JPS61203419A - 反射縮小投影光学系 - Google Patents

反射縮小投影光学系

Info

Publication number
JPS61203419A
JPS61203419A JP60044123A JP4412385A JPS61203419A JP S61203419 A JPS61203419 A JP S61203419A JP 60044123 A JP60044123 A JP 60044123A JP 4412385 A JP4412385 A JP 4412385A JP S61203419 A JPS61203419 A JP S61203419A
Authority
JP
Japan
Prior art keywords
optical system
refractive
aplanatic
curvature
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60044123A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562722B2 (2
Inventor
Koichi Matsumoto
宏一 松本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP60044123A priority Critical patent/JPS61203419A/ja
Publication of JPS61203419A publication Critical patent/JPS61203419A/ja
Priority to US07/171,169 priority patent/US4812028A/en
Publication of JPH0562722B2 publication Critical patent/JPH0562722B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60044123A 1984-07-23 1985-03-06 反射縮小投影光学系 Granted JPS61203419A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60044123A JPS61203419A (ja) 1985-03-06 1985-03-06 反射縮小投影光学系
US07/171,169 US4812028A (en) 1984-07-23 1988-03-21 Reflection type reduction projection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60044123A JPS61203419A (ja) 1985-03-06 1985-03-06 反射縮小投影光学系

Publications (2)

Publication Number Publication Date
JPS61203419A true JPS61203419A (ja) 1986-09-09
JPH0562722B2 JPH0562722B2 (2) 1993-09-09

Family

ID=12682824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60044123A Granted JPS61203419A (ja) 1984-07-23 1985-03-06 反射縮小投影光学系

Country Status (1)

Country Link
JP (1) JPS61203419A (2)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61204935A (ja) * 1985-03-07 1986-09-11 Seiko Epson Corp 反射縮小投影露光装置
KR20180064306A (ko) 2016-12-05 2018-06-14 캐논 가부시끼가이샤 카타디옵트릭 광학계, 조명 광학계, 노광 장치 및 물품 제조 방법

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61204935A (ja) * 1985-03-07 1986-09-11 Seiko Epson Corp 反射縮小投影露光装置
KR20180064306A (ko) 2016-12-05 2018-06-14 캐논 가부시끼가이샤 카타디옵트릭 광학계, 조명 광학계, 노광 장치 및 물품 제조 방법
JP2021113998A (ja) * 2016-12-05 2021-08-05 キヤノン株式会社 カタディオプトリック光学系、照明光学系、露光装置および物品製造方法

Also Published As

Publication number Publication date
JPH0562722B2 (2) 1993-09-09

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term