JPS61160933A - 現像処理装置 - Google Patents
現像処理装置Info
- Publication number
- JPS61160933A JPS61160933A JP60001170A JP117085A JPS61160933A JP S61160933 A JPS61160933 A JP S61160933A JP 60001170 A JP60001170 A JP 60001170A JP 117085 A JP117085 A JP 117085A JP S61160933 A JPS61160933 A JP S61160933A
- Authority
- JP
- Japan
- Prior art keywords
- waste
- exhaust
- piping
- development processing
- trap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60001170A JPS61160933A (ja) | 1985-01-08 | 1985-01-08 | 現像処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60001170A JPS61160933A (ja) | 1985-01-08 | 1985-01-08 | 現像処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61160933A true JPS61160933A (ja) | 1986-07-21 |
| JPH045259B2 JPH045259B2 (2) | 1992-01-30 |
Family
ID=11493958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60001170A Granted JPS61160933A (ja) | 1985-01-08 | 1985-01-08 | 現像処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61160933A (2) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63168025A (ja) * | 1986-12-29 | 1988-07-12 | Tokyo Electron Ltd | 現像方法 |
| US5088922A (en) * | 1990-01-23 | 1992-02-18 | Tokyo Electron Sagami Limited | Heat-treatment apparatus having exhaust system |
| JP2002187249A (ja) * | 2000-12-19 | 2002-07-02 | Think Laboratory Co Ltd | グラビア印刷用被製版ロールの製作・リサイクル処理・製版をマルチに行う方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5666044A (en) * | 1979-11-05 | 1981-06-04 | Toshiba Corp | Semiconductor device |
| JPS5850738A (ja) * | 1981-09-21 | 1983-03-25 | Toshiba Corp | レジストの塗布及び現像装置 |
| JPS614576A (ja) * | 1984-06-15 | 1986-01-10 | Hoya Corp | スプレ−方法 |
-
1985
- 1985-01-08 JP JP60001170A patent/JPS61160933A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5666044A (en) * | 1979-11-05 | 1981-06-04 | Toshiba Corp | Semiconductor device |
| JPS5850738A (ja) * | 1981-09-21 | 1983-03-25 | Toshiba Corp | レジストの塗布及び現像装置 |
| JPS614576A (ja) * | 1984-06-15 | 1986-01-10 | Hoya Corp | スプレ−方法 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63168025A (ja) * | 1986-12-29 | 1988-07-12 | Tokyo Electron Ltd | 現像方法 |
| US5088922A (en) * | 1990-01-23 | 1992-02-18 | Tokyo Electron Sagami Limited | Heat-treatment apparatus having exhaust system |
| JP2002187249A (ja) * | 2000-12-19 | 2002-07-02 | Think Laboratory Co Ltd | グラビア印刷用被製版ロールの製作・リサイクル処理・製版をマルチに行う方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH045259B2 (2) | 1992-01-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |