JPS6089573A - 透明導電膜 - Google Patents

透明導電膜

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Publication number
JPS6089573A
JPS6089573A JP58195181A JP19518183A JPS6089573A JP S6089573 A JPS6089573 A JP S6089573A JP 58195181 A JP58195181 A JP 58195181A JP 19518183 A JP19518183 A JP 19518183A JP S6089573 A JPS6089573 A JP S6089573A
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JP
Japan
Prior art keywords
transparent conductive
conductive film
film
group
item
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58195181A
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English (en)
Inventor
Shoji Nitsuta
仁田　昌二
Yukio Ide
由紀雄 井手
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP58195181A priority Critical patent/JPS6089573A/ja
Priority to DE19843438437 priority patent/DE3438437A1/de
Publication of JPS6089573A publication Critical patent/JPS6089573A/ja
Priority to US06/816,685 priority patent/US5057244A/en
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3464—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide
    • C03C17/347—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a chalcogenide comprising a sulfide or oxysulfide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C23C16/303—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
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    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
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    • C03C2217/281—Nitrides
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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 技術分野 本発明は透明導電膜に関し、より詳細には、太１１ｆｆ
ｉ池、光センザ、液晶ディスプレイパネル等に適用し得
る透明導電膜に関するものである。
従来技術 従来、太陽電池、光セ１ンサ、液晶ディスプレイパネル
等の光関連デバイスにおいては、ガラスまたはポリマー
等の透明基板上にＩｎ２Ｏ３，５ｎ０２に代表される様
な酸化物系の透明導電膜を透明電極として被着形成した
ものが広く用いられている。一方、近年ａ−３ｉ（アモ
ルファスシリコン）系材料を使用する光関連デバイスの
研究、開発が極めて盛んであり、ａ−８ｉ太隔電池をは
じめａ−８ｉ光センサ、ａ−８ｉ材料を発光材料とする
ディスプレイ装置等に於いて一部商品化もすすめられて
いる。しかし、ａ−８ｉ系の材料を使用した場合、従来
の透明導電膜では界面状態の悪化等の問題が発生する。
即ち、ａ−８１の製法としては、原料にモノシラン（Ｓ
Ｉ　Ｈ４）を使用でるグロー放電分解法が用いられるの
が一般的であるが、その際、基板上の透明電極である前
記酸化物系の透明導電膜中に含まれるＯ（酸素）原子が
、プラズマ中に発生するＨ（水素）ラジカルと反応して
Ｈ２０を発生覆る。このＨ２０はａ−８ｉ材料の付着性
や表面準位、に影響を与え、その結果界面状態が極めて
悪くなる可能性が大きい。また、仮に成膜できたとして
も、例えばＩｎ２Ｏ３とａ−０＋：ｔ−１の界面で、ｒ
ｎ、ｏ、ｓｔが相互に拡散し、新たに８１０２の様な化
合物を生成する為に、結果として良好な界面が得られな
くなり、デバイス特性に悪影響を及ぼす可能性がある。
目　的 本発明は以上の問題を解消する為になされたものであっ
て、太陽電池、光センサ、ディスプレイ装置等の光関連
デバイスにａ−８’ｉ系材料を使用する場合にも、界面
状態が良好で、特性劣化をきたさない透明導電膜を提供
することを目的とする。
１−え 本発明の構成について、以下、具体的な実施例に基づい
て説明する。周期律表■族とＩＶ族の元素からは、１電
性付与の為にＩｎ、Ｓｎ、Ｔρ、Ｐｂ等を選択する。ま
た、透明性を持たせる為には光学的バンドギャップを広
げる必要があるから、周期律表の第１．２．３周期の元
素であるＮ、Ｃ。
Ｓの中からどれかを選択する。更に、膜中に日を含んで
いれば還元性となり好都合である。この様にして■族、
　ＩＶ族の中から選択した元素と、Ｎ。
Ｃ９Ｓの中から選択した元素と、Ｈとからなる薄膜を適
当な方法で形成すれば良い。例えば、周期律表■族の元
素からＳｎを選択し、Ｎ、Ｓ、Ｃの元素からＮを選択し
、Ｈを付加する様にして、透明導電膜３ｎズＮ１−χ：
Ｈを形成する。その場合の製造方法としては、原料ガス
にスタナン（Ｓｎ　Ｈａ　）とＮ２あるいはＮＨａを使
用してプラズマＣＶＤ（グロー放電分解法）、ＨＯＭＯ
ＣＶＤ、光ＣＶＤ等の方法で成膜すれば良い。また、テ
トラメチル錫（Ｓｎ　（ＣＨ３）４　）の様な有機金屑
ガスを使用してＭＯＣＶＤ、プラズｖＣＶＤ、ＨＯＭＯ
ＣＶＯ，光ＣＶＤ等の方法で成膜することもできる。或
いは、３ｎをターゲットにしてＡｒ　−Ｎ２又はＮＨ３
−Ｎ２の雰囲気中で反応性スパッタリングを行なうこと
によって成膜しても良い。更に、Ｓ１１の真空蒸着とＮ
２　、Ｎ２の放電とを組合せることにより成膜する方法
もある。これらは何れも公知の薄膜形成技術である。尚
、本発明の透明導電膜を被着形成する為の基板は、ガラ
ス、ポリマー等の透明基板であれば何でも良い。又、透
明導電膜には導電性のコントロールの為に、必要に応゛
　じてＢ、Ｐ等を適量付加しても良い。
効　果 以上の如く、本発明により、従来にない還元性透明導電
膜が実現され、プラズマ中（特に、５ＩＨ４やＮ２を含
むグロー放電分解法、Ｎ２中での反応性スパッター等）
で使用しても、界面にＮ２０を発生せず良好な付着性が
得られる。又、透明導電膜中に酸漿を含まないから、界
面での不必要な化学結合や拡散がなくなり、特性劣化を
防止する効果がある。従って、ａ−８ｉ系材料を使用す
る光関連デバイスに透明電極として使用すれば、デバイ
スの品質、製造上の歩留が向上するという効果がある。
尚、本発明は上述の実施例に限定されることなく、種々
の変形、応用が可能であることは勿論であって、種々の
元素の組合せによる還元性透明導電膜を作成することが
可能である。

Claims (1)

  1. 【特許請求の範囲】 １、周期律表■族とＩＶ族のどちらが一方又は両方から
    選択される元素と、窒素またはイオウまたは炭素とから
    構成されることを特徴とする透明導電膜。 ２、上記第１項に於いて、前記Ｔｆｉ族元素がインジウ
    ムまたはタリウムであることを特徴とする透明導電膜。 ３、上記第１項に於いて、前記ＩＶ族元素がスズまたは
    鉛であることを特徴とする透明導電膜。 ４、上記第７項に於いて、構成元素に水素を付は加えた
    ことを特徴とする透明導電膜。
JP58195181A 1983-10-20 1983-10-20 透明導電膜 Pending JPS6089573A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58195181A JPS6089573A (ja) 1983-10-20 1983-10-20 透明導電膜
DE19843438437 DE3438437A1 (de) 1983-10-20 1984-10-19 Transparenter, elektrisch leitender film
US06/816,685 US5057244A (en) 1983-10-20 1986-01-06 Transparent, electrically conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58195181A JPS6089573A (ja) 1983-10-20 1983-10-20 透明導電膜

Publications (1)

Publication Number Publication Date
JPS6089573A true JPS6089573A (ja) 1985-05-20

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US (1) US5057244A (ja)
JP (1) JPS6089573A (ja)
DE (1) DE3438437A1 (ja)

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US5751452A (en) * 1993-02-22 1998-05-12 Nippon Telegraph And Telephone Corporation Optical devices with high polymer material and method of forming the same
US6710540B1 (en) * 1995-07-20 2004-03-23 E Ink Corporation Electrostatically-addressable electrophoretic display
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US5057244A (en) 1991-10-15

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