JPS61168736A - clean room - Google Patents

clean room

Info

Publication number
JPS61168736A
JPS61168736A JP60007525A JP752585A JPS61168736A JP S61168736 A JPS61168736 A JP S61168736A JP 60007525 A JP60007525 A JP 60007525A JP 752585 A JP752585 A JP 752585A JP S61168736 A JPS61168736 A JP S61168736A
Authority
JP
Japan
Prior art keywords
clean
air
room
clean room
ceiling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60007525A
Other languages
Japanese (ja)
Inventor
Nobuaki Sato
宣明 佐藤
Toshiyoshi Iino
飯野 利喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60007525A priority Critical patent/JPS61168736A/en
Publication of JPS61168736A publication Critical patent/JPS61168736A/en
Pending legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Ventilation (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本・発明は、半導体の製造などで必要とする清浄な作業
環境を作り出すためのクリーンルームに係り、特にクリ
ーンルーム内で発生した微粒子も室内に滞留することな
く、速やかに室外へ除去するのに好適なりリーンルーム
に関する。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a clean room for creating a clean working environment necessary for semiconductor manufacturing, etc., and particularly to a clean room in which particulates generated in the clean room also remain inside the room. Relating to lean rooms, it is suitable for rapid removal outside the room without any problems.

〔発明の背景〕[Background of the invention]

クリーンルーム内で発生した塵埃を製品から遠ざける方
法として1例えば特開昭58−129125号公報に示
されるように、作業部の清浄気漣の平均風速を通路部の
清浄気流の平均流速以上に保ち、通路部で発生した塵埃
が作業部へ拡散しないような気流の分布とするものが知
られている。しかし。
As a method for keeping dust generated in a clean room away from products, for example, as shown in Japanese Unexamined Patent Publication No. 58-129125, the average velocity of the clean air in the working area is kept higher than the average velocity of the clean air in the passage, It is known that the airflow is distributed so that dust generated in the passage does not spread to the working part. but.

この方法では作業部で発生した塵埃については、2九を
作業部から除去する手段について配慮されていなかった
。
In this method, no consideration was given to a means for removing dust generated in the working part from the working part.

まず、従来半導体製造工程に用いられていたクリーンル
ームの代表的な例である全面ダウンフロ一方式クリーン
ルームを第1図に示す。1は建屋、2はクリーンルーム
室内、3は高性能フィルタ、4は照明灯、5は整流格子
、6は法条孔板、7は側壁、8は空調用給気ダクト、9
は空調用戻りダクト、10は露光、エツチング、拡散、
メタライズ等の作業用機器、11は作業用機器を設置し
た作業部である。図中矢印で示すように高性能フィルタ
3で処理された清浄空気は天井全面より室内2に吹き出
し、室内空気は床下を通って排出される。これにより、
室内全体をほぼ一様な清浄度に維持し、全工程の作業を
この清浄雰囲気中で行えるようにしている。
First, FIG. 1 shows a full-scale down-flow clean room, which is a typical example of a clean room conventionally used in semiconductor manufacturing processes. 1 is a building, 2 is a clean room interior, 3 is a high-performance filter, 4 is a lighting lamp, 5 is a rectifier grid, 6 is a vertical hole plate, 7 is a side wall, 8 is an air conditioning supply duct, 9
10 is the air conditioning return duct, 10 is the exposure, etching, diffusion,
Work equipment for metallization, etc. 11 is a work section in which work equipment is installed. As shown by arrows in the figure, clean air processed by the high-performance filter 3 is blown out into the room 2 from the entire surface of the ceiling, and the room air is exhausted through the floor. This results in
The entire room is maintained at a nearly uniform level of cleanliness, allowing all processes to be carried out in this clean atmosphere.

しかし、全面ダウンフロ一方式クリーンルームでは設備
費および維持費が高いので、最近クリーントンネル方式
と呼ばれるクリーンルームも用いられるようになってき
た。第2図はクリーントンネル方式のクリーンルームの
長手方向に垂直な断面図である。支柱12と横梁13と
で門形フレームを組み、これに天板14と両側の側板1
5を張ってトンネル状覆いを構成し、このトンネル状覆
いとそれを設置する床16とで囲まれたクリーンルーム
室内に作業用機器1oを設置する作業部11と作業者が
通行する通路部17とをトンネル状覆いの長手方向に連
続して設ける0作業部11の天井部には空気浄化要素で
ある送風機18゜19、送風チャンバ20,21、高性
能フィルタ22.23と照明灯4を収納し、その下部の
清浄空気吹き出し口に整流格子5を設置する。また、通
路部17の天井部空間には照明灯4を収納し、その下部
の清浄空気吹き出し口に整流格子5を設置する。
However, since equipment costs and maintenance costs are high for full-scale down-flow clean rooms, clean rooms called clean tunnel systems have recently come into use. FIG. 2 is a sectional view perpendicular to the longitudinal direction of a clean tunnel type clean room. A gate-shaped frame is assembled with the pillars 12 and cross beams 13, and a top plate 14 and side plates 1 on both sides are attached to this.
5 is stretched to form a tunnel-like cover, and the clean room is surrounded by this tunnel-like cover and a floor 16 on which it is installed, and includes a work section 11 where work equipment 1o is installed and a passage section 17 through which workers pass. The ceiling of the working section 11, which is provided continuously in the longitudinal direction of the tunnel-like cover, houses a blower 18, 19, blowing chambers 20, 21, high-performance filters 22, 23, and a lighting lamp 4, which are air purifying elements. , a rectifying grid 5 is installed at the clean air outlet at the bottom thereof. Further, a lighting lamp 4 is housed in the ceiling space of the passage section 17, and a rectifying grid 5 is installed at the clean air outlet at the bottom thereof.

送風機18.19の運転により、外部空気はプレフィル
タ24を通して空気吸込み口25から吸込まれる0作業
部用送風機18から送風チャンバ20へ送り出された空
気は作業部用高性能フィルタ22により清浄化された後
、作業部天井から室内め作業部11へ吹き出し、また、
通路部用送風機19から送風チャンバ21へ送り出され
た空気は通路部用高性能フィルタ23により清浄化され
た後、通路部天井から室内の通路部17へ吹き出す、整
流格子5は清浄気流の整流と照明の散光のために設けら
れたものである。
By operating the blowers 18 and 19, external air passes through the pre-filter 24 and is sucked in from the air suction port 25.0 The air sent from the work section blower 18 to the blow chamber 20 is purified by the high performance filter 22 for the work section. After that, the air blows out from the ceiling of the working area to the indoor working area 11, and
The air sent from the passage blower 19 to the air blowing chamber 21 is purified by the passage high-performance filter 23 and then blown out from the passage ceiling to the indoor passage 17. The rectifier grid 5 rectifies the clean air flow. It is provided for the purpose of scattering the light.

天井面から吹き出された清浄気流は図の矢印で示すよう
に室内を流れ、両側の側板15の下部に設けた側面排気
口26から外部の保全域27へ排出される。室内圧力は
保全域27の圧力より高く保たれているため、保全域2
7からの汚染空気が室内へ流入しない。
The clean air flow blown from the ceiling surface flows through the room as shown by the arrows in the figure, and is discharged to the outside conservation area 27 from side exhaust ports 26 provided at the lower part of the side panels 15 on both sides. Since the indoor pressure is kept higher than the pressure in conservation area 27, conservation area 2
Contaminated air from 7 does not flow into the room.

第3図にはモジュール化したクリーントンネルを多数連
結したクリーンルームの外観を示す。
Figure 3 shows the appearance of a clean room with a large number of modular clean tunnels connected together.

しかし、これらの方式によるクリーンルームの共通な欠
点は、天井部に取り付けた高性能フィルタ3,22.2
3間および高性能フィルタ3゜22.23と側壁7ある
いは側板15との間には′清浄空気を吹き出さない天井
部分が生じることである。この部分では空気が滞留して
おり、もし。
However, a common drawback of clean rooms using these methods is that high-performance filters installed on the ceiling3,22.2
3 and between the high-performance filter 3°22.23 and the side wall 7 or side plate 15, there is a ceiling portion from which clean air is not blown out. Air stagnates in this part, and if...

作業者がクリーンルーム内において発塵した場合には塵
埃がこの空気が滞留した部分に入り、ある時間の後に重
力沈降あるいは外乱のために塵埃は作業部11へ流れ込
み、製品に付着し、不良品を発生させる原因となる。そ
こで、クリーンルームを清浄に保つ手段である清浄空気
の流れに乱れが生じ難く、また、外乱のため乱れが生じ
た場合にも速やかに定常状態の気流に戻るような気流を
実現させる必要がある。このような気流を得るためには
前述した従来のクリーンルームの空気が滞留した部分を
除かなければならない。
When a worker generates dust in a clean room, the dust enters the area where the air is stagnant, and after a certain period of time, due to gravity settling or disturbance, the dust flows into the work area 11 and adheres to the product, causing defective products. cause it to occur. Therefore, it is necessary to realize an airflow that is difficult to cause turbulence in the flow of clean air, which is a means of keeping a clean room clean, and that even if turbulence occurs due to external disturbances, the airflow quickly returns to a steady state. In order to obtain such an airflow, it is necessary to remove the portions of the conventional clean room where air stagnates.

〔発明の目的〕[Purpose of the invention]

従って、本発明の目的は作業者が作業部において、気流
を乱し、発塵した場合にもクリーンルーム内の気流が速
やかにその定常状態に戻り、塵埃が滞留することなく速
やかに作業部から除去されるような気流を実現するクリ
ーンルームを提供することにある。
Therefore, the purpose of the present invention is to quickly return the airflow in the clean room to a steady state even if a worker disturbs the airflow and generates dust in the work area, so that the dust is quickly removed from the work area without accumulating. The goal is to provide a clean room that achieves the same airflow as possible.

〔発明の概要〕[Summary of the invention]

本発明は側壁と、空気浄化要素を内蔵する天井と゛、こ
れらを設置する床面とで囲まれた室内に作業用機器を設
置する作業部と作業者が通行する通路部を備え、空気浄
化要素を通して天井より清浄空気を吹き出し、室内を浄
化するようにしたクリーンルームにおいて、空気浄化要
素を内蔵する天井の清浄空気の吹き出し部にこの清浄空
気を整流する整流体を設けたもので、従来のクリーンル
ームにおいて滞留の生じない気流とし、同時にクリーン
ルーム内の清浄空気の流れを乱れの生じ灘いものとする
ことにより、作業部で発生した塵埃も速やかに作業部か
ら除去し、高清浄度を保つクリーンルームを実現するよ
うにしたものである。
The present invention has a working section in which work equipment is installed and a passage section through which workers pass, in a room surrounded by a side wall, a ceiling containing an air purifying element, and a floor surface on which these are installed, and an air purifying element. In a clean room that purifies the room by blowing clean air out from the ceiling through the ceiling, a flow rectifier is installed at the clean air outlet in the ceiling that contains an air purification element to rectify the clean air. By creating an airflow that does not cause stagnation and at the same time creating a turbulent flow of clean air within the clean room, dust generated in the work area is quickly removed from the work area, creating a clean room that maintains a high level of cleanliness. It was designed to do so.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を第4図により説明する。第4
図は、第1図に示した全面ダウンフロ一方式クリーンル
ームに本発明を実施した例である。
An embodiment of the present invention will be described below with reference to FIG. Fourth
The figure shows an example in which the present invention is implemented in the one-sided down-flow clean room shown in FIG. 1.

本発明の整流体28を空気清浄要素である高性能フィル
タ3間に相当する位置の整流格子5に取り付ける。第5
図は本発明の整流体28を含む清浄空気吹き出し部の詳
細図である。第5図に示すように高性能フィルタ3間で
は本発明の整流体28を2枚向い合わせた構造とし、高
性能フィルタ3と側壁7との間では整流体28を1枚図
示のように設置する。このとき、整流格子5上での本発
明の整流体28の幅は、大略、高性能フィルタ3間では
その間隔、また、高性能フィルタ3と側壁7との間では
その間隔とする。整流体28をこのように配置すれば、
整流体28は流体機械におけるディフューザと同じ作用
をし、高性能フィルタ3から吹き出した清浄空気をうす
を生じることなく滑らかにクリーンルーム全体に一様に
広げることができる。
The rectifying fluid 28 of the present invention is attached to the rectifying grid 5 at a position corresponding to between the high-performance filters 3, which are air purifying elements. Fifth
The figure is a detailed view of the clean air blowing section including the flow regulator 28 of the present invention. As shown in FIG. 5, between the high-performance filters 3, two flow regulators 28 of the present invention are arranged facing each other, and between the high-performance filters 3 and the side wall 7, one flow regulator 28 is installed as shown in the figure. do. At this time, the width of the rectifying fluid 28 of the present invention on the rectifying grid 5 is approximately the same as the spacing between the high-performance filters 3, and the same as the spacing between the high-performance filter 3 and the side wall 7. If the rectifying fluid 28 is arranged in this way,
The flow regulator 28 has the same function as a diffuser in a fluid machine, and can smoothly and uniformly spread the clean air blown out from the high-performance filter 3 throughout the clean room without creating a thin layer.

本発明の整流体28を用いれば、整流格子5から吹き出
された清浄空気の流れは第4図および第5図の矢印のよ
うになり、従来のクリーンルームの清浄空気吹き出し部
で生じる空気滞留部をなくすことができる。したがって
、室内で発生した塵埃を室内に留めることなく、塵埃を
気流とともに速やかに作業用機器10あるいは製品から
遠ざけることができる。また、室内に空気の滞留する部
分がないので、作業者の移動などにより気流が乱された
場合でも速やかに定常の気流状態に復帰でき、乱れの生
じ難い気流を実現できる。
If the flow straightener 28 of the present invention is used, the flow of clean air blown out from the straightener grid 5 will be as shown by the arrows in FIGS. It can be eliminated. Therefore, the dust generated indoors can be quickly moved away from the work equipment 10 or the product along with the airflow without being trapped inside the room. Furthermore, since there is no part of the room where air stagnates, even if the airflow is disturbed due to the movement of a worker, it can quickly return to a steady airflow state, and an airflow that is less likely to be disturbed can be realized.

第5図は、また、第2図および第3図に示したクリーン
トンネル方式のクリーンルームに本発明を実施した例と
も考えることができる。すなわち、第3図において長手
方向の断面をとると1作業部11の高性能フィルタ22
あるいは通路部17の高性能フィルタ23にはそれぞれ
のフィルタ間に吹き出しのない部分があり、ここに、第
1図に示した全面ダウンフロ一方式クリーンルームに実
施したときと同じように本発明の整流体28を適用でき
るからである。
FIG. 5 can also be considered as an example in which the present invention is implemented in the clean tunnel type clean room shown in FIGS. 2 and 3. That is, if you take a cross section in the longitudinal direction in FIG.
Alternatively, the high-performance filters 23 in the passage section 17 have a part without blowouts between the respective filters, and here the rectifying fluid of the present invention is applied in the same way as when implemented in the all-down flow one-type clean room shown in FIG. This is because 28 can be applied.

第6図は他の実施例を示す、この実施例では本発明によ
る整流体28を曲線で構成し、先の実施例と同じく高性
能フィルタ3間あるいは高性能フィルタ3と側壁7との
間に適用している。この実施例では整流格子5を出た清
浄空気はまず整流体28に沿って下方向へ流れ1次第に
横方向に一様に広がった後、隣接する高性能フィルタ3
からの清浄空気の流れと合流し、全面に一様な下方向の
気流を実現する。
FIG. 6 shows another embodiment. In this embodiment, the rectifier 28 according to the present invention is constructed with a curved line, and as in the previous embodiment, between the high-performance filters 3 or between the high-performance filters 3 and the side wall 7. Applied. In this embodiment, the clean air that has exited the rectifier grid 5 first flows downward along the rectifier 28 1 and then spreads uniformly in the horizontal direction, and then passes through the adjacent high-performance filter 3
It merges with the flow of clean air from above, creating a uniform downward airflow over the entire surface.

第7図はさらに他の実施例を示す、この実施例でも本発
明による整流体28を曲線で構成しているが、第6図の
実施例とは異なり、整流格子5を出た清浄空気は整流体
28の前半で横方向の拡散をほぼ終え、整流体28を離
れるときには一様な下方向の気流を実現することができ
る。
FIG. 7 shows yet another embodiment. In this embodiment as well, the rectifier 28 according to the present invention is constructed with a curved line, but unlike the embodiment shown in FIG. The lateral diffusion is almost completed in the first half of the regulating fluid 28, and a uniform downward airflow can be realized when leaving the regulating fluid 28.

第8図はさらに他の実施例を示す、この実施例では本発
明による整流体28を高性能フィルタ3の清浄空気吹き
出し部に直接取り付け、高性能フィルタ3から吹き出し
た気流を直ちに下方向の一様流に整流している。
FIG. 8 shows yet another embodiment. In this embodiment, a flow regulator 28 according to the present invention is directly attached to the clean air outlet of the high-performance filter 3, and the airflow blown from the high-performance filter 3 is immediately directed downward. It's flowing smoothly.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、従来のクリーンルームでは高性能フィ
ルタから吹き出した空気が高性能フィルタ間の吹き出し
のない部分に巻き込むことで生じていたうずが生じなく
なるので、クリーンルーム内では滞留のない気流を得る
ことができ1作業部で発生した塵埃も速やかに作業部か
ら除去し、室内の高清浄度を保つことができる効果があ
る。
According to the present invention, the turbulence that occurs in conventional clean rooms when the air blown out from high-performance filters gets caught in the non-blown parts between high-performance filters is no longer generated, so airflow without stagnation can be obtained in the clean room. This has the effect of quickly removing dust generated in the working area from the working area and maintaining a high level of cleanliness in the room.

また、本発明は0.1μm粒子等の重力沈降が期待でき
ない超微粒子を除去対象とした超LSIの製造用クリー
ンルームなどの超クリーンな環境の清浄化に特に効果が
ある。
Furthermore, the present invention is particularly effective in cleaning ultra-clean environments such as clean rooms for manufacturing ultra-LSIs, where ultrafine particles such as 0.1 μm particles that cannot be expected to settle due to gravity are removed.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の全面ダウンフロ一方式のクリーンルーム
の縦断面図、第2図はクリーントンネル方式のクリーン
ルームの断面図、第3図はクリーントンネル方式のクリ
ーンルームの外観斜視図。 第4図は本発明を第1図のクリーンルームに実施した一
例を示す縦断面図、第51i2Jは第4図の吹き出し部
の詳細断面図、第6図および第7図はそれぞれ本発明の
整流体を曲線で構成した一例を示す詳細断面図、第8図
は本発明を高性能フィルタの吹き出し部に直接実施した
例を示す詳細断面図である。 3・・・高性能フィルタ、5・・・整流格子、6・・・
法条孔板、7・・・側壁、10・・・作業用機器、11
・・・作業部。 14・・・天板、15・・・側板、16・・・床、17
・・・通路部、18.19・・・送風機、20.21・
・・送風チャンバ、22.23・・・高性能フィルタ、
24・・・プレフィルタ、26・・・側面排気口、28
・・・整流体。
Fig. 1 is a vertical sectional view of a conventional all-down flow type clean room, Fig. 2 is a sectional view of a clean tunnel type clean room, and Fig. 3 is an external perspective view of a clean tunnel type clean room. FIG. 4 is a longitudinal sectional view showing an example of the present invention implemented in the clean room of FIG. 1, FIG. 51i2J is a detailed sectional view of the blow-off part of FIG. FIG. 8 is a detailed cross-sectional view showing an example in which the present invention is implemented directly in a blow-out portion of a high-performance filter. 3... High performance filter, 5... Rectifier grid, 6...
Law hole plate, 7... Side wall, 10... Work equipment, 11
...Working department. 14...Top plate, 15...Side plate, 16...Floor, 17
...Aisle section, 18.19...Blower, 20.21.
...Blow chamber, 22.23...High performance filter,
24... Pre-filter, 26... Side exhaust port, 28
...Fluid regulation.

Claims (1)

【特許請求の範囲】 1、側壁と、空気浄化要素を内蔵する天井と、これらを
設置する床面とで囲まれた室内に、作業用機器を設置す
る作業部と作業者が通行する通路部を備え、前記空気浄
化要素を通して天井より清浄空気を吹き出し、前記室内
を浄化するようにしたクリーンルームにおいて、前記空
気浄化要素を内蔵する天井の清浄空気の吹き出し部に該
清浄空気を整流する整流体を設けたことを特徴とするク
リーンルーム。 2、特許請求の範囲第1項において、前記整流体は前記
空気浄化要素間の清浄空気の吹き出し部に設置すること
を特徴とするクリーンルーム。 3、特許請求の範囲第1項において、前記整流体は前記
空気浄化要素を内蔵する天井と前記側壁との間の清浄空
気の吹き出し部に設置したことを特徴とするクリーンル
ーム。
[Claims] 1. A working section where work equipment is installed and a passageway section through which workers pass, in a room surrounded by a side wall, a ceiling containing an air purifying element, and a floor surface on which these are installed. In a clean room that purifies the room by blowing clean air from the ceiling through the air purification element, a rectifying fluid for rectifying the clean air is provided in a clean air blowing part of the ceiling in which the air purification element is built. A clean room with the following features: 2. The clean room according to claim 1, wherein the flow regulator is installed at a clean air outlet between the air purification elements. 3. The clean room according to claim 1, wherein the flow regulator is installed in a clean air outlet between the ceiling containing the air purification element and the side wall.
JP60007525A 1985-01-21 1985-01-21 clean room Pending JPS61168736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60007525A JPS61168736A (en) 1985-01-21 1985-01-21 clean room

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60007525A JPS61168736A (en) 1985-01-21 1985-01-21 clean room

Publications (1)

Publication Number Publication Date
JPS61168736A true JPS61168736A (en) 1986-07-30

Family

ID=11668193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60007525A Pending JPS61168736A (en) 1985-01-21 1985-01-21 clean room

Country Status (1)

Country Link
JP (1) JPS61168736A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6391441A (en) * 1986-10-02 1988-04-22 Takenaka Komuten Co Ltd Clean room with complete laminar flow
JPH0972587A (en) * 1995-09-08 1997-03-18 Shin Nippon Kucho Kk Air stream control structure in clean room
US6110244A (en) * 1994-10-22 2000-08-29 Howorth Airtech Limited Clean air system
KR20180049289A (en) * 2016-10-31 2018-05-11 삼성전자주식회사 Substrate transferring apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6391441A (en) * 1986-10-02 1988-04-22 Takenaka Komuten Co Ltd Clean room with complete laminar flow
US6110244A (en) * 1994-10-22 2000-08-29 Howorth Airtech Limited Clean air system
JPH0972587A (en) * 1995-09-08 1997-03-18 Shin Nippon Kucho Kk Air stream control structure in clean room
KR20180049289A (en) * 2016-10-31 2018-05-11 삼성전자주식회사 Substrate transferring apparatus

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