JPS6077997A - Electrolytic etching bath for gold or gold alloy - Google Patents

Electrolytic etching bath for gold or gold alloy

Info

Publication number
JPS6077997A
JPS6077997A JP18559283A JP18559283A JPS6077997A JP S6077997 A JPS6077997 A JP S6077997A JP 18559283 A JP18559283 A JP 18559283A JP 18559283 A JP18559283 A JP 18559283A JP S6077997 A JPS6077997 A JP S6077997A
Authority
JP
Japan
Prior art keywords
bath
acetic acid
gold
hydrochloric acid
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18559283A
Other languages
Japanese (ja)
Other versions
JPH0521999B2 (en
Inventor
Ryozo Sugimura
杉村 了三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tanaka Kikinzoku Kogyo KK
Original Assignee
Tanaka Kikinzoku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tanaka Kikinzoku Kogyo KK filed Critical Tanaka Kikinzoku Kogyo KK
Priority to JP18559283A priority Critical patent/JPS6077997A/en
Publication of JPS6077997A publication Critical patent/JPS6077997A/en
Publication of JPH0521999B2 publication Critical patent/JPH0521999B2/ja
Granted legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To obtain an electrolytic etching bath for gold or a gold alloy giving a lustrous surface to any of annealed, worked and electroformed articles by specifying the relation among water, hydrochloric acid and acetic acid and the relation between hydrochloric acid and acetic acid. CONSTITUTION:This electrolytic etching bath for gold or a gold alloy consists of water, hydrochloric acid and acetic acid in 1:(0.1-100):(0.1-100) ratio of water: hydrochloric acid:acetic acid and 1:(1-10) ratio of hydrochloric acid:acetic acid. The bath is characterized by acetic acid contained. Luster is not obtd. in a bath consisting of hydrochloric acid and water. In accordance with an increase in the concn. of acetic acid in the bath, the resistance of the bath is increased, and luster is improved. Since the resistance of this bath is low, the bath has low power consumption, and the temp. of the bath is hardly raised. Even when the bath is produced in large quantities, the composition is hardly changed, and the bath maintains its stability.

Description

【発明の詳細な説明】 本発明は金または金合金の電解エツチング浴に関するも
ので、特に金電鋳品や圧延あがりの金製品などの全装飾
品の電解エツチング浴に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electrolytic etching bath for gold or gold alloys, and more particularly to an electrolytic etching bath for all decorative articles such as gold electroformed articles and rolled gold articles.

従来、電解エツチング浴としては主にシアンやクロム酸
等の有害物を使用したものが多く用いられていた。そし
て、これらの有害物を使用しない浴として硫酸−リン酸
−塩化ナトリウム浴−塩酸浴が知られている。しかし、
この浴では焼鈍すれば光沢面がでるものの、加工品は光
沢がなく、また形状が複雑になるとくぼんだ部分は光沢
が得られず、雲ってくるという欠点があった。さらに、
硫酸、リン酸、塩化ナトリウム、塩酸という四成分の系
を用いているため浴が複雑でその維持管理が困ゲ毬であ
るという欠点を有していた。
Conventionally, many electrolytic etching baths have been used that mainly contain harmful substances such as cyanide and chromic acid. A sulfuric acid-phosphoric acid-sodium chloride bath-hydrochloric acid bath is known as a bath that does not use these harmful substances. but,
Although this bath produces a glossy surface when annealed, the processed product lacks luster, and when the shape becomes complex, the concave areas do not become glossy and appear cloudy. moreover,
Because it uses a four-component system of sulfuric acid, phosphoric acid, sodium chloride, and hydrochloric acid, it has the disadvantage that the bath is complex and maintenance is difficult.

本発明は上記欠点に鑑みなされたもので、シアンやクロ
ム酸等の有害物を使用せず、しかも焼鈍品、加工品、電
鋳品の区別なく光沢面かえられる電解エツチング浴を提
供するものである。
The present invention was made in view of the above-mentioned drawbacks, and provides an electrolytic etching bath that does not use harmful substances such as cyanide or chromic acid, and can change the glossy surface of annealed products, processed products, and electroformed products. be.

本発明における電解エツチング浴は、酢酸と塩酸と水か
らなる浴で、 (a)水:塩酸:酢酸−1:0.1〜100 : 0.
1〜100の関係があり、かつ (b)塩酸:酢酸−1:1〜10の関係があることを特
徴とするものである。
The electrolytic etching bath in the present invention is a bath consisting of acetic acid, hydrochloric acid, and water, (a) water: hydrochloric acid: acetic acid - 1:0.1 to 100:0.
It is characterized by having a relationship of 1 to 100, and (b) a relationship of hydrochloric acid:acetic acid of 1:1 to 10.

本発明において、最も大きな特徴は酢酸である。In the present invention, the most significant feature is acetic acid.

つまり、塩酸と水の浴では光沢が全く得られなかったも
のが、系の酢酸濃度を増すに従って、浴抵抗が増大する
とともに光沢が良くなる。しかし、系の酢酸濃度が濃く
なりすぎると、凹凸が大きい形状の品物では四部の低電
流密度部の曇り度合が激しくなり実用的でない。したが
って、浴の酢酸の割合は上記(a)、(b)の範囲にあ
ることが好ましい。
In other words, no gloss was obtained with a bath of hydrochloric acid and water, but as the concentration of acetic acid in the system was increased, the bath resistance increased and the gloss improved. However, if the acetic acid concentration in the system becomes too high, the degree of haze in the four low current density areas becomes severe in the case of articles with large irregularities, making it impractical. Therefore, the proportion of acetic acid in the bath is preferably within the ranges (a) and (b) above.

以下、実施例と従来例について説明する。Examples and conventional examples will be described below.

〔実施例1〕 幅101×長さ50龍×厚さ0.5龍の金板を圧延あが
りの加工品(No、1)と600℃30分間熱処理した
焼鈍品(No、2)及び幅10龍×長さ50+u x厚
さ50μの電鋳品(No、3)を作成した。これを、酢
酸400m1!。
[Example 1] A rolled product (No. 1) of a metal plate of width 101 x length 50 x 0.5 x thickness, an annealed product heat treated at 600°C for 30 minutes (No. 2), and a width 10 An electroformed product (No. 3) of dragon x length 50+u x thickness 50μ was created. Add this to 400ml of acetic acid! .

水12m1.塩酸80 mβの組成の浴に室温で30V
2分間電解エツチングした。その結果No、1〜N01
3とも全て光沢があった。特にNo、1とNo、2の光
沢は著しかった(鏡面光沢)。
Water 12ml1. 30V at room temperature in a bath with a composition of 80 mβ of hydrochloric acid.
Electrolytic etching was performed for 2 minutes. Result No. 1~N01
All three were shiny. In particular, the gloss of No. 1 and No. 2 was remarkable (mirror gloss).

〔従来例1〕 実施例1と同様の加工品(No、4) 、焼鈍品(No
、5)電鋳品(No、6)を作成し、これを塩化ナトリ
ウム200g/ I) 、硫酸100m/ / Il、
リン酸100nl / 12 。
[Conventional Example 1] Processed product similar to Example 1 (No. 4), annealed product (No.
, 5) Create an electroformed product (No. 6) and add it to sodium chloride 200g/I), sulfuric acid 100m/Il,
Phosphoric acid 100 nl/12.

塩酸50m1l/j2の浴に室温で50〇八/ di’
 、 20秒間電解エツチングした。その結果No、4
とNo、6は光沢があったが、No、5の焼鈍品は光沢
がなかった。また、No、4の加工品はNo、 1に比
べ光沢が劣っていた。
5008/di' in a bath of 50 ml/j2 of hydrochloric acid at room temperature.
, electrolytically etched for 20 seconds. Result No. 4
and No. 6 were glossy, but No. 5 annealed products were not glossy. In addition, the processed product No. 4 had inferior gloss compared to No. 1.

〔実施例2〕 幅101111×長さ50雌×厚さ5 mの焼鈍品(N
o、7〜No、10 )を5鰭φの円筒状にし、実施例
1と同様な浴で下表左欄の条件で電解エツチングし、光
沢度合、曇り状態エツチング量を調べたところ下表右欄
の結果を得た。
[Example 2] Annealed product (N
o, 7 to No., 10) were made into a cylindrical shape with 5 fins φ and electrolytically etched in the same bath as in Example 1 under the conditions shown in the left column of the table below, and the degree of gloss and amount of cloudy etching were examined. I got the results in the column.

ここで◎は鏡面光沢を示す。Here, ◎ indicates specular gloss.

〔実施例3〕 次に、実施例2と同様の純鈍品(No、11〜No、1
6 )を実施例1と同様な浴で、5A、30Vでエツチ
ング時間を変化させたところ下表の結果を得た。
[Example 3] Next, pure blunt products similar to those in Example 2 (No. 11 to No. 1
6) was etched in the same bath as in Example 1 at 5 A and 30 V for varying etching times, and the results shown in the table below were obtained.

〔実施例4〕 次に実施例2と同様の加工品(No、17〜No、19
 )を実施例1と同様な浴で、下表右欄の条件で行った
ところ下表左欄の結果を得た。
[Example 4] Next, processed products similar to Example 2 (No. 17 to No. 19
) was carried out in the same bath as in Example 1 under the conditions shown in the right column of the table below, and the results shown in the left column of the table below were obtained.

〔従来例2〕 実施例2と同一形状の加工品(No、20 )を従来例
■と同様な浴で、下表右欄の条件で行ったところ下表左
欄の結果を得た。
[Conventional Example 2] A processed product (No. 20) having the same shape as in Example 2 was subjected to the same bath as in Conventional Example 2 under the conditions shown in the right column of the table below, and the results shown in the left column of the table below were obtained.

(以下余白) 〔実施例5〕 次に実施例2と同様の加工品(No、21〜No、23
 )を酢酸200mj2 、塩酸100n+42 、水
200m j!の浴に浸漬し、下表右欄の条件で行った
ところ下表左欄の結果を得た。
(Left below) [Example 5] Next, the same processed products as in Example 2 (No. 21 to No. 23)
), acetic acid 200mj2, hydrochloric acid 100n+42, water 200mj! When the test was carried out under the conditions shown in the right column of the table below, the results shown in the left column of the table below were obtained.

〔実施例6〕 酢酸を300nl 、塩酸100nl 、水をLoom
 gとした他は実施例5のNo、21と同様な条件で加
工品(NO024)及び電鋳品(No、25)を行った
ところ、外側光沢が◎、内側曇りが無く、エツチング量
が7.7μ(0g074 )という結果を得た。
[Example 6] 300 nl of acetic acid, 100 nl of hydrochloric acid, Loom water
A processed product (NO024) and an electroformed product (No. 25) were subjected to the same conditions as No. 21 in Example 5, except that the etching was performed with the exception that the outside gloss was ◎, the inside was not cloudy, and the etching amount was 7. A result of .7μ (0g074) was obtained.

〔実施例7〕 実施例6と同一組成条件の浴でに18の金−銀一銅合金
指輪を電解エツチングしたところ(2cm2140OA
/dm’ 、 60秒)外側光沢が鏡面光沢であり内側
曇りは無かった。
[Example 7] Eighteen gold-silver-copper alloy rings were electrolytically etched in a bath with the same composition conditions as in Example 6 (2 cm 2140 OA).
/dm', 60 seconds) The outer gloss was specular, and there was no inner haze.

以上の実施例から明らかなように、本発明によれば従来
浴に比し、以下のような利点を有する。
As is clear from the above examples, the present invention has the following advantages over conventional baths.

■ 不発可溶では従来浴では得られない圧延加工等の金
又は金合金の加工品についても鏡面光沢を出すことがで
きるので、指輪、ブレスレット。
■ Rings, bracelets, etc. can be produced using non-explosion fusible products, such as rings and bracelets, as it is possible to produce mirror-like luster on processed gold or gold alloy products, such as rolled ones, which cannot be obtained with conventional baths.

ペンダント、ブローチ、腕時計の側や枠、めがねつる等
の装飾品に最適な電解エツチング浴である。
This electrolytic etching bath is ideal for decorative items such as pendants, brooches, watch sides and frames, and eyeglass frames.

■ 不発可溶は従来浴に比し、電流が流れにくい電解条
件の悪い部分についても曇りが少ないので、ロストワッ
クス法による鋳造品や金の厚めつきによる電鋳品などの
複雑な形状の品物にも均一に電解エツチングすることが
できる。
■ Compared to conventional baths, non-exploitable fusible baths are less cloudy even in areas with poor electrolytic conditions where it is difficult for current to flow, so they are suitable for products with complex shapes such as products cast by the lost wax method or electroformed products with thick gold. It can also be electrolytically etched uniformly.

■ 不発可溶は従来浴に比し、浴抵抗が低いので、消費
電力も少なくまた、浴温度の上昇も少ない。
■ Non-exploitable soluble baths have lower bath resistance than conventional baths, so they consume less power and cause less rise in bath temperature.

したがって、多量生産しても温度上昇による水分の蒸発
浴組織の変化が少なく、安定したエツチング浴となる。
Therefore, even if the etching bath is produced in large quantities, there is little change in the structure of the water evaporation bath due to temperature rise, resulting in a stable etching bath.

さらに、不発可溶は次の特徴を有する。Furthermore, non-exploitable solubles have the following characteristics.

■ 不発可溶では、電流密度が大きい程光沢が良くなる
が、逆に大きくなりすぎると電流密度分布のばらつきが
激しくなり、いわゆる陰の部分(低電流密度部分)で曇
りやすくなる。そのため複雑な形状の装飾品を電解エツ
チングするときはあまり高くない電流密度で行う。
■ For non-exploitable fusible materials, the higher the current density, the better the gloss, but conversely, if the current density is too high, the current density distribution becomes more uneven, and the so-called shadow areas (low current density areas) tend to become cloudy. Therefore, when electrolytically etching ornaments with complex shapes, the current density is not very high.

■ 不発可溶では、エツチング時間が長い程、光沢は良
くなるが、長くなれば■と同じように陰の部分で曇りや
すくなる。したがって、エツチング形状によってエツチ
ング時間を考慮する必要がある。
■ For non-exploitable soluble materials, the longer the etching time, the better the gloss will be, but the longer the etching time, the more likely it will become cloudy in the shadows, as in ■. Therefore, it is necessary to consider the etching time depending on the etching shape.

■ 不発可溶では、酢酸濃度が薄くなり浴抵抗が下がる
と陰の部分の曇り度合は減少し、酢酸濃度が濃くなり浴
抵抗が上がると光沢が良くなる(頃向にある・ 出願人 田中貴金属工業株式会社
■ For non-exploitable solubles, when the acetic acid concentration becomes thinner and the bath resistance decreases, the degree of cloudiness in the shaded areas decreases, and when the acetic acid concentration becomes thicker and the bath resistance increases, the gloss improves (Applicant: Tanaka Kikinzoku) Industrial Co., Ltd.

Claims (1)

【特許請求の範囲】 酢酸と塩酸と水からなる浴で、 (a)水:塩酸:酢酸=l:0.1〜100 : 0.
1〜100の関係があり、かつ (b)塩酸:酢酸=l:1〜10の関係があることを特
徴とする金または金合金の電解エツチング浴。
[Claims] A bath consisting of acetic acid, hydrochloric acid, and water, (a) water: hydrochloric acid: acetic acid = l: 0.1 to 100: 0.
1. An electrolytic etching bath for gold or gold alloy, characterized in that there is a relationship of 1 to 100, and (b) hydrochloric acid:acetic acid=1:1 to 10.
JP18559283A 1983-10-04 1983-10-04 Electrolytic etching bath for gold or gold alloy Granted JPS6077997A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18559283A JPS6077997A (en) 1983-10-04 1983-10-04 Electrolytic etching bath for gold or gold alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18559283A JPS6077997A (en) 1983-10-04 1983-10-04 Electrolytic etching bath for gold or gold alloy

Publications (2)

Publication Number Publication Date
JPS6077997A true JPS6077997A (en) 1985-05-02
JPH0521999B2 JPH0521999B2 (en) 1993-03-26

Family

ID=16173494

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18559283A Granted JPS6077997A (en) 1983-10-04 1983-10-04 Electrolytic etching bath for gold or gold alloy

Country Status (1)

Country Link
JP (1) JPS6077997A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6324079A (en) * 1986-07-16 1988-02-01 Tanaka Kikinzoku Kogyo Kk Method for dissolving gold

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5120584B2 (en) * 2006-01-23 2013-01-16 日本表面化学株式会社 Method for producing glossed metal member and composition liquid for production thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6324079A (en) * 1986-07-16 1988-02-01 Tanaka Kikinzoku Kogyo Kk Method for dissolving gold

Also Published As

Publication number Publication date
JPH0521999B2 (en) 1993-03-26

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