JPS6076024A - Manufacturing device of vertical magnetic recording medium - Google Patents
Manufacturing device of vertical magnetic recording mediumInfo
- Publication number
- JPS6076024A JPS6076024A JP18368883A JP18368883A JPS6076024A JP S6076024 A JPS6076024 A JP S6076024A JP 18368883 A JP18368883 A JP 18368883A JP 18368883 A JP18368883 A JP 18368883A JP S6076024 A JPS6076024 A JP S6076024A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- evaporation
- upstream side
- evaporation source
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000001704 evaporation Methods 0.000 claims abstract description 46
- 230000008020 evaporation Effects 0.000 claims abstract description 46
- 239000000463 material Substances 0.000 claims abstract description 31
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 17
- 230000008021 deposition Effects 0.000 claims description 11
- 230000002265 prevention Effects 0.000 claims description 7
- 238000010894 electron beam technology Methods 0.000 abstract description 4
- 238000007740 vapor deposition Methods 0.000 abstract 3
- 235000013290 Sagittaria latifolia Nutrition 0.000 abstract 1
- 235000015246 common arrowhead Nutrition 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 6
- 230000005415 magnetization Effects 0.000 description 5
- 238000001816 cooling Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000010408 sweeping Methods 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は、垂直磁気記録体の製造装置に関する。[Detailed description of the invention] The present invention relates to an apparatus for manufacturing a perpendicular magnetic recording medium.
従来の此種製造装置は、第１図示のように、基材ａを矢
示方向に走行させ、その下方にこれに対面して設けた蒸
発源すよシミ子ビーム発生装置より電子ビームｃｆ：ス
イープさせて蒸発源すに当て加熱溶解蒸発させ、その基
材ａと核蒸発源すとの間に、射め入射蒸着を防ぐ防着板
ｄの垂直蒸着用開口部ｅｔ介して、該走行基板ａにほと
んど垂直に入射蒸着せしめるようにしたものが公知であ
るが、一般に、その蒸発源すの基材の走行方向の長さ４
は、該開口部ｅの基材の走行方向の長さｔより小さい。In the conventional manufacturing apparatus of this kind, as shown in FIG. The traveling substrate is heated and melted and evaporated by sweeping it against the evaporation source, and between the base material a and the nuclear evaporation source, the traveling substrate A method is known in which the incident evaporation is performed almost perpendicular to a, but generally the length of the evaporation source in the running direction of the base material is 4.
is smaller than the length t of the opening e in the running direction of the base material.
従って、特に走行基材ａがその開口ｍｅのその走行方向
の上流端よシ開ロ部ｅに走行する個所では、図示の如き
、矢示の如く斜めに入射蒸着する傾向となる。Therefore, particularly at the location where the traveling base material a runs from the upstream end of the opening me in the traveling direction to the opening bottom e, there is a tendency for the incident deposition to occur obliquely as shown by the arrow.
然るに、一般にその蒸着原子の析出生長は、基材面に最
初に蒸着する蒸発原子が核となりその核の方向に成長す
るから、か＼る上記の装置では、その基材面に最初に蒸
着する蒸発原子は基材面に対し傾めに付着しこれが核と
なるので。However, in general, the deposition growth of the evaporated atoms is such that the evaporated atoms that are first deposited on the substrate surface serve as nuclei and grow in the direction of the nucleus. The evaporated atoms attach at an angle to the base material surface, and this becomes the nucleus.
その核に従って爾後斜めに生長する傾向があり。It tends to grow obliquely following its nucleus.
従て良好な垂直磁化膜が得られない不都合を有する。Therefore, there is a disadvantage that a good perpendicular magnetization film cannot be obtained.
本発明は、この欠点を解消し、基材面に一層優れた垂直
磁化膜を製造することができる垂直磁気記録体の製造袋
ｒＩｔｆ、提供するもので、１方へ走行する基材と、該
基材の下方にこれに対面して設けた蒸発源と、該基材と
該蒸発源との間にその基材の近傍に斜め入射蒸着を防ぐ
防着板の垂直蒸着用開口部とを備えた垂直磁気記録体の
製造装置において、該蒸発源に該蒸着用開口部の走行基
材の上流側の開口端縁をまたいで拡がる上流側蒸発面を
有するようにしたことを特徴とする。The present invention eliminates this drawback and provides a manufacturing bag rItf for perpendicular magnetic recording bodies that can produce a more excellent perpendicular magnetization film on the surface of the base material. An evaporation source provided below and facing the base material, and an opening for vertical evaporation of a deposition prevention plate that prevents obliquely incident evaporation near the base material between the base material and the evaporation source. In the apparatus for manufacturing a perpendicular magnetic recording medium, the evaporation source has an upstream evaporation surface that extends across the opening edge on the upstream side of the running substrate of the evaporation opening.
本発明装置を第２図示の原理図で説明する。The device of the present invention will be explained with reference to the principle diagram shown in the second figure.
図面で（１）は矢示方向に走行する基材、（２）はその
下方に設けた蒸発源、（３）は該基材（１）と該蒸発源
（２）との間に介在し該基材（１）の下面近傍に設けた
斜め入射蒸着を防ぐ防着板、（４）は該防着板（３）に
設けたその垂直蒸着用開口部を示す。In the drawing, (1) is a base material running in the direction of the arrow, (2) is an evaporation source provided below it, and (3) is a base material interposed between the base material (1) and the evaporation source (2). A deposition prevention plate is provided near the bottom surface of the substrate (1) to prevent obliquely incident deposition, and (4) indicates an opening for vertical deposition provided in the deposition prevention plate (3).
本発明によれば、該蒸発源（２）に、該垂直開口部（４
）の走行基材（１）の上流側の開口端縁（４ａ）を跨い
で拡がる上流側蒸発面（２ａ）を有するようにしたもの
である。一般には、蒸発源（２）は、その下流側の開口
端縁（４ｂ）を跨いで拡がる下流側蒸発面（２ｂ）を有
するようにすることが好ましい。換言すれば、その蒸発
源（２）の基材の走行方向の長さＬＯは、開口部（４）
の基材の走行方向の長さＬより大きくつくることが好ま
しく一般である。而して、この蒸発源（２）に電子ビー
ム発生装置からの電子ビームＢをその上流側蒸発面（２
ｂ）にスイープしあてるときは、矢示のように、該上流
側の開口端縁（４ｂ）の近傍では垂直に蒸発すると共に
その両側に、互に反対方向の斜めに蒸発し基材面近傍で
その垂直蒸発と合流し結局、いづれか１方への斜め入射
蒸着はなくなる傾向となシ、はとんど垂直に蒸着し、こ
れが核となってその後の開口部（４）の面域での蒸着は
これに従って垂直に析出生長する。尚１図示の実施例で
は、その下流側の蒸発面（２ｂ）でも前記と同様に斜め
蒸着は可及的におさえられて、一層良好な垂直磁化膜が
得られる。According to the invention, the evaporation source (2) includes the vertical opening (4).
) has an upstream evaporation surface (2a) extending across the upstream opening edge (4a) of the running base material (1). Generally, it is preferable that the evaporation source (2) has a downstream evaporation surface (2b) extending across the downstream opening edge (4b). In other words, the length LO of the base material of the evaporation source (2) in the running direction is the same as that of the opening (4).
Generally, it is preferable to make the length larger than the length L in the running direction of the base material. Then, the electron beam B from the electron beam generator is applied to this evaporation source (2) on its upstream evaporation surface (2).
When sweeping b), as shown by the arrow, evaporation occurs vertically near the upstream opening edge (4b), and evaporates obliquely in opposite directions on both sides of the opening edge (4b), as shown by the arrow, near the substrate surface. The vertical evaporation merges with the vertical evaporation, and eventually the oblique incidence evaporation in one direction tends to disappear. The deposition grows vertically in accordance with this. In the embodiment shown in FIG. 1, the oblique evaporation is suppressed as much as possible on the evaporation surface (2b) on the downstream side as well, as described above, and an even better perpendicularly magnetized film can be obtained.
第３図は、本発明を実除に適用した本発明装置の１例を
示し、図面で（５）は、真空排気される密閉容器、（６
）はテープ状基材（１）を１方へ移行する送シ出しロー
ル（６ａ）と巻き取りロール（６ｂ）から成る移行装置
、（７）はテープ基材ｆｉｌに回転と冷却を与える冷却
キャン、（８）は電子ビーム発生装置、（９）は、容器
（５）を気密に貫通しその開口部（４）に指向開口する
酸素導入管、 （１０１は１Ｍ発源（２）を収容したる
つぼを示す。この本装置によシ酸Ｘを導入しながら蒸発
源（２）よシＦ ｅ ＋ Ｃｏ ＊ Ｎ ｉやその合金
等の強磁性金属を蒸発させ、その１部を酸化させながら
金属と金属酸化物との２相が所定割合でまざったＣｏ−
０ｍ Ｃｏ−Ｎｉ −０＋ Ｆｅ −Ｃｏ−Ｎｉ−０な
どの垂直磁化膜をテープ基材面に形成した垂直磁気記録
テープを装置するものである。FIG. 3 shows an example of the apparatus of the present invention in which the present invention is applied to actual extraction.
) is a transfer device consisting of a feed roll (6a) and a take-up roll (6b) that transfer the tape-shaped base material (1) in one direction, and (7) is a cooling can that rotates and cools the tape base material fil. , (8) is an electron beam generator, (9) is an oxygen introduction tube that airtightly penetrates the container (5) and opens toward the opening (4), (101 houses the 1M source (2) A crucible is shown.While introducing silicic acid Co-
This device uses a perpendicular magnetic recording tape in which a perpendicular magnetization film such as 0 m Co-Ni -0+ Fe -Co-Ni-0 is formed on the tape base material surface.
第４図は、第３図示の冷却キャンに変えて、無端金属ベ
ル）（１１１を張設した１対の冷却ローラーα’ａａ’
ｚｔによυテープ状基材（１）を走行させるようにした
ものである７又その酸素導入管（９）は左右に１対対象
に設けた。Fig. 4 shows a pair of cooling rollers α'aa' on which endless metal bells (111) are stretched, instead of the cooling can shown in Fig. 3.
A pair of oxygen inlet tubes (9) were provided symmetrically on the left and right to allow the υ tape-shaped base material (1) to travel along the zt.
第３図及び第４図に明らかなように、その蒸発源（２）
の長さＬｏ は防着板（３）の開口部（４）の長さ琺り
は、著しく長手とし、その両側の蒸発面（２ａ）（２ｂ
）はその開口端縁（４ａＮ４ｂ）よりは夫々等しい長さ
延長するようにした。As is clear from Figures 3 and 4, the evaporation source (2)
The length Lo of the opening (4) of the adhesion prevention plate (3) is extremely long, and the evaporation surfaces (2a) (2b
) were made to extend by the same length from the opening edge (4aN4b).
而して、第３図示の装置により実験を重ねた所、そのＬ
ｏ／Ｌ の比が１を越えればＨｃＬ／Ｈａ、は２以上ｈ
ＢｒＬ／ＢｒＩは１．５以上を有する垂直磁化膜を有
するものが得られるに対し、Ｌｏ／Ｌの比が０．５では
、Ｈｃｈ ／ ＨａＩは１．２程度、 Ｂｒｔ／Ｂｒｚ
は１程度にすぎず１本装置により、一層すぐれた垂直磁
化膜が得られることが分った。After repeated experiments using the device shown in Figure 3, the L
If the o/L ratio exceeds 1, HcL/Ha is 2 or more h
A perpendicular magnetization film with BrL/BrI of 1.5 or more can be obtained, whereas when the Lo/L ratio is 0.5, Hch/HaI is about 1.2 and Brt/Brz
was only about 1, and it was found that even better perpendicular magnetization films could be obtained using one apparatus.
このように本発明によるときは、蒸発源の上流側蒸発面
を防着板の垂直蒸着用開口部の上流側の開口端縁をまた
いで拡がる面としたので、従来の蒸発源の基材走行の長
さよりは開口部の基材走行の長さよりは小さく設計した
装置によるものに比し、優れた垂直磁化膜を製造できる
効果を有する。In this way, according to the present invention, the upstream evaporation surface of the evaporation source is a surface extending across the upstream opening edge of the vertical evaporation opening of the deposition prevention plate, so that the base material running of the conventional evaporation source is This method has the effect of producing an excellent perpendicularly magnetized film compared to an apparatus designed to have a length smaller than the length of the base material running through the opening.
第１図は従来装置の側面線図、第２図は、本発明の基本
的側面線図、第３図及び第４図は夫々本発明の実施例の
装置を示す。
（１）・・・基材 （２）・・・蒸発源（２ａ）・・・
上流側蒸発面 （３）・・・防着板（４）・・・垂直蒸
着用開口部
（４ａ）・・・上流側開口端縁
特許出願人 日本真空技術株式会社
代 理 人 北 村 欣 ≠１．１１’、、ｔ−，・−
１１５，τ
他２名
第１図
第２図FIG. 1 is a side view of a conventional device, FIG. 2 is a basic side view of the present invention, and FIGS. 3 and 4 each show a device according to an embodiment of the present invention. (1)... Base material (2)... Evaporation source (2a)...
Upstream evaporation surface (3)... Deposition prevention plate (4)... Vertical evaporation opening (4a)... Upstream opening edge Patent applicant: Japan Vacuum Technology Co., Ltd. Agent: Kin Kitamura ≠ 1.11',,t-,・-
115, τ and 2 others Figure 1 Figure 2
Claims (1)
設けた蒸発源と、＃、基材と核蒸発源との開にその基材
の近傍に斜め入射蒸着を防ぐ防着板の垂直蒸着用開口部
とを備えた垂直磁気記録体の製造装置において、該蒸発
源に該重着用開口部の走行基材の上流側の開口端縁をま
たいで拡がる上流側蒸発面を有するようにしたことを特
徴とする垂直磁気記録体の製造装置。A base material traveling downward, an evaporation source provided below and facing the base material, #, an adhesion prevention device that prevents obliquely incident evaporation in the vicinity of the base material between the base material and the nuclear evaporation source. In an apparatus for producing a perpendicular magnetic recording body, the evaporation source has an upstream evaporation surface that extends across the opening edge on the upstream side of the traveling base material of the vertical deposition opening of the plate. An apparatus for manufacturing a perpendicular magnetic recording medium, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18368883A JPS6076024A (en) | 1983-10-01 | 1983-10-01 | Manufacturing device of vertical magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18368883A JPS6076024A (en) | 1983-10-01 | 1983-10-01 | Manufacturing device of vertical magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6076024A true JPS6076024A (en) | 1985-04-30 |
| JPH0418373B2 JPH0418373B2 (en) | 1992-03-27 |
Family
ID=16140189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18368883A Granted JPS6076024A (en) | 1983-10-01 | 1983-10-01 | Manufacturing device of vertical magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6076024A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5814326A (en) * | 1981-07-16 | 1983-01-27 | Matsushita Electric Ind Co Ltd | Production for magnetic recording medium |
| JPS5896868A (en) * | 1981-12-02 | 1983-06-09 | Matsushita Electric Ind Co Ltd | Reactive vapor deposition equipment |
| JPS58105433A (en) * | 1981-12-18 | 1983-06-23 | Nippon Telegr & Teleph Corp <Ntt> | Producing device of magnetic recording medium |
| JPS59175036A (en) * | 1983-03-24 | 1984-10-03 | Matsushita Electric Ind Co Ltd | Method for manufacturing magnetic recording media |
-
1983
- 1983-10-01 JP JP18368883A patent/JPS6076024A/en active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5814326A (en) * | 1981-07-16 | 1983-01-27 | Matsushita Electric Ind Co Ltd | Production for magnetic recording medium |
| JPS5896868A (en) * | 1981-12-02 | 1983-06-09 | Matsushita Electric Ind Co Ltd | Reactive vapor deposition equipment |
| JPS58105433A (en) * | 1981-12-18 | 1983-06-23 | Nippon Telegr & Teleph Corp <Ntt> | Producing device of magnetic recording medium |
| JPS59175036A (en) * | 1983-03-24 | 1984-10-03 | Matsushita Electric Ind Co Ltd | Method for manufacturing magnetic recording media |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0418373B2 (en) | 1992-03-27 |
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