JPS6113734B2 - - Google Patents

Info

Publication number
JPS6113734B2
JPS6113734B2 JP52081319A JP8131977A JPS6113734B2 JP S6113734 B2 JPS6113734 B2 JP S6113734B2 JP 52081319 A JP52081319 A JP 52081319A JP 8131977 A JP8131977 A JP 8131977A JP S6113734 B2 JPS6113734 B2 JP S6113734B2
Authority
JP
Japan
Prior art keywords
radiation
sensitive composition
composition according
irradiation
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52081319A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5417015A (en
Inventor
Yoshitake Oonishi
Masaki Ito
Kenji Mizuno
Hiroshi Gokan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP8131977A priority Critical patent/JPS5417015A/ja
Publication of JPS5417015A publication Critical patent/JPS5417015A/ja
Priority to US06/059,845 priority patent/US4279986A/en
Publication of JPS6113734B2 publication Critical patent/JPS6113734B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP8131977A 1977-06-01 1977-07-06 Radiation sensitive composite Granted JPS5417015A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8131977A JPS5417015A (en) 1977-07-06 1977-07-06 Radiation sensitive composite
US06/059,845 US4279986A (en) 1977-06-01 1979-07-23 Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8131977A JPS5417015A (en) 1977-07-06 1977-07-06 Radiation sensitive composite

Publications (2)

Publication Number Publication Date
JPS5417015A JPS5417015A (en) 1979-02-08
JPS6113734B2 true JPS6113734B2 (cs) 1986-04-15

Family

ID=13743069

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8131977A Granted JPS5417015A (en) 1977-06-01 1977-07-06 Radiation sensitive composite

Country Status (1)

Country Link
JP (1) JPS5417015A (cs)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5677843A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
JPS5869217A (ja) * 1981-10-22 1983-04-25 Japan Synthetic Rubber Co Ltd 感光性シリコ−ン樹脂組成物
US4588671A (en) * 1981-12-21 1986-05-13 Institut Khimii Akademii Nauk Sssr Photo and electron resist with donor-acceptor complex and light sensitive compound
JPH0656491B2 (ja) * 1983-07-20 1994-07-27 日立化成工業株式会社 感光性シリコ−ン樹脂組成物
JP2651725B2 (ja) * 1988-11-18 1997-09-10 キヤノン株式会社 感光性樹脂組成物、感光体及びそれを使用する体積位相型ホログラムの製造方法

Also Published As

Publication number Publication date
JPS5417015A (en) 1979-02-08

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