shown in the attached sheet.

明 細 誓 1、発明の名称 無″屯騨餉め−)@用触媒 2、鉤IFf細求の41I!題 1、 2i1111(/Jパラジウム化打付9カ又、1
訓、21田jの銅化8−物?アミノ■とli比、させて
侍らn。
Details Oath 1, No title of the invention "Tun-Dan-Cook Me-) @ Catalyst 2, 41I! of hook IFf request! Title 1, 2i1111 (/J Palladium-plated 9-kilometer, 1
Kun, 21 ta j's copper 8- thing? Amino ■ and li ratio, let samurai n.

〃1j熱V(より曽輌パラジウム又は蛍栖痢を生成する
藉化付吻τぼむ焦中績蝙a〕つき用触妹05、発明の1
網11な祝町 本弁明は、無11L駒銅めっき用触緑e(圓丁ゐ0熊也
鱗絢めっさは、印刷配庫板の分明−C1槓鳩板4?O帽
紛革板に1Qj路γ彩成丁ゐにめVC広く用いられてい
る。
〃1j Fever V (more palladium or pharyngeal fever-producing proboscis τ-bom jiao-chu-kiri-bata) 05, Invention 1
Net 11 Iwaimachi Honbenmei is No 11L piece bronze plated touch green e (Ending 20 Kumaya Scale Aya Messa is the printing distribution board understanding-C1 dove board 4? O cap powder leather board It is widely used in VC.

こり揚曾、絶縁水板の無電解鋼めっさか施さ扛る聞は活
性化、テなわら無電解鋼めっきのためのPPJi課核か
形成ざjLる0この盾謀枳τ申)1ノVCして%無a解
卸jめっき故申り銅イオンが析出し、成長して鯛嗅とな
り1回路となる0 絶縁&仮τ活性化するために、無電解鋼めっきのための
触媒となる金椙パラジウム又eユ金為鮒τ側縁舖似表囲
に形成式せている。
When the electroless steel plating of the insulating water plate is applied, it is activated, and the PPJI section core for electroless steel plating is formed. During VC and %A release, copper ions precipitate and grow to form a single circuit, becoming a catalyst for electroless steel plating in order to activate insulation and temporary τ. There is a formation type on the side edge of Kanazawa Palladium or e Yukin Tame Funa τ side edge.

oE米、トリえはこQ金椙パラジウムrJCl PdC1m + Sn(Jm Pd +5nCA!4の
反応で侍ら′nており、自−L繰まなどの相坏に招待さ
れ、触Itφrト用?米丁よつに工夫されてい心。
oE rice, Tori Ehako Q Kanasu palladium rJCl PdC1m + Sn (Jm Pd +5nCA! 4 reaction, the samurai 'n'n was invited to the association such as J-L, and touched Itφr to? Yonecho It's a well-thought-out heart.

そのため、Sn、Cβなとの小軸物tψ〈会むうぇに亀
イキ体τ披用丁67tめ、徽虐創vC混入し、アティテ
ィグ印Aβ11 k lR仮用り艦盾納(肱緑入り)N
IX層板忙裏煩する硼貧、でり、ねじtL7ji発生し
、側縁性に魅点かあり、又、絶林篭1の絶線1曽中V(
α入子bcとを一1困ルであっkO本弁明はこりような
点に艦みてなちγしたもので、21曲bりラジクム化合
吻又は11曲、21曲Q銅化会吻τ、アミノ酸と反応ざ
ぜて侍らtL、加熱により金践パラジウム又1J金桐嗣
を生11にする蛤化合妨r宮む煕岨牌鯛めりさ用触嫁で
ある。
Therefore, Sn, Cβ and small axis tψ〈meeting tortoise body τ and 67t, mixed with Hui torture vC, Atitigu mark Aβ11 k lR temporary ship ship (with green color) N
The IX layer plate is busy and has troubles, edges, and screws tL7ji, and the side edges are attractive, and the disconnection 1 of Zetsurinkago 1 Sochu V (
α Insert bc and 11 troubles kO This defense is based on the ship's point of view. It reacts with amino acids and heats up the metal palladium or 1J metallurgy.

211IiIリバラジワム化合物として01埴化パラジ
ウム(Iす、フッ化バフジワム(川、臭化パラジウム(
■)、ヨウ化バラジクムtub、6MNバラジr) ム
(It)。
211IiI rivaradiwam compound as 01 palladium bromide (Isu, buffi fluoride (kawa), palladium bromide (
■), Baladicum iodide tub, 6MN Baladicum r) mu (It).

臥酸パラジウム(IU)、版化バラジワム(1す、減化
パラジウム(H)及びこtLらの混合物か使用さB6゜
ハロゲン化物、杓に環化バラジクム(川が好ましいo 
11曲、21曲の餉仕付物としては、埴化卸II几埴化
im(1」)、硫酸鋼(川及びこ(Lらの九曾吻かに用
さnゐ。
Palladium oxate (IU), baladium chloride (IU), reduced palladium (H) and a mixture of these are used.
The decorations for the 11th and 21st songs include Hanka Wholesal II Hanka Im (1), sulfuric acid steel (Kawa Takoko (L et al.'s Kusengoku Kani).

アビノばとしては、グルメゼ/醸、アスパラキンj亥、
グリシン、アラニ/、バリン、フェニルアラニン及びこ
れらの混合物か使用さnゐ021曲りパラジウム化付吻
tアミノ酸と反応させて錯化合物τ侍るVcは、例えば
、メタノール1.5CCVc、L−グルp<ンu、17
 gs fM化バ2ジウム(11J11sl加χ做とう
することVCよジ侍らn心。この輪化曾1勿rJBO℃
の刀0熱でψ楓パラジウムを生成丁ゐ0侍られた鉋化曾
吻で汀。
As for Abinobaba, gourmetase/jojo, asparagus,
Glycine, arani, valine, phenylalanine and mixtures thereof are used to react with bent palladized amino acids to form a complex compound τ, for example, methanol 1.5 CCV, L-glue p , 17
gs fM vanadium (11J11sl addition) VC Yoji Samurai n mind.
ψ Kaede palladium is generated with zero heat of the sword.

塩化パラジウム(IJJ 0アミノ酸のアミン基に配位
しており、アミ石I5結曾する炭水Vc帖曾する分位し
た水素により壬橋パラジウムか生々にさ扛る0 加熱確度に、ガχは50〜200−Cか好1しく、アば
ノ@の樵類により鳩硯が大めら1しる。
Palladium chloride (IJJ0) is coordinated to the amine group of the amino acid, and is exposed to palladium Imbashi by the hydrogen that is separated from the carbon water Vc that forms the amicite I5. 50-200-C is preferable, and the pigeon inkstone is made large by the woodcutter of Abano@.

5− 4;発明の錯化什物の使用例を瓶明する。使用猶にPd
 、CII C/J−1口でケj1慮−%以下か好還し
い。
5-4; Examples of use of the complexing material of the invention will be explained. Pd after use
, CII C/J-1 mouth is less than 1% or less.

(1) シh化付物τ−゛む水wj欣中VC被めっき物
ン陸rKシ引き上げ、加熱することVCLすvンめっき
切次1ftl VC敞掬パラジウム又は金楓納r主71
にさ一+!:/)。
(1) Raise and heat the VC plating object in the water tank and heat it.
Nisaichi+! :/).

(2)罎化f5−物τ、ゴムーフェノール系咎の1g膚
犀」申VC分散し、この桜盾R1JτカラスイロV(エ
ボヤシrせ反した邊貞1麹値専の表1用IC頭イ11シ
、力l熱vi、沫f 6 J3. I’dで蜜縞バシシ
ウム又に金極鋼忙午取させる。
(2) Introducing f5-product τ, 1g of rubber-phenol-based toxins. 11 shi, power l fever vi, 沫 f 6 J3.

(5)軸化付物て、エホキシ樹1j口のアセトン浴故申
VC分IPiδぜにソニスケカラス涌勅υ丞材r(せ反
させ、適音の力泳にエリ偵鳩仮を装造するO プリ プ
レグ′の乾縁1j、7.4貞J−板q)刀ロ熱力11圧
狩り熱により金桝パラジウム又a金#4鋼か庄成丁/b
(5) With the axle attachment, the acetone bath accident of the epoxy tree 1j mouth IPi δ and the Soniske Karasu wakucho υ material (reverse it, and set up the eli reconnaissance pigeon temporary in the force stroke of the appropriate sound). Preg' dry edge 1j, 7.4 Tei J-plate q) Katana Ro thermal power 11 pressure hunting heat and gold palladium or a gold #4 steel or Sho seicho/b
.

(4)錆化合’IvJ= * ポリエステル位Illぽ
の有機溶11すf61)欠申Vc分n又6ぜ、V毘少止
法でフィルムτつ(小。 /′に恨梗浴卸」q)力11
46除去中の刀n熱に よ り慟2見輻4− パラジウム又は金属鋼が缶底する。
(4) Rust compound 'IvJ= * Organic solution of polyester position Illpo 11sf61) Deficiency Vc minute n and 6ze, film τ one (small. ) force 11
46 The heat during removal causes the palladium or metal steel to burn to the bottom of the can.

(5)卸仕付’# k * ポリイばドのテトラヒドロ
フラン浴故中に分散さぜ、銅線に扱援丁ゐ。焼き付は時
の熱により合軸パラジウム又e、J金鵜附がtJE、敢
し触媒性r有丁杷厭通絨が狗らjl−ゐ。
(5) Wholesale distribution'#k * Disperse polyamide in a tetrahydrofuran bath and treat it to copper wire. Seizing occurs due to the heat of time, and the J gold is tJE.

以上Hに四したよりに、4発明の無m房鋼めっき用P!
i!媒は、次の4り点か通せら扛め。
Based on the above H, the P for plating without m tassel steel of the 4th invention!
i! The medium should pass through the following four points.

(1)1瓜する金秋パラジウム又a苔属嗣り教子か卸1
かいKめ、侍らイ[た無41.所めっきの時性が攪扛ゐ
0 12) 4+↓捺士寺の#Li庫ケ使用しないですむの
で。
(1) 1 golden autumn palladium or a moss successor teacher wholesale 1
Kai K, samurai [Tamu 41. Because the timing of plating is agitated ゐゐゐ12) 4+↓I don't have to use #Li storage at Sashiji Temple.

浴数中での使用が1jJj+t=であり、均一混打か容
易0 (3J bn、(、;g4rの不純W=含−1aい7I
:ohibらjL7を無′14.屏めっきの狩性か艮い
O5−
The number of baths used is 1jJj+t=, and uniform mixing is easily 0 (3J bn, (,;g4r impurity W=contains -1a 7I
:ohib et al. jL7 without '14. The hunting nature of the folding plate O5-

Claims (1)

【特許請求の範囲】[Claims] 1.21曲のパラジウム化付物メは、11曲、21曲の
物化合物?アミン敞と反応させて伶ら几。 加熱により金塊パラジウムを生成丁々妬化合物紫言む無
電解鋼めっき用触媒。
1. Is the palladium compound of 21 songs the compound of 11 and 21 songs? React with amine filtrate. A catalyst for electroless steel plating that produces gold ingot palladium by heating.
JP14463483A 1983-08-08 1983-08-08 Catalyst for electroless copper plating Pending JPS6036675A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14463483A JPS6036675A (en) 1983-08-08 1983-08-08 Catalyst for electroless copper plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14463483A JPS6036675A (en) 1983-08-08 1983-08-08 Catalyst for electroless copper plating

Publications (1)

Publication Number Publication Date
JPS6036675A true JPS6036675A (en) 1985-02-25

Family

ID=15366612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14463483A Pending JPS6036675A (en) 1983-08-08 1983-08-08 Catalyst for electroless copper plating

Country Status (1)

Country Link
JP (1) JPS6036675A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0370699U (en) * 1989-11-08 1991-07-16

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0370699U (en) * 1989-11-08 1991-07-16

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