JPS61203542U - - Google Patents
Info
- Publication number
- JPS61203542U JPS61203542U JP8682985U JP8682985U JPS61203542U JP S61203542 U JPS61203542 U JP S61203542U JP 8682985 U JP8682985 U JP 8682985U JP 8682985 U JP8682985 U JP 8682985U JP S61203542 U JPS61203542 U JP S61203542U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- etched
- introduction pipe
- mounting shelf
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001312 dry etching Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 3
- 230000005284 excitation Effects 0.000 claims 1
- 238000005192 partition Methods 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8682985U JPS61203542U (2) | 1985-06-11 | 1985-06-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8682985U JPS61203542U (2) | 1985-06-11 | 1985-06-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61203542U true JPS61203542U (2) | 1986-12-22 |
Family
ID=30638487
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8682985U Pending JPS61203542U (2) | 1985-06-11 | 1985-06-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61203542U (2) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997015073A1 (en) * | 1995-10-17 | 1997-04-24 | Asm Japan K.K. | Semiconductor treatment apparatus |
-
1985
- 1985-06-11 JP JP8682985U patent/JPS61203542U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997015073A1 (en) * | 1995-10-17 | 1997-04-24 | Asm Japan K.K. | Semiconductor treatment apparatus |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0722151B2 (ja) | エツチングモニタ−方法 | |
| JPS61203541U (2) | ||
| JPS61192446U (2) | ||
| JPS63127125U (2) | ||
| JPS6273542U (2) | ||
| JPH0224535U (2) | ||
| JPS63153527U (2) | ||
| JPH01125357U (2) | ||
| JP2657954B2 (ja) | ウエハ真空乾燥装置 | |
| JPS6418727U (2) | ||
| JPS62167359U (2) | ||
| JPS6163833U (2) | ||
| JPH0425230U (2) | ||
| JPH0374665U (2) | ||
| JPH0399762U (2) | ||
| JPS61196528U (2) | ||
| JPS6120561U (ja) | 真空成膜装置 | |
| JPH0423130U (2) | ||
| JPS64326U (2) | ||
| JPH01118400U (2) | ||
| JPS6384866U (2) | ||
| JPS6123257U (ja) | 質量分析装置等用イオン源 | |
| JPS6018541U (ja) | 気相成長装置 | |
| JPS62188138U (2) | ||
| JPS63147815U (2) |