JPS61106414A - Fine powder of electroconductive titanium oxide of low oxidation state and its preparation - Google Patents
Fine powder of electroconductive titanium oxide of low oxidation state and its preparationInfo
- Publication number
- JPS61106414A JPS61106414A JP14296884A JP14296884A JPS61106414A JP S61106414 A JPS61106414 A JP S61106414A JP 14296884 A JP14296884 A JP 14296884A JP 14296884 A JP14296884 A JP 14296884A JP S61106414 A JPS61106414 A JP S61106414A
- Authority
- JP
- Japan
- Prior art keywords
- titanium oxide
- fine powder
- powder
- fine
- titanium dioxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims abstract description 101
- 239000000843 powder Substances 0.000 title claims abstract description 34
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 title claims abstract description 32
- 230000003647 oxidation Effects 0.000 title claims abstract description 12
- 238000007254 oxidation reaction Methods 0.000 title claims abstract description 12
- 239000002245 particle Substances 0.000 claims abstract description 24
- 239000010936 titanium Substances 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims abstract description 14
- 229910003087 TiOx Inorganic materials 0.000 claims abstract description 7
- 238000001354 calcination Methods 0.000 claims abstract description 7
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000004408 titanium dioxide Substances 0.000 claims description 33
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 18
- 229910052719 titanium Inorganic materials 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 13
- 238000002156 mixing Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000011248 coating agent Substances 0.000 abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- 229910052758 niobium Inorganic materials 0.000 abstract description 2
- 229910052721 tungsten Inorganic materials 0.000 abstract description 2
- 239000000654 additive Substances 0.000 abstract 3
- 230000000996 additive effect Effects 0.000 abstract 3
- 238000004040 coloring Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 description 14
- 239000010419 fine particle Substances 0.000 description 9
- 239000004115 Sodium Silicate Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 7
- 229910052911 sodium silicate Inorganic materials 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000012752 auxiliary agent Substances 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 238000006722 reduction reaction Methods 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 239000006229 carbon black Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 230000003301 hydrolyzing effect Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- -1 titanium oxide compound Chemical class 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 2
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000349 titanium oxysulfate Inorganic materials 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- IOHGCXDWUOZSRD-UHFFFAOYSA-N Cl.Cl.Cl.Cl.[Ti] Chemical compound Cl.Cl.Cl.Cl.[Ti] IOHGCXDWUOZSRD-UHFFFAOYSA-N 0.000 description 1
- 229910019704 Nb2O Inorganic materials 0.000 description 1
- 239000006057 Non-nutritive feed additive Substances 0.000 description 1
- 239000004614 Process Aid Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- CZSABVBCTRZESY-UHFFFAOYSA-N [O-2].[O-2].[Ti+4].OS(O)(=O)=O Chemical compound [O-2].[O-2].[Ti+4].OS(O)(=O)=O CZSABVBCTRZESY-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 150000002821 niobium Chemical class 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000002822 niobium compounds Chemical class 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- WPCMRGJTLPITMF-UHFFFAOYSA-I niobium(5+);pentahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[Nb+5] WPCMRGJTLPITMF-UHFFFAOYSA-I 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- HDUMBHAAKGUHAR-UHFFFAOYSA-J titanium(4+);disulfate Chemical class [Ti+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O HDUMBHAAKGUHAR-UHFFFAOYSA-J 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003658 tungsten compounds Chemical class 0.000 description 1
Landscapes
- Inorganic Compounds Of Heavy Metals (AREA)
- Conductive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、電子写真、静電記録などの記録材料の支持体
用導電性付与剤として、フィルム、w&維、磁気テープ
などの帯電防止剤として、或はプラスチックス、塗料、
インキ、化粧料などの黒色系着色顔料として有用な導電
性低次酸化チタン微粉末及びその製造方法に関する。[Detailed Description of the Invention] <Industrial Application Field> The present invention is an antistatic agent for films, W&fibers, magnetic tapes, etc., as a conductivity imparting agent for supports of recording materials such as electrophotography and electrostatic recording. as, or plastics, paints,
The present invention relates to a conductive low-order titanium oxide fine powder useful as a black colored pigment for inks, cosmetics, etc., and a method for producing the same.
く従来の技術〉
前記の導電性付与剤、帯電防止剤或は黒色系着色顔料と
しては、従来からカーボンブラックが主に使用されてい
る。BACKGROUND ART Conventionally, carbon black has been mainly used as the conductivity imparting agent, antistatic agent or black colored pigment.
しかしながら、カーボンブラックは、樹脂との混合性(
分散性)が悪く、また発ガン性物質を含有する等の問題
があることから、これに替わるものの出現が期待されて
いる。However, carbon black has poor miscibility with resins (
Since there are problems such as poor dispersibility and the presence of carcinogenic substances, it is hoped that an alternative will emerge.
最近、上記カーボンブラックの代替品として、二酸化チ
タンを還元して得られる低次酸化チタンが、例えば特開
昭58−91037号で提案されている。Recently, lower titanium oxide obtained by reducing titanium dioxide has been proposed as a substitute for the carbon black, for example, in JP-A-58-91037.
〈発明が解決しようとする問題点〉
従来の低次酸化チタンは、分散性、色調、人体への安全
性の面ではカーボンブラックの代替物として優れたもの
であるが、金属チタンと二酸化チタンを混合して不活性
気体中で加熱して得られるものは粒径が大きい為に平滑
な塗膜、高い隠ぺい力を得ることが難しい。従って、磁
気テープ、フィルムなどの非常に薄い塗膜が要求される
分野での1史用には問題があり、また電子写真感光紙、
静電記録紙などの分野では均質で鮮明な画像が得られ難
いといった問題がある。また、二酸化チタンをアンモニ
アガスで還元して低次酸化チタンを得る方法が提案され
ているが、アンモニアガスは腐蝕性のものであるために
、その取扱い及び反応装置、設備等の面で種々の制約が
あり、工業化に際しての問題も多い。<Problems to be solved by the invention> Conventional low-order titanium oxide is an excellent substitute for carbon black in terms of dispersibility, color tone, and safety to the human body. Since the particles obtained by mixing and heating in an inert gas have large particle sizes, it is difficult to obtain a smooth coating film and high hiding power. Therefore, there are problems when used in fields that require very thin coatings such as magnetic tape and film, and there are also problems with electrophotographic paper,
In fields such as electrostatic recording paper, there is a problem in that it is difficult to obtain homogeneous and clear images. In addition, a method has been proposed to obtain lower titanium oxide by reducing titanium dioxide with ammonia gas, but since ammonia gas is corrosive, there are various issues regarding its handling, reaction equipment, equipment, etc. There are restrictions and there are many problems with industrialization.
〈問題点を解決するための手段〉
本願の第1の発明は、上記問題点を解決した導電性低次
酸化チタン微粉末を提供するものであって、すなわち一
般式TiOx(但しXは酸化度)において、Xが1.5
〜1.9で示される組成を有し、比抵抗が100ΩC以
下でかつ平均粒径が0.05〜0.1μであることを特
徴とする導電性低次酸化チタン微粉末である。また、本
願の第2の発明は、二酸化チタンと金属チタンとの混合
物を不活性雰囲気中で加熱処理して低次酸化チタンを製
造するに際し、前記二酸化チタンとして種々の化合物の
使用について試行錯誤をした結果、(イ)二酸化チタン
として微粒子含水二酸化チタンが最適であること、(ロ
)加熱処理の際焼成処理補助剤を存在させることにより
、前記含水二酸化チタンの粒子成長、焼結が抑制できる
こと、を見出して本発明方法を完成したものであって、
すなわち、微粒子含水二酸化チタンと金属チタンとをモ
ル比が2.4:1〜12:1になるように混合し、該混
合物を焼成処理補助剤の存在下不活性雰囲気中で加熱処
理し、次いで粉砕して、一般式TiOx(但しXは酸化
度)において、Xが1.5〜1.9で示される組成を有
し、比抵抗が100Ωcm以下でかつ平均粒径が(11
,05〜0.1°μの微粉状生成物を得ることを特徴と
する導電性低次酸化チタン微粉末の製造方法である。<Means for Solving the Problems> The first invention of the present application provides a conductive low-order titanium oxide fine powder that solves the above problems, that is, it has the general formula TiOx (where X is the degree of oxidation). ), X is 1.5
It is a conductive low-order titanium oxide fine powder having a composition shown by ~1.9, a specific resistance of 100 ΩC or less, and an average particle size of 0.05 to 0.1 μ. Further, the second invention of the present application is based on trial and error regarding the use of various compounds as the titanium dioxide when producing lower titanium oxide by heat-treating a mixture of titanium dioxide and metal titanium in an inert atmosphere. As a result, (a) particulate hydrous titanium dioxide is optimal as titanium dioxide; (b) particle growth and sintering of the hydrous titanium dioxide can be suppressed by the presence of a sintering treatment aid during heat treatment; The method of the present invention was completed by discovering
That is, fine particulate hydrous titanium dioxide and metallic titanium are mixed at a molar ratio of 2.4:1 to 12:1, the mixture is heat-treated in an inert atmosphere in the presence of a calcination treatment aid, and then It is pulverized and has a composition represented by the general formula TiOx (where X is the degree of oxidation), where X is 1.5 to 1.9, a specific resistance of 100 Ωcm or less, and an average particle size of (11
, 05 to 0.1 μm is obtained.
本発明の導電性低次酸化チタン微粉末は、Ti:Oが特
定割合の組成よりなる化合物であって、かつ比抵抗と平
均粒子径が特定範囲にあるものより実質的に構成されて
いるものであるが、(a)前記Ti:Oの割合は一般式
TiOに(但しXは酸化度)において、Xは通常1.5
〜1.9、望ましくは1.6〜1.8、特に望ましくは
1.6〜1.7である。このような酸化度の範囲で“示
される本発明の導電性低次酸化チ9ン微粉末は、例工l
! T i O、T i 203、Ti3O−1T i
407、T i s Os、T i s O+ +、
T i 7013、T!aO+ 1、T ! s 01
7、Til。019などの化合物が前記酸化度の範囲内
において実質的に単−相で存在する場合であっても、あ
るいは前記酸化度の範囲内においてそれらの化合物が複
数相共存している場合であってもよい。(b)前記比抵
抗は、通常100Ωcm以下、望ましくは50Ωam以
下、特に望ましくは30Ωcm以下である。また、(c
)平均粒子径は、通常0.05〜0.1μであり、望ま
しくは0.05〜0.07μである。The conductive low-order titanium oxide fine powder of the present invention is a compound consisting of Ti:O in a specific ratio, and is substantially composed of a compound having a specific resistance and an average particle size within a specific range. However, (a) the ratio of Ti:O is expressed in the general formula TiO (where X is the degree of oxidation), and X is usually 1.5.
-1.9, preferably 1.6-1.8, particularly preferably 1.6-1.7. The conductive low-order titanium oxide fine powder of the present invention having such an oxidation degree range is
! T i O, T i 203, Ti3O-1T i
407, Tis Os, Tis O+ +,
T i 7013, T! aO+ 1,T! s 01
7. Til. Even if compounds such as 019 exist in a substantially single phase within the range of the oxidation degree, or even if multiple phases of these compounds coexist within the range of the oxidation degree, good. (b) The specific resistance is usually 100 Ωcm or less, preferably 50 Ωcm or less, and particularly preferably 30 Ωcm or less. Also, (c
) The average particle diameter is usually 0.05-0.1μ, preferably 0.05-0.07μ.
本発明において、前記の(、)、(b)及び(c)が前
記各範囲を一つでも満足しない場合には、導電性能や分
散性能などの特性について少なくとも部分的に欠けると
ころがみられ望ましくない。In the present invention, if even one of the above-mentioned (,), (b) and (c) does not satisfy the above-mentioned ranges, it is undesirable because at least some of the properties such as conductive performance and dispersion performance are lacking. .
本発明の導電性低次酸化チタン微粉末を製造するには、
先ず(1)微粒子含水二酸化チタンと金属チタンとを、
生成する低次酸化チタン化合物のTi:Oの割合、加熱
処理条件などに応して所定のモル比で混合する。前記微
粒子含水二酸化チタンと金属チタンの混合モル比は、通
常2.4:1〜12:1、望ましくは3:1〜4:1の
範囲である。To produce the conductive low-order titanium oxide fine powder of the present invention,
First, (1) particulate hydrated titanium dioxide and metallic titanium,
They are mixed at a predetermined molar ratio depending on the Ti:O ratio of the lower titanium oxide compound to be produced, heat treatment conditions, and the like. The mixing molar ratio of the particulate hydrated titanium dioxide and metallic titanium is usually in the range of 2.4:1 to 12:1, preferably 3:1 to 4:1.
前記の金属チタンと混合する微粒子含水二酸化チタンと
は、チタン塩類溶液を加水分解してチタン分を沈殿させ
る時に用いる種晶(部分的にルチル構造をもつ微粒子含
水二酸化チタン、平均粒子径50〜12OA)のことで
あって、このものは例えば硫酸性二酸化チタン製造工業
において、チタン硫酸塩溶液を加水分解する際に用いら
れるものである。このような種晶の製造方法としては、
例えばチタニル硫酸などのチタン硫酸塩類の酸性溶液ま
たは四塩酸チタンなどのチタン塩化物の酸性溶液などを
中和して析出させたコロイド状チタン化合物を適当に熟
成してシードとしての活性をもつようにする方法がいく
つか知られている。その例として1949年米国ザ・ロ
ナルド・プレス社(TheRonald Press
Company)発行チタニウム(T itani
um)160〜173頁に記載されている方法、米国特
許第2.303,306号、同2,304,110号、
同2.345,985号、同2,971,821号、特
公昭29−8178号などに記載されている方法を挙げ
ることができる。このような方法で得られる微粒子含水
二酸化チタンは、そのまま或は低温で、例えば400〜
650℃、望ましくは450〜600℃で焼成し、粉砕
して使用できる。The fine particulate hydrated titanium dioxide to be mixed with the metallic titanium mentioned above refers to the seed crystals (fine particulate hydrated titanium dioxide having a partially rutile structure, average particle size of 50 to 12 OA) used when hydrolyzing a titanium salt solution to precipitate the titanium component. ), which is used, for example, in the sulfuric acid titanium dioxide production industry when hydrolyzing titanium sulfate solutions. The method for producing such seed crystals is as follows:
For example, a colloidal titanium compound precipitated by neutralizing an acidic solution of titanium sulfates such as titanyl sulfate or an acidic solution of titanium chloride such as titanium tetrahydrochloride is appropriately aged to have seed activity. There are several known ways to do this. For example, in 1949, The Ronald Press
Company) Published by Titanium (Titani)
U.S. Pat. No. 2,303,306, U.S. Pat. No. 2,304,110,
Examples include methods described in Japanese Patent Publication No. 2.345,985, Japanese Patent Publication No. 2,971,821, and Japanese Patent Publication No. 29-8178. The fine particle hydrated titanium dioxide obtained by such a method can be heated as it is or at a low temperature, for example, 400~
It can be used by firing at 650°C, preferably 450-600°C, and pulverizing it.
本発明方法において使用する微粒子含水二酸化チタンは
、後記還元反応の際に粒子成長や焼結を起こし易いもの
であり、還元設定温度の僅かな上昇で粒子が粗大化し、
望ましくない粒径の低次酸化チタンが生成する。そこで
本発明においては、それを抑制するために、珪素、アル
ミニウム、ニオブ、タングステンから成るグループから
選択される少くとも一種の金属を含む無機或は有機化合
物を焼成処理補助剤として存在させて還元することが必
要である。この場合、該補助剤を、微粒子含水二酸化チ
タンと金属チタンとの混合物に添加したり、該含水二酸
化チタンと該補助剤とを予め混合したり或は該含水二酸
化チタンを予め該補助剤で被覆処理したりして存在させ
ることもできるが、被覆処理する方法が効果的である。The fine-particle hydrated titanium dioxide used in the method of the present invention is likely to cause particle growth and sintering during the reduction reaction described below, and a slight increase in the set reduction temperature causes the particles to become coarse.
Lower titanium oxide of undesirable particle size is produced. Therefore, in the present invention, in order to suppress this, an inorganic or organic compound containing at least one metal selected from the group consisting of silicon, aluminum, niobium, and tungsten is present as a calcination treatment aid for reduction. It is necessary. In this case, the auxiliary agent may be added to a mixture of particulate hydrated titanium dioxide and metallic titanium, the hydrated titanium dioxide and the auxiliary agent may be mixed in advance, or the hydrated titanium dioxide may be coated with the auxiliary agent in advance. Although it can be made to exist by treatment, a coating treatment method is effective.
前記補助剤の使用量は、該含水二酸化チタンと金属チタ
ンとの混合割合、加熱処理条件によって異なり一概に規
定できないが、補助剤の酸化物換算で、該含水二酸化チ
タン中のT i O2重量基準に対して0゜1〜10%
望ましくは0.3〜5%、特に望ましくは005〜2%
である。使用する焼成処理補助剤としては兵、体的には
例えば黒磯珪素化合物としては、フロイダルシリ力或は
ケイ酸ナトリウムなどの水可溶性ケイ酸塩など、有機珪
素化合物としては、シリコンオイル、シランカップリン
グ剤など、アルミニウム化合物としては、硫酸アルミニ
ウム、硝酸アルミニウム、塩化アルミニウムなどの水可
溶性アルミニウム塩、ニオブ化合物としては、酸化ニオ
ブ(Nb20.)に変化しうる水可溶性ニオブ塩、タン
グステン化合物としては、タングステン酸アンモニウム
などが挙げられる。The amount of the auxiliary agent to be used varies depending on the mixing ratio of the hydrated titanium dioxide and metal titanium, and the heat treatment conditions, and cannot be absolutely specified, but it is based on the weight of T i O2 in the hydrated titanium dioxide in terms of the oxide of the auxiliary agent. 0°1~10% against
Preferably 0.3 to 5%, particularly preferably 0.05 to 2%
It is. The firing processing aids to be used include, for example, Kuroiso silicon compounds such as floidal silicate or water-soluble silicates such as sodium silicate, and the organic silicon compounds such as silicone oil and silane coupling agents. Examples of aluminum compounds include water-soluble aluminum salts such as aluminum sulfate, aluminum nitrate, and aluminum chloride; examples of niobium compounds include water-soluble niobium salts that can be converted to niobium oxide (Nb20.); and examples of tungsten compounds include ammonium tungstate. Examples include.
本発明方法においては、前記のように還元反応の際に焼
成処理補助剤を使用するので、粒子成長や粒子焼結を抑
制することができ、また比較的低温で還元反応を行なう
ことができるために、分散性や導電性能の優れた導電性
低次酸化チタン微粉末を得ることができる。In the method of the present invention, since a calcination treatment aid is used during the reduction reaction as described above, particle growth and particle sintering can be suppressed, and the reduction reaction can be carried out at a relatively low temperature. In addition, it is possible to obtain conductive low-order titanium oxide fine powder with excellent dispersibility and conductive performance.
本願発明方法において金属チタン粉末は、微粉状のもの
でも、粉状のものでもいづれのものも使用できるが、粒
度は通常100メツシユ以下、望ましくは200メツシ
ユ以下、特に望ましくは350メツシユ以下である。In the method of the present invention, the metallic titanium powder may be in the form of fine powder or powder, but the particle size is usually 100 mesh or less, preferably 200 mesh or less, and particularly preferably 350 mesh or less.
次いで(2)、前記(1)で得られた微粒子含水二酸化
チタンと金属チタンとの混合物を加熱処理する。この処
理は、例えば窒素、アルゴン、ヘリウムなどの気流によ
る不活性雰囲気中で、通常650〜900℃望ましくは
700〜850″Cでおこなう。加熱時間は、加熱温度
、原料の混合割合、原料の粒度などにより異なり一概に
言えないが通常2〜5時間である。前記加熱処理は、種
々の型式の加熱炉を使用して行なうことができるが、工
業的には回転炉中で窒素気流下でおこなうのが望ましい
。得られた粉状生成物は、非酸化性雰囲気中で100°
C以下望ましくは常温まで放冷し、次いで乾式法又は湿
式法或はそれらを組合せて微粉砕して本発明の導電性低
次酸化チタン微粉末の製品とする。Next (2), the mixture of the fine particles of hydrated titanium dioxide and metallic titanium obtained in the above (1) is heat-treated. This treatment is carried out in an inert atmosphere with a gas flow of nitrogen, argon, helium, etc., usually at 650 to 900 degrees Celsius, preferably at 700 to 850 inches.Heating time depends on the heating temperature, the mixing ratio of the raw materials, the particle size of the raw materials The heating time is usually 2 to 5 hours, although it can vary depending on the situation.The above heat treatment can be carried out using various types of heating furnaces, but industrially it is carried out in a rotary furnace under a nitrogen stream. The resulting powder product is heated at 100° in a non-oxidizing atmosphere.
C or lower, preferably to room temperature, and then finely pulverized by a dry method, a wet method, or a combination thereof to obtain the conductive low-order titanium oxide fine powder product of the present invention.
実施例1
四塩化チタン溶液を水酸化す) IJウムで中和して得
られた微粒子含水二酸化チタンを575°Cで焼成し、
粉砕した後TiO2として100g/ρの水性スラリー
とし、ケイ酸ナトリウム溶液をS i O2換算でT
i O2に対して0.5%添加した。その後10分間攪
拌後硫酸を添加してスラ17−のpHを7に調整してケ
イ素の水和酸化物を沈殿させ、乾燥後粉砕した。このよ
うにして得られたS i O2被覆微粒子含水二酸化チ
タンと金属チタン粉末(粒度325メツシュ全通品、純
度99.1重量%)とをモル比で4:1の割合で均一に
混合し、この混合物を回転炉に装入し、窒素ガス気流の
不活性雰囲気中で850°Cで3時間加熱し、次いで得
られた粉状生成物を同雰囲気中で70°Cまで冷却し、
更に大気中で常温まで放冷した。しかる後このものをサ
ンドミルで粉砕後次いでバルベライザーで粉砕して本発
明の導電性低次酸化チタン微粉末を得た。Example 1 (hydroxidation of titanium tetrachloride solution) Fine particles of hydrated titanium dioxide obtained by neutralizing with IJium were calcined at 575°C,
After pulverization, it is made into an aqueous slurry of 100g/ρ as TiO2, and the sodium silicate solution is converted to T in terms of SiO2.
i Added 0.5% to O2. Thereafter, after stirring for 10 minutes, sulfuric acid was added to adjust the pH of slurry 17 to 7 to precipitate a hydrated oxide of silicon, which was dried and pulverized. The thus obtained SiO2-coated fine particles of hydrated titanium dioxide and metallic titanium powder (particle size: 325 mesh, purity: 99.1% by weight) were uniformly mixed at a molar ratio of 4:1, This mixture was charged into a rotary furnace and heated at 850 °C for 3 hours in an inert atmosphere of nitrogen gas flow, and then the obtained powder product was cooled to 70 °C in the same atmosphere,
Furthermore, it was allowed to cool down to room temperature in the atmosphere. Thereafter, this material was pulverized with a sand mill and then pulverized with a balberizer to obtain a conductive low-order titanium oxide fine powder of the present invention.
実施例2
実施例1において、微粒子含水二酸化チタンを焼成、粉
砕することなく 100g/Qの水性スラリーとするこ
と、ケイ酸ナトリウム溶液をSiO□換算でTiO2に
対して5%添加すること及び不活性雰囲気中で800
’Cで3時間加熱すること以外は実施例1と同様に処理
して本発明の導電性低次酸化チタン微粉末を得た。Example 2 In Example 1, the fine particles of hydrated titanium dioxide were made into an aqueous slurry of 100 g/Q without being calcined or pulverized, the sodium silicate solution was added in an amount of 5% based on TiO2 in terms of SiO□, and inertness was added. 800 in the atmosphere
The conductive low-order titanium oxide fine powder of the present invention was obtained in the same manner as in Example 1, except that it was heated at C for 3 hours.
実施例3
実施例1において、微粒子含水二酸化チタンの水性スラ
リーに添加するケイ酸ナトリウム溶液の量を0.1%と
し、処理された微粒子含水二酸化チタンと金属チタン粉
末との混合モル比を3:1とし、不活性雰囲気中での加
熱を800℃で3時間行なうこと以外は実施例1と同様
に処理して本発明の導電性低次酸化チタン微粉末を得た
。Example 3 In Example 1, the amount of sodium silicate solution added to the aqueous slurry of particulate hydrated titanium dioxide was 0.1%, and the mixing molar ratio of the treated particulate hydrated titanium dioxide and metal titanium powder was 3: 1 and treated in the same manner as in Example 1 except that heating was performed at 800° C. for 3 hours in an inert atmosphere to obtain a conductive low-order titanium oxide fine powder of the present invention.
実施例4
実施例1において、ケイ酸ナトリウム溶液の量を0.3
%とし、不活性雰囲気中での加熱を825°Cで3時間
行なうこと以外は実施例1と同様に処理して本発明の導
電性低次酸化チタン微粉末を得た。Example 4 In Example 1, the amount of sodium silicate solution was changed to 0.3
%, and the conductive low-order titanium oxide fine powder of the present invention was obtained in the same manner as in Example 1, except that heating was performed at 825° C. for 3 hours in an inert atmosphere.
実施例5
実施例1と同じ微粒子含水二酸化チタンの575°C焼
成粉砕物にジメチルポリシロキサン5H−200(東レ
シリコン株式会社製)をSiO□換算でT i O2に
対して2%添加し、ヘンシェルミキサーにて混合、処理
した。得られた処理微粒子含水二酸化チタンと金属チタ
ン粉末(実施例1と同一のもの)とを実施例1と同じ割
合で均一に混合した後不活性雰囲気中での加熱を700
℃で3時間行なうこと以外は実施例1と同様に処理して
本発明の導電性低次酸化チタン微粉末を得た。Example 5 Dimethylpolysiloxane 5H-200 (manufactured by Toray Silicon Co., Ltd.) was added in an amount of 2% based on T i O2 in terms of SiO□ to the same microparticle hydrated titanium dioxide as in Example 1, calcined and crushed at 575°C. Mixed and processed using a mixer. The obtained treated fine particles of hydrated titanium dioxide and metallic titanium powder (same as in Example 1) were mixed uniformly in the same ratio as in Example 1, and then heated in an inert atmosphere for 700 min.
The conductive low-order titanium oxide fine powder of the present invention was obtained in the same manner as in Example 1 except that the treatment was carried out at ℃ for 3 hours.
実施例6
実施例5において、処理微粉子含水二酸化チタンと金属
チタン粉末との混合割合を6:1とすること以外は実施
例5と同様に処理して、本発明の導電性低次酸化チタン
微粉末を得た。Example 6 The conductive lower titanium oxide of the present invention was produced in the same manner as in Example 5, except that the mixing ratio of the treated fine powdered hydrated titanium dioxide and the metal titanium powder was 6:1. A fine powder was obtained.
実施例7〜12
実施例1におけるT i 02として100g/Qの微
粒子含水二酸化チタンスラリー中に焼成処理補助剤とし
て各々硫酸アルミニウム粉末、水酸化ニオブ粉末、タン
グステン酸アンモニウム水溶液を下記表1に示す量(そ
れぞれA Q 203、Nb2O5、WO,としての換
算量)を添加し、pHを7に調整して処理すること、同
表に示す処理微粒子含水二酸化チタンと金属チタン粉末
との混合比及び加熱条件を採用すること以外は実施例1
と同様に処理して本発明の導電性低次酸化チタン微粉末
を得た。Examples 7 to 12 As the T i 02 in Example 1, aluminum sulfate powder, niobium hydroxide powder, and ammonium tungstate aqueous solution were added as firing treatment aids in the 100 g/Q microparticle hydrous titanium dioxide slurry in amounts shown in Table 1 below. (converted amounts as AQ 203, Nb2O5, and WO, respectively) and adjust the pH to 7 for treatment, and the mixing ratio and heating conditions of the treated fine-particle hydrated titanium dioxide and metal titanium powder shown in the table. Example 1 except that
The conductive low-order titanium oxide fine powder of the present invention was obtained in the same manner as above.
表1
7 A&20. 1% 4:1 7008 //
3 // 4 : 1 7509 Nb2O,1
// 4:1 8001Q tt 3// 4
:1 1t11 Wo、 3// 4:1 85
012 // 3:l ii3〃
比較例1
実施例1において、焼成処理補助剤(ケイ酸ナトリウム
)を添加しないこと及び加熱を800℃で行なうこと以
外は実施例1と同様に処理した。Table 1 7 A&20. 1% 4:1 7008 //
3 // 4: 1 7509 Nb2O,1
// 4:1 8001Q tt 3// 4
:1 1t11 Wo, 3// 4:1 85
012 // 3:l ii3〃 Comparative Example 1 The same process as in Example 1 was carried out except that the baking treatment aid (sodium silicate) was not added and the heating was performed at 800°C.
比較例2
実施例1において、微粒子含水二酸化チタンに代えて硫
酸チタニル溶液を核形成用種晶の存在下で加熱加水分解
して得られたアナタース形水和二酸化チタン(解膠粒子
径約5ooX)を使用すること、焼成処理補助剤(ケイ
酸ナトリウム)を添加しないこと、金属チタン粉末との
混合モル比を3:1とすること以外は実施例1と同様に
処理した。Comparative Example 2 In Example 1, anatase-type hydrated titanium dioxide (peptized particle diameter of about 5ooX) obtained by heating and hydrolyzing a titanyl sulfate solution in the presence of nucleation seed crystals instead of the fine particle hydrated titanium dioxide The process was carried out in the same manner as in Example 1, except that the firing process aid (sodium silicate) was not added, and the molar ratio of the mixture with the metal titanium powder was 3:1.
試験例1
前記の実施例及び比較例で得られた低次酸化チタン粉末
について、組成、比抵抗、粒子径、フィルム光透過率を
それぞれ次記のように測定した。その結果を表2に示す
。Test Example 1 The composition, specific resistance, particle diameter, and film light transmittance of the low-order titanium oxide powders obtained in the above Examples and Comparative Examples were measured as follows. The results are shown in Table 2.
表2
2 X=1.725 0.1 20
3 X=1.840 0.05 19
実4 X=1.723 0.07 215 X=1.7
28 0.07 23
施6 X=1.870 0.O529
7X=1.8 45 0.05 29例8
X=1.7 2 0.08 309 X=1.7
28 0.1 2610 X=1.8
37 0.07 2411 X=1.7
10 0.1 23例2 X=1.726
0.4 36なお表2の比抵抗は、温度20℃で相対
湿度50%で測定したものであるが、本発明の実施例1
〜11の導電性低次酸化チタン微粉末試料について、相
対湿度90%の雰囲気下で一定期間放置後測定したとこ
ろ、いづれのものも湿度変化に対してほとんど影響はみ
られなかった。Table 2 2 X=1.725 0.1 20 3 X=1.840 0.05 19 Actual 4 X=1.723 0.07 215 X=1.7
28 0.07 23 6 X=1.870 0. O529 7X=1.8 45 0.05 29 Example 8
X=1.7 2 0.08 309 X=1.7
28 0.1 2610 X=1.8
37 0.07 2411 X=1.7
10 0.1 23 Example 2 X=1.726
0.4 36 The specific resistance in Table 2 was measured at a temperature of 20°C and a relative humidity of 50%, but it was measured in Example 1 of the present invention.
When the conductive low-order titanium oxide fine powder samples No. 1 to 11 were measured after being left in an atmosphere with a relative humidity of 90% for a certain period of time, almost no effect on humidity changes was observed in any of them.
組 成 : 試料粉末におけるT i OxのX(酸化
度)の値は、化学分析により求めた。なお試料粉末のX
線回折をおこなったところ、いづれのものも低次酸化チ
タン結晶物であることがみとめられた。Composition: The value of X (degree of oxidation) of TiOx in the sample powder was determined by chemical analysis. Note that the X of the sample powder
When line diffraction was performed, it was found that all of them were low-order titanium oxide crystals.
比抵抗 二 試料粉末を100 Kg/am2の圧力で
成型して円型圧粉体(直径18n+m、厚3關)とし、
その直流抵抗を測定した。Specific resistance 2 The sample powder was molded at a pressure of 100 Kg/am2 to form a circular powder compact (diameter 18n+m, thickness 3mm),
Its DC resistance was measured.
粒子径 : 電子顕微鏡写真法により平均粒子径を測定
した。Particle size: Average particle size was measured by electron microphotography.
Claims (2)
が1.5〜1.9で示される組成を有し、比抵抗が10
0Ωcm以下でかつ平均粒径が0.05〜0.1μであ
ることを特徴とする導電性低次酸化チタン微粉末。(1) In the general formula TiOx (where X is the degree of oxidation),
has a composition of 1.5 to 1.9, and has a specific resistance of 10
An electrically conductive, low-order titanium oxide fine powder characterized by having a particle diameter of 0 Ωcm or less and an average particle size of 0.05 to 0.1 μ.
が2.4:1〜12:1になるように混合し、該混合物
を焼成処理補助剤の存在下、不活性雰囲気中で加熱処理
し、次いで粉砕して、一般式TiOx(但しXは酸化度
)において、Xが1.5〜1.9で示される組成を有し
、比抵抗が100Ωcm以下でかつ平均粒径が0.05
〜0.1μの微粉状生成物を得ることを特徴とする導電
性低次酸化チタン微粉末の製造方法。(2) Particulate hydrous titanium dioxide and metallic titanium are mixed at a molar ratio of 2.4:1 to 12:1, and the mixture is heat-treated in an inert atmosphere in the presence of a calcination treatment aid. , and then pulverized to obtain TiOx, which has a composition represented by the general formula TiOx (where X is the degree of oxidation), where X is 1.5 to 1.9, has a specific resistance of 100 Ωcm or less, and has an average particle size of 0.05
A method for producing a conductive low-order titanium oxide fine powder, characterized in that a fine powder product of ~0.1μ is obtained.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14296884A JPS61106414A (en) | 1984-07-10 | 1984-07-10 | Fine powder of electroconductive titanium oxide of low oxidation state and its preparation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14296884A JPS61106414A (en) | 1984-07-10 | 1984-07-10 | Fine powder of electroconductive titanium oxide of low oxidation state and its preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61106414A true JPS61106414A (en) | 1986-05-24 |
| JPS6411572B2 JPS6411572B2 (en) | 1989-02-27 |
Family
ID=15327840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14296884A Granted JPS61106414A (en) | 1984-07-10 | 1984-07-10 | Fine powder of electroconductive titanium oxide of low oxidation state and its preparation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61106414A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6317221A (en) * | 1986-07-03 | 1988-01-25 | Taki Chem Co Ltd | Crystalline titanium oxide sol and production thereof |
| JPH0292824A (en) * | 1988-09-30 | 1990-04-03 | Ishihara Sangyo Kaisha Ltd | Acicular low oxidized titanium and production thereof |
| US5173215A (en) * | 1991-02-21 | 1992-12-22 | Atraverda Limited | Conductive titanium suboxide particulates |
| US5320782A (en) * | 1990-10-19 | 1994-06-14 | Ishihara Sangyo Kaisha, Ltd. | Acicular or platy titanium suboxides and process for producing same |
| EP0707050A3 (en) * | 1994-10-11 | 1996-06-12 | Shiseido Co Ltd | Pigment containing low-order titanium oxide and method of manufacturing the same |
| US5582773A (en) * | 1987-01-23 | 1996-12-10 | Cass; Richard B. | Electrically-conductive titanium suboxides |
| US6524750B1 (en) | 2000-06-17 | 2003-02-25 | Eveready Battery Company, Inc. | Doped titanium oxide additives |
| WO2018159420A1 (en) * | 2017-03-01 | 2018-09-07 | 堺化学工業株式会社 | Electrically conductive material and electrode material |
| JP2018177553A (en) * | 2017-04-04 | 2018-11-15 | 東京印刷機材トレーディング株式会社 | Method for producing titanium suboxide particles and titanium suboxide particles |
| WO2022039111A1 (en) * | 2020-08-21 | 2022-02-24 | デンカ株式会社 | Particle having specific lower order titanium oxide crystal composition, and method for producing same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5891037A (en) * | 1981-11-27 | 1983-05-30 | Mitsubishi Metal Corp | Manufacture of titanium oxide powder |
-
1984
- 1984-07-10 JP JP14296884A patent/JPS61106414A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5891037A (en) * | 1981-11-27 | 1983-05-30 | Mitsubishi Metal Corp | Manufacture of titanium oxide powder |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6317221A (en) * | 1986-07-03 | 1988-01-25 | Taki Chem Co Ltd | Crystalline titanium oxide sol and production thereof |
| US5582773A (en) * | 1987-01-23 | 1996-12-10 | Cass; Richard B. | Electrically-conductive titanium suboxides |
| US5585041A (en) * | 1987-01-23 | 1996-12-17 | Cass; Richard B. | Electrically-conductive titanium suboxides |
| JPH0292824A (en) * | 1988-09-30 | 1990-04-03 | Ishihara Sangyo Kaisha Ltd | Acicular low oxidized titanium and production thereof |
| US5320782A (en) * | 1990-10-19 | 1994-06-14 | Ishihara Sangyo Kaisha, Ltd. | Acicular or platy titanium suboxides and process for producing same |
| US5173215A (en) * | 1991-02-21 | 1992-12-22 | Atraverda Limited | Conductive titanium suboxide particulates |
| US5281496A (en) * | 1991-02-21 | 1994-01-25 | Atraverda Limited | Electrochemical cell containing a titanium suboxide electrode |
| EP0707050A3 (en) * | 1994-10-11 | 1996-06-12 | Shiseido Co Ltd | Pigment containing low-order titanium oxide and method of manufacturing the same |
| US6524750B1 (en) | 2000-06-17 | 2003-02-25 | Eveready Battery Company, Inc. | Doped titanium oxide additives |
| WO2018159420A1 (en) * | 2017-03-01 | 2018-09-07 | 堺化学工業株式会社 | Electrically conductive material and electrode material |
| JP2018147569A (en) * | 2017-03-01 | 2018-09-20 | 堺化学工業株式会社 | Conductive material and electrode material |
| US11094944B2 (en) | 2017-03-01 | 2021-08-17 | Sakai Chemical Industry Co., Ltd. | Electrically conductive material and electrode material |
| JP2018177553A (en) * | 2017-04-04 | 2018-11-15 | 東京印刷機材トレーディング株式会社 | Method for producing titanium suboxide particles and titanium suboxide particles |
| WO2022039111A1 (en) * | 2020-08-21 | 2022-02-24 | デンカ株式会社 | Particle having specific lower order titanium oxide crystal composition, and method for producing same |
| JPWO2022039111A1 (en) * | 2020-08-21 | 2022-02-24 | ||
| CN115835912A (en) * | 2020-08-21 | 2023-03-21 | 电化株式会社 | Particles having a crystal composition of specific titanium suboxide and method for producing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6411572B2 (en) | 1989-02-27 |
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