JPS607906A - Manufacture of dynamic membrane - Google Patents
Manufacture of dynamic membraneInfo
- Publication number
- JPS607906A JPS607906A JP11543883A JP11543883A JPS607906A JP S607906 A JPS607906 A JP S607906A JP 11543883 A JP11543883 A JP 11543883A JP 11543883 A JP11543883 A JP 11543883A JP S607906 A JPS607906 A JP S607906A
- Authority
- JP
- Japan
- Prior art keywords
- dynamic membrane
- colloidal silica
- membrane
- alumina sol
- dynamic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は限外p過の用途に好適外ダイナミック膜の製造
方法に関するものである。詳しくは、アルミナゾルとコ
ロイド状シリカからなる二層桁造をなすダイナミック膜
の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing an extradynamic membrane suitable for ultrapolar applications. Specifically, the present invention relates to a method for producing a dynamic membrane having a two-layer structure consisting of alumina sol and colloidal silica.
従来、アルミナゾルによるダイナミック膜はよく知られ
ており、その限外P遇の性能は、例えばJ工s4種相当
の5%ゼラチン水溶液の濾過の場合、圧力20kg/d
G、膜簡に沿った流速o、tm7θec、温度乙θ℃の
条件下の溶質排除率96〜22%程度であった。また、
コロイド状シリカによるダイナミック膜もよく知られて
おり、その限外P通の性能は、上記と同様の条件下で溶
質排除率ソ7〜2と九程度であった。Conventionally, dynamic membranes using alumina sol are well known, and their ultra-P performance is, for example, in the case of filtration of a 5% gelatin aqueous solution equivalent to J-S4 type, at a pressure of 20 kg/d.
The solute exclusion rate was about 96 to 22% under the following conditions: G, flow rate along the membrane strip, o, tm7θec, and temperature O: θ°C. Also,
A dynamic membrane made of colloidal silica is also well known, and its ultra-P performance under the same conditions as above was about 9, with a solute rejection rate of 7 to 2.
即ち、アルミナゾルのダイナミックImによりは溶質の
うち3〜り3I6に透過水とともに損失することになシ
、コロイド状シリカのダイナミック膜によれば溶質のう
ち2〜3Xを透過水とともに損失することになる。That is, depending on the dynamic Im of the alumina sol, 3~3I6 of the solute will be lost with the permeate water, and with the dynamic membrane of colloidal silica, 2~3X of the solute will be lost along with the permeate water. .
従って2θ数%に達する溶質排除率をさらに/ポイント
向上させることが出来れば、溶質の損失量を相当の割合
で減少芒せることか可能となり、溶質成分が高価な物で
あればその効果は極めて大きい。Therefore, if the solute rejection rate, which reaches several % of 2θ, can be further improved by a point, it will be possible to reduce the amount of solute loss by a considerable percentage, and if the solute component is expensive, the effect will be extremely high. big.
本発明者等はこれらの実情に鑑み鋭意何党を重ねた結果
、アルミナゾルとコロイド状シリカを組み合わせること
によシ、これら個々の材料よりなるダイナミック膜よね
高い溶失排除性能を壱することを見出し、本発明に到達
した。In view of these circumstances, the inventors of the present invention have conducted extensive research and have discovered that by combining alumina sol and colloidal silica, a dynamic membrane made of these individual materials has higher elution and removal performance. , arrived at the present invention.
以下本発明の詳細な説明する。The present invention will be explained in detail below.
本発明で使用する多孔質支持体としては、公知の各種の
ものが挙げられる。例えばセラミックス、焼結金楓粉末
、解結ガラス粉末、炭素材料々どの無機質多孔勿支特体
および酢酸セルロース、ポリ塩化ビニル、ポリメタクリ
ロニトリル、ポリアミド、フッ素樹脂などの各種合成樹
脂などの上様多孔質支持体が羊げられる。As the porous support used in the present invention, various known ones can be mentioned. Examples include ceramics, sintered maple powder, sintered glass powder, carbon materials, and other inorganic porous materials, as well as various synthetic resins such as cellulose acetate, polyvinyl chloride, polymethacrylonitrile, polyamide, and fluororesin. The porous support is removed.
多孔質支持体の表面細孔の孔径は、その材質によシ相違
するが、通常θ、θ/〜−μ、好オしく
樟は0.θ!〜θ、2μのものが使用される。The diameter of the surface pores of the porous support varies depending on the material, but is usually θ, θ/~-μ, preferably 0. θ! ~θ, 2μ is used.
多孔質支持体の厚さは、とくに制限芒れるものではなく
、ダイナミック膜の使用目的に応じ。The thickness of the porous support is not particularly limited and depends on the intended use of the dynamic membrane.
機械的強度をもつ程度であればよい。It is sufficient as long as it has mechanical strength.
アルミナゾルとしては、粒子の大きさが!θ×jfrL
μ〜りθO×41θmIt、 好ましくは1100X1
0μ〜3θox3omμで羽毛状の形状アルミナゾルの
濃度は、固形分として0.θ/〜θ、2 f / l
、好ましくは0.02〜θ、/グ/lがよい。As an alumina sol, the particle size is great! θ×jfrL
μ~riθO×41θmIt, preferably 1100X1
The concentration of the feather-shaped alumina sol with a solid content of 0μ to 3θox3omμ is 0. θ/~θ, 2 f/l
, preferably 0.02 to θ,/g/l.
コロイド状シリカとしては、粒径!〜!θmμ、好まし
くは10−.20mμの粒状形の粒子が使用される。コ
ロイド状シリカの水溶液は酸性あるいはアルカリ性のど
ちらで安定化しているものも使用可能であるが、酸性で
安定化しているものの方が好ましい。Particle size for colloidal silica! ~! θmμ, preferably 10-. Particles of granular shape of 20 mμ are used. An aqueous solution of colloidal silica that is either acidic or alkaline stabilized can be used, but acidic and stabilized aqueous solutions are preferred.
コロイド状シリカの濃度は、固形分としてθ、θ3〜/
、θy7t%好ましくは0.7〜0.!t f/lがよ
い。同、このような濃度の酸性安定型シリカのコロイド
溶液は1通常pH4t−6である、
アルミナゾルを含む水溶液と、コロイド状シリカを含む
水溶液の量は支持体の異面積/イ当りコ0− j Oを
程度でよい。The concentration of colloidal silica is θ as solid content, θ3~/
, θy7t% preferably 0.7 to 0. ! t f/l is good. Similarly, a colloidal solution of acid-stable silica with such a concentration is usually pH 4t-6.The amounts of the aqueous solution containing alumina sol and the aqueous solution containing colloidal silica are calculated by the difference in area of the support/per 0-j. O can be expressed in degrees.
本発明方法に従いダイナミック膜を製造するには、前述
した方法によればよい。この方法では、まず多孔質支持
体上に、アルミナゾルの水溶液を還流させる。還流は、
加圧下、通常コ〜0.7〜/ Om / sec 、好
ましくはθ、2〜−m/secで行なうことが必要であ
る。The method described above can be used to produce a dynamic membrane according to the method of the present invention. In this method, first, an aqueous solution of alumina sol is refluxed on a porous support. The reflux is
It is necessary to carry out the process under pressure, usually at ~0.7~/Om/sec, preferably at ~2~-m/sec.
このアルミナゾルの温度は常温でよい。The temperature of this alumina sol may be room temperature.
還流時間は;t:li々の条件により相違するが5〜3
0分でよい。The reflux time varies depending on the conditions; 5 to 3
0 minutes is enough.
この後、常圧に戻し流路内を水洗する。After this, the pressure is returned to normal pressure and the inside of the flow path is washed with water.
次いで、コロイド状シリカの水溶液を還流する。還流は
加圧下、通常2〜”kg/caG、好ましくは’ 〜’
j kg / e4 G 、流速0./ 〜/ Om
/sac、好ましくは0.2〜2 m / seeで行
々うことか必要である。このコロイド状シリカの水溶液
の温度は常温でよい。The aqueous solution of colloidal silica is then refluxed. Reflux is carried out under pressure, usually 2~''kg/caG, preferably '~''
j kg/e4 G, flow rate 0. / ~/ Om
/sac, preferably 0.2 to 2 m/see. The temperature of this colloidal silica aqueous solution may be room temperature.
還流時間は神々の条件によシ相違するが5〜30分でよ
い。The reflux time varies depending on the conditions, but may be 5 to 30 minutes.
この後、加圧下のまま、pH/〜3.5好ましくはpH
/、オ〜λ、!の酸水溶液を還流させる。After this, while still under pressure, pH/~3.5, preferably pH
/, Oh~λ,! Reflux the acid aqueous solution.
具体的には、硫酸、硝酸、塩酸等の強酸によって調製さ
れた酸水溶液が使用される。還流時間は種々の条件によ
り相違するがオル3θ分でよい、この処理によシリカ粒
子相互の凝集が促進され、強固なダイナミック膜が形成
される。Specifically, an aqueous acid solution prepared with a strong acid such as sulfuric acid, nitric acid, or hydrochloric acid is used. Although the reflux time varies depending on various conditions, it may be 3θ minutes. This treatment promotes aggregation of silica particles and forms a strong dynamic film.
次いで、さらに加圧下のま捷、加熱水を還流させるのが
好ましい。Subsequently, it is preferable that the mixture is further kneaded under pressure and the heated water is refluxed.
加熱水として1通常yo〜/θθ℃、好甘しくは7θ〜
10θ℃のものが使用さり、る。Heated water is usually 1yo~/θθ℃, preferably 7θ~
The temperature of 10θ℃ is used.
還流時間は種々の条件によシ相違するが/!〜90分で
よい。これ罠より、シリカ粒子相互の結合を一層強める
とともに、アルミナ粒子とも力・らみ合い強固で溶質排
除率の高いダイナミックkf形沢させることガ2できる
。Reflux time varies depending on various conditions/! ~90 minutes is enough. By this method, it is possible to further strengthen the bond between the silica particles and create a dynamic kf shape with strong force and entanglement with the alumina particles and a high solute exclusion rate.
この後、常圧に戻して流路内を水洗し、ダイナばツク膜
の形成は完了する。Thereafter, the pressure is returned to normal and the inside of the channel is washed with water, completing the formation of the DynaBac film.
同、ダイナミック膜の製造中に、透通水が排出される多
孔質支持体の片側は、常に常圧に保たれているととは言
うまでもない。It goes without saying that during the production of a dynamic membrane, one side of the porous support from which permeated water is discharged is always kept at normal pressure.
かくして得られたダイナミック膜は、アルミ製造方法と
同様にして製造したダイナミック族と比較して、高分子
物質の排除性能が良好である。The thus obtained dynamic membrane has better performance in excluding polymeric substances than the dynamic membrane produced in the same manner as the aluminum production method.
以下、実施例および比較例を誉げて1本発明をさらに詳
細VCH明するが1本発明の袈旨を超えない眠り、以下
の例によって限定されるものではない。Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples, but the present invention is not limited to the following examples and does not exceed the gist of the present invention.
実施例/
θ、77dのセラミック製多孔負支持体(表面孔径:約
θ、/μ)上に、水301中にアルミナゾル(粒子の大
きさ二20ox、zomμ〜30θX 3Qmμ)を固
形分として1.22溶力・した水溶液を、圧力20に9
/dG、流速0.1 m / BeC1温度−0℃の条
件下、20分間還流させ膜を形成した。この後、常圧に
戻し流路内を水洗した。Example/Alumina sol (particle size: 220 ox, zomμ to 30θX 3Qmμ) was added as a solid content in water 301 on a ceramic porous negative support (surface pore diameter: about θ, /μ) of θ, 77d. 22% aqueous solution to a pressure of 20%
/dG, flow rate 0.1 m/BeC1 temperature -0°C, the mixture was refluxed for 20 minutes to form a film. Thereafter, the pressure was returned to normal and the inside of the channel was washed with water.
次いで、水301−中にコロイド状シリカ(粒径:10
−20mμ)を固形分として69溶かした水溶液を、圧
力20/c9/cdG、流速O6にfn/sec、温度
−0℃の条件下%2θ分間還流させ膜を形成した。圧力
コθに9 / crl Gの加圧下のまま、pH,2,
21,20℃の硫酸水溶液を20分間還流させ、次いで
同圧力のまま水を還流して硫酸を洗浄除去した。この後
、常圧に戻し、流路内を水洗し、ダイナミック膜を形成
した。Next, colloidal silica (particle size: 10
A membrane was formed by refluxing an aqueous solution in which 69% (-20 mμ) was dissolved as a solid content at a pressure of 20/c9/cdG, a flow rate of O6 of fn/sec, and a temperature of -0°C for %2θ minutes. While keeping the pressure θ at 9/crl G, pH, 2,
The sulfuric acid aqueous solution at 21.20° C. was refluxed for 20 minutes, and then water was refluxed at the same pressure to wash and remove the sulfuric acid. Thereafter, the pressure was returned to normal, and the inside of the channel was washed with water to form a dynamic membrane.
このようにして製造したダイナミック膜を用いて、圧力
−〇に9 / cdl G、流速0.にm / eec
。Using the dynamic membrane thus produced, the pressure was -9/cdl G and the flow rate was 0. nim/eec
.
温度に0℃の条件下、JIsg棟相当のゼラチン3%水
溶液のP通を行なブた。結果を表−/に示した。A 3% gelatin aqueous solution equivalent to JIsg building was passed through at a temperature of 0°C. The results are shown in Table-/.
理後に加圧下(,20に91 crlG )のまま50
℃。After treatment, it was left under pressure (20 to 91 crlG) for 50
℃.
、lf″θ℃の加熱水を各々20分間還流を行なう他は
実加J例/と同様にしてダイナミック膜の製造、ゼラチ
ン水溶液のPMを行なった。その結果を表−/VC示し
た。A dynamic membrane was produced and an aqueous gelatin solution was PMed in the same manner as in Example J, except that the heated water at temperatures of 20°C and 10°C was refluxed for 20 minutes.The results are shown in Table VC.
表−/
比較例/
アルミナゾルのダイナミック膜を形成させること1r省
略した以外は笑力世例/に配車v、シたのと同様にして
ダイナミック膜を製造した。Table - / Comparative Example / A dynamic film was produced in the same manner as in the case of Shoriki Seisei, except that the step 1 to form a dynamic film of alumina sol was omitted.
さらに、実施例/に記J柿したのとNbζb’c Lで
ゼラチン水溶液の濾過を行ηつノ辷ところ、溶質排除;
キ・は2オ、7%であった。Furthermore, the aqueous gelatin solution was filtered with Nbζb'c L as described in Example 1, and solutes were removed;
Ki/o was 2o, 7%.
代 理 人 弁理士 長谷用 − ほか7名 内 0発 明 者 田辺孝之 内 0出 願 人 三菱化成テクノエンジニアズ株式会社 東京都港区芝二丁目1番30号Representative Patent Attorney Hase - 7 others Inside 0 shots by Takayuki Tanabe Inside 0 applicants Mitsubishi Kasei Techno Engineers Co., Ltd. 2-1-30 Shiba, Minato-ku, Tokyo
Claims (2)
せて膜を形成し、該膜の上に、さらにコロイド状シリカ
を加圧子還流させ膜を形成し、次いで加圧下のままpg
値が3.夕以下の酸水溶液を還流させることを%徽とす
るダイナミック膜の製造方法。(1) Alumina sol is refluxed with an indenter on a porous support to form a membrane, colloidal silica is further refluxed with an indenter on top of the membrane to form a membrane, and then pg
The value is 3. A method for producing a dynamic membrane that involves refluxing an acid aqueous solution at a lower temperature.
のまま加熱水を還流させることを特徴とする特許請求の
範囲第1項記植の製造方法。(2) A method for producing the implant according to claim 1, which comprises refluxing the acid aqueous solution using a pressurizer, and then refluxing heated water under pressure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11543883A JPS607906A (en) | 1983-06-27 | 1983-06-27 | Manufacture of dynamic membrane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11543883A JPS607906A (en) | 1983-06-27 | 1983-06-27 | Manufacture of dynamic membrane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS607906A true JPS607906A (en) | 1985-01-16 |
| JPH0418888B2 JPH0418888B2 (en) | 1992-03-30 |
Family
ID=14662557
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11543883A Granted JPS607906A (en) | 1983-06-27 | 1983-06-27 | Manufacture of dynamic membrane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS607906A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6471215A (en) * | 1987-09-11 | 1989-03-16 | Oki Electric Ind Co Ltd | Switch circuit for electronic device |
-
1983
- 1983-06-27 JP JP11543883A patent/JPS607906A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6471215A (en) * | 1987-09-11 | 1989-03-16 | Oki Electric Ind Co Ltd | Switch circuit for electronic device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0418888B2 (en) | 1992-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20010001453A1 (en) | Inorganic nanofiltration membrane and its application in the sugar industry | |
| US3628669A (en) | Semipermeable membranes | |
| CN1031191A (en) | Improved gas separates permeable membrane | |
| JPH0534043B2 (en) | ||
| JPS624422A (en) | Anisotropic film for separating gas and manufacture thereof | |
| JPH09508066A (en) | Method for modifying surface of polymer membrane and modified membrane | |
| CN115090122A (en) | Ceramic membrane with alumina whisker film layer structure and preparation method and application thereof | |
| CN110152505A (en) | A kind of preparation method of bilayer polysulfone hollow fibre ultrafiltration membrane | |
| JP2000503900A (en) | Inorganic nanofiltration membrane and its use in the sugar industry | |
| CN100391582C (en) | Asymmetric porous ceramic ultrafiltration membrane and preparation method thereof | |
| KR20040081735A (en) | Novel inorganic nanofiltration membranes | |
| US3923654A (en) | Ultrafiltration membrane | |
| CN110270235A (en) | The composite nanometer filtering film that a kind of pair of monovalence, divalent salts efficiently separate | |
| US3600147A (en) | Method of making a glass semipermeable membrane | |
| CN111153684B (en) | Ceramic membrane and preparation method and application thereof | |
| JP2009255031A (en) | Treatment method of ceramic porous film | |
| JP2011115691A (en) | Method for manufacturing zeolite separation membrane | |
| JP4892265B2 (en) | Manufacturing method of filter material | |
| CN100393400C (en) | Asymmetric porous ceramic microfiltration membrane and preparation method thereof | |
| RU2075329C1 (en) | Fine filtering material for cleaning air | |
| JPH0419888B2 (en) | ||
| JPH0418888B2 (en) | ||
| JPS6127091B2 (en) | ||
| CN108047696B (en) | TPU (thermoplastic polyurethane) film material for micro-pore filtration and preparation method thereof | |
| CN115180927B (en) | Ceramic microfiltration membrane and preparation method and application thereof |