JPS6040760B2 - Manufacturing method of diaphragm for condenser microphone - Google Patents
Manufacturing method of diaphragm for condenser microphoneInfo
- Publication number
- JPS6040760B2 JPS6040760B2 JP15019377A JP15019377A JPS6040760B2 JP S6040760 B2 JPS6040760 B2 JP S6040760B2 JP 15019377 A JP15019377 A JP 15019377A JP 15019377 A JP15019377 A JP 15019377A JP S6040760 B2 JPS6040760 B2 JP S6040760B2
- Authority
- JP
- Japan
- Prior art keywords
- ring
- diaphragm
- manufacturing
- membrane
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
- Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)
Description
【発明の詳細な説明】
本発明はコンデンサ型マイクロホン用振動膜の製造方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a diaphragm for a condenser microphone.
第1図は従来のマイクロホンの全体の構造を示したもの
である。FIG. 1 shows the overall structure of a conventional microphone.
同図において振動膜3は膜張りリング1に接着剤を用い
て固定され、引張られている。この振動膜3はスベーサ
5によって平滑に仕上げられた固定電極9との間に適当
な間隙が保持されている。固定電極9は絶縁体から成る
電極支持ケース7によって固定支持され、固定電極9の
端子6は電極支持ケース7の中心を貫通して外部へ引き
出されている。また膜張りリング1、固定電極9、電極
支持ケース7などは外錘ケース8に依って被われ、下端
部8′に於てかしめられ、固定されている。この様に構
成されたコンデンサマィクロホソにおいて、従釆振動膜
は第2図に示す如く構成されている。In the figure, the vibrating membrane 3 is fixed to the membrane tensioning ring 1 using an adhesive and is being stretched. A suitable gap is maintained between the vibrating membrane 3 and the fixed electrode 9 which has been smoothed by a smoother 5. The fixed electrode 9 is fixedly supported by an electrode support case 7 made of an insulator, and the terminal 6 of the fixed electrode 9 passes through the center of the electrode support case 7 and is drawn out. Further, the membrane tension ring 1, fixed electrode 9, electrode support case 7, etc. are covered by an outer weight case 8, and are fixed by caulking at the lower end 8'. In the condenser micrometer constructed in this manner, the subordinate vibrating membrane is constructed as shown in FIG.
すなわち10はプラスチック,セラミック,ガラスなど
の絶縁体から成る膜張り用リング、11はプラスチック
などのフィルムから成る振動膜、12は振動膿の上に被
着された金属蒸着箔、13,14は膜張り用リングの側
面及び上面に被着された金属蒸着箔の部分である。この
様な振動膜を製作するに当っては、金属蒸着していない
段階でプラスチックフィルム11上に膜張り用リング1
0を接着剤を用いてあるし、は熱融着等により固定し、
この後に、上面より膜張り用リング10及び振動膿11
を含め全面に金属蒸着を行なう。That is, 10 is a membrane ring made of an insulator such as plastic, ceramic, or glass, 11 is a vibrating membrane made of a film of plastic, etc., 12 is a metal-deposited foil deposited on the vibrating material, and 13 and 14 are membranes. This is the part of the metallized foil that is applied to the side and top surfaces of the tension ring. When manufacturing such a vibrating membrane, a membrane-stretching ring 1 is placed on the plastic film 11 before metal vapor deposition.
0 is used with adhesive, and 0 is fixed by heat fusion etc.
After this, from the top surface, the membrane tensioning ring 10 and the vibrating pus 11 are
Metal vapor deposition is performed on the entire surface including the
その後、各膜張り用リング毎に切り抜き切断を行なう。
第3図に実際に金属蒸着を行なう場合の装置の概略を示
す。Thereafter, each membrane tensioning ring is cut out.
FIG. 3 schematically shows an apparatus for actually performing metal vapor deposition.
3一1は蒸着装層本体、3一2はベルジャー、3−3は
チャソバーでポンプ等により真空に排気されている。Reference numeral 3-1 is a vapor deposition layer body, 3-2 is a bell jar, and 3-3 is a chasobar which is evacuated to a vacuum by a pump or the like.
3一4は蒸着給具、3一5はヒーター、3一6はニッケ
ル等の金属、3一7は金属分子の飛ぶ方向、3一1川ま
膜張り用リング、3−11は振動膜である。3-4 are evaporation supply tools, 3-5 are heaters, 3-6 are metals such as nickel, 3-7 are the directions in which metal molecules fly, 3-1 are membrane tension rings, and 3-11 are vibrating membranes. be.
金属分子の飛ぶ方向3一7は被蒸着物の付近では真上へ
向かう方向となり、第2図に示す膜張り用リングの内側
面とは平行する事になり、この内側面に金属が蒸着し‘
こくく、蒸着面12と14の導通がとれずにマイクロホ
ンの感度が大中に低下する事がある。なお、蒸着面14
と外蟹ケース8は電気的に導通がとれている。上記のよ
うな欠点を改善する一方法として第4図に示す如く、膜
張り用リングの内側面にテーパを付ける事が考えられる
。The flying direction 3-7 of the metal molecules is directly upward near the object to be evaporated, and is parallel to the inner surface of the film tensioning ring shown in Fig. 2, and the metal is deposited on this inner surface. '
Unfortunately, conduction between the vapor deposition surfaces 12 and 14 may not be established, and the sensitivity of the microphone may be significantly reduced. Note that the vapor deposition surface 14
The outer crab case 8 is electrically conductive. One possible way to improve the above-mentioned drawbacks is to taper the inner surface of the membrane tensioning ring, as shown in FIG.
第2図の構造と異なる点は15のテーパ角が900より
小さい事であるが、この角度は鋭角の部分の強度を保持
するため、600〜750が望ましい。しかしながら、
プラスチック材料の切削加工ではこのテーパ角は小さく
するのは不可能であり、加工のコストダウンのため、プ
レス加工にすると、第2図と同一の構造にせざるを得な
い。本発明はこのような振動膜周辺の製造上の欠点を改
善せんとするものである。The difference from the structure in FIG. 2 is that the taper angle of 15 is smaller than 900, but this angle is preferably 600 to 750 in order to maintain the strength of the acute angle portion. however,
It is impossible to reduce this taper angle when cutting plastic materials, and if press working is used to reduce processing costs, the structure must be the same as that shown in FIG. 2. The present invention aims to improve such manufacturing defects around the vibrating membrane.
以下第5図により本発明の一実施例を説明する。第5図
は実際に金属葵着を行なう場合の装瞳の概略を示すもの
で、5ーーは蒸着装層本体、5−2はベルジャー、5一
3はチャンバーでポンプ等により真空に排気されている
。An embodiment of the present invention will be described below with reference to FIG. Figure 5 shows an outline of the pupil installation when actually performing metal hollyhose deposition. 5-- is the main body of the vapor-deposited layer, 5-2 is a bell jar, and 5-3 is a chamber that is evacuated to a vacuum by a pump or the like. There is.
5−4は蒸着治具、5一5はヒーター、5−6はニッケ
ル等の金属、5一7は金属分子の飛ぶ方向、5−10は
膜張り用リング、5−11は振動膜である。5-4 is a vapor deposition jig, 5-5 is a heater, 5-6 is a metal such as nickel, 5-7 is a direction in which metal molecules fly, 5-10 is a membrane tensioning ring, and 5-11 is a vibrating membrane. .
被蒸着物を傾ける角度5−8は均一の厚さで蒸着させる
ため、チャンバ5一3の大きさによって多少異なるが、
150〜30oが望ましい。これにより、第2図に示す
葵着面12と14には確実に金属が蒸着でき、ある一方
向で確実に電気的な導通がとれる。尚、コンデンサマィ
クロホンの場合、振動膜と電極間の容量はせし、ぜし、
10肥Fであるから、IKHZでIMOとなり、導通抵
抗が10KOであってもマイクロホンの感度ロスは無視
し得る。つまり、第2図における蒸着面12と14が一
方向だけ、一部分だけ電気的に導通しても、導通抵抗が
数KQ以下になるので、マイクロホンの感度のロスはな
い。以上のように、本発明によれば、膜張り用リングの
材料、加工法の選択の自由度が大きく、かつマイクロホ
ンの感度ロスを十分に防止できる。The angle 5-8 of inclining the object to be deposited varies somewhat depending on the size of the chamber 5-3 in order to deposit a uniform thickness.
150-30o is desirable. As a result, metal can be reliably deposited on the hollyhock deposition surfaces 12 and 14 shown in FIG. 2, and electrical continuity can be reliably established in one direction. In the case of a condenser microphone, the capacitance between the diaphragm and the electrode is
Since it is 10 F, IKHZ becomes IMO, and even if the conduction resistance is 10 KO, the sensitivity loss of the microphone can be ignored. In other words, even if the deposition surfaces 12 and 14 in FIG. 2 are electrically connected in only one direction and in only a portion, the conduction resistance is less than several KQ, so there is no loss in sensitivity of the microphone. As described above, according to the present invention, there is a large degree of freedom in selecting the material and processing method for the membrane ring, and sensitivity loss of the microphone can be sufficiently prevented.
第1図は従来のマイクロホンの全体の構造を示す断面図
、第2図は従来の振動膜の要部側断面図、第3図は上記
振動膜の製法における金属蒸着装瞳の概略図、第4図は
従来の振動膜の一致良例を示す要部側断面図、第5図は
本発明の一実施例によるコンデンサマィクロホン用振動
膜の製法における金属蒸着装瞳の概略図である。
10,3−10,5−10・・・・・・膜張り用リング
「 11,3−11,5一11……プラスチックフィル
ム、12,13,14・・・…蒸着面。
第1図第2図
第3図
第4図
第5図Fig. 1 is a sectional view showing the overall structure of a conventional microphone, Fig. 2 is a side sectional view of the main part of a conventional diaphragm, and Fig. 3 is a schematic diagram of a metal vapor-deposited pupil in the above method of manufacturing the diaphragm. FIG. 4 is a sectional side view of a main part showing an example of good matching of a conventional diaphragm, and FIG. 5 is a schematic diagram of a metal vapor-deposited pupil in a method for manufacturing a diaphragm for a condenser microphone according to an embodiment of the present invention. Figure 1 Figure 2 Figure 3 Figure 4 Figure 5
Claims (1)
張り用リングを金属分子が飛ぶ方向に対して傾けて設け
、上記プラスチツクフイルムの片面および上記リングの
片面にそれぞれ金属蒸着箔を設けるとともに、上記リン
グの内周面の少なくとも一部に金属蒸着箔を設け、上記
プラスチツクフイルム上の金属蒸着箔と、上記リング上
の金属蒸着箔とを、上記リング内周面上の金属蒸着箔で
電気的に導通させることを特徴とするコンデンサマイク
ロホン用振動膜の製造方法。1. A film-stretching ring made of an insulator fixed to a plastic film is provided at an angle with respect to the direction in which metal molecules fly, and metal vapor-deposited foil is provided on one side of the plastic film and on one side of the ring, and the inside of the ring is A metallized foil is provided on at least a portion of the peripheral surface, and the metallized foil on the plastic film and the metallized foil on the ring are electrically connected to each other by the metallized foil on the inner peripheral surface of the ring. A method for manufacturing a diaphragm for a condenser microphone, characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15019377A JPS6040760B2 (en) | 1977-12-13 | 1977-12-13 | Manufacturing method of diaphragm for condenser microphone |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15019377A JPS6040760B2 (en) | 1977-12-13 | 1977-12-13 | Manufacturing method of diaphragm for condenser microphone |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5482227A JPS5482227A (en) | 1979-06-30 |
| JPS6040760B2 true JPS6040760B2 (en) | 1985-09-12 |
Family
ID=15491542
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15019377A Expired JPS6040760B2 (en) | 1977-12-13 | 1977-12-13 | Manufacturing method of diaphragm for condenser microphone |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6040760B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58132499U (en) * | 1982-02-26 | 1983-09-07 | 松下電器産業株式会社 | Bidirectional electret condenser microphone |
-
1977
- 1977-12-13 JP JP15019377A patent/JPS6040760B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5482227A (en) | 1979-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5854846A (en) | Wafer fabricated electroacoustic transducer | |
| US2795709A (en) | Electroplated ceramic rings | |
| US4173522A (en) | Method and apparatus for producing carbon coatings by sputtering | |
| JPH02149199A (en) | electret condenser microphone | |
| FR2364243A1 (en) | DRIED POROUS MEMBRANE OF ACRYLONITRILE POLYMER, PROCESS FOR THE MANUFACTURE OF THE SAME AND BATTERY SEPARATORS OF ACCUMULATORS INCLUDING APPLICATION | |
| JPH0387010A (en) | Electric double layer capacitor | |
| JPS6040760B2 (en) | Manufacturing method of diaphragm for condenser microphone | |
| EP0305540B1 (en) | Diaphragm unit of a condenser microphone, a method of fabricating the same, and a condenser microphone | |
| SE447568B (en) | THE WINDSCREEN BOXING AND PROCEDURE AND DEVICE FOR MANUFACTURING THEM | |
| US1945933A (en) | Process for the manufacture of diaphragms adapted for use in physical or like apparatus | |
| FR2450500A1 (en) | PRESSURE SENSOR CAPACITOR AND METHOD FOR CALIBRATING THE CAPACITOR | |
| GB1504314A (en) | Electrostatic transducer | |
| EP0665303A1 (en) | Method of producing a microporous, gas permeable electrode structure and a microporous, gas permeable electrode structure | |
| JPS5478690A (en) | Crystal vibrator | |
| JPS5847118B2 (en) | Multilayer diaphragm for acoustic transducer and its manufacturing method | |
| JPS62116100A (en) | Diaphragm for microphone | |
| JPS5669994A (en) | Diaphragm for audio loudspeaker | |
| JPS5478691A (en) | Crystal vibrator | |
| US4562094A (en) | Method of manufacturing porous carbon structures | |
| JPH05171439A (en) | Vacuum window | |
| KR920003362A (en) | Manufacturing method of impregnated cathode | |
| JPS5925883Y2 (en) | Dry plating equipment | |
| JPH02149198A (en) | electret condenser microphone | |
| JPH053599A (en) | Condenser microphone and manufacturing method thereof | |
| JPS56117499A (en) | Speaker diaphragm |