JPS609125A - パターン焼付け装置 - Google Patents

パターン焼付け装置

Info

Publication number
JPS609125A
JPS609125A JP58115863A JP11586383A JPS609125A JP S609125 A JPS609125 A JP S609125A JP 58115863 A JP58115863 A JP 58115863A JP 11586383 A JP11586383 A JP 11586383A JP S609125 A JPS609125 A JP S609125A
Authority
JP
Japan
Prior art keywords
wafer
chuck
semiconductor wafer
etching
vertical movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58115863A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6330781B2 (2
Inventor
Masayoshi Serizawa
芹澤　正芳
Minoru Ikeda
稔 池田
Yukio Kenbo
行雄 見坊
Nobuyuki Akiyama
秋山　伸幸
Tomohiro Kuji
久迩　朝宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58115863A priority Critical patent/JPS609125A/ja
Publication of JPS609125A publication Critical patent/JPS609125A/ja
Publication of JPS6330781B2 publication Critical patent/JPS6330781B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58115863A 1983-06-29 1983-06-29 パターン焼付け装置 Granted JPS609125A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58115863A JPS609125A (ja) 1983-06-29 1983-06-29 パターン焼付け装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58115863A JPS609125A (ja) 1983-06-29 1983-06-29 パターン焼付け装置

Publications (2)

Publication Number Publication Date
JPS609125A true JPS609125A (ja) 1985-01-18
JPS6330781B2 JPS6330781B2 (2) 1988-06-21

Family

ID=14673009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58115863A Granted JPS609125A (ja) 1983-06-29 1983-06-29 パターン焼付け装置

Country Status (1)

Country Link
JP (1) JPS609125A (2)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62279629A (ja) * 1986-05-28 1987-12-04 Hitachi Ltd プロキシミテイ方式の露光装置
JPH0183337U (2) * 1987-11-26 1989-06-02
JP2009212344A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法
JP2009212345A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01312391A (ja) * 1988-06-10 1989-12-18 Matsushita Electric Ind Co Ltd 伝熱管

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5898941A (ja) * 1981-11-30 1983-06-13 テンコ−・インストルメンツ ウエ−ハ・チヤツク

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5898941A (ja) * 1981-11-30 1983-06-13 テンコ−・インストルメンツ ウエ−ハ・チヤツク

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62279629A (ja) * 1986-05-28 1987-12-04 Hitachi Ltd プロキシミテイ方式の露光装置
JPH0183337U (2) * 1987-11-26 1989-06-02
JP2009212344A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法
JP2009212345A (ja) * 2008-03-05 2009-09-17 Nsk Ltd ワークチャック、露光装置及びフラットパネル製造方法

Also Published As

Publication number Publication date
JPS6330781B2 (2) 1988-06-21

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