JPS61222010A - 平坦化方法 - Google Patents

平坦化方法

Info

Publication number
JPS61222010A
JPS61222010A JP60062500A JP6250085A JPS61222010A JP S61222010 A JPS61222010 A JP S61222010A JP 60062500 A JP60062500 A JP 60062500A JP 6250085 A JP6250085 A JP 6250085A JP S61222010 A JPS61222010 A JP S61222010A
Authority
JP
Japan
Prior art keywords
resist
insulating layer
etching
ion
incidence angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60062500A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0546612B2 (da
Inventor
Satoshi Yoshida
敏 吉田
Shigeru Kamioka
尉 上岡
Yoshiaki Kato
吉明 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP60062500A priority Critical patent/JPS61222010A/ja
Priority to US06/843,416 priority patent/US4662985A/en
Publication of JPS61222010A publication Critical patent/JPS61222010A/ja
Publication of JPH0546612B2 publication Critical patent/JPH0546612B2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells

Landscapes

  • Magnetic Heads (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP60062500A 1985-03-27 1985-03-27 平坦化方法 Granted JPS61222010A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60062500A JPS61222010A (ja) 1985-03-27 1985-03-27 平坦化方法
US06/843,416 US4662985A (en) 1985-03-27 1986-03-24 Method of smoothing out an irregular surface of an electronic device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60062500A JPS61222010A (ja) 1985-03-27 1985-03-27 平坦化方法

Publications (2)

Publication Number Publication Date
JPS61222010A true JPS61222010A (ja) 1986-10-02
JPH0546612B2 JPH0546612B2 (da) 1993-07-14

Family

ID=13201946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60062500A Granted JPS61222010A (ja) 1985-03-27 1985-03-27 平坦化方法

Country Status (1)

Country Link
JP (1) JPS61222010A (da)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63188812A (ja) * 1987-01-30 1988-08-04 Matsushita Electric Ind Co Ltd 薄膜磁気ヘツドの製造方法
JPH01230254A (ja) * 1988-03-10 1989-09-13 Sanyo Electric Co Ltd 平坦化方法
JP2007511918A (ja) * 2003-11-18 2007-05-10 エフ　イー　アイ　カンパニ 構造部のミル処理断面の局部的変化を制御する方法および装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59104718A (ja) * 1982-12-08 1984-06-16 Comput Basic Mach Technol Res Assoc 薄膜磁気ヘツドの製造方法
JPS59112416A (ja) * 1982-12-20 1984-06-28 Nippon Telegr & Teleph Corp <Ntt> 薄膜ヘツドの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59104718A (ja) * 1982-12-08 1984-06-16 Comput Basic Mach Technol Res Assoc 薄膜磁気ヘツドの製造方法
JPS59112416A (ja) * 1982-12-20 1984-06-28 Nippon Telegr & Teleph Corp <Ntt> 薄膜ヘツドの製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63188812A (ja) * 1987-01-30 1988-08-04 Matsushita Electric Ind Co Ltd 薄膜磁気ヘツドの製造方法
JPH01230254A (ja) * 1988-03-10 1989-09-13 Sanyo Electric Co Ltd 平坦化方法
JP2007511918A (ja) * 2003-11-18 2007-05-10 エフ　イー　アイ　カンパニ 構造部のミル処理断面の局部的変化を制御する方法および装置
US8163145B2 (en) 2003-11-18 2012-04-24 Fei Company Method and apparatus for controlling topographical variation on a milled cross-section of a structure
US9852750B2 (en) 2003-11-18 2017-12-26 Fei Company Method and apparatus for controlling topographical variation on a milled cross-section of a structure

Also Published As

Publication number Publication date
JPH0546612B2 (da) 1993-07-14

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