JPS6123280B2 - - Google Patents

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Publication number
JPS6123280B2
JPS6123280B2 JP57061547A JP6154782A JPS6123280B2 JP S6123280 B2 JPS6123280 B2 JP S6123280B2 JP 57061547 A JP57061547 A JP 57061547A JP 6154782 A JP6154782 A JP 6154782A JP S6123280 B2 JPS6123280 B2 JP S6123280B2
Authority
JP
Japan
Prior art keywords
chromic acid
treatment
chromium
bath
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57061547A
Other languages
Japanese (ja)
Other versions
JPS58177490A (en
Inventor
Hideo Kobayashi
Hajime Ogata
Shunichi Tsugawa
Toshiro Ichida
Shunichi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP6154782A priority Critical patent/JPS58177490A/en
Publication of JPS58177490A publication Critical patent/JPS58177490A/en
Publication of JPS6123280B2 publication Critical patent/JPS6123280B2/ja
Granted legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は金属クロム被膜とクロム水和酸化物被
膜との密着性およびクロム水和酸化物被膜と塗料
との密着性に優れたレトルト処理用テインフリー
鋼板の製造方法に関するものである。 従来の二液方式は、金属クロムとクロム水和酸
化物被膜とを別々に析出させるので、それぞれの
析出量を容易にコントロールすることができる利
点があるが、二液方式においては両液の液組成が
異なるため、クロムめつき後の鋼板をそのまま電
解クロム酸処理浴に移すと、クロムめつき時に生
成したクロム水和酸化物中に共析しためつき助剤
アニオンが最終製品の被膜中に残存したり、鋼表
面に付着したクロムめつき液が電解クロム酸処理
浴中に持ち込まれ、クロム水和酸化物被膜の析出
量が変動したり、部分的に溶出した助剤アニオン
が再析出したりするなどの不都合が生ずる。従つ
て、クロムめつき後電解クロム酸処理浴に至るま
での間に水洗を十分に行なつてこれを防止する必
要があるが、クロムめつき後の水洗だけではクロ
ムめつき時に生成するクロム水和酸化物中のクロ
ムめつき助剤アニオンの除去が困難である。特
に、硫酸やその化合物を助剤とするクロムめつき
においては、その後のクロム酸溶液による電解ク
ロム酸処理を行なつても、最終的に生成したクロ
ム水和酸化物中に硫酸根が共析して塗膜との密着
性に不都合を生じている。 この欠点を解消する方法として、クロムめつき
後に該液中で逆電解を施すことによつてクロムめ
つき時に生成したクロム水和酸化物やこの中の助
剤アニオンを少なくすることができ、その後に電
解クロム酸処理浴に至るまでの間に水洗を十分に
行なつて引続くクロム酸水溶液中で電解クロム酸
を施すことが耐レトルト処理性の改善に極めて有
効であることを見い出し、既に特願昭56―62766
号(以後、原発明と称する)として提案してい
る。 ところが、その後研究を重ねたところ、原発明
は耐レトルト処理法の改善に極めて有効である
が、クロム水和酸化物被膜が不均一になる場合の
あることが判明し、この欠点を解決すべく研究を
重ねた結果均一なクロム水和酸化物被膜を得るこ
とができ、レトルト処理性がさらに改善されて本
発明に至つた。 本発明は冷延鋼板に片面20〜200mg/m2の金属
クロムめつきを施し、この金属クロム層表面に5
〜50mg/m2のクロム水和酸化物被膜を形成したテ
インフリー鋼板に関するものである。金属クロム
層は20mg/m2以下であるとマイクロクラツク、ピ
ンホールなどが多くなつて耐食性が劣り、また
200mg/m2より多くても耐食性の向上が望めない
ので、通常のクロムめつき鋼板は20〜200mg/m2
の金属クロム層を有している。 一方、水和クロム酸化物皮膜(以下、CrOX
膜という)が5mg/m2以下であると所望の塗料密
着性が望めず、また50mg/m2より多いと外観が悪
くなつたり、加工時にCrOX皮膜にクラツクが入
つたりして実用的でない。さらにいえば、CrOX
皮膜量は10〜30mg/m2が実用範囲であり、最も望
ましい。 テインフリー鋼板は塗装してはじめて食缶材料
となるものであり、食缶として用いる場合には塗
膜との密着性が特に重要である。この塗膜との密
着性および内容物充填後の耐レトルト処理性に優
れたテインフリー鋼板を得るために、硫酸または
その化合物などのアニオンを含む助剤を用いる汎
用クロムめつき浴によるクロムめつき後、この浴
中で0.1〜15クーロン/dm2の逆電解を施し、次
いで水洗槽を介してクロム酸水溶液中で電解クロ
ム酸処理を行う方法を原発明において提案してい
る。この方法により得られるテインフリー鋼板は
耐レトルト処理法の改善に極めて有効であるが、
この処理だけではCrOX皮膜が不均一になる場合
があるのは前述の通りである。 そこで、本発明においては、従来の如く脱脂酸
洗した鋼板に、硫酸やその化合物を助剤として含
むクロムめつき浴にてクロムめつきした後、この
浴中で逆電解を施し、クロムめつき時に生成した
CrOX皮膜中に共析したSO4 2-などの助剤アニオン
を低減させた後に、電解クロム酸処理を行うので
あるが、この処理を以下に述べるような条件下で
行うことを特長とする。 すなわち、電解クロム酸処理を施すに際して、
電解析出する皮膜構造が均一でかつ耐レトルト処
理性が良好なCrOX皮膜を得るために、不可避的
に不純物アニオンを含有する以外は助剤を意図的
に添加しないクロム酸水溶液の処理浴を用い、逆
電解で荒れたCrOX皮膜を均一に改質するために
施す電解クロム酸第1処理およびCrOX皮膜量を
確保するために施す電解クロム酸第2処理の2段
階に分けて同一処理浴あるいは別個の処理浴中で
電解クロム酸処理を施す。 本発明で用いるクロム酸処理水溶液の主剤は、
無水クロム酸、クロム酸塩および重クロム酸塩か
ら選択された少なくとも1種の化合物で構成さ
れ、主剤に由来する可避的不純物アニオンは含む
ものの助剤は意図的に添加されない。重クロム酸
塩としては重クロム酸のアルカリ金属塩、アルカ
リ土類金属塩、アンモニウム塩などが、またクロ
ム酸塩としてはクロム酸のアルカリ金属塩、アル
カリ土類金属塩、アンモニウム塩などが適当であ
るが、特に化合物の種類は限定されることはな
い。電解クロム酸水溶液浴のクロム酸と他の塩と
の組成は第1処理と第2処理において同一でも良
いし、電解条件等に応じて異ならせても良い。 不可避的に不純物を含むクロム酸水溶液の濃度
は特に限定される必要はないがCrO3換算で10〜
200g/の範囲が適当である。濃度が10g/
未満では浴の電気低抗が増大し、整流器の電圧が
オーバーしたり鋼板が熱をもつなどの不都合を生
じるので好ましくない。また、200g/を超し
ても所期の効果を向上をさほど期待できず、浴の
持出しによる経済的損失が大きいので望ましくな
い。このようなクロム酸処理浴の浴温は35〜60℃
が適当である。35℃より低いと夏場の冷却水温の
上昇により温度管理が難しくなり、60℃より高い
とクロム酸水溶液に耐える電解槽の材質が限定さ
れる。 クロムめつき後同液中で逆電解を施すと、クロ
ムめつき時に形成されたCrOX皮膜が溶解され、
この時同時にあるいは終了後に従前の陰極CrOX
皮膜と異質な陽極CrOX皮膜が金属クロム層上に
形成される。この皮膜形成により金属クロムの露
出が従前の陰極皮膜に比べて少ないことが明らか
になつているが、クロムめつきに用いる助剤の種
類および浴濃度ならびに逆電解条件によつては陽
極的に形成されたCrOX皮膜の一部に異常析出が
みられる場合がある。この皮膜の上に従来より行
われている二液方式における電解クロム酸処理を
施すと、耐レトルト処理性は良好だがCrOX皮膜
の異常析出が認められることがあつた。 これを回避する方法について助剤を意図的に添
加せず、不可避的不純物アニオンを含むクロム酸
水溶液につき種々の検討を行つたところ、まず最
初にクロム酸水溶液中で低電流密度および低電気
量で電解クロム酸第1処理を施すことが効果的で
あることがわかつた。 電解クロム酸処理時には、陰極において水の電
気分解によりH2ガスが発生し、陰極近傍のPHは
上昇する。これにに伴つて低原子価のクロムイオ
ンに水酸基や水分子が配位した重合度の高いオー
ル化合物が形成される。本発明では低電流密度か
つ低電気量でクロム酸第1処理を施すことによつ
てCrOX皮膜をできるだけ生成しないようにし、
かつ電解終了直後のクロム酸水溶液への溶解を促
進させるのでCrOX皮膜は薄く均一に形成され
る。 本発明による電解クロム酸第1処理は逆電解で
金属クロム上に形成された陽極CrOX皮膜が荒れ
た場合にCrOX皮膜を改質して均一にならしめる
ために施すものであり、CrOX皮膜量の増大を目
的とするものではない。電解時の陰極近傍のPHは
重クロム酸塩やクロム酸塩の組成が高まる程上昇
し、無水クロム酸のみの浴ではその反対である。
従つて、両者では電解時に形成されるCrOX皮膜
のオール結合の割合も異なり、電解時のCrOX
膜の溶解生成の繰り返しと電解終了直後の溶解挙
動も異なるが、いずれにおいても電解クロム酸第
1処理後形成されたCrOX皮膜は均一になつてい
る。 本発明における電解クロム酸第1処理の電解条
件は、0.1〜10A/dm2の低電流密度で、0.1〜10
クーロン/dm2の低電気量とするのが良い。電流
密度が0.1A/dm2未満では所期の目的が達せら
れず、10A/dm2を超えるとCrOX量の析出異常が
生じ不都合を生じることがある。また、電気量が
0.1クーロン/dm2未満では所期の目的が達せら
れず、10クーロン/dm2を超えるとCrOX量が過
多となり、析出異常を生じ不都合を生じることが
ある。 以上述べたように、電解クロム酸第1処理によ
り逆電解で荒れたCrOX皮膜が改質される。さら
に、本発明においては、クロム酸第1処理後に、
第1処理で用いたのと同組成または異組成の浴を
用いて以下に述べるような電解条件で電解クロム
酸第2処理を施すのが効果的である。 電解条件はCrOX皮膜量を確保するために必要
な電気量を与えるものであつて特に限定はない
が、電解クロム酸第2処理の電流密度は10〜
80A/dm2の範囲が良い。電流密度が10A/dm2
未満であると所望のCrOX皮膜量を確保するのに
電解時間が長すぎて実用的でなく、80A/dm2
超えるとCrOX皮膜の異常析出が生ずる場合があ
るからである。また、電解クロム酸第2処理の浴
組成は電解クロム酸第1処理液と同じでも良い
が、仮に第1処理浴がクロム酸塩や重クロム酸塩
の組成が大部分を占める場合には電解量が多量に
必要となるので、この場合には無水クロム酸の組
成の多い浴にする方が経済的に望ましい。 次に本発明による処理につき具体的に説明す
る。 板厚0.22mmの冷延鋼板を常法による脱脂、酸洗
の前処理を施した後に、CrO2250g/、
H2SO42.5g/を含有するクロムめつき浴で、
浴温55℃、電流密度60A/dm2で1.0秒の電解を
行つた。この時のCrOX皮膜のEPMAによるライ
ンアナリシスを第1図に示す。クロムめつき後直
ちに同液中で15A/dm2の電流密度で0.2秒間の
逆電解を施した。この時のCrOX皮膜のEPMAに
よるラインアナリシスを第2図に示す。 このクロムめつき鋼板を十分に水洗した後、
CrO250g/、Na2Cr2O710g/なる組成で、
不可避的な不純物アニオンを含む浴温40℃のクロ
ム酸水溶液中で5A/dm2の電流密度で0.2秒の電
解クロム酸第1処理を施した。この時のCrOX
膜のEPMAによるラインアナリシスを第3図に示
す。この第1処理後、無水クロム酸60g/を含
み、浴温40℃のクロム酸水溶液中で15A/dm2
電流密度で1.0秒の電解クロム酸第2処理を施し
た。この時のCrOX皮膜のEPMAによるラインア
ナリシスを第4図に示す。また、400倍の光学顕
微鏡写真を第6図に示す。比較として、クロムめ
つき後同液中で5秒浸漬後無水クロム酸60g/
を含み40℃のクロム酸浴中で15A/dm2×1.0秒
の電解クロム酸処理を施した時のCrOX皮膜の
EPMAによるラインアナリシスを第5図に、400
倍光学顕微鏡写真を第7図に示す。 ラインアナリシスの結果をみると、本発明の処
理を施した第3図および第4図に示すものは、ク
ロムめつき後のもの(第1図)、逆電解後のもの
(第2図)、従来の電解クロム酸処理後のもの(第
5図)に比べて、CrOXの異常析出が少なく、皮
膜が均一であることがわかる。また、顕微鏡写真
をみると、本発明によるもの(第6図)には
CrOX皮膜が均質でむらがないのが明瞭である
が、従来の電解クロム酸処理によるもの(第7
図)にはCrOX皮膜の不均一なむら(黒い斑点状
に見える)が多数生成しているのがわかる。 上記の本発明例および比較例につき、CrOX
膜のむらの判定および後述するようなT型剥離試
験結果を下表1に示す。
The present invention relates to a method for producing a stain-free steel sheet for retort treatment, which has excellent adhesion between a metallic chromium coating and a chromium hydrated oxide coating, and excellent adhesion between a chromium hydrated oxide coating and a paint. The conventional two-part method deposits metallic chromium and the hydrated chromium oxide film separately, so it has the advantage of being able to easily control the amount of each deposited. Because the compositions are different, if a steel plate after chromium plating is directly transferred to an electrolytic chromic acid treatment bath, the tanning aid anions eutectoid in the chromium hydrated oxide generated during chromium plating will be deposited in the coating of the final product. The chromium plating solution that remains or adheres to the steel surface may be brought into the electrolytic chromic acid treatment bath, causing fluctuations in the amount of chromium hydrated oxide film deposited, or re-precipitation of partially eluted auxiliary anions. This may cause inconveniences such as Therefore, it is necessary to thoroughly wash with water after chromium plating and before entering the electrolytic chromic acid treatment bath to prevent this, but washing with water after chrome plating alone will not remove the chromium water generated during chrome plating. It is difficult to remove the chromium plating aid anion in the oxide. In particular, in chromium plating using sulfuric acid or its compounds as an aid, even if electrolytic chromic acid treatment is performed using a chromic acid solution, sulfuric acid groups are eutectoid in the final chromium hydrated oxide. This causes problems in adhesion with the paint film. As a method to overcome this drawback, by performing reverse electrolysis in the solution after chromium plating, it is possible to reduce the chromium hydrated oxide produced during chromium plating and the auxiliary anions therein. We have found that thoroughly washing with water before entering the electrolytic chromic acid treatment bath and then applying electrolytic chromic acid in an aqueous chromic acid solution is extremely effective in improving retort resistance. Gansho 56-62766
(hereinafter referred to as the original invention). However, after repeated research, it was discovered that although the original invention is extremely effective in improving retort-resistant treatment methods, the chromium hydrated oxide film may become non-uniform. As a result of repeated research, it was possible to obtain a uniform chromium hydrated oxide film, and the retort processability was further improved, leading to the present invention. In the present invention, a cold-rolled steel sheet is plated with metallic chromium of 20 to 200 mg/ m2 on one side, and the surface of this metallic chromium layer is
This relates to a stain-free steel sheet with a chromium hydrated oxide coating of ~50 mg/m 2 . If the metallic chromium layer is less than 20mg/ m2 , there will be many microcracks and pinholes, resulting in poor corrosion resistance.
If the amount is more than 200 mg/m2, no improvement in corrosion resistance can be expected, so normal chrome-plated steel sheets are used at 20 to 200 mg/ m2.
It has a metallic chromium layer. On the other hand, if the amount of hydrated chromium oxide film (hereinafter referred to as Cr OX film) is less than 5 mg/m 2 , the desired paint adhesion cannot be expected, and if it is more than 50 mg/m 2 , the appearance may deteriorate or Cracks may appear in the Cr OX film, making it impractical. Furthermore, Cr OX
The coating amount is within the practical range of 10 to 30 mg/m 2 and is most desirable. A stain-free steel plate can only be used as a food can material after being painted, and when used as a food can, adhesion with the coating film is particularly important. In order to obtain a stain-free steel sheet with excellent adhesion to the coating film and resistance to retort treatment after filling, chrome plating is performed using a general-purpose chromium plating bath using an auxiliary agent containing anions such as sulfuric acid or its compounds. The original invention proposes a method in which reverse electrolysis is then carried out at 0.1 to 15 coulombs/dm 2 in this bath, and then electrolytic chromic acid treatment is carried out in an aqueous chromic acid solution via a water washing tank. The stain-free steel sheets obtained by this method are extremely effective in improving retort treatment methods, but
As mentioned above, this treatment alone may cause the Cr OX film to become non-uniform. Therefore, in the present invention, a conventionally degreased and pickled steel sheet is chromium plated in a chromium plating bath containing sulfuric acid or its compounds as an auxiliary agent, and then reverse electrolysis is performed in this bath to form a chrome plating layer. generated at the time
After reducing the auxiliary anions such as SO 4 2- that have eutectoided in the Cr OX film, electrolytic chromic acid treatment is performed, and the feature is that this treatment is performed under the conditions described below. . In other words, when performing electrolytic chromic acid treatment,
In order to obtain a Cr OX film with a uniform electrolytically deposited film structure and good retort treatment resistance, a treatment bath of a chromic acid aqueous solution was used in which no auxiliary agents were intentionally added, except for the unavoidable presence of impurity anions. The same treatment is divided into two stages: the first electrolytic chromic acid treatment is applied to uniformly modify the Cr OX film roughened by reverse electrolysis, and the second electrolytic chromic acid treatment is applied to ensure the amount of Cr OX film. Electrolytic chromic acid treatment is carried out in a bath or a separate treatment bath. The main ingredient of the chromic acid treatment aqueous solution used in the present invention is:
It is composed of at least one compound selected from chromic anhydride, chromate, and dichromate, and contains inevitable impurity anions derived from the base agent, but no auxiliary agent is intentionally added. Suitable dichromates include alkali metal salts, alkaline earth metal salts, and ammonium salts of dichromic acid, and suitable chromates include alkali metal salts, alkaline earth metal salts, and ammonium salts of chromic acid. However, the type of compound is not particularly limited. The composition of chromic acid and other salts in the electrolytic chromic acid aqueous solution bath may be the same in the first treatment and the second treatment, or may be different depending on the electrolytic conditions and the like. The concentration of the chromic acid aqueous solution that inevitably contains impurities does not need to be particularly limited, but it should be 10 to 10% in terms of CrO3 .
A range of 200g/ is appropriate. Concentration is 10g/
If it is less than this, the electrical resistance of the bath increases, causing problems such as overvoltage of the rectifier and heating of the steel plate, which is not preferable. Moreover, if the amount exceeds 200 g/l, it is not desirable to improve the desired effect much, and the economic loss due to taking out the bath will be large. The bath temperature of such a chromic acid treatment bath is 35 to 60℃.
is appropriate. If it is lower than 35°C, temperature control becomes difficult due to the rise in cooling water temperature in the summer, and if it is higher than 60°C, the materials for the electrolytic cell that can withstand the chromic acid aqueous solution are limited. When reverse electrolysis is performed in the same solution after chrome plating, the Cr OX film formed during chrome plating is dissolved.
At this time or after the previous cathode Cr OX
An anodic Cr OX film, which is foreign to the film, is formed on the metallic chromium layer. It has been revealed that the exposure of metallic chromium is less due to the formation of this film than in the conventional cathodic film, but depending on the type of auxiliary agent used for chromium plating, the bath concentration, and the reverse electrolytic conditions, the metal chromium may be formed anodically. Abnormal precipitation may be observed in some parts of the Cr OX film. When the conventional two-component electrolytic chromic acid treatment was performed on this film, the retort treatment resistance was good, but abnormal precipitation of the Cr OX film was sometimes observed. As for ways to avoid this, we conducted various studies on chromic acid aqueous solutions containing unavoidable impurity anions without intentionally adding auxiliary agents, and first of all, in chromic acid aqueous solutions with low current density and low electricity quantity. It was found that performing the first electrolytic chromic acid treatment was effective. During electrolytic chromic acid treatment, H 2 gas is generated by electrolysis of water at the cathode, and the pH near the cathode increases. Along with this, an ol compound with a high degree of polymerization is formed in which a hydroxyl group or a water molecule is coordinated with a low-valent chromium ion. In the present invention, the formation of a Cr OX film is minimized by performing the first chromic acid treatment with a low current density and a low amount of electricity.
In addition, since dissolution in the chromic acid aqueous solution is promoted immediately after electrolysis is completed, a thin and uniform Cr OX film is formed. The first electrolytic chromic acid treatment according to the present invention is carried out in order to modify and make the Cr OX film uniform when the anode Cr OX film formed on metal chromium becomes rough due to reverse electrolysis. It is not intended to increase the amount of film. The pH near the cathode during electrolysis increases as the composition of dichromate and chromate increases, and the opposite is true in a bath containing only chromic anhydride.
Therefore, the ratio of all bonds in the Cr OX film formed during electrolysis is different between the two, and the repetition of dissolution and formation of the Cr OX film during electrolysis and the dissolution behavior immediately after the end of electrolysis are also different, but in both cases, electrolytic chromic acid The Cr OX film formed after the first treatment is uniform. The electrolytic conditions for the first electrolytic chromic acid treatment in the present invention are a low current density of 0.1 to 10 A/ dm2 , and a
It is preferable to use a low amount of electricity of coulomb/dm 2 . If the current density is less than 0.1 A/dm 2 , the intended purpose cannot be achieved, and if it exceeds 10 A/dm 2 , abnormal precipitation of Cr OX may occur, resulting in inconvenience. Also, the amount of electricity
If it is less than 0.1 coulombs/dm 2 , the desired purpose cannot be achieved, and if it exceeds 10 coulombs/dm 2 , the amount of Cr OX becomes excessive, which may cause abnormal precipitation and cause problems. As described above, the first electrolytic chromic acid treatment modifies the Cr OX film that has become rough due to reverse electrolysis. Furthermore, in the present invention, after the first chromic acid treatment,
It is effective to perform the second electrolytic chromic acid treatment using a bath of the same or different composition as used in the first treatment and under the electrolytic conditions described below. The electrolytic conditions are those that provide the amount of electricity necessary to ensure the amount of Cr OX film and are not particularly limited, but the current density of the second electrolytic chromic acid treatment is 10~
A range of 80A/ dm2 is good. Current density is 10A/dm 2
If it is less than 80 A/dm 2 , the electrolysis time is too long to ensure the desired amount of Cr OX film, which is not practical, and if it exceeds 80 A/dm 2 , abnormal precipitation of the Cr OX film may occur. In addition, the bath composition of the electrolytic chromic acid second treatment may be the same as the electrolytic chromic acid first treatment solution, but if the first treatment bath is mostly composed of chromate or dichromate, Since a large amount is required, in this case it is economically desirable to use a bath with a high composition of chromic anhydride. Next, the processing according to the present invention will be specifically explained. After pre-treating a cold-rolled steel plate with a thickness of 0.22 mm by conventional methods such as degreasing and pickling, 250 g of CrO 2 /,
In a chromium plating bath containing 2.5g/H 2 SO 4 ,
Electrolysis was carried out for 1.0 seconds at a bath temperature of 55° C. and a current density of 60 A/dm 2 . Figure 1 shows the EPMA line analysis of the Cr OX film at this time. Immediately after chromium plating, reverse electrolysis was performed in the same solution at a current density of 15 A/dm 2 for 0.2 seconds. Figure 2 shows the EPMA line analysis of the Cr OX film at this time. After washing this chrome-plated steel plate thoroughly with water,
With a composition of CrO 2 50g/, Na 2 Cr 2 O 7 10g/,
A first electrolytic chromic acid treatment was performed at a current density of 5 A/dm 2 for 0.2 seconds in a chromic acid aqueous solution containing unavoidable impurity anions at a bath temperature of 40°C. Figure 3 shows the EPMA line analysis of the Cr OX film at this time. After this first treatment, a second electrolytic chromic acid treatment was performed at a current density of 15 A/dm 2 for 1.0 seconds in an aqueous chromic acid solution containing 60 g of chromic anhydride and a bath temperature of 40°C. Figure 4 shows the EPMA line analysis of the Cr OX film at this time. Furthermore, an optical micrograph at 400x magnification is shown in Fig. 6. For comparison, after chromium plating, 60 g of chromic anhydride was immersed in the same solution for 5 seconds.
Cr OX film when subjected to electrolytic chromic acid treatment at 15 A/dm 2 × 1.0 seconds in a chromic acid bath at 40°C.
Line analysis by EPMA is shown in Figure 5, 400
A double optical microscope photograph is shown in FIG. Looking at the results of line analysis, the products shown in Figures 3 and 4 that were treated according to the present invention are those after chrome plating (Figure 1), those after reverse electrolysis (Figure 2), It can be seen that there is less abnormal precipitation of Cr OX and the film is more uniform than that after conventional electrolytic chromic acid treatment (Figure 5). Moreover, looking at the micrograph, the one according to the present invention (Fig. 6) has
It is clear that the Cr OX film is homogeneous and even.
In the figure), it can be seen that many non-uniform irregularities (looking like black spots) are formed in the Cr OX film. Table 1 below shows the evaluation of the unevenness of the Cr OX film and the results of the T-peel test as described below for the above-mentioned inventive examples and comparative examples.

〔実施例 1〕[Example 1]

板厚0.22mmの冷延鋼板を5%ホメサゾン溶液中
で80℃、15A/dm2の電流密度で10秒間の電解脱
脂を行つた後に水洗し、常温10%の硫酸中に5秒
間浸漬して水洗した後下記の条件で本処理を行つ
た。 クロムめつき処理 浴組成 CrO3 250g/ H2SO4 2.5g/ 浴 温 55℃ 電解条件 50A/dm2×1.5秒 上記クロムめつき後同液中で次の条件で逆電解
処理を施した。 逆電解条件 15A/dm2×0.2秒 この後水洗し、直ちに以下の条件で電解クロム
酸処理を施した。 電解クロム酸第1処理 浴組成 CrO3 50g/ Na2Cr2O7 10g/ 浴 温 40℃ 電解条件 5A/dm2×0.2秒 電解クロム酸第2処理 浴組成 CrO3 50g/ Na2Cr2O7 10g/ 浴 温 40℃ 電解条件 15A/dm2×1.0秒 電解クロム酸第2処理後直ちに水洗してさらに
湯洗後乾燥して試料を作成した。 〔実施例 2〕 下記の条件で電解クロム酸処理を行つた以外は
実施例1と同様の処理を行つた。 電解クロム酸第1処理 浴組成 CrO3 50g/ Na2CrO4 10g/ 浴 温 40℃ 電解条件 10A/dm2×0.2秒 電解クロム酸第2処理 浴組成 CrO3 60g/ 浴 温 40℃ 電解条件 10A/dm2×1.0秒 〔実施例 3〕 下記の条件で電解クロム酸処理を行つた以外は
実施例1と同様の処理を行つた。 電解クロム酸第1処理 浴組成 Na2Cr2O7 60g/ 浴 温 40℃ 電解条件 5A/dm2×0.2秒 電解クロム酸第2処理 浴組成 CrO3 60g/ 浴 温 40℃ 電解条件 10A/dm2×1.0秒 〔比較例 1〕 前記のクロムめつき後同液中で5秒間浸漬し、
下記の条件で電解クロム酸処理を行つた以外は実
施例1と同様の処理を行つた。 電解クロム酸処理 浴組成 CrO3 60g/ 浴 温 40℃ 電解条件 15A/dm2×1.0秒 〔比較例 2〕 前述のクロムめつき後同液中で5秒間浸漬し、
下記の条件で電解クロム酸処理を行つた以外は実
施例1と同様の処理を行つた。 電解クロム酸第1処理 浴組成 CrO3 50g/ Na2Cr2O7 10g/ 浴 温 40℃ 電解条件 5A/dm2×0.2秒 電解クロム酸第2処理 浴組成 CrO3 50g/ Na2Cr2O7 10g/ 浴 温 40℃ 電解条件 15A/dm2×1.0秒 以上のようにして得られたテインフリー鋼板に
対してT型剥離試験を行つた。 上記各テインフリー鋼板の片面を50±5mg/d
m2でサイジング塗装し、190℃で10分焼付した
後、残つた反対面に同量のゴールド塗装を施し、
210℃で10分の焼付を行つた。この後、サイジン
グ塗装した面とゴールド塗装した面との間にナイ
ロン系の接着用合成樹脂テープ(厚み100μm、
幅5mm)を狭み、ホツトプレスにより190℃、1
Kg/cm2で30秒間の圧着を行つて接着させ、複数個
のテストピースを作成した。これらの接着直後の
テストピースについて、インストロン引張り試験
機を用いて200mm/mmの一定引張速度でT型剥離
試験を行い、剥離強度を測定した。 さらに、別のテストピースを用いて蔗糖15g/
を含み、くえん酸でPH3.3に調整した糖酸液に
70℃で7日間浸漬した後の剥離強度を前記と同じ
条件で測定した。 いずれの試験も各テストピースを5個づつ用い
て行つた。試験結果を下表2に示すが、結果はそ
の平均値で示す。接着直後のT型剥離試験値は塗
装後の塗膜の密着性を判定するものである。また
高温殺菌などのレトルト処理を行う場合に、塗膜
を透過して侵入してきた水に溶解するCrOXの成
分が多いと、塗膜とCrOXとの間の接着力が低下
し、耐レトルト処理性が悪くなる。70℃、7日間
浸漬後のT型剥離試験値はこの評価を行うもので
ある。 また、表2の試験結果から、本発明によるテイ
ンフリー鋼板(実施例1〜3)においてはCrOX
皮膜にむらの発生もなく、耐レトルト処理性も優
れているが、従来例1および2においてはCrOX
皮膜にむらが発生し、耐レトルト処理性も劣つて
いることが明らかである。 以上説明した処から明らかなように、本発明に
よれば塗料との密着性や耐レトルト処理性の良好
なCrOX皮膜の均質なテインフリー鋼板が得ら
れ、これはレトルト処理用コーヒー缶や食缶の
他、接着缶であればガロン缶や雑缶にも利用でき
る。また、塗装に用いる塗料はサイジングまたは
ゴールドと称される塗料に限らず、有機溶剤によ
る塗料であれば良く、また接着剤もナイロン系の
みに限定されることはない。
A cold-rolled steel plate with a thickness of 0.22 mm was electrolytically degreased in a 5% fomethazone solution at 80°C and at a current density of 15 A/dm 2 for 10 seconds, then washed with water, and immersed in 10% sulfuric acid at room temperature for 5 seconds. After washing with water, the main treatment was performed under the following conditions. Chromium plating treatment bath composition: 250 g of CrO 3 / 2.5 g of H 2 SO 4 / Bath temperature: 55° C. Electrolytic conditions: 50 A/dm 2 × 1.5 seconds After the above chromium plating, reverse electrolytic treatment was performed in the same solution under the following conditions. Reverse electrolysis conditions: 15A/dm 2 ×0.2 seconds Thereafter, the sample was washed with water and immediately subjected to electrolytic chromic acid treatment under the following conditions. Electrolytic chromic acid first treatment bath composition CrO 3 50g / Na 2 Cr 2 O 7 10g / Bath temperature 40℃ Electrolytic conditions 5A / dm 2 × 0.2 seconds Electrolytic chromic acid second treatment bath composition CrO 3 50g / Na 2 Cr 2 O 7 10g/Bath temperature: 40°C Electrolysis conditions: 15A/dm 2 ×1.0 seconds Immediately after the second electrolytic chromic acid treatment, the sample was washed with water, further washed with hot water, and then dried to prepare a sample. [Example 2] The same treatment as in Example 1 was performed except that the electrolytic chromic acid treatment was performed under the following conditions. Electrolytic chromic acid first treatment bath composition CrO 3 50g / Na 2 CrO 4 10g / Bath temperature 40℃ Electrolytic conditions 10A/dm 2 × 0.2 seconds Electrolytic chromic acid second treatment bath composition CrO 3 60g / Bath temperature 40℃ Electrolytic conditions 10A /dm 2 ×1.0 seconds [Example 3] The same treatment as in Example 1 was performed except that the electrolytic chromic acid treatment was performed under the following conditions. Electrolytic chromic acid first treatment bath composition Na 2 Cr 2 O 7 60g/bath temperature 40℃ Electrolysis conditions 5A/dm 2 ×0.2 seconds Electrolytic chromic acid second treatment bath composition CrO 3 60g/bath temperature 40℃ Electrolysis conditions 10A/dm 2 × 1.0 seconds [Comparative Example 1] After the above chromium plating, immersion in the same solution for 5 seconds,
The same treatment as in Example 1 was performed except that the electrolytic chromic acid treatment was performed under the following conditions. Electrolytic chromic acid treatment bath composition: 60 g of CrO 3 / bath temperature: 40°C Electrolytic conditions: 15 A/dm 2 × 1.0 seconds [Comparative Example 2] After the above-mentioned chromium plating, immerse in the same solution for 5 seconds,
The same treatment as in Example 1 was performed except that the electrolytic chromic acid treatment was performed under the following conditions. Electrolytic chromic acid first treatment bath composition CrO 3 50g / Na 2 Cr 2 O 7 10g / Bath temperature 40℃ Electrolytic conditions 5A / dm 2 × 0.2 seconds Electrolytic chromic acid second treatment bath composition CrO 3 50g / Na 2 Cr 2 O 7 10g/Bath temperature: 40°C Electrolysis conditions: 15A/dm 2 ×1.0 seconds A T-peel test was conducted on the stain-free steel plate obtained as described above. 50±5mg/d on one side of each of the above stain-free steel plates
After applying sizing paint with m2 and baking at 190℃ for 10 minutes, apply the same amount of gold paint to the remaining opposite side.
Baking was performed at 210°C for 10 minutes. After this, a nylon adhesive synthetic resin tape (thickness 100 μm,
Narrow the width (5 mm) and heat at 190℃ using a hot press.
A plurality of test pieces were prepared by crimping at Kg/cm 2 for 30 seconds to bond. These test pieces immediately after adhesion were subjected to a T-peel test using an Instron tensile tester at a constant tensile speed of 200 mm/mm to measure the peel strength. Furthermore, using another test piece, 15 g of sucrose/
Contains sugar acid solution adjusted to PH3.3 with citric acid.
The peel strength after immersion at 70°C for 7 days was measured under the same conditions as above. All tests were conducted using five test pieces of each type. The test results are shown in Table 2 below, and the results are expressed as average values. The T-peel test value immediately after adhesion is used to judge the adhesion of the coating after painting. Furthermore, when performing retort processing such as high-temperature sterilization, if there is a large amount of Cr OX dissolved in the water that has penetrated through the paint film, the adhesive strength between the paint film and Cr OX will decrease, resulting in poor retort resistance. Processability deteriorates. The T-peel test value after 7 days of immersion at 70°C is used for this evaluation. In addition, from the test results in Table 2, it is clear that Cr OX
There is no unevenness in the film and the retort treatment resistance is excellent, but in Conventional Examples 1 and 2, Cr OX
It is clear that unevenness occurs in the film and that the retort treatment resistance is also poor. As is clear from the above explanation, according to the present invention, a homogeneous, stain-free steel sheet with a Cr OX film having good adhesion to paint and retort processing resistance can be obtained, and this can be used for coffee cans for retort processing and food products. In addition to cans, adhesive cans can also be used for gallon cans and miscellaneous cans. Further, the paint used for painting is not limited to a paint called sizing or gold, but any paint made of an organic solvent may be used, and the adhesive is not limited to nylon.

【表】【table】 【図面の簡単な説明】[Brief explanation of the drawing]

第1図はクロムめつき後のCrOX皮膜のEPMA
ラインアナリシス図、第2図は逆電解後のCrOX
皮膜のEPMAラインアナリシス図、第3図は電解
クロム酸第1処理後のCrOX皮膜のEPMAライン
アナリシス図、第4図は電解クロム酸第2処理後
のCrOX皮膜のEPMAラインアナリシス図、第5
図は従来の電解クロム酸処理後のCrOX皮膜の
EPMAラインアナリシス図、第6図および第7図
は金属の表面組織の400倍光学顕微鏡写真であ
り、第6図は第4図と同一試料の顕微鏡写真、第
7図は第5図と同一試料の顕微鏡写真である。
Figure 1 shows EPMA of Cr OX film after chrome plating.
Line analysis diagram, Figure 2 shows Cr OX after reverse electrolysis
Figure 3 is an EPMA line analysis diagram of the Cr OX film after the first electrolytic chromic acid treatment. Figure 4 is an EPMA line analysis diagram of the Cr OX film after the second electrolytic chromic acid treatment. 5
The figure shows the Cr OX film after conventional electrolytic chromic acid treatment.
The EPMA line analysis diagram, Figures 6 and 7 are 400x optical micrographs of the surface structure of the metal, Figure 6 is a micrograph of the same sample as Figure 4, and Figure 7 is the same sample as Figure 5. This is a microscopic photograph.

Claims (1)

【特許請求の範囲】[Claims] 1 クロムめつき浴とこれに対して水洗浴を隔て
て分離された電解クロム酸処理浴とを用い、鋼板
上に金属クロム被膜とこれに重ねて被成したクロ
ム水和酸化物主体の被膜とを有するテインフリー
鋼板を製造するに当り、クロムめつき浴にて鋼板
にクロムめつきを施した後クロムめつき浴中で逆
電解を施し、クロムめつき時に生成したクロム水
和酸化物被膜の一部ならびにクロム水和酸化物被
膜中に共析した助剤アニオンを溶出せしめ、この
後に水洗浴にて十分な水洗を行い、次いで主剤と
して無水クロム酸、クロム酸塩および重クロム酸
塩から選択された少なくとも1種の化合物を含有
し、主剤に由来する不可避的不純物アニオンを含
み助剤を意図的に添加しないクロム酸処理浴で
0.1〜10A/dm2の低電流密度、0.1〜10クーロ
ン/dm2の低電気量で電解クロム酸第1処理を行
い、引き続き10A/dm2以上の電流密度で前記第
1処理とは別個の電極を用いて電解クロム酸第2
処理を行うことを特徴とするテインフリー鋼板の
製造方法。
1 Using a chromium plating bath and an electrolytic chromic acid treatment bath separated from it by a water washing bath, a metallic chromium coating is formed on a steel plate, and a coating consisting mainly of chromium hydrated oxide formed over this is coated on a steel plate. In order to produce a stain-free steel sheet with chromium plating, the steel sheet is chromium plated in a chromium plating bath and then reverse electrolyzed in the chromium plating bath to remove the chromium hydrated oxide film formed during chromium plating. The auxiliary anion co-deposited in the chromium hydrated oxide film is eluted, and then thoroughly washed with water in a water washing bath.Then, the main ingredient is selected from chromic anhydride, chromate, and dichromate. A chromic acid treatment bath containing at least one compound of
A first electrolytic chromic acid treatment is performed at a low current density of 0.1 to 10 A/dm 2 and a low amount of electricity of 0.1 to 10 coulombs/dm 2 , followed by a separate treatment from the first treatment at a current density of 10 A/dm 2 or more. Electrolytic chromic acid secondary using an electrode
A method for manufacturing a stain-free steel sheet, which comprises performing a treatment.
JP6154782A 1982-04-13 1982-04-13 Production of tin-free steel plate Granted JPS58177490A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6154782A JPS58177490A (en) 1982-04-13 1982-04-13 Production of tin-free steel plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6154782A JPS58177490A (en) 1982-04-13 1982-04-13 Production of tin-free steel plate

Publications (2)

Publication Number Publication Date
JPS58177490A JPS58177490A (en) 1983-10-18
JPS6123280B2 true JPS6123280B2 (en) 1986-06-05

Family

ID=13174252

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JPS58177490A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60103200A (en) * 1983-11-10 1985-06-07 Kawasaki Steel Corp Tin-free steel having excellent adhesive properties
JPS60114595A (en) * 1983-11-25 1985-06-21 Kawasaki Steel Corp Tin-free steel having superior adhesive property

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* Cited by examiner, † Cited by third party
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BE696034A (en) * 1966-03-26 1967-09-01
JPS5425894A (en) * 1977-07-29 1979-02-27 Vysoka Skola Chem Tech Method and apparatus for recycling liquid
JPS5610996A (en) * 1979-07-06 1981-02-03 Tanaka Precious Metal Ind Repairing material for disconnected circuit foil on printed circuit board

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