JPS6038195A - Support for planographic printing plate - Google Patents
Support for planographic printing plateInfo
- Publication number
- JPS6038195A JPS6038195A JP14746083A JP14746083A JPS6038195A JP S6038195 A JPS6038195 A JP S6038195A JP 14746083 A JP14746083 A JP 14746083A JP 14746083 A JP14746083 A JP 14746083A JP S6038195 A JPS6038195 A JP S6038195A
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- support
- printing
- plate
- chromium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims abstract description 169
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 90
- 239000000463 material Substances 0.000 claims abstract description 77
- 229910052742 iron Inorganic materials 0.000 claims abstract description 45
- 238000005520 cutting process Methods 0.000 claims abstract description 21
- 230000003746 surface roughness Effects 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 abstract description 47
- 239000000126 substance Substances 0.000 abstract description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 33
- 238000010186 staining Methods 0.000 abstract description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 58
- 238000011282 treatment Methods 0.000 description 47
- 239000011651 chromium Substances 0.000 description 45
- 229910052804 chromium Inorganic materials 0.000 description 44
- 229910000831 Steel Inorganic materials 0.000 description 41
- 239000010959 steel Substances 0.000 description 41
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 40
- 238000007747 plating Methods 0.000 description 36
- 229920005989 resin Polymers 0.000 description 33
- 239000011347 resin Substances 0.000 description 33
- 239000011248 coating agent Substances 0.000 description 29
- 238000000576 coating method Methods 0.000 description 29
- 239000010410 layer Substances 0.000 description 28
- 238000012360 testing method Methods 0.000 description 28
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 26
- 239000000203 mixture Substances 0.000 description 23
- -1 cracks Substances 0.000 description 22
- 238000012545 processing Methods 0.000 description 22
- 238000000866 electrolytic etching Methods 0.000 description 21
- 150000001875 compounds Chemical class 0.000 description 19
- 239000000243 solution Substances 0.000 description 19
- 239000007788 liquid Substances 0.000 description 18
- 239000007864 aqueous solution Substances 0.000 description 16
- 238000005406 washing Methods 0.000 description 16
- 239000013078 crystal Substances 0.000 description 15
- 238000001035 drying Methods 0.000 description 15
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 14
- 150000003839 salts Chemical class 0.000 description 14
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 13
- 238000011161 development Methods 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 10
- 238000004381 surface treatment Methods 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 239000002585 base Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 229930003836 cresol Natural products 0.000 description 7
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 239000002335 surface treatment layer Substances 0.000 description 7
- 229920003169 water-soluble polymer Polymers 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 6
- 238000005238 degreasing Methods 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 5
- 239000008151 electrolyte solution Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 150000002989 phenols Chemical class 0.000 description 5
- VZQBDGHUOBRFAA-UHFFFAOYSA-N 2-(2,6-dihydroxyphenyl)benzaldehyde Chemical compound C1(O)=C(C(O)=CC=C1)C1=CC=CC=C1C=O VZQBDGHUOBRFAA-UHFFFAOYSA-N 0.000 description 4
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- 229920002678 cellulose Polymers 0.000 description 4
- 235000010980 cellulose Nutrition 0.000 description 4
- 235000013339 cereals Nutrition 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 4
- 230000003628 erosive effect Effects 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- 229910000975 Carbon steel Inorganic materials 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 229920002472 Starch Polymers 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 150000001299 aldehydes Chemical class 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 3
- 210000003323 beak Anatomy 0.000 description 3
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 239000010962 carbon steel Substances 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 239000001913 cellulose Substances 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 238000000635 electron micrograph Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910001507 metal halide Inorganic materials 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000007645 offset printing Methods 0.000 description 3
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 238000001878 scanning electron micrograph Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 239000008107 starch Substances 0.000 description 3
- 235000019698 starch Nutrition 0.000 description 3
- 150000003438 strontium compounds Chemical class 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical group OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- 241000345998 Calamus manan Species 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 229920000742 Cotton Polymers 0.000 description 2
- 239000004375 Dextrin Substances 0.000 description 2
- 229920001353 Dextrin Polymers 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- VSGNNIFQASZAOI-UHFFFAOYSA-L calcium acetate Chemical compound [Ca+2].CC([O-])=O.CC([O-])=O VSGNNIFQASZAOI-UHFFFAOYSA-L 0.000 description 2
- 239000001639 calcium acetate Substances 0.000 description 2
- 235000011092 calcium acetate Nutrition 0.000 description 2
- 229960005147 calcium acetate Drugs 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- UOUJSJZBMCDAEU-UHFFFAOYSA-N chromium(3+);oxygen(2-) Chemical class [O-2].[O-2].[O-2].[Cr+3].[Cr+3] UOUJSJZBMCDAEU-UHFFFAOYSA-N 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000002178 crystalline material Substances 0.000 description 2
- 235000019425 dextrin Nutrition 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000005323 electroforming Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 238000010297 mechanical methods and process Methods 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 229920005615 natural polymer Polymers 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 235000012950 rattan cane Nutrition 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 238000005488 sandblasting Methods 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- UBXAKNTVXQMEAG-UHFFFAOYSA-L strontium sulfate Chemical compound [Sr+2].[O-]S([O-])(=O)=O UBXAKNTVXQMEAG-UHFFFAOYSA-L 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 2
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- SIWNEELMSUHJGO-UHFFFAOYSA-N 2-(4-bromophenyl)-4,5,6,7-tetrahydro-[1,3]oxazolo[4,5-c]pyridine Chemical compound C1=CC(Br)=CC=C1C(O1)=NC2=C1CCNC2 SIWNEELMSUHJGO-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 1
- XYJFAQCWRMHWFT-UHFFFAOYSA-N 2-sulfonylnaphthalene-1,4-dione Chemical class S(=O)(=O)=C1C(C2=CC=CC=C2C(C1)=O)=O XYJFAQCWRMHWFT-UHFFFAOYSA-N 0.000 description 1
- JYLNVJYYQQXNEK-UHFFFAOYSA-N 3-amino-2-(4-chlorophenyl)-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(CN)C1=CC=C(Cl)C=C1 JYLNVJYYQQXNEK-UHFFFAOYSA-N 0.000 description 1
- DQYSALLXMHVJAV-UHFFFAOYSA-M 3-heptyl-2-[(3-heptyl-4-methyl-1,3-thiazol-3-ium-2-yl)methylidene]-4-methyl-1,3-thiazole;iodide Chemical compound [I-].CCCCCCCN1C(C)=CS\C1=C\C1=[N+](CCCCCCC)C(C)=CS1 DQYSALLXMHVJAV-UHFFFAOYSA-M 0.000 description 1
- ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 1
- 244000215068 Acacia senegal Species 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 241000286819 Malo Species 0.000 description 1
- 229910000617 Mangalloy Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 241000209140 Triticum Species 0.000 description 1
- 235000021307 Triticum Nutrition 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229920013820 alkyl cellulose Polymers 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 description 1
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 150000001553 barium compounds Chemical class 0.000 description 1
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 1
- 229910001632 barium fluoride Inorganic materials 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Inorganic materials [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-N bromic acid Chemical compound OBr(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229910001567 cementite Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000009500 colour coating Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 239000003337 fertilizer Substances 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 229920003063 hydroxymethyl cellulose Polymers 0.000 description 1
- 229940031574 hydroxymethyl cellulose Drugs 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- KSOKAHYVTMZFBJ-UHFFFAOYSA-N iron;methane Chemical compound C.[Fe].[Fe].[Fe] KSOKAHYVTMZFBJ-UHFFFAOYSA-N 0.000 description 1
- 229910002096 lithium permanganate Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910000734 martensite Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- NVKTUNLPFJHLCG-UHFFFAOYSA-N strontium chromate Chemical compound [Sr+2].[O-][Cr]([O-])(=O)=O NVKTUNLPFJHLCG-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003890 succinate salts Chemical class 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は鉄材を基材とする平版印刷版用支持体に関し、
詳しくは表面が粗面化された鉄材を基材とする耐薬品性
ならびに耐刷性が改良された平版印刷版用支持体に関す
る。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a support for a lithographic printing plate based on iron material,
More specifically, the present invention relates to a lithographic printing plate support having improved chemical resistance and printing durability and having an iron material with a roughened surface as a base material.
従来技術
平版印刷版用支持体としての物理的強度が高く、例えば
オフセヤト印刷機のシリンダー罠取りつける際、鋭角に
曲げるために切断する、いわゆるw版切れnを起こしに
くいという理由から上記支持体に鉄材を基材として用い
ることが知られている。Prior Art The above support is made of iron because it has high physical strength as a support for planographic printing plates, and is less likely to cause so-called "W plate breakage", which occurs when the cylinder trap of an offset printing machine is attached to a cylinder trap, which is caused by cutting at an acute angle. is known to be used as a base material.
すなわち、鉄材上に平担な外面で鋭い突起角が実質上存
在しない電着りpム層を有する平版印刷版用支持体が特
R@55−145193号公報に開示されており、また
特開昭57−138639号公報には、鉄板上に拡散ク
ラ、ク一孔を有し、クロムが結晶状に露出している電着
クロム層を有する支持体が記載されている。しかしこれ
らの支持体は、砂目がクロムの倣細な結晶のみで形成さ
れているため、砂目が浅く平版印刷版に適用した際、保
水性が不充分なため印刷時に地よごれを生じ易(、更に
表面の感光層は引っ掻き傷を生じやす(、製版時に生じ
た引っ掻き傷が印刷時に印刷物に再現される故障が生じ
易かった。That is, a support for a lithographic printing plate having an electrodeposited PM layer on an iron material with a flat outer surface and substantially no sharp protrusion angles is disclosed in Japanese Patent Application Publication No. R@55-145193, and Japanese Patent Application Publication No. 55-145193 discloses Japanese Patent No. 57-138639 describes a support having an electrodeposited chromium layer on an iron plate, which has diffusion cracks and holes, and in which chromium is exposed in the form of crystals. However, these supports have shallow grains and are made only of fine crystals of chromium, so when applied to lithographic printing plates, their water retention is insufficient and they tend to smudge during printing. (Furthermore, the photosensitive layer on the surface was prone to scratches.) Scratches generated during plate making were likely to be reproduced on printed matter during printing.
一方、粗面化された鉄材を基材とする平版印刷版用支持
体としては、例えば特開昭56−64597号、同56
−130395号、同56−130396号及び同56
−150592号に電気鋳造法によって製造される鉄材
を用いるものが記載されている。これらの支持体は前述
の平担な鉄材を基材として用いた支持体の欠点をある程
度は改良したが、これらの支持体を用いた平版印刷版は
画像部における感光層と支持体との接着性が充分でなく
、印刷作条中の汚れ除去、ガム引き等に用いられる各種
処理薬品や、アルコールを含んだ湿し水に画線部が浸さ
れや1−<、又長期印刷中に画線部が一部剥離したりし
て耐刷性が充分でないといった欠点や、現像に際して、
自動現像機を用いずスポンジに現像液を含ませて版を擦
って現像するいわゆる11手現像11などにより現像す
る際に画線部の損傷故障が起きやすいといった問題、即
ち現像方法の寛容度が狭いという問題を有している。On the other hand, as a support for a lithographic printing plate using a roughened iron material as a base material, for example, Japanese Patent Laid-Open No. 56-64597,
-130395, 56-130396 and 56
No. 150592 describes a method using iron material manufactured by electroforming. These supports have improved to some extent the drawbacks of the supports using flat iron as the base material, but lithographic printing plates using these supports have problems with adhesion between the photosensitive layer and the support in the image area. The print area may be soaked in various processing chemicals used for removing dirt or gumming from printing strips, dampening water containing alcohol, or the print may be damaged during long-term printing. There are drawbacks such as some peeling of the line parts and insufficient printing durability, and problems during development.
There is a problem that damage to the image area is likely to occur when developing by so-called 11-hand development 11, in which a sponge is soaked with developer and rubbed against the plate without using an automatic developing machine, in other words, the tolerance of the developing method is low. It has the problem of being narrow.
発明の目的
従っ−C本発明の目的は耐処理薬品性、耐刷性に優れ、
また現像方法の寛容度が広く、汚れのない多数枚の印刷
を行なうことができる平版印刷版用支持体を提供するこ
とにある。Purpose of the Invention - C The purpose of the present invention is to have excellent treatment chemical resistance and printing durability,
Another object of the present invention is to provide a support for a lithographic printing plate which has a wide latitude in developing methods and allows printing on a large number of sheets without staining.
本発明の他の目的は耐処理薬品性、耐刷性に優れ、また
現像方法の寛容度において優れ、汚れのない多数枚の印
刷を行うことができる感光性平版印刷版を提供すること
にある。Another object of the present invention is to provide a photosensitive lithographic printing plate which has excellent processing chemical resistance and printing durability, is excellent in the latitude of the developing method, and is capable of printing a large number of sheets without staining. .
本発明の更に他の目的は明に1■嶺の記載から明らかに
なろう。Still other objects of the present invention will become apparent from the description in part 1.
本発明者らは鋭意研究を重ねた結果、下記構成の平版印
刷版用支持体により上記目的が達成されることを見い出
した。As a result of extensive research, the present inventors have discovered that the above object can be achieved by a lithographic printing plate support having the following structure.
即ち本発明の平版印刷版用支持体は鉄材を基材と1″る
平版印刷版用支持体であって、その表面の粗さプロファ
イルRの切断深さ2.0μmにおけるピークカラ71・
(St y S2)の比が82 / s、 = 0.0
5〜5.0であり、バリーカウント(T、、T2)の比
がT2/ TI= 1.1−5.0であることを特徴と
するものである。That is, the lithographic printing plate support of the present invention is a lithographic printing plate support of 1" with an iron material as a base material, and has a surface roughness profile R with a peak color of 71 mm at a cutting depth of 2.0 μm.
The ratio of (St y S2) is 82/s, = 0.0
5 to 5.0, and the ratio of Barry count (T, , T2) is T2/TI=1.1-5.0.
本発明について更に詳細に説明する。The present invention will be explained in more detail.
本発明における平版印刷版用支持体は基材として鉄材が
用いられるが鉄材の素材としては純麩の他、鉄と他の元
素との合金を包含する。鉄と合金をつくる他の元素とし
ては例えば炭素、マンガン、ニッケル等が挙げられる。In the planographic printing plate support of the present invention, an iron material is used as a base material, and examples of the iron material include pure wheat as well as alloys of iron and other elements. Examples of other elements that form alloys with iron include carbon, manganese, and nickel.
合金と、しては、具体的には炭素鋼〔炭素(0,04〜
1.7%)と鉄の合金〕、炭素鋼より炭素含有率の高い
鋳鉄、更に他の元素(例えばマンガン、ニッケル、クロ
ム、コバルト、タングステン、モリブデン等)を加えた
特殊鋼(例えばマンガン鋼、二、ケル鋼、クロム鋼、ニ
ッケルークロム鋼等)等が挙げられる。上記炭素鋼とし
ては、極軟鋼(炭素0.25%以下)、軟鋼(0,25
〜0.5%)、硬鋼(炭素0.5〜1.0%)、極硬@
(炭素1.0%以上)が包含される。The alloy specifically refers to carbon steel [carbon (0.04~
1.7%) and iron], cast iron with a higher carbon content than carbon steel, and special steels containing other elements (e.g. manganese, nickel, chromium, cobalt, tungsten, molybdenum, etc.) (e.g. manganese steel, (2) KEL steel, chromium steel, nickel-chromium steel, etc.). The carbon steel mentioned above includes extremely mild steel (0.25% carbon or less), mild steel (0.25% carbon or less),
~0.5%), hard steel (carbon 0.5-1.0%), extra hard @
(carbon 1.0% or more) is included.
これを組織別分類として述べると、フ、ライト系、マル
テンサイト系、オーステナイト系、ソルバイト系、トル
ースタイト系、ノく−ライト系、セメンタイト系等が挙
げられる。When classified by structure, examples include fluorite, martensite, austenite, sorbite, troostite, nokurite, and cementite.
本発明に係わる鉄材としては、圧延法、電気鋳造法等に
より製造された板状(箔状のものを含む)の鉄材が使用
できる。As the iron material according to the present invention, a plate-shaped (including foil-shaped) iron material manufactured by a rolling method, an electroforming method, or the like can be used.
本発明において前記の基材の表面の粗さプロファイルR
とは、表面粗さを触針式表面粗さ計で測定した際のドイ
ツ規格DIN 4768に示されるM−システムで規定
されたもので、トレースされたプロファイルと中心線の
差を中心線を基準線として表わした曲線のことである。In the present invention, the surface roughness profile R of the base material
is defined by the M-system shown in the German standard DIN 4768 when surface roughness is measured using a stylus type surface roughness meter, and the difference between the traced profile and the center line is measured with the center line as the reference. A curve expressed as a line.
また本発明におけるピークカウント(S、 t st
)とは、粗さプロファイルRに於いて中心線に平行に設
定された切断線を越えたピークの1インチ当りの数であ
り、SIは第1図に示すように中心1i11より上側の
切断線2を越えたピークの数(第1図におけるX印の数
)であり、S2は中心線より下側の切断線3を越えたピ
ークの数(第1図における・印の数)である。Furthermore, the peak count (S, t st
) is the number of peaks per inch that exceed the cutting line set parallel to the center line in the roughness profile R, and SI is the number of peaks per inch that exceed the cutting line set parallel to the center line, as shown in Figure 1. S2 is the number of peaks exceeding 2 (the number of X marks in FIG. 1), and S2 is the number of peaks exceeding the cutting line 3 below the center line (the number of * marks in FIG. 1).
更に、本発明におけるバリーカウントT、は、第2図に
示すように粗さプロファイルRに於いて、上側の切断線
2を越えて、その次に続く谷の部分が下側の切断線3を
越えているピークの1インチ当りの数(第2図における
十印の数)であり、更にバリーカウントTzは第3図に
示すように、粗さプロファイルRに於いて、上側の切断
線2を越えて、その次に続く谷の部分が中心線を越えて
いるピークの1インチ当りの数(第3図におけるO印の
数)である。Furthermore, the burry count T in the present invention is such that in the roughness profile R, as shown in FIG. It is the number of exceeding peaks per inch (the number of ten marks in Fig. 2), and the burry count Tz is the number of peaks that exceed the upper cutting line 2 in the roughness profile R, as shown in Fig. 3. The number of peaks per inch (number of O marks in FIG. 3) exceeding the center line is the number of peaks that exceed the center line.
尚、上側の切断線と下側の切断線は、前記ピークカウン
ト、バリーカウント、何れに於いても中心線に対して対
象に設置されており、各々の中心線からの距離が切断深
さくC)である。本発明において、この切断深さくQは
2.0μmである。Note that the upper cutting line and the lower cutting line are installed symmetrically with respect to the center line in both the peak count and the burry count, and the distance from each center line is the cutting depth C. ). In the present invention, this cutting depth Q is 2.0 μm.
本発明に係わる鉄材のst/ slは0.05〜5.0
であり、好ましくは、0.1〜3である。更にs2≦s
工の関係にあって、S、と81の値が近いのが好ましく
、特に0.8〜1.0の範囲にあるのが好ましい。又、
本発明に係わる鉄材の’rz/ ’r、は1.1〜5.
0であり、好ましくは、1.1〜3、特に好ましくは1
.5〜2.7である。更に、st/ S、と’rt/
’r、の関係は、S2/ 81< T2/ TIである
のが好ましい。The st/sl of the iron material related to the present invention is 0.05 to 5.0
and preferably 0.1 to 3. Furthermore, s2≦s
It is preferable that the value of S and 81 be close to each other, particularly preferably in the range of 0.8 to 1.0. or,
'rz/'r of the iron material according to the present invention is 1.1 to 5.
0, preferably 1.1 to 3, particularly preferably 1
.. 5 to 2.7. Furthermore, st/S, and 'rt/
The relationship 'r is preferably S2/81<T2/TI.
上記ピークカウント、バリーカウントの測定に際しては
、少なくとも試料表面の異なる部位の10個所を測定し
、その平均値を測定値とする。ま/と測定長さは4.0
μm程度が好ましい。When measuring the peak count and burry count, at least 10 different locations on the sample surface are measured, and the average value is taken as the measured value. The measured length is 4.0
The thickness is preferably about μm.
また本発明に係わる基材表面の中心線平均粗さくRa)
としては0.1〜3μmが好ましく、より好ましくは0
.3〜2μmであり、特に0.4〜1.5μmの場合が
保水性の点で最も好ましい。In addition, the center line average roughness Ra) of the base material surface related to the present invention
is preferably 0.1 to 3 μm, more preferably 0.
.. The thickness is 3 to 2 μm, and most preferably 0.4 to 1.5 μm from the viewpoint of water retention.
ここに中心線平均粗さくRa )とは、ドイツ規格DI
N 4768に示されるように粗さプロファイルにおけ
る中心線からの該プロファイル上の各点ヘノ距離の絶対
値の相加平均であり、横方向の中心綜kX軸とし、縦方
向&Y軸とし、粗さプロファイル上の点を(z、y)で
表わしたとき、測定長さemについて下記式でめられる
Ra 値をミクロン単位で表わしたものである。Here, the center line average roughness (Ra) is defined by the German standard DI.
As shown in N 4768, it is the arithmetic mean of the absolute value of the distance from the center line of the roughness profile to each point on the profile, and the center axis in the horizontal direction is the X axis, and the vertical & Y axes are the roughness. When a point on the profile is expressed as (z, y), the Ra value calculated by the following formula for the measurement length em is expressed in microns.
上記のピークカウント(Sl、82)、バリーカウント
(’r+、Tt)、中心線平均粗さくRa )の値は、
例えばペルテン(Perthen )社製、ベルトメー
ター(Perthometer ) 85Pで測定でき
る。The above values of peak count (Sl, 82), burry count ('r+, Tt), and center line average roughness (Ra) are as follows:
For example, it can be measured using a Perthometer 85P manufactured by Perthen.
次に、本発明に係る表面形状な形成させる方法としては
、例えば機械的方法、電解によりエツチングする方法が
挙げられる。機械的方法としては例えばボール研磨法、
ブラシ研磨法、液体ホーニングによる研磨法等が挙げら
れる。電解によりエツチングする方法としては、リン酸
、硫酸、過塩素酸、塩酸、硝酸、ピロリン酸、フッ酸等
を含む溶液を用いてエツチングする方法が挙げられる。Next, methods for forming the surface shape according to the present invention include, for example, a mechanical method and an electrolytic etching method. Examples of mechanical methods include ball polishing,
Examples include a brush polishing method and a polishing method using liquid honing. Examples of the electrolytic etching method include etching using a solution containing phosphoric acid, sulfuric acid, perchloric acid, hydrochloric acid, nitric acid, pyrophosphoric acid, hydrofluoric acid, and the like.
粗面化された鉄材の製造にあたっては鉄材の組成等に応
じて上述の各種方法を適宜選択して使用することができ
る。本発明において特に好ましいのは電解によりエツチ
ングする方法である。In producing the roughened iron material, the various methods described above can be selected and used as appropriate depending on the composition of the iron material. Particularly preferred in the present invention is an electrolytic etching method.
電解エツチングは、前記の無機の酸を単独ないし2種以
上混合した浴で行なわれる。このうち好ましいものは硫
酸、リン酸、塩酸、硝酸またはこれらを2種以上混合し
た浴であり、特に好ましくは硫酸を主成分とする浴であ
る。この他にアルコール、無水酢酸等の有機物や重クロ
ム酸カリ等の無機物、またゼラチン、デンプン等のコロ
イド質類、更にグリセリン、その他の粘性物質、及び界
面活性剤等を添加剤として浴に加えることができる。こ
れらの添加剤は単独または2種以上混合して使用しても
よい。電解エツチング浴は水に前記の酸類及び必要に応
じて上記添加剤を加えて調製する。Electrolytic etching is carried out in a bath containing one or more of the above-mentioned inorganic acids. Among these, preferred are sulfuric acid, phosphoric acid, hydrochloric acid, nitric acid, or a mixture of two or more of these, and particularly preferred is a bath containing sulfuric acid as a main component. In addition, organic substances such as alcohol and acetic anhydride, inorganic substances such as potassium dichromate, colloids such as gelatin and starch, glycerin, other viscous substances, and surfactants may be added to the bath as additives. I can do it. These additives may be used alone or in combination of two or more. The electrolytic etching bath is prepared by adding the above-mentioned acids and, if necessary, the above-mentioned additives to water.
電解エツチングの際の浴温度は06〜100℃の範囲が
好ましく、電流密度は10〜200A/dm”の範囲が
好ましい。The bath temperature during electrolytic etching is preferably in the range of 06 DEG to 100 DEG C., and the current density is preferably in the range of 10 to 200 A/dm''.
電解エツチングを行なう際の前処理としては、機械研摩
、脱脂、酸洗い等を必要に応じて適用する。脱脂処理と
しては、溶剤洗浄やアルカリ煮沸、アルカリ浴による電
解処理等が挙げられる。As pretreatment for electrolytic etching, mechanical polishing, degreasing, pickling, etc. are applied as necessary. Examples of the degreasing treatment include solvent cleaning, alkaline boiling, and electrolytic treatment using an alkaline bath.
脱脂処理に用いられるアルカリとしては、水酸化ナトリ
ウム、炭酸ナトリウム、ケイ酸ナトリウム、リン酸ナト
リウム等があり、また界面活性剤を添加することもでき
る。Examples of the alkali used in the degreasing treatment include sodium hydroxide, sodium carbonate, sodium silicate, and sodium phosphate, and a surfactant may also be added.
電解エツチングの際の後処理としては、水洗の後、希酸
洗浄しアルカリで中和処理し水洗する方法等が必要に応
じ用いられる。またエツチングが過剰になると、鉄表面
にスマット(汚れ、smut)が付着するので、必要に
応じ、デスマット処理を施すことができる。デスマット
処理としては、予備洗浄、タンプリングあるいは蒸気プ
ラスト等の機械的処理、アルカリクリーナーによる陽極
洗浄、塩酸による脱スケール、スマット除去処理等が挙
げられる。As a post-treatment during electrolytic etching, a method of washing with water, washing with dilute acid, neutralizing with alkali, and washing with water is used as necessary. Moreover, if etching becomes excessive, smut will adhere to the iron surface, so a desmut treatment can be applied as necessary. Examples of the desmut treatment include preliminary cleaning, mechanical treatment such as tampling or steam blasting, anodic cleaning with an alkaline cleaner, descaling with hydrochloric acid, and smut removal treatment.
本発明においてn鉄材を基材とするlとは、鉄材をその
まま平版印刷版用支持体として用いてもよいし、鉄材に
表面処理または裏打ち等の処理を施してもよいことを意
味する。In the present invention, the term ``n'' based on an iron material means that the iron material may be used as it is as a support for a lithographic printing plate, or the iron material may be subjected to surface treatment, lining, or other treatments.
上述の粗面化された鉄材は前述のピークカウントの比B
J Bs及びパリーカウントの比T!/ TI、更に好
ましくは中心線平均粗さRa表面処理を施して設けられ
る表面処理層の版面側の表面形状が紬述の範囲内にある
限りにおいて各種の表面処理な施してもよい。The above-mentioned roughened iron material has the above-mentioned peak count ratio B
J Bs and parry count ratio T! / TI, more preferably centerline average roughness Ra. Various surface treatments may be applied as long as the surface shape of the plate side of the surface treatment layer provided by surface treatment is within the range described above.
紬記の表面処理としては例えば亜鉛、二、、ケル、銅、
錫、クロム等を電気めっき、化学めっき、溶融めっき等
によりめっきする方法、リン酸塩、シュク酸塩、クロム
酸塩等による皮膜化成法(電解による方法でもよい。)
、アルミニ2ム等を蒸着する方法等が挙げられる。また
2以上の表面処理を順次施してもよい。Examples of surface treatments for Tsumugi include zinc, chlorine, copper,
Methods of plating tin, chromium, etc. by electroplating, chemical plating, hot-dip plating, etc., film formation methods using phosphates, succinates, chromates, etc. (methods by electrolysis may also be used)
, a method of vapor depositing aluminum 2m, etc. Further, two or more surface treatments may be performed sequentially.
粗面化された鉄材が箔の如く薄い場合には金属板、プラ
スチ、クフイルム等を直接または接着層を介して裏面に
貼り合わせてもよい。If the roughened iron material is thin like foil, a metal plate, plasti, Kufilm, etc. may be attached to the back surface directly or via an adhesive layer.
上述の表面処理により形成される層(表面処理層)の形
状としては種々のものが適用でき、例えば表面に突起部
が事質上存在しないもの、即ち表面処理層の膜厚が実質
的に均一なもの、クラ、り、孔の存在する多孔性のもの
、及び結晶状の突起部が表面に存在する。ものが挙げら
れる。本発明において好ましい表面処理層は表面に突起
部を有するものである。Various shapes can be applied to the layer formed by the above-mentioned surface treatment (surface treatment layer), for example, one in which there are essentially no protrusions on the surface, that is, the thickness of the surface treatment layer is substantially uniform. On the surface, there are pores, cracks, pores, and crystalline protrusions. Things can be mentioned. In the present invention, a preferable surface treatment layer has protrusions on the surface.
上記突起部の形状として好ましいものとしては、例えば
小さい丸形突出部のある曲面状のやや凝集した、だ臼体
状粒子が融合的に凝集した集合体であって、該集合体に
は角が実質上ないもの5例えば特開昭55−14519
3号公報に記載のもの、並びに角のある結晶状物及び/
又はその凝集体例えば本出願人の昭和57年6月18日
出願の特願昭57−105724 号明細書(発明の名
称「平版印刷版用支持体」)に記載のものが挙げられる
。表面処理層とし′Cは特に、角のある結晶状豐及び/
又はそのIil集体を有するものが平版印刷版の耐刷性
、現像性の寛容度にオ6いて、より優れており好ましい
。角のある結晶状物としては板状または多面体状例えば
立方体状のものが好ましい。A preferable shape of the protrusions is, for example, an agglomerate of curved, slightly agglomerated, agglomerated agglomerated particles with small round protrusions, and the aggregation has corners. Substantially non-existent 5 For example, JP-A-55-14519
Those described in Publication No. 3, as well as angular crystals and/or
or aggregates thereof, such as those described in Japanese Patent Application No. 105724/1983 filed by the present applicant on June 18, 1982 (title of the invention: "Support for lithographic printing plates"). The surface treatment layer 'C is particularly composed of angular crystalline rattan and/or
Or, those having Iil aggregates are preferable because they have better printing durability and developability latitude of lithographic printing plates. The angular crystalline material is preferably plate-shaped or polyhedral, for example cubic.
板状結晶状物としては、多角形、主として6角形の板状
のものが好ましく、多角形状の面の径は0、3〜5 t
m(1)ものが好ましく、厚さは0.01−0.8μm
のものが好ましい。多面体状結晶状豐としては特に直
径が0.05〜5μmのものが好ましい。上述の突起物
の投影面積率としては20%以上が好ましい。ここに、
投影面積率は本発明の支持体面に垂直な方向の投影、即
ち、正投影におけるものであって、該面積率は顕微鏡写
真等により測定できる。The plate-like crystalline material is preferably a polygonal, mainly hexagonal plate, and the diameter of the polygonal surface is 0.3 to 5 t.
m(1) is preferable, and the thickness is 0.01-0.8 μm
Preferably. As the polyhedral crystalline rattan, one having a diameter of 0.05 to 5 μm is particularly preferable. The projected area ratio of the above-mentioned protrusions is preferably 20% or more. Here,
The projected area ratio is a projection in a direction perpendicular to the surface of the support of the present invention, that is, an orthogonal projection, and the area ratio can be measured using a photomicrograph or the like.
又、突起物は、表面に0.05〜5μm突起しているこ
とが好ましく、特に0.2〜4μm突起していることが
好ましい。Further, the protrusions preferably protrude from the surface by 0.05 to 5 μm, particularly preferably by 0.2 to 4 μm.
表面処理層の厚さは0.O1〜5 rimが好ましく特
に0.05〜3μmが好ましい。The thickness of the surface treatment layer is 0. O1-5 rim is preferred, particularly 0.05-3 μm.
この膜厚はケイ光X線分析等により、基準の膜厚既知の
層により、予め作成しておいた検量線から定量して平均
値としてめることができる。This film thickness can be determined as an average value by quantifying it from a calibration curve prepared in advance using a layer of known reference film thickness using fluorescent X-ray analysis or the like.
本発明においては表面処理層が、クロム系、例えばクロ
ム電着層である場合が好ましい。In the present invention, the surface treatment layer is preferably a chromium-based layer, such as a chromium electrodeposited layer.
クロム電着層の元素組成はクロム及びrR累から実質的
になり、深さ方向の元素分析から、りpム酸化物(この
酸化物には水和物も包含される。)及び金属クロムから
実質的に構成され、深くなるにつれて金属クロムの比率
が多くなっていると判断される。クロム酸化物としては
2価、3価又は6価のクロムの酸化物が挙げられるが主
として3価クロムの酸化物であや。The elemental composition of the chromium electrodeposited layer consists essentially of chromium and rR, and elemental analysis in the depth direction shows that it is composed of chromium oxide (this oxide also includes hydrates) and metallic chromium. It is judged that the proportion of metallic chromium increases as the depth increases. Examples of chromium oxides include divalent, trivalent, and hexavalent chromium oxides, but mainly trivalent chromium oxides.
次に突起部な有するクロム電着層を設ける代表的な方法
を示す。Next, a typical method of providing a chromium electrodeposition layer having protrusions will be described.
小さい丸形突出部のある曲面状のやや凝集しただ臼体状
粒子が融合的に凝集した集合体から構成される角のない
突起部を有するクロム電着層はピフルオライドな含む粒
子化槽に鉄材を浸漬した後、Cra+/ B O,!−
の割合を75〜180に保持する量の水、無水クロム酸
及び硫酸を含むめっき浴中で少くとも刃秒間電気めっき
することに°より製造できる。The chromium electrodeposited layer, which has rounded protrusions consisting of agglomerated aggregates of slightly agglomerated curved, slightly agglomerated curved cylindrical particles with small round protrusions, is deposited on iron material in a granulation tank containing pyfluoride. After soaking Cra+/B O,! −
It can be produced by electroplating for at least a blade second in a plating bath containing water, chromic anhydride and sulfuric acid in amounts that maintain the ratio of 75 to 180.
具体的な条件については特開昭55−145393号公
報に詳しく記載されている。Specific conditions are described in detail in JP-A-55-145393.
角のある結晶状物及び/又はその凝集体である突起部を
有するクロム電着層を鉄材上に設ける好ましい方法とし
ては例えば電解液な冷却または加熱して液温を調節し、
電解処理を行うものである。A preferred method for providing a chromium electrodeposited layer having protrusions that are angular crystals and/or aggregates thereof on a steel material is, for example, by cooling or heating an electrolytic solution to adjust the temperature of the solution.
It performs electrolytic treatment.
この電解液1は鉄材の表面に本発明による電着クロム層
を形成するための電着クロム層生成液である。This electrolytic solution 1 is an electrodeposited chromium layer forming solution for forming an electrodeposited chromium layer according to the present invention on the surface of an iron material.
表1 [解 液 l
無水クロム酸(Cr、Os) Zoo 〜500 、!
i’バリウム化合物 i −1of!
弗化物、例えば弗化水素()IF) O〜20F!硝
酸 0ν10g
酢 酸 0−1 g
水で全体をIgとする。Table 1 [Solution Solution l Chromic anhydride (Cr, Os) Zoo ~500,!
i' barium compound i -1of! Fluorides, such as hydrogen fluoride ()IF) O~20F! glass
Acid 0ν10g Acetic Acid 0-1g Add water to make Ig.
表2 電解条件l
直流電圧 5〜15(ロ)
電流密度 5〜50A/dm”
液 温 0〜60℃ 2
陰 極 鉄 材
膜 極 鉛電極
陰極と陽極との面積比 l :l〜l:1.5処理時間
2〜6分
この方法については本出願人による昭和57年6月18
日付出願の特願昭57−105723号明細書(発明の
名称「平版印刷版用支持体の製造方法」)に詳しく記載
されている。Table 2 Electrolysis conditions l DC voltage 5 to 15 (b) Current density 5 to 50 A/dm” Liquid temperature 0 to 60°C 2 Cathode Iron material film Electrode Lead electrode Area ratio of cathode to anode l: l to l: 1 .5 Processing time: 2 to 6 minutes This method was published by the applicant on June 18, 1982.
It is described in detail in Japanese Patent Application No. 57-105723 (title of the invention: ``Method for manufacturing a support for a lithographic printing plate'') filed on 1987-105723.
角のある結晶状物及び/又はその凝集体である突起部を
有するクロム電着層を鉄材上に設ける別の好ましい方法
は、[Cr11+] / [BO,2−] (ココに[
(r6 +]はOr’十のイオン濃度を、[5o−−コ
はso、”−のイオン濃度を表わす。)が75〜18
0のめっき液中、電流密度Zoo l’y’dm”以下
、温反40’C以下で、加秒間以上電解処理して鉄材上
に電着被覆をする方法である。該めっき液中、[Cra
+ 3はα2〜4,5モル/eが好ましく、0.5〜3
モル/eが特に好ましい。[3Q、!−コは0.01〜
0.046モル/eが好ましく、0.015〜0.03
モルが特に好ましい。Another preferred method for providing a chromium electrodeposited layer having protrusions that are angular crystals and/or aggregates thereof on a steel material is [Cr11+] / [BO,2-] (here [
(r6+] represents the ion concentration of Or'10, and [5o--ko represents the ion concentration of so,"-) is 75 to 18
This is a method of electrolytically treating the iron material in a plating solution with a current density of less than 40'C and a temperature of less than 40'C for a period of time or more.In the plating solution, [ Cra
+3 is preferably α2 to 4.5 mol/e, and 0.5 to 3
Especially preferred is mol/e. [3Q,! -ko is 0.01~
0.046 mol/e is preferable, 0.015 to 0.03
Moles are particularly preferred.
Cr’十供給源としては無水クロム酸が好ましく、SO
/−供給源としては硫酸が好ましい。Chromic anhydride is preferred as the Cr' source, and SO
/- Sulfuric acid is preferred as the source.
6価りロムイオン濃度と硫酸イオン濃度の比([Cr6
+]/[so4”−] )は75〜180であり、好ま
しくは80〜130の範囲である。本発明において用い
られるめっ、き液には他にフッ素化合物やストロンチウ
ム化合物等も含有することができる。フ。Ratio of hexavalent ROM ion concentration to sulfate ion concentration ([Cr6
+]/[so4''-]) is 75 to 180, preferably in the range of 80 to 130.The plating solution used in the present invention may also contain fluorine compounds, strontium compounds, etc. I can do it.
素化合物としては、フッ化アンモニウム、ケイフッ化ソ
ーダ、ケイフッ酸、ケイフッ化クロム等が挙げられる。Examples of the elementary compounds include ammonium fluoride, sodium fluorosilicide, hydrofluorosilicic acid, chromium fluorosilicide, and the like.
ストロンチウム化合物としては、硫酸ストロンチウム、
クロム酸ストロンチウム等が挙げられる。フッ素化合物
の添加量は0.5〜10g/eであり、ストロンチウム
化合物の添加量は3〜20みlである。Strontium compounds include strontium sulfate,
Examples include strontium chromate. The amount of the fluorine compound added is 0.5 to 10 g/e, and the amount of the strontium compound added is 3 to 20 microliters.
電解条件としては、電流密度が100A/dmt以下で
あり、好ましくは10〜304/dm”の範囲である。As for the electrolytic conditions, the current density is 100 A/dmt or less, preferably in the range of 10 to 304/dm''.
更にめっき浴温度は、好ましくは0〜40℃、特に好ま
しくは10〜30℃の範囲である。浴温と電流密度の関
係は、浴温か高いときには電流密度を高くし浴温か低い
ときには電流密度も低くするのが好ましい。好ましくは
浴温n±4℃と電流密度15〜201y’dm”の組合
わせである。この方法罠ついては、本出願人による昭和
57年6月園日付出願の特願昭57−114642号明
細書(発明の名称「平版印刷版用支持体の製造方法」)
に詳しく記載されている。Furthermore, the plating bath temperature is preferably in the range of 0 to 40°C, particularly preferably in the range of 10 to 30°C. Regarding the relationship between bath temperature and current density, it is preferable that when the bath temperature is high, the current density is high, and when the bath temperature is low, the current density is also low. Preferably, it is a combination of a bath temperature of n±4°C and a current density of 15 to 201 y'dm.The details of this method are described in the specification of Japanese Patent Application No. 114642/1987 filed in June 1982 by the present applicant. (Name of the invention “Method for manufacturing a support for lithographic printing plates”)
is described in detail.
次に前記のクロム電着層に適用できる多孔性クロムめっ
きについて述べる。多孔性クロムめっきは、クロムめっ
き後、逆電処理を施し、電解エツチングを行って得られ
る。普通1〜2%、硫酸浴中で30〜40 vdm”、
1〜2分間逆電解を行なうか、めっき浴中でめっき後、
逆電で(9)〜60 A/dm!、50〜ω℃、5〜1
0分間エツチングを行なう。Next, porous chromium plating that can be applied to the chromium electrodeposited layer will be described. Porous chromium plating is obtained by performing reverse electric treatment and electrolytic etching after chromium plating. Usually 1-2%, 30-40 vdm” in a sulfuric acid bath,
After plating by performing reverse electrolysis for 1 to 2 minutes or in a plating bath,
(9) to 60 A/dm with reverse current! , 50~ω℃, 5~1
Perform etching for 0 minutes.
クロム電着層を設ける工程(本処理)の後に適当な後処
理を施すことも可能である。It is also possible to perform an appropriate post-treatment after the step of providing the chromium electrodeposition layer (main treatment).
後処理工程として好ましい方法としては次の方法が挙げ
られる。Preferred methods for the post-treatment step include the following method.
クロム電着層を有する鉄材を必要に応じて酸又はアルカ
リ水溶液にて洗浄した後、過マンガン酸塩水溶液の表面
処理液にて表面処理する。After washing the iron material having the chromium electrodeposition layer with an acid or alkaline aqueous solution as required, the surface is treated with a surface treatment liquid of a permanganate aqueous solution.
上記の表面処理液中に使用される過マンガン酸塩の好ま
しいものとしては、過マンガン酸リチウム、過マンガン
酸ナトリウム、過マンガン酸カリウム、過マンガン酸ル
ビジウム、過マンガン酸カルシウム、過マンガン酸バリ
ウム等がある。使用される表面処理液中の過マンガン酸
塩の濃度は、0.05〜10重i%が好ましく、特に好
ましくは1.0〜5.0重量%である。処理液の温度は
0〜80℃が好ましく、特に好ましくは幻〜50’Cで
ある。この方法については本出願人による昭和57年6
月18日付特願昭57−105725号明細書(発明の
名称「平版印刷版用支持体の製造方法」)に更に詳しく
記載されている。Preferred permanganates used in the above surface treatment solution include lithium permanganate, sodium permanganate, potassium permanganate, rubidium permanganate, calcium permanganate, and barium permanganate. There is. The concentration of permanganate in the surface treatment liquid used is preferably 0.05 to 10% by weight, particularly preferably 1.0 to 5.0% by weight. The temperature of the treatment liquid is preferably 0 to 80°C, particularly preferably 50°C to 50'C. This method was described by the applicant in June 1982.
The method is described in more detail in Japanese Patent Application No. 105725/1983 (title of the invention: ``Method for manufacturing a support for a lithographic printing plate'') dated May 18, 1983.
後処理工程として別の好ましい方法は、次の方法である
。Another preferred method for the post-treatment step is the following method.
クロム電着層を有する鉄材を必要に応じて酸またはアル
カリ水溶液にて洗浄した後、水溶性高分子化合物、並び
にカルシウム、マグネシウム、亜鉛、/l+7ム、スト
ロンチウム、コバルト、マンガン、ニッケルおよびシリ
コンの水溶性塩から選ばれた少な(とも1つを含む溶液
の表面処理液にて表面処理する。After washing the iron material with the chromium electrodeposited layer with an acid or alkaline aqueous solution as necessary, water-soluble polymer compounds, as well as calcium, magnesium, zinc, strontium, cobalt, manganese, nickel, and silicon are added to the iron material. The surface is treated with a surface treatment solution containing at least one of the following salts.
水溶性高分子化合物としては、0.01%以上の溶解度
を有するものが好ましい。好ましい水溶性高分子化合物
としては、例えばアラビアガム、デンプン、デキストリ
ン、アルギン酸ナトリウム、ゼラチン等の天然高分子化
合物、水溶性セルロース系化合m、例tjf、カルボキ
シアルキルセルロースの水溶性塩(アルキルとしてはメ
チル、エチル、プロピル等)、アルキルセルロース、例
えばメチルセルロース、ヒドロキシメチルセルロース、
ヒドロキシエチルセルロース、ヒドロキシグロビルセル
ロース等、ポリアクリル酸またはその水溶性塩、ポリメ
タクリル酸またはその水溶性塩、アクリル酸共重合体ま
たはその水溶性塩、メタクリル酸共重合体またはその水
溶性塩、スチレン−無水マレイン酸共重合体、ポリビニ
ルアルコール、ポリアクリルアミド、ポリビニルピロリ
ドン等の合成高分子化合物、ここに高分子化合物の水溶
性塩としてはナトリウム塩、カリウム塩が挙げられる。The water-soluble polymer compound preferably has a solubility of 0.01% or more. Preferred water-soluble polymer compounds include, for example, gum arabic, starch, dextrin, sodium alginate, natural polymer compounds such as gelatin, water-soluble cellulose compounds m, examples tjf, water-soluble salts of carboxyalkylcellulose (alkyl is methyl , ethyl, propyl, etc.), alkylcelluloses such as methylcellulose, hydroxymethylcellulose,
Hydroxyethyl cellulose, hydroxyglobil cellulose, etc., polyacrylic acid or its water-soluble salt, polymethacrylic acid or its water-soluble salt, acrylic acid copolymer or its water-soluble salt, methacrylic acid copolymer or its water-soluble salt, styrene - Synthetic polymeric compounds such as maleic anhydride copolymer, polyvinyl alcohol, polyacrylamide, polyvinylpyrrolidone, etc. Water-soluble salts of the polymeric compounds include sodium salts and potassium salts.
以上の各種の水溶性高分子化合物は単独または2種以上
併用してもよい。水溶性高分子化合物の中でもデンプン
、デキストリン等の天然高分子化合物および水溶性セル
ロース化合物が好ましい。また、分子量としては500
〜i、ooo、oooのものが好ましく用いられる。The above various water-soluble polymer compounds may be used alone or in combination of two or more. Among water-soluble polymer compounds, natural polymer compounds such as starch and dextrin and water-soluble cellulose compounds are preferred. Also, the molecular weight is 500
~i, ooo, ooo are preferably used.
水溶性高分子化合物と共に用いられる水溶性塩として好
ましいのは0.01%以上の溶解度を有するものであり
、特に無機酸または有機酸のカルシウム、マグネシウム
、亜鉛、バリウム、ストロンチウム、コバルト、マンガ
ン、ニッケルおよびシリコンの塩である。代表的な有機
酸塩は、酢酸、プロピオン酸、酪酸、コノ・り酸、安息
香酸、サリチル酸のようなカルボン酸の塩およびアセチ
ルアセトネートである。代表的な無機酸塩は、塩化物、
臭化物、塩素酸塩、臭素酸塩、沃化物、沃素酸塩、硝酸
塩、硫酸塩および燐酸塩である。水溶性塩は単独または
2種以上併用してもよい。Water-soluble salts used with water-soluble polymer compounds are preferably those having a solubility of 0.01% or more, particularly inorganic or organic acids such as calcium, magnesium, zinc, barium, strontium, cobalt, manganese, and nickel. and silicon salts. Representative organic acid salts are salts of carboxylic acids such as acetic acid, propionic acid, butyric acid, cono-phosphoric acid, benzoic acid, salicylic acid and acetylacetonate. Typical inorganic acid salts are chloride,
Bromide, chlorate, bromate, iodide, iodate, nitrate, sulfate and phosphate. The water-soluble salts may be used alone or in combination of two or more.
水溶性塩としては、有機酸塩が特に好ましく、マグネシ
ウム、マグネシウム、バリウムおよび亜鉛の塩が特に好
ましい。この方法により形成される水溶性高分子化合物
および水溶性塩を含む層の皮膜量としては0.001〜
l 19/dm2が好ましく、特に0.05〜0.5m
9/dm”が好ましい。この方法及び形成される皮膜に
ついては本出願人による昭和57年6月18日付出願の
特願昭57−105726号明細書(発明の名称「平版
印刷版用支持体及びその製造方法」)に更に詳しく記載
されている。As water-soluble salts, organic acid salts are particularly preferred, and magnesium, magnesium, barium and zinc salts are particularly preferred. The coating weight of the layer containing the water-soluble polymer compound and water-soluble salt formed by this method is 0.001 to
l 19/dm2 is preferred, especially 0.05 to 0.5 m
9/dm" is preferred. This method and the film formed are described in Japanese Patent Application No. 105726/1983 filed by the present applicant on June 18, 1981 (title of the invention "Support for lithographic printing plate and The manufacturing method is described in more detail in "Manufacturing Method".
本発明の平版印刷版用支持体は、その特異な表面形状の
ため、感光性平版印刷版として用いられた際、その上に
設けられる感光層等親油性表面な有する多くの高分子化
合物を有する層との接着性に優れており、印刷時等に使
用する処理薬品に対する画線部の耐久性が極めて良好で
あり、かつ耐刷性も良好である。又、現像方法の寛容度
が広いため、過剰な摩耗現像処理である11手現像■で
も画像部が損失することが少ない。Due to its unique surface shape, the lithographic printing plate support of the present invention has many polymeric compounds on the lipophilic surface such as the photosensitive layer provided thereon when used as a photosensitive lithographic printing plate. It has excellent adhesion to the layers, has extremely good durability of the printed area against processing chemicals used during printing, and has good printing durability. In addition, since the development method has a wide latitude, image areas are less likely to be lost even in 11-hand development (1), which is an excessively abrasive development process.
更に印刷時において保水性に優れ、汚れ難い。Furthermore, it has excellent water retention properties and is resistant to staining during printing.
又、表面の画線部は引っ掻き傷を受けにくく、製版時に
生じた引っ掻き傷が印刷時に印刷物に再現される故障は
極めて少ない。In addition, the image area on the surface is not susceptible to scratches, and scratches caused during plate making are rarely reproduced in printed matter during printing.
尚、第4図は、硫酸浴で電解エツチング処理を施した本
発明の鉄材の表面の電子顕微鏡写真である。第5〜7図
は第4図の鉄材上に種々の形状の突起部を有するクロム
電着層を設けた本発明に係る支持体の表面の電子顕微鏡
写真である。第8図はピークカウント及びバリーカウン
トが本発明の範囲外にある鉄材の表面の電子顕微鏡写真
を示−f。FIG. 4 is an electron micrograph of the surface of the iron material of the present invention which has been electrolytically etched in a sulfuric acid bath. 5 to 7 are electron micrographs of the surface of a support according to the present invention in which a chromium electrodeposition layer having protrusions of various shapes is provided on the iron material of FIG. 4. FIG. 8 shows an electron micrograph of the surface of an iron material whose peak count and burry count are outside the range of the present invention.
本発明の支持体上に感光性組成物を例えば有機溶媒を用
いて塗設することにより感光性平版印刷版を製造するこ
とができる。A photosensitive lithographic printing plate can be produced by coating the photosensitive composition on the support of the present invention using, for example, an organic solvent.
感光性組成物は必須成分として感光性物質を含んでおり
、感光性物質としては、露ブCにより、現像液に対する
感光性組成物層の溶解性に差が生じるもの、露光の前後
で分子間の接着力に差が生じるもの、露光により感光性
組成物層の水及び油に対する親和性に差が生じるもの等
が使用できる。The photosensitive composition contains a photosensitive substance as an essential component, and the photosensitive substance includes those that cause a difference in the solubility of the photosensitive composition layer in the developer depending on exposure C, and those that cause differences between molecules before and after exposure. It is possible to use a material that causes a difference in the adhesive strength of the photosensitive composition layer, and a material that causes a difference in the affinity of the photosensitive composition layer for water and oil upon exposure.
以下その代表的なものについて説明する。先ず従来公知
の0−ナフトキノンジアジド化合物の如きキノンジアジ
ド型のポジ屋感光性つ質が挙げられる。Typical examples will be explained below. First, quinonediazide-type positive photosensitive substrates such as conventionally known 0-naphthoquinonediazide compounds are mentioned.
0−キノンジアジド化合物は、少な(とも1つの0−キ
ノンジアジド基好ましくは0−ベンゾキノンジアジド基
または0−ナフトキノンジアジド基を有する化合物で、
公知の種々の構造の化合物、例えば、J、 Kosar
著’i−Light−8ensitive Syste
msj(John Wlley & 5ons、 In
c、 1965年発行)第339頁〜353頁に詳細に
記されている化合物を包含する。特に種々のヒドロキシ
ル化合物と0−ナフトキノンジアジドスルフォン酸との
エステルが好適である。好ましいヒドロキシル化合物と
しては、フェノール類とカルボニル基含有化合物との縮
合樹脂、特に酸性触媒存在下での縮合により得られる樹
脂が挙げられる。該フェノール類としてはフェノール、
レゾルシン、クレゾール、ピロガロール等が挙げられ、
該カルボニル基含有化合物とし−Cは、ホルムアルデヒ
ド、ベンズアルデヒドの如きアルデヒド類、アセトンの
如きケトン類が挙げられる。0-quinonediazide compounds are compounds having at least one 0-quinonediazide group, preferably an 0-benzoquinonediazide group or an 0-naphthoquinonediazide group;
Known compounds of various structures, e.g. J. Kosar
Written by 'i-Light-8ensistive System
msj (John Wllley & 5ons, In
c, published in 1965), pages 339 to 353. Particularly suitable are esters of various hydroxyl compounds and 0-naphthoquinonediazide sulfonic acid. Preferred hydroxyl compounds include condensation resins of phenols and carbonyl group-containing compounds, particularly resins obtained by condensation in the presence of an acidic catalyst. The phenols include phenol,
Examples include resorcinol, cresol, pyrogallol, etc.
Examples of the carbonyl group-containing compound -C include aldehydes such as formaldehyde and benzaldehyde, and ketones such as acetone.
特に7−ノール・ホルムアルデヒド樹脂、クレゾ啼1ホ
ルムアルデヒド樹脂、ピロガロール・アセトン樹脂、レ
ゾルシン・ベンズアルデヒド樹脂が好ましい。Particularly preferred are 7-nol formaldehyde resin, creso-1 formaldehyde resin, pyrogallol acetone resin, and resorcinol benzaldehyde resin.
0−キノンジアジド化合物の代表的な具体例としては、
ベンゾキノン−(1,2)−ジアジドスルホニルクロラ
イドまたはナフトキノン−(1゜2)−ジアジドスルホ
ニルクロライドとフェノール・ホルムアルデヒド樹脂ま
たはフレジーA・・ホルムアルデヒド樹脂とのエステル
、米国特許第3゜635.709 号明細書に記載され
ているナフトキノン−(1,2)−ジアジドスルホニル
クロライドとピロガロール−アセトン樹脂のスル月−ン
酸エステル、特開昭56−1044 号公報に記載され
ているナフトキノン−(1,2)−ジアジド−(2)−
5−スルホニルクロライドとレソルシンーベンズアルデ
ヒド樹脂との縮合物、特開昭55−76346号公報に
記載されているナフトキノン−(ls 2)−ジアジド
−(2) −5−スルホニルクロライドとレゾルシン−
ピロガロール−アセトン共重縮合物とのエステル化合物
、その個有用な0−キノンジアジド化合物としては、特
開昭50−117503号公報に記載されている末端に
ヒドロキシル基を有するポリエステルにO−ナフトキノ
ンジアジドスルホニルクロライドをエステル化反応させ
たもの、特開昭5’0−11330!’i号公報に記載
されているよ511 p−ヒドロキシスチレンのホモポ
リマーまたはこれと他の共重合し得るモノマーとの共重
合体Ic o−ナフトキノンジアジドスルホニルクロラ
イドをエステル化反応させたもの等が挙げられる。Typical specific examples of 0-quinonediazide compounds include:
Esters of benzoquinone-(1,2)-diazide sulfonyl chloride or naphthoquinone-(1°2)-diazide sulfonyl chloride with phenol formaldehyde resin or Frazi A. formaldehyde resin, U.S. Pat. No. 3,635,709. Naphthoquinone-(1,2)-diazide sulfonyl chloride and pyrogallol-acetone resin sulfuric acid ester described in the specification, naphthoquinone-(1,2)-diazide sulfonyl chloride described in JP-A-56-1044; 2)-Diazide-(2)-
Condensate of 5-sulfonyl chloride and resorcin-benzaldehyde resin, naphthoquinone-(ls2)-diazide-(2)-5-sulfonyl chloride and resorcin-described in JP-A-55-76346
Ester compounds with pyrogallol-acetone copolycondensates and O-quinonediazide compounds that are particularly useful include O-naphthoquinonediazide sulfonyl chloride in polyesters having a hydroxyl group at the terminal described in JP-A-50-117503. esterification reaction, JP-A-5'0-11330! Examples include homopolymers of p-hydroxystyrene or copolymers of this with other copolymerizable monomers, and those obtained by esterification of Ico-naphthoquinonediazide sulfonyl chloride, as described in Publication No. It will be done.
これらの0−キノンジアジド化合物の含有量は感光性組
成物の全固形分に対し5〜80重量%カー好ましく、特
に好ましくは10−50重量%である。The content of these 0-quinonediazide compounds is preferably 5 to 80% by weight, particularly preferably 10 to 50% by weight, based on the total solid content of the photosensitive composition.
かかるキノンジアジド型のポジ型感光性物質を1必要に
応じて結合剤としてアルカリ可溶性樹脂と併用すること
ができる。アルカリ可溶性樹脂としては、フェノール類
とケトン類又はアルデヒド類を酸性触媒存在下で結合し
文得られるものが好ましい。該フェノール類としては、
例えばフェノール、クレゾール及びp−置換フェノール
等が挙げられる。該アルデヒド類としては、例え番エア
セトアルデヒド、ホルムアルデヒド等が挙ケられホルム
アルデヒドが好ましい。ケトン類としてはアセトンが好
ましい。Such a quinone diazide type positive photosensitive material can be used in combination with an alkali-soluble resin as a binder if necessary. As the alkali-soluble resin, those obtained by bonding phenols and ketones or aldehydes in the presence of an acidic catalyst are preferred. As the phenols,
Examples include phenol, cresol and p-substituted phenol. Examples of the aldehydes include acetaldehyde and formaldehyde, with formaldehyde being preferred. Acetone is preferred as the ketone.
好ましいアルカリ可溶性樹脂としては例えば78ノール
・ホルムアルデヒド樹脂、クレゾール・ホルムアルデヒ
ド樹脂、特開昭55−57841号公報に記載されてい
るようなフェノールφクレゾール・ホルムアルデヒド共
重縮合体樹脂、特開昭55−127553 号公報に記
載されているようなp−置換フェノールとフェノールも
しくは、クレゾールとホルムアルデヒドとの共重縮合体
樹脂、レゾルシン−ベンズアルデヒド樹脂、ピロガロー
ル−ベンズアルデヒド樹脂等の多価フェノール類とベン
ズアルデヒドとの縮合体、ピロガロール−レゾルシン−
アセトン樹脂等の多価フェノールとアセトンとの共重縮
合体、キシレノール・ホルムアルデヒド樹脂が挙げられ
る。これらのアルカリ可溶性樹脂の含有量は感光性組成
物の全固形分に対しI〜頭重量%が好ましく、特に50
〜85重量%が好ましい。Preferred alkali-soluble resins include, for example, 78nol-formaldehyde resin, cresol-formaldehyde resin, phenol φ cresol-formaldehyde copolycondensate resin as described in JP-A-55-57841, and JP-A-55-127553. Copolycondensate resins of p-substituted phenol and phenol or cresol and formaldehyde as described in the above publication, condensates of benzaldehyde and polyhydric phenols such as resorcinol-benzaldehyde resins and pyrogallol-benzaldehyde resins, Pyrogallol - resorcinol -
Examples include copolycondensates of polyhydric phenol and acetone such as acetone resin, and xylenol formaldehyde resins. The content of these alkali-soluble resins is preferably I to % by weight based on the total solid content of the photosensitive composition, particularly 50% by weight.
~85% by weight is preferred.
別の感光性物質としては、芳香族ジアゾニウム塩とホル
ムアルデヒドとの縮合物で代表されるジアゾ樹脂も用い
られる。特に好ましくは、p−ジアゾジフェニルアミン
とホルムアルデヒド又はアセトアルデヒドとの縮合物の
塩、例えばヘキサフルオロ燐酸塩、テトラフルオロホウ
酸塩、過塩素酸塩または過ヨク累酸塩と前記縮合物との
反応生成物であるジアゾ樹脂無機塩や、米国特許第3゜
300.309 号明細書に記載されているような、前
記縮合物とスルフォンl11Mの反応生成物であるジア
ゾ樹脂有機塩等が挙げられる。さらにジアゾ樹脂は、好
ましくは結合剤と共に使用される。かかる結合剤として
は種々の高分子化合柳が使用され得るが好ましくは特開
昭54−98613号公報に記載されているような芳香
族性水酸基を有する単量体、例工ばN−(4−ヒドロキ
シフェニル)アクリルアミド、N−(4−ヒドロキシエ
チル)メタクリルアミド、””# −1またはp−ヒド
ロキシスチレノs o # −9またはp−ヒドロキシ
7!ニルメタクリレート等と他の単量体との共重合体、
米国特許第4m123,276号tJiJ細書に記載さ
れているようなヒドロキシエチルアクリレート単位また
はヒドロキシエチルアクリレート単位を主なる繰り返し
単位として含むポリマー、シェラ、り、ロジン等の天然
樹脂、ポリビニルアルコール、米国特許第3,751,
257号明細書に記載されているポリアミド樹脂、米国
特許第3゜660.097 号明細書に記載されている
線状ポリウレタン樹脂、ポリビニルアルコールの7タレ
ート化樹脂、ビスフェノールAとエピクロルヒドリンか
ら縮合されたエポキシ樹脂、酢酸セルロース、−kkQ
−スアセテートフタレート等のセルロース類が包含され
る。Another photosensitive material that can be used is a diazo resin typified by a condensate of an aromatic diazonium salt and formaldehyde. Particularly preferred are salts of condensates of p-diazodiphenylamine and formaldehyde or acetaldehyde, such as reaction products of hexafluorophosphates, tetrafluoroborates, perchlorates or periodicates with said condensates. and diazo resin organic salts which are the reaction products of the above condensate and sulfone 111M, as described in US Pat. No. 3,300,309. Furthermore, diazo resins are preferably used together with binders. As such a binder, various polymer compounds can be used, but preferably a monomer having an aromatic hydroxyl group, such as N-(4 -Hydroxyphenyl)acrylamide, N-(4-hydroxyethyl)methacrylamide, ``''#-1 or p-hydroxystyrenoso#-9 or p-hydroxy7! Copolymers of nil methacrylate, etc. and other monomers,
Hydroxyethyl acrylate units or polymers containing hydroxyethyl acrylate units as a main repeating unit as described in U.S. Pat. 3,751,
257, linear polyurethane resins as described in U.S. Pat. No. 3,660,097, heptatalated polyvinyl alcohol resin, epoxy condensed from bisphenol A and epichlorohydrin. resin, cellulose acetate, -kkQ
-Includes celluloses such as suacetate phthalate.
更に別の感光性物質としては、重合体主鎖又はυ
チル類、ポリアミド類、ポリカーボネート類のような感
光性重合体を主成分とするものも適している。例えば、
特開昭55−40415号公報に記載されているような
、フェニレンジエチルアクリレートと水素添加したビス
7、ノールA及びトリエチレングリコールとの縮合で得
られる感光性ポリエステル、米国特許第2,956,8
78号明細書に記載されているような、シンナミリデ/
マロ/酸等の(2−グロベリデ/)マロン酸化合資及び
二官能性グリコール類から誘導される感光性ポリエステ
ル類等が挙げられる。Further suitable photosensitive materials include those based on polymeric backbone chains or photosensitive polymers such as polyamides, polycarbonates, and the like. for example,
Photosensitive polyester obtained by condensation of phenylene diethyl acrylate with hydrogenated bis-7, nor-A and triethylene glycol, as described in JP-A-55-40415, U.S. Pat. No. 2,956,8
Cinnamylide/as described in specification No. 78
Examples include photosensitive polyesters derived from (2-globeride/)malonic acid combinations such as malo/acid and difunctional glycols.
さらに別の感光性物質としては、アジド基が直接又はカ
ルボニル基もしくはスルホニル基な介して芳香環に結合
している芳香族アジド化合つも使用される。例えば、米
国特許第3,096,311号明細書に記載されている
ようなポリアジドスチレン、ポリビニル−p−アジドベ
ンゾアート、ポリビニル−p−アジドベンザール、特公
昭45−9613号公報に記載のアジドアリールスル7
アニルクロリドと不飽和炭化水素系ポリマーとの反応生
成物、又特公昭43−21067号、同44−229号
、同44−22954号、同45−24915号の各公
報に記載されているような、スルホニルアシトヤカルボ
ニルアジドを持つポリマー等が挙げられる。As another photosensitive substance, aromatic azide compounds in which the azide group is bonded directly or via a carbonyl group or a sulfonyl group to an aromatic ring are also used. For example, polyazidostyrene as described in U.S. Pat. No. 3,096,311, polyvinyl-p-azidobenzoate, polyvinyl-p-azidobenzal, Azido Aryl Sul 7
Reaction products of anyl chloride and unsaturated hydrocarbon polymers, as well as those described in Japanese Patent Publications Nos. 43-21067, 44-229, 44-22954, and 45-24915. , a polymer having sulfonylacetoyacarbonyl azide, and the like.
さらにまた、別の感光性幣質としては、付加重合性不飽
和化合物からなる光重合性組成物も使用される。Furthermore, as another photosensitive material, a photopolymerizable composition comprising an addition polymerizable unsaturated compound is also used.
以下、実施例によって、本発明を更に詳細に説明する。Hereinafter, the present invention will be explained in more detail with reference to Examples.
ただし本発明の実施態様はこれらに限定されるものでは
ない。However, the embodiments of the present invention are not limited to these.
実施例1
厚さ0.17mmの鋼板(東洋鋼鈑製■ハイド、プ11
鋼板)を陽極として、水酸化ナトリウム50 g/eを
含む水溶液中で、浴温度30℃、電流密度10 A7d
m”、処理時間1分間の条件で、上記鋼板を電解脱脂処
理した。水洗した後、続けてこの鋼板を陽極とし、鉛板
を陰極とし、硫酸50 Veを含む水溶液中で、浴温度
30’C1電流密度15 j%)/’dm” 、処理時
間1分間の条件で、前記電解脱脂処理した鋼板を電解エ
ツチングした。この後、水洗して、電解エツチングで生
じたスマットなスポンジで擦って除去した。Example 1 Steel plate with a thickness of 0.17 mm (Toyo Kohan ■ Hyde, P11
A steel plate) was used as an anode in an aqueous solution containing 50 g/e of sodium hydroxide at a bath temperature of 30°C and a current density of 10 A7d.
The above steel plate was electrolytically degreased under the conditions of 1 minute of treatment time. After washing with water, the steel plate was used as an anode and a lead plate was used as a cathode, and the bath temperature was 30' in an aqueous solution containing 50 Ve of sulfuric acid. The electrolytically degreased steel sheet was electrolytically etched under the conditions of a C1 current density of 15 j%)/'dm'' and a treatment time of 1 minute. Thereafter, the film was washed with water, and the smut produced by electrolytic etching was removed by rubbing with a sponge.
この電解エツチングした鋼板に無水クロム酸25097
e 、硫酸2.511Aを含む電解液を用い、浴温(9
)℃、電流密度20 Vdmt、電解時間3分間の条件
でクロムメッキを行った。Chromic anhydride 25097 was applied to this electrolytically etched steel plate.
e, using an electrolytic solution containing 2.511A of sulfuric acid, the bath temperature (9
)C, a current density of 20 Vdmt, and an electrolytic time of 3 minutes.Chromium plating was performed under the following conditions.
次にこのようにして本処理工程を終了した鋼板は、続い
てシャワー水洗を行い、次の後処理工程に移した。後処
理工程では、先ずはじめに5%カセイソーダ水溶液に4
0℃にて1分間浸漬し、続いてシャワー水洗を行い、次
にカルボキシメチルセルロースナトリウム塩と酢酸カル
シクムの水溶液(各々0.07重量%)に室温にて約1
分間浸漬し、続いてシャワー水洗を行った。後処理工程
を終了した後、冷風にて乾燥を行った。Next, the steel plate that had undergone the main treatment step in this manner was subsequently washed with shower water, and then transferred to the next post-treatment step. In the post-treatment process, first, add 4% to 5% caustic soda aqueous solution.
Immerse for 1 minute at 0°C, then wash with shower water, and then soak in an aqueous solution of carboxymethyl cellulose sodium salt and calcium acetate (0.07% by weight each) at room temperature for about 1 minute.
I soaked it for a minute, then took a shower and rinsed it off. After completing the post-treatment step, drying was performed with cold air.
この支持体表面形状を電子顕微鏡で観察すると、直径0
.5〜8μmの多面体のクロムの結晶粒子及びその凝集
体が表面に一様に分布していた。次に、この支持体の表
面粗さを測定した。表面粗さ計はペルテン(Perth
en )社製、ベルトメーター(PerthomeLe
r ) 85Pを用いて、以下の測定条件で行なった。When observing the surface shape of this support with an electron microscope, it was found that the diameter was 0.
.. Polyhedral chromium crystal particles of 5 to 8 μm and their aggregates were uniformly distributed on the surface. Next, the surface roughness of this support was measured. The surface roughness meter is Perth
Belt meter (PerthomeLe) manufactured by
r) The measurement was carried out using 85P under the following measurement conditions.
針のカートリ、ヂ; RT−50C(ダイヤモンド針、
針の先端の半径5μm)
針の感度調整; Pen−10−1,9,0pmを基準
に調整プロファイル;粗さプロファイルR
縦 倍 率;2.5μm
横 倍 率; 250μm
切断深さC;2.0μm
測定長さ;4.0μm
力、トオフ値’、0.8m
得られた鋼板のピークカウント、バリーカウント、及び
中心線平均粗さの値は以下のとおりである。Needle cartridge; RT-50C (diamond needle,
Radius of the tip of the needle: 5 μm) Sensitivity adjustment of the needle; Adjustment profile based on Pen-10-1, 9, and 0 pm; Roughness profile R Vertical magnification; 2.5 μm Horizontal magnification; 250 μm Cutting depth C; 2. 0 μm Measurement length: 4.0 μm Force, to-off value, 0.8 m The values of the peak count, burry count, and center line average roughness of the obtained steel plate are as follows.
(電解エツチング後、クロムめっき前)中心線平均粗さ
翫=0.6μm
(クロムめっき後、後処理前)
中心線平均粗さRa= 0.62へ
上記値は異なる10個所の測定値の平均値である。(After electrolytic etching, before chrome plating) Center line average roughness = 0.6 μm (After chrome plating, before post-treatment) Center line average roughness Ra = 0.62 The above value is the average of the measured values at 10 different locations. It is a value.
次いで、前記後処理を施した支持体上に下記組成の感光
性塗布液を回転塗布機を用いて塗布し、100℃で4分
間乾燥し、平版印刷版材料を得た。Next, a photosensitive coating solution having the following composition was coated onto the post-treated support using a rotary coater and dried at 100° C. for 4 minutes to obtain a lithographic printing plate material.
(感光性塗布液組成)
ナフトキノン−(1,2)−ジアジド−■)−5−スル
ホン酸クロライドとレゾルシン−ベンズアルデヒド樹脂
との縮合物(特開昭56−1044号公報実施例1に記
載された方法で合成されたもの) 2.6 g
フェノールとm−e P−混合クレゾールとホルムアル
デヒドとの共重縮合樹脂(7,ノールとクレゾールのモ
ル比が3ニア、重量平均分子量1500) 7.8 g
ナフトキノン−(1,2)−ジアジド−(2)−4−ス
ルホン酸クロライド 0.15gビクトリアピュアーブ
ルーBOHO,15g(採土ケ谷化学■社製)
p−t−ブチルフェノールとp−オクチルフ。(Photosensitive coating liquid composition) Condensate of naphthoquinone-(1,2)-diazide-)-5-sulfonic acid chloride and resorcinol-benzaldehyde resin (described in Example 1 of JP-A-56-1044) 2.6 g Copolycondensation resin of phenol, m-e P-mixed cresol and formaldehyde (7, molar ratio of nor to cresol is 3 near, weight average molecular weight 1500) 7.8 g Naphthoquinone-(1,2)-diazide-(2)-4-sulfonic acid chloride 0.15g Victoria Pure Blue BOHO, 15g (manufactured by Odugaya Kagaku ■) p-t-butylphenol and p-octylph.
ノールとホルムアルデヒドより合成されたノボラック樹
脂とナンドキノン−(1,2)−ジアジド−(2) −
5−スルホン酸クロライドとジエステル化物(縮合率刃
モル%) o、+19メチルセロソルブ 1009
乾燥後の塗布重量は約2.19βであった。Novolak resin synthesized from nol and formaldehyde and nandoquinone-(1,2)-diazide-(2)-
5-Sulfonic acid chloride and diester compound (condensation rate mol %) o, +19 methyl cellosolve 1009 The coating weight after drying was about 2.19β.
か<L”C得られた平版印刷版材料上に感度測定用ステ
ップタブレット(イーストマン・コダック社製應2)及
びポジ原稿フィルムを密着して2KWメタルハライドラ
ンプ(岩崎電気−社製アイドルフィン2000 )を光
源として1mの距離から70秒間露光を行ない、4%メ
タケイ酸ナトリウム水溶液で5℃にて45秒間現像した
ところ非面線部は完全に除去されて平版印刷版を得た。A step tablet for sensitivity measurement (Kodak 2, manufactured by Eastman Kodak) and a positive original film were closely attached to the obtained lithographic printing plate material, and a 2KW metal halide lamp (Idol Fin 2000, manufactured by Iwasaki Electric Co., Ltd.) was applied. The plate was exposed to light for 70 seconds from a distance of 1 m using as a light source, and developed with a 4% sodium metasilicate aqueous solution at 5° C. for 45 seconds, and the non-surface line portions were completely removed to obtain a lithographic printing plate.
支持体と画線部との接着性及び印刷版の耐刷性を検討す
るために、耐処理薬品性試験及び印刷試験を行なった。In order to examine the adhesion between the support and the image area and the printing durability of the printing plate, a processing chemical resistance test and a printing test were conducted.
耐処理薬品性試験として、印刷中非画像部に発生する地
汚れを除去する洗浄液として用いられるウルトラプレー
トクリーナー(A、 B。As a processing chemical resistance test, Ultra Plate Cleaner (A, B), which is used as a cleaning liquid to remove background stains that occur in non-image areas during printing, was used.
C,ケミカル■製)に対する耐久性を調べた。C, manufactured by Chemical ■) was investigated.
上記グレースケールの階段上虻濃度差を持つ画像ができ
た印刷版をウルトラプレートクリーナー原液に室温で4
0分間浸漬の後水洗し、浸漬前の画像部と比較すること
により、画像部の処理薬品に対する侵食度を判定した。The printing plate with the image with the above grayscale density difference is added to the Ultra Plate Cleaner stock solution for 4 hours at room temperature.
After immersion for 0 minutes, the sample was washed with water and compared with the image area before immersion to determine the degree of corrosion of the image area against the processing chemicals.
その結果、前記印刷版は画像部の侵食がなく、又網点に
ついても面積率2%の網点まで保存され良好な耐処理薬
品性な示1、た。次に、オフセット印刷機(ハマダスタ
ー900CDX)に別の前記印刷版をかげて、ス余ンジ
に前記ウルトラプレートクリーナー原液を含ませ、印刷
版の表面全体をこのスポンジで擦り、4分間にわたって
印刷版の画像部をウルトラプレートクリーナーに接触さ
せる。その後水洗いして、500枚印刷を行なう。この
サイクルを何度も繰り返し、画像部が侵食され印刷出来
なくなるまでのサイクルの回数より、処理薬品による化
学的侵食と印刷による物理的摩耗との相乗効果による印
刷版の耐処理薬品性と耐刷性を同時に検討した。その結
果。As a result, the printing plate had no erosion in the image area, and the halftone dots were preserved up to the halftone dots with an area ratio of 2%, showing good resistance to processing chemicals. Next, place another printing plate in an offset printing machine (Hamadustar 900CDX), soak the surface of the printing plate in the Ultra Plate Cleaner stock solution, rub the entire surface of the printing plate with this sponge, and apply it to the printing plate for 4 minutes. Contact the image area with the Ultra Plate Cleaner. After that, it is washed with water and 500 sheets are printed. This cycle is repeated many times, and the number of cycles until the image area is eroded and cannot be printed is determined by the chemical attack resistance of the printing plate due to the synergistic effect of the chemical attack caused by the processing chemicals and the physical abrasion caused by printing. Gender was also considered at the same time. the result.
前記印刷版はn回のサイクルまで良好な印刷を行な得た
。耐刷性試験は、前記オフセット印刷機に更に別の前記
印刷版をかけておこない、画像部に損傷が生じ印刷不可
能となるまでに得られた印刷物の枚数で評価した。その
結果、前記印刷版では必万枚まで良好な印刷物が得られ
た。また、前記印刷版は印刷時に汚れ難く、また保水性
も良好であった。更に画像部への引っ掻き傷も発生しプ
よかつプヒ0
比較例1 一
実施例1と同じ鋼板を用いて、特開昭56−IFi05
92号に記載されている鉄めっきを施した。The printing plate gave good printing up to n cycles. The printing durability test was conducted by applying another printing plate to the offset printing machine, and was evaluated based on the number of prints obtained until the image area was damaged and printing became impossible. As a result, good quality printed matter was obtained using the printing plate. Further, the printing plate was hardly stained during printing and had good water retention. Furthermore, scratches on the image area also occurred, causing 0 damage. Comparative Example 1 Using the same steel plate as in Example 1,
Iron plating was applied as described in No. 92.
すなわち、前記鋼板に炭素板を陽極として、塩化第一鉄
400 El/e、塩化カルシウム2009/eを含む
pHが0.8の電梶液を用い、浴温度100℃、電流密
度30A/dm20条件で5μmの厚みに鉄めっきな行
い、鉄めっき鋼板を得た。That is, using a carbon plate as an anode on the steel plate, using a sulfur solution containing 400 El/e of ferrous chloride and 2009/e of calcium chloride and having a pH of 0.8, the bath temperature was 100°C and the current density was 30 A/dm20. Iron plating was carried out to a thickness of 5 μm to obtain an iron-plated steel sheet.
この鉄めっき鋼板に実施例1と同じ争件でクロムめっき
を行った。This iron-plated steel sheet was chromium-plated in the same manner as in Example 1.
この支持不表面形状を電子顕微鏡で観察すると実施例1
と同様のクロム結晶粒子が一面に広がっていた。When observing the shape of this support surface with an electron microscope, Example 1
Chromium crystal particles similar to the above were spread all over the area.
次いで、実施例1と同様の後処理を行い、水洗、乾燥を
行なった。、更にこの支持体の表面粗さを実施例1にお
けるのと同様にして測定したところ、以下の結果を得た
。Next, the same post-treatment as in Example 1 was performed, including washing with water and drying. Furthermore, the surface roughness of this support was measured in the same manner as in Example 1, and the following results were obtained.
鉄めっき後、クロムめっき前
ピークカウント52=137
S、= 12
バリーカウントTt= 12
T、= 12
中心線平均粗さ島=0.6μm
クロムめっき後、後処理前
ピークカウントS2二140
S、= 13
バリーカウントT2= 13
Tr= 13
中心線平均粗さR,== 0.63μm以上のようにS
、/ S、= 11.4、’rt/ ’r、 = 1及
びS、/ S、= 10.8、T2/ T、 = 1で
あり本発明の支持体とは異なった粗さグロファイルの形
状を有している。After iron plating, before chrome plating, peak count 52 = 137 S, = 12 Barry count Tt = 12 T, = 12 Center line average roughness island = 0.6 μm After chrome plating, before post-processing peak count S2 2 140 S, = 13 Burry count T2 = 13 Tr = 13 Center line average roughness R, = = S as 0.63 μm or more
, /S, = 11.4, 'rt/'r, = 1 and S, /S, = 10.8, T2/T, = 1, and the roughness profile differs from that of the support of the present invention. It has a shape.
次に、前記後処理を施こした支持体上に実施例lと同じ
処方で同様に塗布して平版印刷版材料を得た。乾燥後の
塗布重量は約2.1 El/rr:であった。Next, the same formulation as in Example 1 was coated onto the post-treated support to obtain a lithographic printing plate material. The coating weight after drying was approximately 2.1 El/rr:.
かかる平版印刷版材料に実施例1と同様に露光、現像を
行ない平版印刷版を得て、これについて、上記実施例1
と同様の耐処理薬品性試験及び印刷試験を行なった。そ
の結果、この印刷版はウルトラプレートクリーナーに切
分間浸漬させると、画像部の侵食が著しく認められ、又
網点についても面積率5%の網点まで消失した。更に、
耐処理薬品性と耐刷性の同時検討では、ウルトラプレー
トクリーナー擦きと印刷500枚のサイクルは、8回迄
で既に画像部が侵食されて印刷不可能となってしまった
。又、耐刷性試験でも9万枚程印刷したところで、画像
部の損傷が発生してしま(・、耐刷性は不良であった。The lithographic printing plate material was exposed and developed in the same manner as in Example 1 to obtain a lithographic printing plate.
The same processing chemical resistance test and printing test were conducted. As a result, when this printing plate was immersed in Ultra Plate Cleaner for a period of time, significant erosion of the image area was observed, and even halftone dots with an area ratio of 5% disappeared. Furthermore,
In a simultaneous study of processing chemical resistance and printing durability, the image area was already eroded and printing became impossible after 8 cycles of rubbing with Ultra Plate Cleaner and printing 500 sheets. Also, in the printing durability test, after about 90,000 sheets were printed, damage to the image area occurred (-, the printing durability was poor).
実施例2
実施例1と同−争件で電解エツチング及びデスマットを
行った鋼板に、下記の組成の電解液およ電解液
無水クロム酸 43’Og/e
硝酸バリウム 3.8g/e
硝e (64% ) 1.2m/!/ e弗化水素アン
モニウム 5 g/e
酢 酸 0.2g/ll
弗化バリウム o、ig、”g
電解条件
電流密度 5 A/dm2
液 温 度 5℃
陰 極 鉄めっき鋼板
陽 極 鉛板
処理時間 5分
次いで、実施例1と同様の後処理を行ない、水洗、乾燥
を行なった。Example 2 A steel plate that had been electrolytically etched and desmutted in the same manner as Example 1 was treated with an electrolytic solution having the following composition: chromic anhydride 43'Og/e barium nitrate 3.8g/e nitric acid ( 64%) 1.2m/! / e Ammonium hydrogen fluoride 5 g/e Acetic acid 0.2 g/ll Barium fluoride o, ig, "g Electrolytic conditions Current density 5 A/dm2 Liquid temperature 5°C Cathode Iron-plated steel plate Anode Lead plate treatment time After 5 minutes, the same post-treatment as in Example 1 was carried out, followed by washing with water and drying.
この支持体表面形状を電子顕微鏡で観察すると、クロム
の板状結晶物が表面より突出しており、この板状結晶物
は直径1〜5μm、厚さは0.1〜0.5μm、その形
状は多角ふ、主として6角形の板状をなしている。上記
クロムの板状結晶物が第5図の如く表面を覆っているの
が観察された。When the surface shape of this support was observed with an electron microscope, plate-like chromium crystals protruded from the surface, and these plate-like crystals had a diameter of 1 to 5 μm, a thickness of 0.1 to 0.5 μm, and a shape of Polygonal, mainly hexagonal plates. It was observed that the plate-like crystals of chromium covered the surface as shown in FIG.
この支持体の表面粗さな実施例1と同様にして測定した
ところ、St * Sl s Tz J T+ p R
aとも実施例1の支持体とほぼ同じ値を得た。When the surface roughness of this support was measured in the same manner as in Example 1, it was found that St * Sl s Tz J T+ p R
Almost the same value as the support of Example 1 was obtained for both a.
このようにして得られた表面に電着クロム層を有する鋼
板支持体上に実施例1と同じ処方の感光性塗布液を同様
に塗布して平版印刷版材料を得た。A photosensitive coating liquid having the same formulation as in Example 1 was similarly coated onto the thus obtained steel plate support having an electrodeposited chromium layer on its surface to obtain a lithographic printing plate material.
(塗布重量2.39β)
かかる平版印刷版材料に実施例1と同様に露光、現像な
行ない平版印刷版を得て、これについて、上記実施例1
と同様の耐処理薬品性試験及び印刷試験を行なった。そ
の結果、この印刷版は実施例1と同様、耐処理薬品性、
保水性、耐刷性が良好でありが方杖まで良好な印刷物が
得られた。(Coating weight: 2.39β) This lithographic printing plate material was exposed and developed in the same manner as in Example 1 to obtain a lithographic printing plate.
The same processing chemical resistance test and printing test were conducted. As a result, this printing plate had similar treatment chemical resistance and
Printed matter with good water retention and printing durability was obtained.
実施例3
実施例1と同種の鋼板を実施例1と同様に電解脱脂を行
い、水洗した後、続いて硫酸loo E/eを含む水溶
液を用い、浴温度40℃、電流密度80 ty’rkr
t、処理時間15秒間で電解エツチングを行い、続いて
水洗を行ないながら、実施例1と同様にスマットを除去
した。Example 3 A steel plate of the same type as in Example 1 was electrolytically degreased in the same manner as in Example 1, washed with water, and then treated with an aqueous solution containing sulfuric acid loo E/e at a bath temperature of 40° C. and a current density of 80 ty'rkr.
t, electrolytic etching was performed for a treatment time of 15 seconds, and smut was removed in the same manner as in Example 1 while washing with water.
この鋼板に無水クロム酸250 F!//!、硫酸2.
5 El/eを含む電解液を用い、浴温度35℃、電流
密度(9)h7a、、t 、処理時間2分間の争件でク
ロムめっきを行なった。Chromic anhydride 250F on this steel plate! //! , sulfuric acid 2.
Chromium plating was performed using an electrolytic solution containing 5 El/e at a bath temperature of 35° C., a current density of (9)h7a,,t, and a processing time of 2 minutes.
次いで、実施例1におけるのと同様にして、その表面粗
さを測定して以下の結果を得た。Next, the surface roughness was measured in the same manner as in Example 1, and the following results were obtained.
電解エツチング後、クロムめっき前
ピークカウントS、=76
S+”89
バリーカウントTz=89
T+=44
中心綜平均籾さRa−0,6μm
クロムめっき後
ピークカウントS2= 78
S、=92
バリーカウントT、=92
T+=46
中心綜平均粗さRa= 0.62μm
更に、実施例1と同様に後処理を行(〜、水洗、乾燥を
行なった。但し使用したカルボキシメチルセルロースナ
トリウム塩と酢酸カルシシムの水溶液の濃度は、各々が
0.35重重量子ある。After electrolytic etching, peak count before chromium plating S, = 76 S+”89 Barry count Tz = 89 T+ = 44 Center heddle average grain size Ra - 0.6 μm Peak count after chrome plating S2 = 78 S, = 92 Barry count T, =92 T+=46 Center helix average roughness Ra = 0.62 μm Furthermore, post-treatment was performed in the same manner as in Example 1 (~, water washing and drying were performed. However, the aqueous solution of carboxymethyl cellulose sodium salt and calcium acetate used was The concentration is 0.35 deuterons each.
この支持体表面形状を電子顕微鏡で観察すると、実施例
1と同様なりロム結晶粒子及びその凝集体が表面に分布
しているのが判った。When the surface shape of this support was observed using an electron microscope, it was found that ROM crystal particles and their aggregates were distributed on the surface, as in Example 1.
次いで、この支持体上に下記組成の感光性塗布液を回転
塗布機を用いて塗布し、100℃で4分間乾燥し、平版
印刷版材料を得た。Next, a photosensitive coating solution having the following composition was coated onto this support using a rotary coater and dried at 100° C. for 4 minutes to obtain a lithographic printing plate material.
(感光性塗布液組成)
ナフトキノン−(1,2)−ジアジド−(2)−5−ス
ルホ/酸クロライドとレゾルシン−ベンズアルデヒド樹
脂との縮合物←特開昭56−IQ44号公報実施例1に
記載された方法で合成されたもの) 2.9g
フェノールとm−s P−混合クレゾールとホルムアル
デヒドとの共重縮合樹脂(フェシールドクレゾールのモ
ル比がl:9、重量平均分子量1500) 7.1 F
ナフトキノン−(1,2)−ジアジド−(2)−4−ス
ルホ/酸クロライド 0.1sIiオイルブルー#60
3
(オリエント化学工業■社製) 0.2 1p−t−ブ
チルフェノール・ホルムアルデヒドノボラック樹脂 o
、isg
メチルセロソルブ 1ooy
乾燥後の塗布重量は約2,3p賀であった。(Photosensitive coating liquid composition) Condensate of naphthoquinone-(1,2)-diazide-(2)-5-sulfo/acid chloride and resorcinol-benzaldehyde resin←Described in Example 1 of JP-A-56-IQ44 2.9g Copolycondensation resin of phenol, m-s P-mixed cresol and formaldehyde (mole ratio of face shield cresol 1:9, weight average molecular weight 1500) 7.1 F Naphthoquinone-(1,2)-diazide-(2)-4-sulfo/acid chloride 0.1sIi Oil Blue #60
3 (manufactured by Orient Kagaku Kogyo ■) 0.2 1p-t-butylphenol formaldehyde novolac resin o
, isg methyl cellosolve 1 ooy The coating weight after drying was about 2.3 p.
かくして得られた平版印刷版材料上にポジ原稿フィルム
及び感度測定用ステ、ブタプレット(イーストマン・コ
ダ、り社製A 2 、濃度差0.15づつで21段階の
もの)を密着して2KWメタルハライドランプ(岩崎電
気■社製アイドルフィy2000)を光源として1mの
距離から(社)秒間露光を行ない、4%メタケイ酸ナト
リウム水溶液で5℃にて45秒間現偉し平版印刷版を得
た。On the lithographic printing plate material obtained in this way, a positive original film, a step for measuring sensitivity, and a button plate (A 2 manufactured by Eastman Koda, Inc., 21 levels with a density difference of 0.15 each) were adhered and 2KW metal halide was applied. Exposure was carried out for 2 seconds from a distance of 1 m using a lamp (IDOLFI Y2000 manufactured by Iwasaki Denki Co., Ltd.) as a light source, and the plate was exposed with a 4% aqueous sodium metasilicate solution at 5° C. for 45 seconds to obtain a lithographic printing plate.
支持体と画線部との接着性及び印刷版の耐刷性な検討す
るために、耐処理薬品性試験及び印刷試験を行なった。In order to examine the adhesion between the support and the image area and the printing durability of the printing plate, a processing chemical resistance test and a printing test were conducted.
耐処理薬品性試験としては、ダールグレン湿し水装置で
用いられているイソプロピルアルコール水溶液に対する
耐久性を調べた。As a treatment chemical resistance test, durability against an aqueous isopropyl alcohol solution used in a Dahlgren dampening device was investigated.
上記グレースケールの階段上に濃度差を持つ画像i;
”c−キた印刷版を35%イソプロピルアルコール水溶
液に室温で九分間浸漬の後、水洗し水を含ませた脱脂綿
で画像部をこすり、その画像部をイソプロピルアルコー
ルに浸漬前の画像部と比較することにより、画像部の薬
品に対する侵食度を判定した。その結果、前記印刷版は
画像部の侵食がなく良好な耐処理薬品性な示した。又、
実施例1と同様に耐処理薬品性と耐刷性の同時検討では
、ウルトラグレートクリーナー擦さと印刷500枚のサ
イクルは45回まで繰り返して良好な印刷を行なえた。Image i having a density difference on the above gray scale stairs;
After soaking the printed printing plate in 35% isopropyl alcohol aqueous solution for 9 minutes at room temperature, wash it with water and rub the image area with absorbent cotton soaked in water, and compare the image area with the image area before immersion in isopropyl alcohol. The degree of corrosion of the image area against chemicals was determined by this method. As a result, the printing plate showed no erosion of the image area and had good resistance to processing chemicals.
Similar to Example 1, in a simultaneous study of treatment chemical resistance and printing durability, the cycle of rubbing with Ultra Great Cleaner and printing 500 sheets was repeated up to 45 times and good printing was achieved.
更に実施例1と同様の耐刷性試駆においても前記印刷版
は4万枚まで良好な印刷物が得られた。Furthermore, in the same printing durability test as in Example 1, good prints were obtained with the printing plate up to 40,000 copies.
比較例2
比較例1と同種の鋼板に比較例1と同様に鉄めっきを行
ない、次にこの鉄めっき鋼板に実施例3と同じ条件でク
ロムめっきを行った。Comparative Example 2 A steel plate of the same type as Comparative Example 1 was plated with iron in the same manner as in Comparative Example 1, and then this iron-plated steel plate was plated with chrome under the same conditions as in Example 3.
次に実施例3と同様の後処理を行い、水洗、乾燥を行っ
た。Next, the same post-treatment as in Example 3 was performed, followed by washing with water and drying.
この支持体の表面粗さを実施例1と同様にして測定しタ
トコろ、”1! p SI # ’r、 y ’rXl
Raとも、比較例1の支持体とほぼ同じ値を得た。The surface roughness of this support was measured in the same manner as in Example 1 and was found to be 1! p SI # 'r, y 'rXl
Almost the same value as the support of Comparative Example 1 was obtained for both Ra.
以下!に7日
次いで、実施例3と同じ処方で同様に塗布して平版印刷
版材料を得た。below! After 7 days, the same formulation as in Example 3 was applied in the same manner as in Example 3 to obtain a lithographic printing plate material.
乾燥後の塗布重量に約2.31/ピであった。The coating weight after drying was approximately 2.31/pi.
かかる平版印刷版材料に実施例1と同様に露光、験を行
なった。その結果、この印刷版は35%イソプロピルア
ルコール水溶液に加分間浸漬させると、画像部の侵食が
著しく認められ、又、耐処理薬品性と耐刷性の同時検討
では、ウルトラプレートクリーナー擦きと印a soo
枚のサイクルは、15回迄で既に画像部が侵食されて印
刷工iJ能となってしまった。更に耐刷性試験でも13
万枚程印刷したところで、画像部の損傷が発生してしま
い印刷不可能となった。The lithographic printing plate material was exposed and tested in the same manner as in Example 1. As a result, when this printing plate was immersed in a 35% isopropyl alcohol aqueous solution for an additional period of time, significant erosion of the image area was observed. a soo
By the 15th cycle of printing, the image area had already been eroded and the printing process had become impossible. Furthermore, it was 13 in the printing durability test.
After printing about 10,000 sheets, the image area became damaged and printing became impossible.
実施例4
実施例1と同種の銅板に実施例2と同様に、電FIIF
x 7−F 7 F 、スマット除去続いてクロムメ
ッキを行い水洗・乾燥した。Example 4 Electrical FIIF was applied to the same type of copper plate as in Example 1 in the same manner as in Example 2.
x 7-F 7 F, smut was removed, followed by chrome plating, washed with water, and dried.
次いでこの支持体に、下記の組成を有する感光性塗布液
を回転塗布機を用いて塗布し、85℃で3分間乾燥し平
版印刷版材料を得た。Next, a photosensitive coating liquid having the following composition was applied to this support using a rotary coater, and dried at 85° C. for 3 minutes to obtain a lithographic printing plate material.
(感光性塗布液組成)
共重合体A 5.OIi
ジアゾ樹脂B 0.5.9
ジユリマーAC−log、 0.0511(日本純某■
社@)
ビクトリアピュアーブルーBOH0,1N(採土ケ谷化
学■社Isり
メチルセロソルブ 100が
但し、上記共重合体へは11モル比でp−ヒドロキシフ
ェニルメタクリルアミド/アクリロニトリル/エチルア
クリレート/メタクリル酸= 10 / 30 /60
/6及びアゾビスイソブチロニトリル(単量体総モル数
の1 / 400 モル量)の組成をメチルセロソルブ
に溶解し、窒素置換した封管中で65℃で10時間加熱
し、反応終了後、反応液を水中に攪拌下注ぎ生じた白色
法#を濾取乾燥して得たものである。ジアゾ樹脂Bは、
室温で5%のジアゾ樹脂(商品名、E、 H,C■an
−ox2)水溶液と、10%ヘキサフルオロリン酸アン
モニウム水溶液を混合し、生じた沈澱物を吸収濾過し、
30〜40℃で波圧乾燥して得たヘキサフルオロリン酸
塩である。上記共重合体の重量平均分子量は80,00
0であり、更に上記ジアゾ樹肥の分子量分布なゲルパー
ミネーションクロマトグラフィー(GPC)によって間
違したところ、3量体以下が全体の93モル%であった
。(Photosensitive coating liquid composition) Copolymer A 5. OIi Diazo resin B 0.5.9 Julymer AC-log, 0.0511 (Japan Pure)
Victoria Pure Blue BOH0,1N (Odugaya Kagaku ■ Co., Ltd.) Methyl cellosolve 100 is added to the above copolymer at a molar ratio of 11 p-hydroxyphenylmethacrylamide/acrylonitrile/ethyl acrylate/methacrylic acid = 10/ 30 /60
/6 and azobisisobutyronitrile (1/400 molar amount of the total number of monomers) were dissolved in methyl cellosolve, heated at 65°C for 10 hours in a sealed tube purged with nitrogen, and after the completion of the reaction. The reaction solution was poured into water with stirring, and the resulting white color was filtered and dried. Diazo resin B is
5% diazo resin (trade name, E, H, C■an) at room temperature
-ox2) aqueous solution and a 10% ammonium hexafluorophosphate aqueous solution, the resulting precipitate is absorbed and filtered,
It is a hexafluorophosphate obtained by wave pressure drying at 30 to 40°C. The weight average molecular weight of the above copolymer is 80,00
Furthermore, gel permeation chromatography (GPC) of the molecular weight distribution of the above-mentioned diazo tree fertilizer revealed that 93 mol% of the total amount was 93 mole % of the total.
乾燥後の塗布重量は約2.011/vlであった。The coating weight after drying was approximately 2.011/vl.
か(して得られた平版印刷版材料上にネガ原稿フィルム
ラ密着して2KWメタルハライドランプ(岩崎電気■社
製アイドルフィン2000 )を光源として1mの距脇
からu秒間露光を行ない、下記の組成の現像液で現像し
、平版印刷版を得た。A negative original film was placed in close contact with the lithographic printing plate material obtained in this manner, and exposure was performed for u seconds from a distance of 1 m from the side using a 2KW metal halide lamp (Idol Fin 2000 manufactured by Iwasaki Electric Co., Ltd.) as a light source. A lithographic printing plate was obtained by developing with a developer.
(現像液組成)
フェニルセロソルブ 100I
ジエタノールアミン 5011
パイオニンA −44B 30 Jim(竹本油脂■社
製)
水 780 #
現像条件は、5℃、6秒間である。(Developer composition) Phenyl Cellosolve 100I Diethanolamine 5011 Pionin A-44B 30 Jim (manufactured by Takemoto Yushi ■) Water 780 # Development conditions were 5° C. and 6 seconds.
支持体と画像部との接着性、現像性の寛容度、及び印刷
版の耐刷性を検討するために、現像について自動現像機
による処理の他に1手現像″処理試験を行ない、又印刷
試験を行なった。In order to examine the adhesion between the support and the image area, the latitude of developability, and the printing durability of the printing plate, we conducted a one-hand development process test in addition to the process using an automatic developing machine, and also the printing process. I conducted a test.
手現像に、スポンジに上記現像液を充分含ませ、皿の中
に置いた上記露光済みの平版印刷版材料表面をそのスポ
ンジで2分間均一に軽く擦り、その後水洗いすることに
よって行なった。その結果、上記平版印刷版材料は手現
像によっても画像部が損なわれることにまったくなかっ
た。印刷試験に実施例1と同様にして行なった。その結
果、本発明の支持体を用いた平版印刷版はn方杖まで良
好な印刷物が得られた。Manual development was carried out by thoroughly soaking a sponge with the above developer, and lightly rubbing the surface of the exposed lithographic printing plate material placed in a dish with the sponge evenly for 2 minutes, followed by washing with water. As a result, the image area of the above lithographic printing plate material was not damaged at all even by manual development. The printing test was carried out in the same manner as in Example 1. As a result, good prints were obtained from the lithographic printing plate using the support of the present invention up to the n-way.
比較例3
実施例1と同種の鋼板に比較例1と同様に鉄めっきを行
ない、更に実施例2と同じ条件でクロムメッキを行い水
洗、乾燥した。Comparative Example 3 A steel plate of the same type as Example 1 was plated with iron in the same manner as in Comparative Example 1, and further plated with chrome under the same conditions as in Example 2, washed with water, and dried.
次いでこの支持体に実施例4と同じ組成の感光性塗布液
を同様に塗布、乾燥し平版印刷版材料な得た。次にこれ
を実施例4と同様にして平版印刷版を作成し、又、同様
に手現像処理及び耐刷性試#を行なった。その結果、手
現像処理において、画線部が著しく損なわれ、はとんど
剥離してしまった。更に、印刷においては、8万枚印刷
して画線部の一部が剥離してしまい印刷不可能と1よっ
た。Next, a photosensitive coating solution having the same composition as in Example 4 was applied to this support in the same manner as in Example 4, and dried to obtain a lithographic printing plate material. Next, a lithographic printing plate was prepared in the same manner as in Example 4, and a manual development process and a printing durability test were performed in the same manner. As a result, during manual development processing, the image area was significantly damaged and almost peeled off. Furthermore, in printing, after printing 80,000 sheets, part of the image area peeled off, making it impossible to print.
実施例5
実施例1と同種の鋼板に実施例1と同様に、電解エツチ
ングとスマット除去を行い、次に厚み0.5μmの亜鉛
めっきを行い、次&も実施例1と同様のクロムめっきを
施し、以下実施例1と同様に感光性塗布液を塗布して、
平版印刷版材料を得た。ついで実施例1と同様[i4元
、現像して平版印刷版を得た。Example 5 A steel plate of the same type as in Example 1 was subjected to electrolytic etching and smut removal in the same manner as in Example 1, and then zinc plated to a thickness of 0.5 μm, and then chromium plated in the same manner as in Example 1. Then, apply a photosensitive coating liquid in the same manner as in Example 1,
A lithographic printing plate material was obtained. Then, it was developed in the same manner as in Example 1 [i4 original] to obtain a lithographic printing plate.
この印刷版に同様に印刷したところ、地汚れがなく良好
な品質の印刷物が得られた。When this printing plate was printed in the same manner, good quality printed matter was obtained with no scumming.
実施例6
実施例1と同種の銅板に実施例1と同様に電解エツチン
グとスマット除去を行い、次に厚み0,2μmのニッケ
ルめっきを行い、次に実施例1と同様のクロムめっきを
施し、以下実施例1と同様に、感光性塗布液の塗(IT
、7EL元、現1#!を行ない、平版印刷版材料た。Example 6 A copper plate of the same type as in Example 1 was electrolytically etched and smut removed in the same manner as in Example 1, then nickel plated to a thickness of 0.2 μm, and then chromium plated in the same manner as in Example 1. Hereinafter, in the same manner as in Example 1, coating of the photosensitive coating liquid (IT
, 7EL original, current 1#! The process was carried out to produce lithographic printing plate materials.
この印刷版は同様に印刷したところ、地汚れがなく良好
ブよ品質の印刷物が得られた。When this printing plate was printed in the same manner, it was possible to obtain printed matter of good quality with no background smearing.
実施例7
実施例1と同種の鋼板に実施例1と同様に電解エツチン
グとスマット除去を行い、次にPi−1,5μm のニ
ッケルめっきt施し、以下実施例1と同様に感)′C,
性塗布液の塗布、露光、現像を行ない平版印刷版を得た
。Example 7 A steel plate of the same type as in Example 1 was subjected to electrolytic etching and smut removal in the same manner as in Example 1, and then nickel plated with Pi-1.5 μm.
A lithographic printing plate was obtained by applying a color coating liquid, exposing to light, and developing.
この印刷版に同様を印刷したところ、地汚れがなく良好
な品質の印刷物が得られた。When the same printing was carried out on this printing plate, a good quality printed matter was obtained with no scumming.
実施例8
実施例1と同種の鋼板に実施例1と同様VC電解エエツ
チングスマット除去を行い、次に厚み1.5μmの亜鉛
めっきを施し、以下実施例1と同様に感光性印刷版の塗
布、n元、現像を行ない、平版印刷版を得た。Example 8 A steel plate of the same type as in Example 1 was subjected to VC electrolytic etching to remove smut in the same manner as in Example 1, then galvanized to a thickness of 1.5 μm, and thereafter coated with a photosensitive printing plate in the same manner as in Example 1. , n-source development was performed to obtain a lithographic printing plate.
この印刷版で同様に印刷したところ、地汚れがなく良好
な品質の印刷物が得られた。When similarly printed using this printing plate, a good quality printed matter was obtained with no scuffing.
実施例9
実施例1と同種の鋼板に実施例1と同様に電解エツチン
グとスマット除去を行い、次にアルミニウムをこの表面
に蒸着し厚み1μmの層を形成する。Example 9 A steel plate of the same type as in Example 1 is subjected to electrolytic etching and smut removal in the same manner as in Example 1, and then aluminum is vapor deposited on the surface to form a 1 μm thick layer.
更に硫酸浴にて陽極酸化処理を行い、表面に酸化アルl
ニウムの層を施し、以下実施例1と同様に感光性塗布液
の塗布、露光、現像を行ない、平版印刷版を得た。Furthermore, anodic oxidation treatment is performed in a sulfuric acid bath to add aluminum oxide to the surface.
After that, a photosensitive coating solution was applied, exposed, and developed in the same manner as in Example 1 to obtain a lithographic printing plate.
上記印刷版を同様に印刷したところ、保水性に優れ、地
汚れがなく良好な印刷物が得られ、又、耐刷性も良好で
あった。When the above printing plate was printed in the same manner, good printed matter with excellent water retention and no scumming was obtained, and the printing durability was also good.
実施例1O
実施例1と同種の鋼板を平面ホーニングによって砂目室
て処理を行ない、次に希塩酸で洗浄し、水洗後、ただち
にこの鋼板に実施例3と同様にクロムめっき処理及び後
処理を施した。支持体表面形状を電子顕微鏡で観察する
と、直径0.5〜8μmの多面体のクロムの結晶粒子が
表面に分散していた。Example 1O A steel plate of the same type as in Example 1 was treated in a grain chamber by plane honing, then washed with dilute hydrochloric acid, and immediately after washing with water, the steel plate was subjected to chromium plating and post-treatment in the same manner as in Example 3. did. When the surface shape of the support was observed with an electron microscope, polyhedral chromium crystal particles with a diameter of 0.5 to 8 μm were dispersed on the surface.
更にこの支持体の表面粗さを実施例1と同様にして測定
したところ、以下の結果を得た〇ホーニング後(クロム
めっき前)
S1= 92
中心線平均粗さRa=0.6μm
クロムめっき後(後処理前)
S、= 92
w T、=62
中心線平均粗さRa−0,62μm
次いで、上記クロムめっきした支持体上に実施例1と同
様の感光性塗布液を同様に塗布し、平版印刷版材料を得
た。Furthermore, when the surface roughness of this support was measured in the same manner as in Example 1, the following results were obtained: After honing (before chrome plating) S1 = 92 Center line average roughness Ra = 0.6 μm After chrome plating (Before post-treatment) S, = 92 w T, = 62 Center line average roughness Ra - 0.62 μm Next, the same photosensitive coating liquid as in Example 1 was applied onto the chromium-plated support in the same manner, A lithographic printing plate material was obtained.
乾燥後の塗布重量に約2.41/dであった。The coating weight after drying was approximately 2.41/d.
更に、実施例1と同様の操作により平版印刷版を得た。Furthermore, a lithographic printing plate was obtained by the same operation as in Example 1.
この印刷版に実施例1と同じ耐処理薬品性試験及び印刷
性紙@を行なった。その結果、耐処理薬品性と耐刷性の
同時検討では、ウルトラプレートクリーナー擦きと印刷
500枚のサイクルは32回まで繰り返しても良好な印
刷が行なえた。更に耐刷性試験では前記印刷版に6万枚
まで良好な印刷を行なえた。This printing plate was subjected to the same processing chemical resistance test and printability paper @ as in Example 1. As a result, in a simultaneous study of processing chemical resistance and printing durability, good printing was achieved even when the cycle of rubbing with Ultra Plate Cleaner and printing 500 sheets was repeated up to 32 times. Furthermore, in a printing durability test, the printing plate was able to print satisfactorily up to 60,000 sheets.
比較例4
実施例1と同種の鋼板について、サンドブラストによっ
て砂目型て処理を行ない、次にrmvc浸漬した後、水
洗し、ただちに、実施例1Oと同様にクロムめっき処理
及び後処理を施した。この支持体表面には、実施例10
の支持体と同様なりロムの結晶が存在した。次にこの支
持体の表面粗さを実施例1と同様にして測定したところ
、以下の結果を得た。Comparative Example 4 A steel plate of the same type as in Example 1 was subjected to a grain pattern treatment by sandblasting, then immersed in rmvc, washed with water, and immediately subjected to chromium plating and post-treatment in the same manner as in Example 1O. On the surface of this support, Example 10
Similar to the support, ROM crystals were present. Next, the surface roughness of this support was measured in the same manner as in Example 1, and the following results were obtained.
サンドブラスト後(クロムめっき一前)ピークカウント
S!=32
S、−6
バリーカウントT、=6
′工ゝ、=6
中心線平均粗さRa=0.50μm
クロムめっき後(後処理前)
ピークカウントS、=34
S1=6
バリーカウントT2=7
T、= 7
中心平均粗さRa=0.52μm
更に、上記クロムめっきした支持体上に実施例1と同様
の感光性塗布液を同様に塗布し、平版印刷版材料を得た
。After sandblasting (before chrome plating) Peak count S! = 32 S, -6 Burry count T, = 6 'workゝ, = 6 Center line average roughness Ra = 0.50 μm After chrome plating (before post-treatment) Peak count S, = 34 S1 = 6 Burry count T2 = 7 T, = 7 Center average roughness Ra = 0.52 μm Furthermore, the same photosensitive coating liquid as in Example 1 was similarly coated on the chromium-plated support to obtain a lithographic printing plate material.
乾燥後の塗布重金は約2.511/ゴであった。The coating weight after drying was approximately 2.511/go.
次に、実施例10と同様の操作により平版印刷版を得た
。この印刷版に実施例1Oと同様に耐処理薬品性試験及
び印刷性試験を行なった。その結果、耐処理薬品性と耐
刷性の同時検討では、ウルトラプレートクリーナー擦き
と印刷500枚のサイクルに16回迄で既に画像部が浸
食されて印刷不可能となってしまった。更に耐刷性試験
でも15万枚程印刷したところで画像部の損傷が発生し
てしまい、耐刷性は不良であった。Next, a lithographic printing plate was obtained by the same operation as in Example 10. This printing plate was subjected to a treatment chemical resistance test and a printability test in the same manner as in Example 1O. As a result, in a simultaneous study of processing chemical resistance and printing durability, it was found that the image area was already eroded and printing became impossible after 16 cycles of rubbing with the Ultra Plate Cleaner and printing 500 sheets. Furthermore, in a printing durability test, the image area was damaged after about 150,000 sheets were printed, and the printing durability was poor.
実施例11
実施例1と同種の鋼板について、実施例1と同4美に電
解脱脂処理した後、水洗後、続けてこのa板を陽極とし
、鉛板を陰極とし、硫酸50!1/ノを含む水溶液中で
、浴温度肋℃、電流密度7OA/d771’、処理時間
1分++tの条件で、前記電解脱脂処理l−た鋼板を1
u解エツチングした。この後、水洗して、電解エツチン
グで生じたスマットをスポンジで擦って除去した。Example 11 A steel plate of the same type as in Example 1 was subjected to the same electrolytic degreasing treatment as in Example 1, and after washing with water, the A plate was used as an anode, the lead plate was used as a cathode, and sulfuric acid 50!1/no. The electrolytically degreased steel sheet was subjected to the electrolytic degreasing process for 1 minute in an aqueous solution containing:
U-etched. Thereafter, it was washed with water and the smut generated by electrolytic etching was removed by rubbing with a sponge.
この電解エツチングした鋼板に実施例1と同様にしてク
ロムめっきを施し、更に後処理を行なった。この支持体
表面形状を電子顕微鏡でpl察すると、直径0.5〜8
μmの多面体のクロムの結晶粒子及びその凝集体が表面
に分散して〜゛た。次に、この支持体の表面粗さを実施
例1と同様にして測定したところ、以下の結果を得た。This electrolytically etched steel plate was chromium plated in the same manner as in Example 1, and further post-treated. When observing the surface shape of this support with an electron microscope, the diameter was 0.5 to 8.
Polyhedral chromium crystal particles of μm size and their aggregates were dispersed on the surface. Next, the surface roughness of this support was measured in the same manner as in Example 1, and the following results were obtained.
電解エツチング後(クロムめっき前)
バリーカウントT、=93
バリーカウントT、=35 T2/T、=2.7中心線
平均粗さRa=0.55μm
りTffムめっき後(後処理前)
中心線平均粗さRa=0.57μm
更に、上記クロムめっきした支持体上に実施例3と同様
の感光性塗布液を実施例3と同様に塗布し、平版印刷版
材料を得た。After electrolytic etching (before chrome plating) Burry count T, = 93 Bury count T, = 35 T2/T, = 2.7 Center line average roughness Ra = 0.55 μm After chromium plating (before post-treatment) Center line Average roughness Ra=0.57 μm Further, the same photosensitive coating solution as in Example 3 was applied onto the chromium-plated support in the same manner as in Example 3 to obtain a lithographic printing plate material.
乾燥後の塗布型nは約2.41/77L″であった。The coating type n after drying was approximately 2.41/77L''.
次に実施例3と同様の操作により平版印刷版を得た。こ
の印刷版に実施例1と同様に耐処理薬品試験及び印刷試
験を行なった。Next, a lithographic printing plate was obtained by the same operation as in Example 3. This printing plate was subjected to a treatment chemical resistance test and a printing test in the same manner as in Example 1.
その結果、耐処理薬品性と耐刷性の同時検討でにウルト
ラプレートクリーナー擦きと印刷500枚のサイクルは
18回まで繰り返しても良好な印刷が行なえた。更に耐
刷性試験では、前記印刷版はm方杖まで良好な印刷が行
なえた。As a result, in a simultaneous study of processing chemical resistance and printing durability, good printing was achieved even when the cycle of rubbing with Ultra Plate Cleaner and printing 500 sheets was repeated up to 18 times. Furthermore, in a printing durability test, the printing plate was able to perform good printing up to m-way.
比較例5
実施例1と同種の鋼板について、実施例1と同様に電解
脱脂処理した後、水洗後、続けてこの質板を陽極とし、
鉛板t@極とし、す/ 22.511/1を含む水溶液
で、浴温度lO℃、電流密度5A/dm”、処理時間1
分間の条件で、前記IZ解脱詣処理した副板を電解エツ
チングした。この後、水洗して、スマットを除去した。Comparative Example 5 A steel plate of the same type as Example 1 was subjected to electrolytic degreasing treatment in the same manner as in Example 1, and after washing with water, the steel plate was used as an anode,
Lead plate t @ electrode, bath temperature 10℃, current density 5A/dm'', treatment time 1 with an aqueous solution containing 22.511/1
The sub-plate subjected to the IZ decomposition process was electrolytically etched under conditions of 1 minute. Thereafter, the smut was removed by washing with water.
この電解エツチングした鋼板に実施例1と同様にしてク
ロムめっぎを施し、更に後処理を行なった。この支持体
表面形状を?はり電子顕微鏡で観察すると、表面は実施
例11の支持体と同様なりロムの結晶粒子及びその凝祭
体でUわれていた。次にこの支持体の表面粗さを実施例
1と同様にして測定したところ、以下の結果な得た。This electrolytically etched steel plate was chromium plated in the same manner as in Example 1, and further post-treated. What is the surface shape of this support? When observed with a beam electron microscope, the surface was similar to that of the support of Example 11 and was covered with ROM crystal particles and aggregates thereof. Next, the surface roughness of this support was measured in the same manner as in Example 1, and the following results were obtained.
電解エツチング後(クロムめっき前)
ビークカウントg、=25
バリーカウントT、=2
T、 / TI= 1
FT、=2
中心線平均粗さR1=0.3μm
クロムめっき後(後処理前)
ピークカウント8t=29
# 5t=3
バリーカウントT2=3
T1=3
中心軸平均粗さRa =0.35μm
更に、上記クロムめっきした支持体上に実施例11と同
様の感光性塗布液を実施例11と同様に塗布し、平版印
刷版材料を得た。After electrolytic etching (before chrome plating) Beak count g, = 25 Barry count T, = 2 T, / TI = 1 FT, = 2 Center line average roughness R1 = 0.3 μm After chrome plating (before post-treatment) Peak count 8t = 29 # 5t = 3 Burry count T2 = 3 T1 = 3 Center axis average roughness Ra = 0.35 μm Furthermore, the same photosensitive coating liquid as in Example 11 was applied on the chromium-plated support. Coating was carried out in the same manner to obtain a lithographic printing plate material.
乾燥後の塗布重危框約2.4 F/mであった。The coating criticality after drying was approximately 2.4 F/m.
次に実施例11と同様の操作により平版印刷版を得た。Next, a lithographic printing plate was obtained by the same operation as in Example 11.
この印刷版に実施例11と同様に耐処理薬品試験及び印
刷状112を行なった。その結果、耐処理薬品性と耐刷
性の同時検討では、ウルトラプレートクリーナー擦きと
印刷500枚のサイクルに5回迄で既&C画像部が侵食
されて印刷不可能となってしまった。又、耐剛性試験で
も7万枚程印刷したところで画像部の損傷が発生してし
ま〜1、耐剛性は不良であった。This printing plate was subjected to a treatment chemical resistance test and a printed form 112 in the same manner as in Example 11. As a result, in a simultaneous study of processing chemical resistance and printing durability, it was found that the existing &C image area was eroded and printing became impossible after five cycles of rubbing with the Ultra Plate Cleaner and printing 500 sheets. Also, in the rigidity test, damage to the image area occurred after about 70,000 copies were printed, and the rigidity was poor.
発明の効果
本発明に係る鉄材を基材とする平版印刷版用支持体を用
いた平版印刷版は、耐処理薬品性、耐刷性に優れ、また
保水性も良好であるため印刷版面に擦り傷を付けること
もな(、さらに現像方法の寛容度も大きい。Effects of the Invention The lithographic printing plate using the iron-based lithographic printing plate support according to the present invention has excellent processing chemical resistance and printing durability, and also has good water retention, so that there are no scratches on the printing plate surface. There is no need to add (and there is also a large degree of latitude in the development method.
第1図は、ピークカウント(st 、 st )を示す
粗さプロファイルであり、!TrLは測定長さであり、
K印にピークカウントS、のピークで、φ印にピークカ
ウントS、のビーク、Cは切断深さ、1は中心綿、2に
上側の切断線、3は下側の切断gIf:示す。
第2図に、バリーカウントT1を示す粗さプロファイル
であり、1mfrl測定長さ、1は中心線、2は上側の
切断線、3は下側の切断線、十印rs:、sリーカウン
)Ttのピークを示す。
嬉3vliは、バリーカウントτ鵞を示す粗さプロファ
イルであり、 imは測定長さ、lに中心線、2は上側
の切断線、0印はバリーカウントT、のビークを示す。
第4因(写真)は、電解エツチング処理によって、粗面
化され、切断深さが2μmの条件で、Bz /5s=0
,8、T、/T、=2、Ra=0.6μmの表面粗さを
有する鉄材の表面の走査型電子顕微鏡写真(倍率700
倍、傾斜角45°)を示す。
第5図〜第7図(全て写真)は本発明の支持体表面の走
査型電子顕微鏡写真(倍率全て700倍。
傾斜角456)を示す。
第8図(写真)は、鉄めっき処理で粗面化され、切断深
さが21tmの条件でSt / St = 10.8、
Tt / Ts =1、Ra=0.5μmの表面粗さを
有する鉄材の表面の走査型電子顕微鏡写真(倍率700
倍、傾斜角45′)を示す。
代理人 桑TjX#i 美FIG. 1 is a roughness profile showing peak counts (st, st), ! TrL is the measured length;
The mark K shows the peak of peak count S, the mark φ shows the beak of peak count S, C is the cutting depth, 1 is the center cotton, 2 is the upper cutting line, and 3 is the lower cutting gIf: shown. Fig. 2 shows the roughness profile showing the burry count T1, where the measurement length is 1 mfrl, 1 is the center line, 2 is the upper cutting line, 3 is the lower cutting line, and the 100 marks rs:, s Lee count) Tt shows the peak of 3vli is a roughness profile showing the burry count τ, im is the measurement length, l is the center line, 2 is the upper cutting line, and 0 mark is the beak of the burry count T. The fourth factor (photo) is that the surface is roughened by electrolytic etching and the cutting depth is 2 μm, and Bz /5s = 0.
,8,T,/T,=2,Scanning electron micrograph of the surface of a steel material with a surface roughness of Ra=0.6 μm (magnification: 700
times, angle of inclination 45°). Figures 5 to 7 (all photographs) show scanning electron micrographs (all magnifications: 700x; tilt angle: 456) of the surface of the support of the present invention. Fig. 8 (photo) shows that the surface is roughened by iron plating and the cutting depth is 21 tm, with St/St = 10.8.
Scanning electron micrograph of the surface of a steel material with a surface roughness of Tt/Ts = 1 and Ra = 0.5 μm (magnification 700
times, angle of inclination 45'). Agent KuwaTjX#i Beauty
Claims (1)
材がその表面の粗さグロファイルRの切断深さ2.0μ
mにおけるピークカウント(S、、 St)の比がst
/ 8. = o、os〜5.0であり、バリーカウン
ト(’r+t’rt)の比がT!/ T、= 1.1〜
5.0であることを特徴とする平版印刷版用支持体。In a lithographic printing plate support based on iron material, the base material has a surface roughness of Grofile R with a cutting depth of 2.0 μm.
The ratio of peak counts (S,, St) at m is st
/ 8. = o, os ~ 5.0, and the ratio of Barry count ('r + t'rt) is T! / T, = 1.1~
5.0. A support for a lithographic printing plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14746083A JPS6038195A (en) | 1983-08-11 | 1983-08-11 | Support for planographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14746083A JPS6038195A (en) | 1983-08-11 | 1983-08-11 | Support for planographic printing plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6038195A true JPS6038195A (en) | 1985-02-27 |
Family
ID=15430865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14746083A Pending JPS6038195A (en) | 1983-08-11 | 1983-08-11 | Support for planographic printing plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6038195A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002332982A (en) * | 2001-05-11 | 2002-11-22 | Tohatsu Corp | Fire pump |
| JP2023515242A (en) * | 2020-03-26 | 2023-04-12 | スペイラ ゲゼルシャフト ミット ベシュレンクテル ハフツング | Litho strip with flat topography and printing plate made therefrom |
-
1983
- 1983-08-11 JP JP14746083A patent/JPS6038195A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002332982A (en) * | 2001-05-11 | 2002-11-22 | Tohatsu Corp | Fire pump |
| JP2023515242A (en) * | 2020-03-26 | 2023-04-12 | スペイラ ゲゼルシャフト ミット ベシュレンクテル ハフツング | Litho strip with flat topography and printing plate made therefrom |
| US11807027B2 (en) | 2020-03-26 | 2023-11-07 | Speira Gmbh | Litho strip having flat topography and printing plate produced therefrom |
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