JPS61250032A - シラノ−ルオリゴマ−液の製造法 - Google Patents

シラノ−ルオリゴマ−液の製造法

Info

Publication number
JPS61250032A
JPS61250032A JP60091124A JP9112485A JPS61250032A JP S61250032 A JPS61250032 A JP S61250032A JP 60091124 A JP60091124 A JP 60091124A JP 9112485 A JP9112485 A JP 9112485A JP S61250032 A JPS61250032 A JP S61250032A
Authority
JP
Japan
Prior art keywords
solvent
silanol
oligomer liquid
liquid
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60091124A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6346095B2 (mo
Inventor
Shunichiro Uchimura
内村　俊一郎
Nintei Sato
任廷 佐藤
Daisuke Makino
大輔 牧野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP60091124A priority Critical patent/JPS61250032A/ja
Publication of JPS61250032A publication Critical patent/JPS61250032A/ja
Publication of JPS6346095B2 publication Critical patent/JPS6346095B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Formation Of Insulating Films (AREA)
JP60091124A 1985-04-30 1985-04-30 シラノ−ルオリゴマ−液の製造法 Granted JPS61250032A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60091124A JPS61250032A (ja) 1985-04-30 1985-04-30 シラノ−ルオリゴマ−液の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60091124A JPS61250032A (ja) 1985-04-30 1985-04-30 シラノ−ルオリゴマ−液の製造法

Publications (2)

Publication Number Publication Date
JPS61250032A true JPS61250032A (ja) 1986-11-07
JPS6346095B2 JPS6346095B2 (mo) 1988-09-13

Family

ID=14017773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60091124A Granted JPS61250032A (ja) 1985-04-30 1985-04-30 シラノ−ルオリゴマ−液の製造法

Country Status (1)

Country Link
JP (1) JPS61250032A (mo)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62230828A (ja) * 1985-12-17 1987-10-09 Sumitomo Chem Co Ltd 半導体用絶縁膜形成塗布液
JPH0366730A (ja) * 1989-07-28 1991-03-22 Dow Corning Corp シラン加水分解物溶液並びにその調製方法及び使用方法
JPH03221577A (ja) * 1990-01-26 1991-09-30 Sumitomo Chem Co Ltd 絶縁膜形成用塗布液
WO1992021632A3 (en) * 1991-05-31 1993-04-01 Minnesota Mining & Mfg Method for treating fluoroaluminosilicate glass
WO1996009993A1 (de) * 1994-09-27 1996-04-04 Metallgesellschaft Aktiengesellschaft Mischung zum behandeln von siliciumhaltigen substraten
US5874367A (en) * 1992-07-04 1999-02-23 Trikon Technologies Limited Method of treating a semi-conductor wafer
WO2016104765A1 (ja) * 2014-12-26 2016-06-30 日東電工株式会社 塗料およびその製造方法
JP2017025277A (ja) * 2014-12-26 2017-02-02 日東電工株式会社 塗料およびその製造方法
JP2017061641A (ja) * 2015-09-25 2017-03-30 日本ペイント・オートモーティブコーティングス株式会社 カチオン電着塗料組成物
CN107011763A (zh) * 2015-12-08 2017-08-04 赢创德固赛有限公司 含[3‑(2,3‑二羟基丙‑1‑氧基)丙基]硅醇低聚物的含水组合物、制备法及用途
US10472483B2 (en) 2014-12-26 2019-11-12 Nitto Denko Corporation Silicone porous body and method of producing the same
US11460610B2 (en) 2015-07-31 2022-10-04 Nitto Denko Corporation Optical laminate, method of producing optical laminate, optical element, and image display
US11505667B2 (en) 2014-12-26 2022-11-22 Nitto Denko Corporation Laminated film roll and method of producing the same
US11524481B2 (en) 2015-09-07 2022-12-13 Nitto Denko Corporation Low refractive index layer, laminated film, method for producing low refractive index layer, method for producing laminated film, optical element, and image display device
US11536877B2 (en) 2015-08-24 2022-12-27 Nitto Denko Corporation Laminated optical film, method of producing laminated optical film, optical element, and image display
US11618807B2 (en) 2014-12-26 2023-04-04 Nitto Denko Corporation Film with void spaces bonded through catalysis and method of producing the same
US11674004B2 (en) 2015-07-31 2023-06-13 Nitto Denko Corporation Laminated film, optical element, and image display

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5739659A (en) * 1980-08-21 1982-03-04 Nec Corp Calling out system for private branch of exchanger
JPS58171455A (ja) * 1982-03-16 1983-10-08 アンステイテユ・ナシヨナル・ド・ルシエルシエ・シミク・アプリケ 固体表面上で透明被覆またはワニスを作るのに好適な基礎液体組成物
JPS58179232A (ja) * 1973-10-11 1983-10-20 ゼネラル・エレクトリツク・カンパニイ 線状ポリシロキサンの製法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58179232A (ja) * 1973-10-11 1983-10-20 ゼネラル・エレクトリツク・カンパニイ 線状ポリシロキサンの製法
JPS5739659A (en) * 1980-08-21 1982-03-04 Nec Corp Calling out system for private branch of exchanger
JPS58171455A (ja) * 1982-03-16 1983-10-08 アンステイテユ・ナシヨナル・ド・ルシエルシエ・シミク・アプリケ 固体表面上で透明被覆またはワニスを作るのに好適な基礎液体組成物

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62230828A (ja) * 1985-12-17 1987-10-09 Sumitomo Chem Co Ltd 半導体用絶縁膜形成塗布液
JPH0366730A (ja) * 1989-07-28 1991-03-22 Dow Corning Corp シラン加水分解物溶液並びにその調製方法及び使用方法
JPH03221577A (ja) * 1990-01-26 1991-09-30 Sumitomo Chem Co Ltd 絶縁膜形成用塗布液
WO1992021632A3 (en) * 1991-05-31 1993-04-01 Minnesota Mining & Mfg Method for treating fluoroaluminosilicate glass
US5874367A (en) * 1992-07-04 1999-02-23 Trikon Technologies Limited Method of treating a semi-conductor wafer
US6287989B1 (en) 1992-07-04 2001-09-11 Trikon Technologies Limited Method of treating a semiconductor wafer in a chamber using hydrogen peroxide and silicon containing gas or vapor
WO1996009993A1 (de) * 1994-09-27 1996-04-04 Metallgesellschaft Aktiengesellschaft Mischung zum behandeln von siliciumhaltigen substraten
BE1008724A3 (nl) * 1994-09-27 1996-07-02 Couttenier Andre Samenstelling voor het beschermen en waterafstotend maken van een siliciumhoudend substraat.
JPH10506144A (ja) * 1994-09-27 1998-06-16 メタルゲゼルシャフト・アクチエンゲゼルシャフト ケイ素含有基体を処理するための混合物
JP2017025277A (ja) * 2014-12-26 2017-02-02 日東電工株式会社 塗料およびその製造方法
WO2016104765A1 (ja) * 2014-12-26 2016-06-30 日東電工株式会社 塗料およびその製造方法
US11618807B2 (en) 2014-12-26 2023-04-04 Nitto Denko Corporation Film with void spaces bonded through catalysis and method of producing the same
US10472483B2 (en) 2014-12-26 2019-11-12 Nitto Denko Corporation Silicone porous body and method of producing the same
US10494546B2 (en) 2014-12-26 2019-12-03 Nitto Denko Corporation Coating material and method of producing the same
US10815355B2 (en) 2014-12-26 2020-10-27 Nitto Denko Corporation Silicone porous body and method of producing the same
US11505667B2 (en) 2014-12-26 2022-11-22 Nitto Denko Corporation Laminated film roll and method of producing the same
US11674004B2 (en) 2015-07-31 2023-06-13 Nitto Denko Corporation Laminated film, optical element, and image display
US11460610B2 (en) 2015-07-31 2022-10-04 Nitto Denko Corporation Optical laminate, method of producing optical laminate, optical element, and image display
US11536877B2 (en) 2015-08-24 2022-12-27 Nitto Denko Corporation Laminated optical film, method of producing laminated optical film, optical element, and image display
US11524481B2 (en) 2015-09-07 2022-12-13 Nitto Denko Corporation Low refractive index layer, laminated film, method for producing low refractive index layer, method for producing laminated film, optical element, and image display device
JP2017061641A (ja) * 2015-09-25 2017-03-30 日本ペイント・オートモーティブコーティングス株式会社 カチオン電着塗料組成物
CN107011763B (zh) * 2015-12-08 2022-09-02 赢创运营有限公司 含[3-(2,3-二羟基丙-1-氧基)丙基]硅醇低聚物的含水组合物、制备法及用途
CN107011763A (zh) * 2015-12-08 2017-08-04 赢创德固赛有限公司 含[3‑(2,3‑二羟基丙‑1‑氧基)丙基]硅醇低聚物的含水组合物、制备法及用途

Also Published As

Publication number Publication date
JPS6346095B2 (mo) 1988-09-13

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