JPS61119002A - Thermosensitive resistor - Google Patents
Thermosensitive resistorInfo
- Publication number
- JPS61119002A JPS61119002A JP23950384A JP23950384A JPS61119002A JP S61119002 A JPS61119002 A JP S61119002A JP 23950384 A JP23950384 A JP 23950384A JP 23950384 A JP23950384 A JP 23950384A JP S61119002 A JPS61119002 A JP S61119002A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- rho
- powder
- sensitive resistor
- ruo
- Prior art date
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は温度に体して抵抗値が大きく変わる感温抵抗体
に係わり、特に抵抗急変領域でのヒステリシスが小さく
、かつ膜状素子形成に適した感温抵抗体に関する。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a temperature-sensitive resistor whose resistance value changes greatly depending on the temperature, and which has a small hysteresis particularly in the region of sudden resistance changes and is suitable for forming film-like elements. The present invention relates to a temperature-sensitive resistor.
アルミナ基板等の絶縁基板上に、約68°Cで抵抗値が
大きく変わるvo2粉末を感温抵抗材料とした抵抗ペー
ストを、厚11rA印刷技術によって塗布し、これを空
気中で処理して厚膜感温素子を形成することが行なわれ
ている(特開昭54.158696)。On an insulating substrate such as an alumina substrate, a resistance paste made of VO2 powder, which has a temperature-sensitive resistance material whose resistance value changes greatly at about 68°C, is applied to a thickness of 11rA using printing technology, and this is processed in air to form a thick film. Formation of a temperature sensing element has been carried out (Japanese Patent Application Laid-Open No. 158696/1983).
VO2は600℃以上の高温下では極めて酸化され易く
、炭酸ガス中で熱処理を行なう。熱処理、即ち焼成を空
気中でなく炭酸ガス等のような特殊な雰囲気で行なうこ
とは、雰囲気制御という設備的な問題ととbに、感温素
子特性のばらつきをおさえるという点からも極めて厳し
い管理が必要であった。VO2 is extremely easily oxidized at high temperatures of 600° C. or higher, so heat treatment is performed in carbon dioxide gas. Performing heat treatment, that is, firing, in a special atmosphere such as carbon dioxide gas instead of in air requires extremely strict management, both from the equipment issue of controlling the atmosphere and from the standpoint of suppressing variations in temperature-sensitive element characteristics. was necessary.
この観点から、V○2粉末と、ガラスフリットに、金属
ボロン粉末を加え、これを空気中焼成することが行なわ
れている(特公昭57−25961)。From this point of view, metal boron powder is added to V○2 powder and glass frit, and the mixture is fired in air (Japanese Patent Publication No. 57-25961).
しかしVO2は第1図に示すように温度−抵抗特性にヒ
ステリシスがあり、例えば急変領域の所定抵抗値に対す
る温度差は2℃にも及び、感温抵抗材料としてVO2を
単独に用いるセラミック焼結体あるいは膜状焼成体の感
温素子は、精度の低い制御器として利用されるに留まっ
ていた。However, as shown in Figure 1, VO2 has hysteresis in its temperature-resistance characteristics, and for example, the temperature difference for a given resistance value in a region of rapid change can be as much as 2°C. Alternatively, the temperature sensing element of the film-like fired body has been used only as a controller with low precision.
このヒステリシスを解消するため、粒径50μm以下の
VO2に、Ba、 Sr、 A Q t Nby Fe
及びPの酸化物粉体を混合し、焼結して成る抵抗急変型
感温材料が知られている(特公昭46−8547)。In order to eliminate this hysteresis, Ba, Sr, A Q t Nby Fe are added to VO2 with a particle size of 50 μm or less.
A temperature-sensitive material with rapid resistance change is known, which is made by mixing and sintering oxide powders of P and P (Japanese Patent Publication No. 46-8547).
しかし、高抵抗値と低抵抗値の急変領域での極めて高い
温度依存性を利用した高精度温度検知器、あるいはこの
領域での微小温度変化を活用する高周波発振器へ適用す
るには、前記ヒステリシスを尚一層低減し、所定温度に
対する二つの抵抗値の差を5%以内とすることが望まれ
ていた。However, in order to apply the hysteresis to a high-precision temperature sensor that utilizes extremely high temperature dependence in the region of sudden changes in high and low resistance values, or to a high-frequency oscillator that utilizes minute temperature changes in this region, the hysteresis described above must be applied. It has been desired to further reduce the resistance and keep the difference between the two resistance values at a predetermined temperature within 5%.
本発明の目的は前記した従来技術の欠点を改善し温度−
抵抗特性のヒステリシスが極めて小さく、空気中焼成可
能な感温抵抗体を提供するにある。The purpose of the present invention is to improve the above-mentioned drawbacks of the prior art and to
The object of the present invention is to provide a temperature-sensitive resistor having extremely small hysteresis in resistance characteristics and capable of being fired in air.
上記目的は、(a)VO,と二酸化型の金属酸化物であ
るRuO2、RhO2.Rho、もしくはMoO□との
反応焼結体の粉末と、(b)金属ボロン粉末と、(C)
ガラスフリットなる混合物であって、かつ前記(a)
、 (b) 。The above purpose is to (a) VO, and dioxide-type metal oxides RuO2, RhO2. Powder of a reaction sintered body with Rho or MoO□, (b) metallic boron powder, and (C)
A mixture of glass frit, and the above (a)
, (b).
(C)よりなる混合物の組成が、第2図のこれら三成分
の三角組成図において、点A〜Eを結んだ線で囲まれた
範囲にあり、更に前記(a)の焼結体がVo、65〜8
5重量%、RuO2、RhO2.Rho□もしくはM
o O,が35〜15重景%よりなる混合物を酸化雰囲
気中で熱処理して得た感温抵抗体で達成される。The composition of the mixture consisting of (C) is within the range surrounded by the line connecting points A to E in the triangular composition diagram of these three components in Figure 2, and the sintered body of (a) is Vo , 65-8
5% by weight, RuO2, RhO2. Rho□ or M
This is achieved with a temperature-sensitive resistor obtained by heat-treating a mixture of 35 to 15% o O in an oxidizing atmosphere.
但し、上記の点A〜Eは、以下の組成を゛表わす。However, the above points A to E represent the following composition.
Vo2と、RuO2、RhO2.Rho、 金属ボ
ロン ガラス反応焼結体(重量%) (重
量%) (重量%)A 60
30 10B 85
5 10C55540
D 50 10 4
0E 50 30
20なお、Vo2にRuO2、RhO、、Rho、もし
くはM o O2を上記の割合で配合したものを反応焼
結させると。Vo2, RuO2, RhO2. Rho, metallic boron glass reaction sintered body (weight%) (weight%) (weight%) A 60
30 10B 85
5 10C55540 D 50 10 4
0E 50 30
20 Note that when a mixture of Vo2 and RuO2, RhO, Rho, or MoO2 in the above ratio is reacted and sintered.
急変感温特性を示すVO2はあらかじめ歪の与えられた
結晶構造となるため、温度に対して歪んだV○2結晶部
分を起点とする原子の移動が徐々に始まり、これに伴っ
て抵抗値も徐々に追従して変化するものとみられる。VO2, which exhibits sudden temperature-sensitive characteristics, has a pre-distorted crystal structure, so atoms gradually begin to move starting from the V○2 crystal part that is distorted due to temperature, and as a result, the resistance value also increases. It is expected that changes will follow gradually.
この時、’JO,を単独に用いる場合に比べて、急変領
域に相当する温度範囲が広がり、抵抗値の変化量の低下
があるが、ヒステリシスが小さくなり、温度に対して抵
抗値がほぼ一義的に決まるようになる。At this time, compared to the case where 'JO, is used alone, the temperature range corresponding to the sudden change region is expanded and the amount of change in resistance value is reduced, but the hysteresis is reduced and the resistance value is almost unique to temperature. It comes to be determined by
また、上記各粉末の粒径は、通常の厚膜材料と同じく5
μm以下である。In addition, the particle size of each of the above powders is the same as that of ordinary thick film materials.
It is less than μm.
また、金属ボロンの配合割合が上記の範囲であると、ア
ルミナなどの絶縁基板上に印刷形成した未焼成の感温抵
抗ペーストを、通常の空気焼成型厚膜ベルドにより熱処
理ができ、Vo2の酸化によると思われる抵抗値の温度
変化率の低下、焼結物の強度低下がない。In addition, when the blending ratio of metallic boron is within the above range, an unfired temperature-sensitive resistance paste printed on an insulating substrate such as alumina can be heat-treated using a normal air-fired thick film belt, resulting in oxidation of Vo2. There is no decrease in the rate of change in resistance value due to temperature change, and there is no decrease in the strength of the sintered product.
また、ガラスは、主に上記V○2系反応焼結体と基板を
結合させるものであり。上記の範囲外では膜強度の低下
、抵抗値の増大あるいは感温性の低下を生じる。Further, the glass is mainly used to bond the V○2-based reaction sintered body and the substrate. Outside the above range, film strength decreases, resistance increases, or temperature sensitivity decreases.
また、上記(a)、(b)、 (c)よりなる組成物に
、有機ビヒクルを加えて混練し、ペースト状にして使用
しても良い。Alternatively, the composition consisting of the above (a), (b), and (c) may be kneaded with an organic vehicle and used in the form of a paste.
以下、本発明を実施例によって詳述する。 Hereinafter, the present invention will be explained in detail by way of examples.
実施例1
平均粒径2μmのV O、、:s末とRu O□鉛粉末
を第1表のNα1〜Nα28に示すよ−Iな配合割き゛
−混合し、これらを用いてプレス成型によ11直径10
mm、Mさ5mn+の圧粉体を作成し、02を30pp
m含むN2雰囲気中で1000°Cにて10分間熱処理
した。vQ2の熱処理はその酸化防止のため基本的に非
酸化雰囲気で行なう必要があるが1反応を伴なう本実施
例では02を小量含有させた。次いで、この焼結体を粉
砕機で砕き、平均粒径1.5μmの粉末を作成した。Example 1 VO,:s powder with an average particle size of 2 μm and RuO□lead powder were mixed in the proportions indicated by Nα1 to Nα28 in Table 1, and these were used to form the powder by press molding. 11 diameter 10
mm, M 5mm+ green compact, 30pp of 02
Heat treatment was performed at 1000° C. for 10 minutes in an N2 atmosphere containing m. The heat treatment of vQ2 basically needs to be carried out in a non-oxidizing atmosphere to prevent its oxidation, but in this example, which involves one reaction, a small amount of 02 was included. Next, this sintered body was crushed with a crusher to create powder with an average particle size of 1.5 μm.
ガラスフリットは、一般常法により作成した平均粒径1
.0μmの第2表に示す組成A、Bのものを用いた。The glass frit has an average particle size of 1, prepared by a general method.
.. 0 μm compositions A and B shown in Table 2 were used.
vo2系焼結体の粉末と、ガラスフリットと平均粒径1
.0μmの金属ボロン粉とを第1表&1〜血28に示す
ような配合割合に混合し、粉末総量100gに対してそ
れぞれ40gの有機ビヒクル(エチルセルローズ5%の
α−テルピネオール溶液)を加えて混練してペースト状
とした。VO2 sintered powder, glass frit and average particle size 1
.. 0 μm metal boron powder is mixed in the proportions shown in Table 1 & 1 to Blood 28, and 40 g of organic vehicle (5% ethyl cellulose α-terpineol solution) is added to each 100 g of total powder and kneaded. It was made into a paste.
ペーストを、予め850℃厚膜ベルト炉で2.5mm口
、厚さ0.2mmのアルミナ基板1上に形成したAg−
Pd−系電極間に印刷し、150℃で乾燥してα−テル
ピネオール揮散させ、空気中で700°Cにて10分間
焼成し、第3図に示す1mm口、厚さ40μmの厚膜底
部抵抗体3を設けたn欣感温抵抗素子を形成した。The paste was formed in advance on an alumina substrate 1 with a diameter of 2.5 mm and a thickness of 0.2 mm in an 850°C thick film belt furnace.
Printed between Pd-based electrodes, dried at 150°C to volatilize α-terpineol, and baked in air at 700°C for 10 minutes to form a thick film bottom resistor with a 1 mm opening and a thickness of 40 μm as shown in Figure 3. An n-type temperature-sensitive resistance element provided with a body 3 was formed.
素子の50℃の抵抗値RL、100℃の抵抗値R,,5
0℃と100℃の抵抗値の比RL/R11(ヒステリシ
スにおける所定温度での二つの抵抗値の比の最大値を示
す)を測定した。Resistance value RL of the element at 50°C, resistance value R at 100°C, 5
The ratio RL/R11 of resistance values between 0° C. and 100° C. (indicating the maximum value of the ratio of two resistance values at a predetermined temperature in hysteresis) was measured.
従来の一般の厚膜サーミスタ素子以上の抵抗値の温度変
化を得るには丘記RL/R11は10以上が望まれ、実
用回路として用いるに50℃の抵抗値は500 kΩ以
下が望まれる。そして、ヒステリシスにおける最大抵抗
値比は、二つの抵抗値の差を5%以下とするため、 1
.05以下が望まれる。In order to obtain a temperature change in resistance value greater than that of a conventional general thick film thermistor element, the value RL/R11 is desired to be 10 or more, and for use as a practical circuit, the resistance value at 50° C. is desired to be 500 kΩ or less. The maximum resistance value ratio in hysteresis is 1 because the difference between the two resistance values is 5% or less.
.. 05 or less is desirable.
第1表の尚1〜N1128から明らかなように、vQよ
とRu G 2との反応焼結本粉、金属ボロン粉、ガラ
スフリッ1〜が第2図に示す三角組成図の範囲にあり、
かつvQ2との反応焼結体においてRuO□が15〜3
5wt%である組成物において、すべて所望の特性を得
た。As is clear from Notes 1 to N1128 in Table 1, the reaction sintered main powder of vQ and Ru G 2, metallic boron powder, and glass frit 1 to 1 are within the range of the triangular composition diagram shown in FIG.
And in the reaction sintered body with vQ2, RuO□ is 15 to 3
All desired properties were obtained in the composition at 5 wt%.
実施例2
RuO2、RhO、のかわりにRhO2を用いた以外は
、すべて実施例1と同様にしてアルミナ基板上に厚膜抵
抗体を設けた厚膜感温抵抗素子を得た。Example 2 A thick film temperature-sensitive resistance element in which a thick film resistor was provided on an alumina substrate was obtained in the same manner as in Example 1 except that RhO2 was used instead of RuO2 and RhO.
特性は第3表に示すとおりであり、これまた実施例1と
同様であった。The properties are as shown in Table 3, and were also similar to Example 1.
実施例3
RuO2、RhO、のかわりにM2O3を用いた以外は
、すべて実施例1と同様にしてアルミナ基板上に厚膜抵
抗体を設けた厚膜感温抵抗素子を得た。Example 3 A thick film temperature-sensitive resistance element in which a thick film resistor was provided on an alumina substrate was obtained in the same manner as in Example 1 except that M2O3 was used instead of RuO2 and RhO.
特性は第4表に示すとおりであり、これまた実施例1と
同様であった。The properties are shown in Table 4 and were also similar to Example 1.
以下余白
〔発明の効果〕
以上述べたように本発明によれば温度−抵抗特性におい
てヒステリシスを極めて小さく抑えた感温抵抗体ができ
、高精度の温度計測、制御、あるいは微小温度変動を利
用した高周波発振器が可能となった・Margins below [Effects of the Invention] As described above, according to the present invention, a temperature-sensitive resistor with extremely low hysteresis in temperature-resistance characteristics has been created, and can be used for highly accurate temperature measurement and control, or for utilizing minute temperature fluctuations. High frequency oscillator has become possible.
第1図はvO2単結晶の温度−抵抗特性、第2図は本発
明の感温抵抗体の組成範囲を示す三角組成図、第3図は
厚膜感温抵抗素子断面図である。
1・・セラミック基板、2・・・Ag−Pd電匝、3・
・・厚膜感温抵抗体。FIG. 1 is a temperature-resistance characteristic of a vO2 single crystal, FIG. 2 is a triangular composition diagram showing the composition range of a temperature-sensitive resistor of the present invention, and FIG. 3 is a sectional view of a thick-film temperature-sensitive resistor element. 1...Ceramic substrate, 2...Ag-Pd electric spoon, 3...
・Thick film temperature sensitive resistor.
Claims (1)
O_2との反応焼結体の粉末と、金属ボロン粉末と、ガ
ラスフリットよりなる混合物を、酸化性雰囲気中で、熱
処理して得た感温抵抗体。 2、前記VO_2と、RuO_2、RhO_2もしくは
MoO_2との反応焼結体の粉末と、金属ボロン粉末と
、ガラスフリットよりなる混合物の組成が、これら三成
分の三角組成図において、点A−Eを結んだ線で囲まれ
た範囲にあることを特徴とする特許請求の範囲第1項記
載の感温抵抗体。 但し、上記の点A〜Eは以下の組成を示す。 VO_2と、RuO_2、RhO_2もしくはMoO_
2との反応焼結体(重量%) 金属ボロン粉末(重量%
) ガラスフリット(重量%)A 60 30 10 B 85 5 10 C 55 5 40 D 50 10 40 E 50 30 20 3、前記VO_2と、RuO_2、RhO_2もしくは
MoO_2との反応焼結体が、VO_265〜85重量
%、RuO_2、RhO_2もしくはMoO_2が35
〜15重量%よりなる混合物を反応焼結させたものであ
ることを特徴とする特許請求の範囲第1項記載の感温抵
抗体。[Claims] 1. VO_2 and RuO_2, RhO_2 or Mo
A temperature-sensitive resistor obtained by heat-treating a mixture of reaction sintered body powder with O_2, metallic boron powder, and glass frit in an oxidizing atmosphere. 2. The composition of the mixture consisting of the reaction sintered powder of VO_2 and RuO_2, RhO_2 or MoO_2, metallic boron powder, and glass frit connects points A-E in the triangular composition diagram of these three components. The temperature-sensitive resistor according to claim 1, wherein the temperature-sensitive resistor is in the range surrounded by a dotted line. However, the above points A to E indicate the following compositions. VO_2 and RuO_2, RhO_2 or MoO_
Reaction sintered body with 2 (wt%) Metallic boron powder (wt%)
) Glass frit (wt%) A 60 30 10 B 85 5 10 C 55 5 40 D 50 10 40 E 50 30 20 3, the reaction sintered body of the VO_2 and RuO_2, RhO_2 or MoO_2 has a weight of VO_265 to 85 %, RuO_2, RhO_2 or MoO_2 is 35
2. The temperature-sensitive resistor according to claim 1, wherein the temperature-sensitive resistor is obtained by reaction-sintering a mixture consisting of 15% by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23950384A JPS61119002A (en) | 1984-11-15 | 1984-11-15 | Thermosensitive resistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23950384A JPS61119002A (en) | 1984-11-15 | 1984-11-15 | Thermosensitive resistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61119002A true JPS61119002A (en) | 1986-06-06 |
Family
ID=17045753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23950384A Pending JPS61119002A (en) | 1984-11-15 | 1984-11-15 | Thermosensitive resistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61119002A (en) |
-
1984
- 1984-11-15 JP JP23950384A patent/JPS61119002A/en active Pending
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