JPS6064441A - 耐熱樹脂膜の形成方法 - Google Patents

耐熱樹脂膜の形成方法

Info

Publication number
JPS6064441A
JPS6064441A JP58171193A JP17119383A JPS6064441A JP S6064441 A JPS6064441 A JP S6064441A JP 58171193 A JP58171193 A JP 58171193A JP 17119383 A JP17119383 A JP 17119383A JP S6064441 A JPS6064441 A JP S6064441A
Authority
JP
Japan
Prior art keywords
resin film
heat
solution
resistant resin
polyimide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58171193A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0216007B2 (de
Inventor
Ken Ogura
謙 小椋
Yasushi Nakabo
中坊 康司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58171193A priority Critical patent/JPS6064441A/ja
Priority to US06/581,365 priority patent/US4528216A/en
Publication of JPS6064441A publication Critical patent/JPS6064441A/ja
Publication of JPH0216007B2 publication Critical patent/JPH0216007B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/106Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/01Manufacture or treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP58171193A 1983-02-24 1983-09-19 耐熱樹脂膜の形成方法 Granted JPS6064441A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58171193A JPS6064441A (ja) 1983-09-19 1983-09-19 耐熱樹脂膜の形成方法
US06/581,365 US4528216A (en) 1983-02-24 1984-02-17 Process for forming heat-resistant resin films of polyimide and organosilicic reactants

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58171193A JPS6064441A (ja) 1983-09-19 1983-09-19 耐熱樹脂膜の形成方法

Publications (2)

Publication Number Publication Date
JPS6064441A true JPS6064441A (ja) 1985-04-13
JPH0216007B2 JPH0216007B2 (de) 1990-04-13

Family

ID=15918730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58171193A Granted JPS6064441A (ja) 1983-02-24 1983-09-19 耐熱樹脂膜の形成方法

Country Status (1)

Country Link
JP (1) JPS6064441A (de)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53140973A (en) * 1977-05-13 1978-12-08 Sanyo Electric Co Ltd Forming method of semiconductor insulation film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53140973A (en) * 1977-05-13 1978-12-08 Sanyo Electric Co Ltd Forming method of semiconductor insulation film

Also Published As

Publication number Publication date
JPH0216007B2 (de) 1990-04-13

Similar Documents

Publication Publication Date Title
WO2023058288A1 (ja) 樹脂組成物及び絶縁電線
KR900005120B1 (ko) 반도체 장치용 절연수지조성물 및 반도체장치
JP2021109908A (ja) 樹脂組成物、ポリイミド、及びポリイミドフィルムの製造方法
JPH0145493B2 (de)
JP7701444B2 (ja) ポリアミック酸組成物およびこれを含むポリイミド
CN117210122A (zh) 一种耐水解易加工的聚酰亚胺清漆及绝缘电线
US4528216A (en) Process for forming heat-resistant resin films of polyimide and organosilicic reactants
JPS61195130A (ja) 芳香族ポリイミドフイルムの製造方法
JPS6064441A (ja) 耐熱樹脂膜の形成方法
JPH03243625A (ja) ポリイミド前駆体組成物およびポリイミドの製造方法
JPS62135529A (ja) ポリイミド前駆体
JPS6066437A (ja) 耐熱樹脂膜の形成方法
JPH0129370B2 (de)
CN118374148A (zh) 树脂组合物以及绝缘电线
JP7675184B2 (ja) ポリアミック酸組成物およびこれを含むポリイミド
JPS61273806A (ja) 絶縁被覆電線
JP3192762B2 (ja) ポリイミドフィルムの製造方法
JPS6066438A (ja) 耐熱樹脂膜の形成方法
JPH0259619B2 (de)
JP7700237B2 (ja) ポリアミック酸組成物及びそれを含むポリイミド
JPH04239037A (ja) ポリイミド多層膜の製造方法
JP2594545B2 (ja) 半導体装置の製造方法
JPH0794502A (ja) 半導体装置
JPS61273524A (ja) 液晶配向膜形成用溶液
JPH0782482A (ja) 高分子複合体とその製造方法