JPS6096762A - 蒸着方法 - Google Patents

蒸着方法

Info

Publication number
JPS6096762A
JPS6096762A JP58203367A JP20336783A JPS6096762A JP S6096762 A JPS6096762 A JP S6096762A JP 58203367 A JP58203367 A JP 58203367A JP 20336783 A JP20336783 A JP 20336783A JP S6096762 A JPS6096762 A JP S6096762A
Authority
JP
Japan
Prior art keywords
substrate
heater
film
vapor deposition
distribution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58203367A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6157391B2 (2
Inventor
Kinichi Isaka
井坂　欽一
Jun Kawaguchi
川口　順
Hiroshi Kishishita
岸下　博
Hisashi Kamiide
上出　久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP58203367A priority Critical patent/JPS6096762A/ja
Publication of JPS6096762A publication Critical patent/JPS6096762A/ja
Publication of JPS6157391B2 publication Critical patent/JPS6157391B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP58203367A 1983-10-28 1983-10-28 蒸着方法 Granted JPS6096762A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58203367A JPS6096762A (ja) 1983-10-28 1983-10-28 蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58203367A JPS6096762A (ja) 1983-10-28 1983-10-28 蒸着方法

Publications (2)

Publication Number Publication Date
JPS6096762A true JPS6096762A (ja) 1985-05-30
JPS6157391B2 JPS6157391B2 (2) 1986-12-06

Family

ID=16472850

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58203367A Granted JPS6096762A (ja) 1983-10-28 1983-10-28 蒸着方法

Country Status (1)

Country Link
JP (1) JPS6096762A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003522294A (ja) * 1999-08-04 2003-07-22 ゼネラル・エレクトリック・カンパニイ 電子ビーム物理蒸着被覆装置と方法
WO2013111600A1 (ja) * 2012-01-27 2013-08-01 パナソニック株式会社 有機エレクトロルミネッセンス素子製造装置及び有機エレクトロルミネッセンス素子の製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003522294A (ja) * 1999-08-04 2003-07-22 ゼネラル・エレクトリック・カンパニイ 電子ビーム物理蒸着被覆装置と方法
WO2013111600A1 (ja) * 2012-01-27 2013-08-01 パナソニック株式会社 有機エレクトロルミネッセンス素子製造装置及び有機エレクトロルミネッセンス素子の製造方法
CN104066866A (zh) * 2012-01-27 2014-09-24 松下电器产业株式会社 有机电致发光元件制造装置及有机电致发光元件的制造方法

Also Published As

Publication number Publication date
JPS6157391B2 (2) 1986-12-06

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