JPS61259449A - Double convergence mass spectrograph - Google Patents
Double convergence mass spectrographInfo
- Publication number
- JPS61259449A JPS61259449A JP10085185A JP10085185A JPS61259449A JP S61259449 A JPS61259449 A JP S61259449A JP 10085185 A JP10085185 A JP 10085185A JP 10085185 A JP10085185 A JP 10085185A JP S61259449 A JPS61259449 A JP S61259449A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- magnetic field
- electrostatic lens
- quadrupole electrostatic
- value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
- H01J49/28—Static spectrometers
- H01J49/32—Static spectrometers using double focusing
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
り産業上の利用分野コ
本発明は特公昭57−31261号に記載された二重収
束質量分析装置の改良に関し、特に測定質量範囲が広く
、感度及び分解能の面で優れた質量分析装置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an improvement of the double convergence mass spectrometer described in Japanese Patent Publication No. 57-31261. Regarding excellent mass spectrometers.
[従来技術]
最近生化学等の応用分野から高質量分子を分析したいと
いう要望が強くなって来ている。これは−次イオン衝撃
あるいは高速原子衝撃等のイオン化法の進歩によりm/
z =10,000を超える高質量分子のイオンでも比
較的容易に作成できるようになったからである。このよ
うな高質量分子イオンを分析するためには極めて大型の
質量分析装置が必要になるが、大型の質量分析装置は極
めて高価で、だれでも容易に使用できる状況にはない。[Prior Art] Recently, there has been a strong desire to analyze high-mass molecules in applied fields such as biochemistry. This is due to advances in ionization methods such as -order ion bombardment or high-speed atom bombardment.
This is because even ions of high-mass molecules exceeding z = 10,000 can now be produced relatively easily. In order to analyze such high-mass molecular ions, an extremely large mass spectrometer is required, but large mass spectrometers are extremely expensive and cannot be easily used by anyone.
そこで、比較的小型で高質足載まで分析できる質量分析
装置が要望されており、例えば以下のような工夫がされ
ている。Therefore, there is a need for a mass spectrometer that is relatively small and capable of performing high-quality analysis, and the following ideas have been made, for example.
即ち、従来市販されている第7図Ca)に示すような質
量分析装置の電場Eと一様扇形磁場をそのまま使い、第
7図(b)に示すように磁場におけるイオンビームの回
転半径rmを2倍程度に大きくすると共に回転角φmを
172程度に小さくし、測定質量範囲を4倍程度拡大す
る方法である。第7図においてSはイオン源、Dはイオ
ン検出器でおる。That is, by using the electric field E and uniform fan-shaped magnetic field of a conventional commercially available mass spectrometer as shown in Fig. 7(b), we can calculate the rotation radius rm of the ion beam in the magnetic field as shown in Fig. 7(b). This is a method of increasing the measurement mass range by about 4 times by increasing the rotation angle by about 2 times and decreasing the rotation angle φm by about 172 times. In FIG. 7, S represents an ion source and D represents an ion detector.
[発明が解決しようとする問題点コ
この方法によれば測定質量範囲は確かに拡大するものの
、φmが小さくなるためイオン軌道が長くなり、イオン
ビームの縦方向の広がりによって高次収差が大きくなり
分解能も低下してしまう傾向がおり、この傾向は避けら
れないものと思われて来た。[Problems to be solved by the invention] Although this method does expand the measurement mass range, the ion trajectory becomes longer because φm becomes smaller, and higher-order aberrations increase due to the vertical spread of the ion beam. There is also a tendency for resolution to decrease, and this tendency has been thought to be inevitable.
第1表は、第7図(1))に示された従来装置の一般計
例(φm=35°、φe =70’ 、 re /r
m =0.643)における、−次の収差係数AX 、
Ay。Table 1 shows a general example of the conventional device shown in Fig. 7 (1)) (φm = 35°, φe = 70', re /r
m = 0.643), -th order aberration coefficient AX,
Ay.
Aβ及び二次の収差係数A(XCX+ A(X8t A
66t A”ly。Aβ and second-order aberration coefficient A (XCX + A (X8t A
66t A”ly.
Ays、Asβの値を示す。The values of Ays and Asβ are shown.
実用上必要な分解能を50,000とし、イオン源での
イオンビームの幅をr m/300前後とした時に、二
次の収差係数は少なくとも0.8〜1.0よりも小さい
ことが望まれるが、この値を考慮に入れて第1表の二次
収差係数を見れば、第1表の装置では満足のゆく分解能
が19られないことが分る。When the practically required resolution is 50,000 and the width of the ion beam at the ion source is around r m/300, it is desirable that the second-order aberration coefficient is at least smaller than 0.8 to 1.0. However, if we take this value into consideration and look at the second-order aberration coefficients in Table 1, we will see that the apparatus shown in Table 1 cannot provide a satisfactory resolution.
ところで、本発明者は先にイオンビームの横方向に対し
発散性を与え且つ縦方向に対し収束性を与えるようにし
た四極静電レンズQLをN場Eと1i場Hの間に配置す
ることを特徴とする二重収束質量分析装置を特公昭57
−31261号として提案した。By the way, the inventor first arranged a quadrupole electrostatic lens QL between the N field E and the 1i field H, which gives the ion beam a divergent property in the horizontal direction and a convergent property in the vertical direction. A double convergence mass spectrometer featuring
It was proposed as No.-31261.
この提案装置は、例えばφe=70’〜95°、φm
=65.8°〜74.ド、re/rm = 1.27〜
1.357に選ばれ、すべての二次収差を小さくするこ
とができ高感度で高分解能が得られている。この提案装
置に先に述べたrm@2倍程度程度くしφmを172程
度に小ざくして(具体的には30°≦φm≦50’、0
.4≦r e/ r m≦0.8程度の範囲)測定質量
範囲を拡大する手法を適用すれば、高次収差が大きくな
り分解能が低下してしまうことは十分に予想される。This proposed device has, for example, φe=70′ to 95°, φm
=65.8°~74. de, re/rm = 1.27~
1.357, all secondary aberrations can be reduced and high sensitivity and high resolution can be obtained. In this proposed device, the comb φm is reduced to about 172 times (rm@2) as described above (specifically, 30°≦φm≦50', 0
.. If a method of expanding the measurement mass range (in the range of approximately 4≦re/rm≦0.8) is applied, it is fully expected that higher-order aberrations will increase and resolution will decrease.
本発明は上述した諸点に鑑みてなされたものでおり、上
記提案装置のφm及びr e/ r mを30°≦φm
≦50°、0.4≦r e/ r m≦0.8の範囲に
設定して測定質量範囲を拡大しても分解能が低下しない
条件を与えることを目的としている。The present invention has been made in view of the above-mentioned points, and the φm and r e/r m of the proposed device are set to 30°≦φm.
The purpose is to provide conditions in which the resolution does not deteriorate even if the measurement mass range is expanded by setting the range to be ≦50° and 0.4≦r e/r m≦0.8.
[問題点を解決するための手段]
この目的を達成するため、本発明にかかる二重収束質量
分析装置は、電場と磁場の間に配置され、イオンビーム
の横方向に対し発散性を与えると共に該イオンビームの
縦方向に対し収束性を与えるようになした四極静電レン
ズを備えた二重収束質量分析装置において、磁場におけ
るイオンビームの回転角をφm、磁場におけるイオンビ
ームの回転半径をrm、電場にあけるイオンビームの回
転半径をre、四極静電レンズの強度をQk、四極静電
レンズのイオンビーム方向の実効長をQj、磁場の入射
端面に凸につけられた曲率をρ′、出射端面に凸につけ
られた曲率をρ″とした時、30°≦φm≦50’
0.4≦r e/ r m≦0.8
0.35≦Qk2Qjr6≦1゜O
rm 、/p’ 十rm 、/、o” < 0を満足す
るようにしたことを特徴としている。[Means for solving the problem] In order to achieve this object, the double focusing mass spectrometer according to the present invention is arranged between an electric field and a magnetic field, and provides divergence in the lateral direction of the ion beam. In a double-focusing mass spectrometer equipped with a quadrupole electrostatic lens that provides convergence in the longitudinal direction of the ion beam, the rotation angle of the ion beam in the magnetic field is φm, and the radius of rotation of the ion beam in the magnetic field is rm. , the radius of rotation of the ion beam in the electric field is re, the strength of the quadrupole electrostatic lens is Qk, the effective length of the quadrupole electrostatic lens in the ion beam direction is Qj, the convex curvature of the input end face of the magnetic field is ρ', and the output When the convex curvature on the end face is ρ'', 30°≦φm≦50' 0.4≦re/ r m≦0.8 0.35≦Qk2Qjr6≦1°O rm , /p' 10rm , /, o''< 0.
[実施例]
第1図は本発明の一実施例を示す装置構成図である。イ
オン源ゴはイオン化室2と複数のスリット3S−有し、
加速されたイオンビームIBがスリット4から外部へ取
出される。このIBは円筒電場5.四極静電レンズ6を
介して一様扇形磁場7へ入射し、この磁場7により質量
電荷比に応じた分散を受け、特定の質量電荷比を持つも
のがイオン検出器8へ入射して検出される。上記1@7
は図示しない電源によりその磁場強度を繰返し掃引でき
るように構成されている。そのため、その掃引に伴って
磁場7を通過するイオンの質量電荷比が変化し、検出器
8から質量スペクトル信号が得られる。尚、磁場7の入
出射面にはイオンビームが斜めに入出射するような角度
ε′、ε″がつけられており、且つその入出射端面には
ρ′、ρ″なる曲率半径が与えられている。[Embodiment] FIG. 1 is a diagram showing the configuration of an apparatus showing an embodiment of the present invention. The ion source has an ionization chamber 2 and a plurality of slits 3S,
The accelerated ion beam IB is taken out from the slit 4. This IB is a cylindrical electric field5. The ions enter a uniform fan-shaped magnetic field 7 through a quadrupole electrostatic lens 6, undergo dispersion according to the mass-to-charge ratio, and those with a specific mass-to-charge ratio enter the ion detector 8 and are detected. Ru. Above 1@7
is configured so that its magnetic field strength can be repeatedly swept by a power source (not shown). Therefore, the mass-to-charge ratio of ions passing through the magnetic field 7 changes with the sweep, and a mass spectrum signal is obtained from the detector 8. Incidentally, the entrance and exit surfaces of the magnetic field 7 are set at angles ε' and ε" such that the ion beam enters and exits obliquely, and the entrance and exit end faces are given curvature radii of ρ' and ρ". ing.
第2図は上記四極静電レンズ6のA−A断面図及びこれ
に電位を与えるための電源9の構成を示す図で必る。四
極静電レンズ6は4本の円筒状電極から成り、これがイ
オンビーム通路Oを中心に90°間隔で対称配置され、
正イオンを分析する場合には、イオンご一ムの軌道平面
に垂直な方向(y方向)の対向する電極Pyに正電位が
印加され、イオンビームの動径方向(X方向)の対向す
る電極Pxには負電位が印加される。そのため、正イオ
ンはy方向には収束方向の力を受け、X方向には発散方
向の力を受ける。FIG. 2 is a cross-sectional view taken along the line AA of the quadrupole electrostatic lens 6 and a diagram showing the configuration of a power source 9 for applying a potential to the quadrupole electrostatic lens 6. The quadrupole electrostatic lens 6 consists of four cylindrical electrodes, which are arranged symmetrically at 90° intervals around the ion beam path O.
When analyzing positive ions, a positive potential is applied to opposing electrodes Py in a direction perpendicular to the orbital plane of the ions (y direction), and a positive potential is applied to opposing electrodes Py in the radial direction (X direction) of the ion beam. A negative potential is applied to Px. Therefore, positive ions receive a force in the convergence direction in the y direction, and a force in the divergence direction in the x direction.
第2表は前記提案装置の62計例(*)と、本発明によ
る装置について適宜なディメンジョンを与えた5つの設
計例((1)〜(5))を示す。Table 2 shows 62 examples (*) of the proposed device and five design examples ((1) to (5)) with appropriate dimensions for the device according to the present invention.
(以下余白)
第2表
第2表において使用される記号で未定義のものは以下の
通りである。(Left below) Table 2 The undefined symbols used in Table 2 are as follows.
Qk:静電四極レンズの強度
Q12:静電四極レンズの長ざ
je’:主スリットと電場との距離
1IIl″ニコレクタスリツトと磁場との距離deq:
電場と四極静電レンズとの距離dqm:四極静電レンズ
と磁場との距離尚、第2表における長さについては、ず
べて提案装置の設計例(杓における磁場回転半径rmを
1としてノーマライズされており、Qkはイオンビーム
の加速電圧でノーマライズされている。Qk: Strength of the electrostatic quadrupole lens Q12: Length of the electrostatic quadrupole lens je': Distance between the main slit and the electric field 1IIl'' Distance between the collector slit and the magnetic field deq:
Distance dqm between the electric field and the quadrupole electrostatic lens: Distance between the quadrupole electrostatic lens and the magnetic field Note that the lengths in Table 2 are all normalized using the design example of the proposed device (the radius of rotation of the magnetic field rm in the ladle is 1). Qk is normalized by the acceleration voltage of the ion beam.
上記(1)から(5)の設計例では、二次収差係数はす
べて1よりもはるかに小さい1直になっており、第・1
表の従来装置では実規できなかった高い分解能が得られ
ることが分る。In the design examples (1) to (5) above, the second-order aberration coefficients are all 1, which is much smaller than 1;
It can be seen that a high resolution that could not be achieved with the conventional device shown in the table can be obtained.
ところで、第2表中にQk 2Qj reの数値が示さ
れているが、本願発明者はこの値が二次収差及びイオン
の1〜ランスミツシヨンを表わすA−V 。By the way, although the numerical value of Qk 2Qj re is shown in Table 2, the inventor of the present application believes that this value represents the second-order aberration and the 1~transmission of ions.
Aβ(小さい方がトランスミッションが優れている)と
密接なつながりがおることを見出した。We found that there is a close connection with Aβ (the smaller the size, the better the transmission).
第3図は、上記設計例(1)についてQkz(1reの
値によって二次収差係数の絶対値の和IとAy、Aβ及
びA”と△βの絶対値の和がどのように変化するかを調
べた結果を示す。第4図、第5図は上記設計例(4)
、 (5)について夫々同様に調べた結果を示す。Figure 3 shows how the sum of the absolute values of the secondary aberration coefficients I and Ay, Aβ, and the sum of the absolute values of A'' and Δβ change depending on the value of Qkz(1re) for the above design example (1). The results of the investigation are shown in Figures 4 and 5 for the above design example (4).
, (5) are similarly investigated.
通常、■の値が4〜5を超えると実用上十分な分解能が
得られないのでそれ以下に抑える必要がある。更にAy
と八βの絶対値の和が10を超えると感度が十分に)q
られないのでそれ以下に抑える必要がある。この2つの
条件をもとに第3図〜第5図を見ると、■の条件からは
Qk+!QJ2reを0.35から1.0の範囲に設定
する必要があるし、更に併せて感度の面も考慮すると、
Qk2Qjreは0.4から0.9の範囲に設定するこ
とが必要である。Usually, if the value of (■) exceeds 4 to 5, practically sufficient resolution cannot be obtained, so it is necessary to keep it below this value. Furthermore, Ay
If the sum of the absolute values of and 8β exceeds 10, the sensitivity is sufficient) q
Therefore, it is necessary to keep it below that level. Looking at Figures 3 to 5 based on these two conditions, we can see that from the condition (■), Qk+! It is necessary to set QJ2re in the range of 0.35 to 1.0, and also considering the sensitivity,
Qk2Qjre needs to be set in the range of 0.4 to 0.9.
上記Qk2Qereの値と共に二次収差に大きな影響を
与えるのが磁場の人出射面につ(プられる曲率ρ′、ρ
″である。上記設計例(1)〜(5)においては、vi
i場の出射端面には曲率をつけていないが、本願発明者
が見出した条件から言うと、このような場合には入射端
面に負の(端面が凹む方向の)曲率をつけることが必要
条件で必る。実際には曲率を磁場の入射端面につけても
出射端面につけても略等価であるため、rm/ρ’+r
m、/ρ″の値としてとらえる必要がめる。Along with the value of Qk2Qere mentioned above, the curvatures ρ′ and ρ
''.In the above design examples (1) to (5), vi
Although the output end face of the i-field does not have a curvature, based on the conditions discovered by the inventor, in such a case, it is necessary to give the input end face a negative curvature (in the direction in which the end face is concave). It is necessary. In reality, the curvature is approximately equivalent whether it is applied to the input end face of the magnetic field or to the output end face, so rm/ρ'+r
It is necessary to consider it as a value of m, /ρ''.
第6図は上記設計例(1)についてrm/ρ′十rm/
ρ″の値をいくつか与え、その値によって二次収差係数
の絶対値の和■がどのような値をとるかを調べた結果を
示す。この図をもとに、■の値が4〜5を超えると実用
上十分な分解能が得られないことを考慮すると、■の値
をそれ以下に抑えるためには少なくともrm/ρ’+r
m/ρ〃が負の値をとることが必要であり、更に言えば
、rm 、/l:)’ 十rm 、/ρ”は−0,3か
ら−1,5の範囲に設定することが望ましい。Figure 6 shows rm/ρ′+rm/ for the above design example (1).
Given several values of ρ'', the results of investigating what value the sum of the absolute values of the second-order aberration coefficients takes depending on the values are shown.Based on this figure, the value of ■ is 4 to 4. Considering that it is not possible to obtain a practically sufficient resolution when the value exceeds 5, at least rm/ρ'+r is required to suppress the value of
It is necessary for m/ρ〃 to take a negative value, and furthermore, rm, /l:)' rm, /ρ'' can be set in the range of -0.3 to -1.5. desirable.
更に、本発明においては磁場の回転角が小ざくなるため
磁場による収束作用が弱くなることは避けられず、第2
表における提案装置の設計例(*)のように磁場入射端
面に傾き(ε′ )を−15°つけるだけでは磁場とイ
オン検出器との距離が長くなってしまい、実用装置とし
ては問題となる。そのため、磁場出射端面にも傾きくε
′)を−15゜以上つける必要がある。尚、あまり傾き
を増加さぼると収差が大きくなるため、ε′、ε″とも
実用上は一30’程度が限度である。Furthermore, in the present invention, since the rotation angle of the magnetic field becomes smaller, it is inevitable that the convergence effect of the magnetic field becomes weaker.
As shown in the design example of the proposed device in the table (*), simply adding an inclination (ε') of -15° to the magnetic field input end face would increase the distance between the magnetic field and the ion detector, which would be a problem as a practical device. . Therefore, the magnetic field output end face also tilts ε
') must be set at -15° or more. Incidentally, if the inclination is increased too much, the aberration becomes large, so the practical limit for both ε' and ε'' is about -30'.
[発明の効果]
以上詳述した如く、本発明によれば、電場と磁場の間に
配置され、イオンビームの横方向に対し発散性を与える
と共に該イオンビームの縦方向に対し収束性を与えるよ
うになした四極静電レンズを備えた二重収束質量分析装
置において、φmを30°≦φm≦50°、re/rm
を0.4≦r e/ r m≦0.8の範囲に設定して
測定質量範囲の広い質量分析装置を得る場合であっても
分解能の高い装置を得ることができる。[Effects of the Invention] As detailed above, according to the present invention, the ion beam is disposed between an electric field and a magnetic field, and provides divergence in the lateral direction of the ion beam, and convergence in the longitudinal direction of the ion beam. In a double focusing mass spectrometer equipped with a quadrupole electrostatic lens, φm is set to 30°≦φm≦50°, re/rm
Even if a mass spectrometer with a wide measurement mass range is obtained by setting r e/r m in the range of 0.4≦re/r m≦0.8, a device with high resolution can be obtained.
第1図は本発明の一実施例を示ず装置描成図、第2図は
四極静電レンズのA−A断面図及びこれに電位を与える
ための電源の構成を示す図、第3図乃至第5図は、設計
例(1) 、 (4) 、 (5)についてQk ”
Qj reの値によって二次収差係数の絶対値の和Iと
Ay、Aβ及びAVと八βの絶対値の和がどのように変
化するかを調べた結果を示す図、第6図は設計例(1)
についてrm/ρ′十rm/ρ“の値をいくつか与え、
その値によって二次収差係数の絶対値の和Iがどのよう
な値をとるかを調べた結果を示す図、第7図は従来装置
を説明するための図である。
1:イオン源 2:イオン化室
3.4ニスリツト 5:円筒電場
6:四極静電レンズFig. 1 is a diagram showing an embodiment of the present invention, and Fig. 2 is a sectional view taken along line A-A of a quadrupole electrostatic lens and a diagram showing the configuration of a power supply for applying a potential to the lens. Fig. 3 Figures 5 to 5 show Qk'' for design examples (1), (4), and (5).
A diagram showing the results of investigating how the sum of the absolute values of the quadratic aberration coefficients I, Ay, Aβ, AV, and 8β changes depending on the value of Qj re. Figure 6 is a design example. (1)
Give some values of rm/ρ′+rm/ρ” for
FIG. 7 is a diagram illustrating a conventional apparatus, which shows the results of examining what value the sum I of the absolute values of the secondary aberration coefficients takes depending on the value. 1: Ion source 2: Ionization chamber 3.4 Nislit 5: Cylindrical electric field 6: Quadrupole electrostatic lens
Claims (1)
し発散性を与えると共に該イオンビームの縦方向に対し
収束性を与えるようになした四極静電レンズを備えた二
重収束質量分析装置において、磁場におけるイオンビー
ムの回転角をφm、磁場におけるイオンビームの回転半
径をrm、電場におけるイオンビームの回転半径をre
、四極静電レンズの強度をQk、四極静電レンズのイオ
ンビーム方向の実効長をQl、磁場の入射端面に凸につ
けられた曲率をρ′、出射端面に凸につけられた曲率を
ρ″とした時、 30°≦φm≦50° 0.4≦re/rm≦0.8 0.35≦Qk^2Qlre≦1.0 rm/ρ′+rm/ρ″<0 を満足するようにしたことを特徴とする二重収束質量分
析装置。[Claims] A quadrupole electrostatic lens is arranged between an electric field and a magnetic field, and is provided with a quadrupole electrostatic lens that provides divergence in the lateral direction of the ion beam and convergence in the longitudinal direction of the ion beam. In a double focusing mass spectrometer, the rotation angle of the ion beam in the magnetic field is φm, the radius of rotation of the ion beam in the magnetic field is rm, and the radius of rotation of the ion beam in the electric field is re.
, the strength of the quadrupole electrostatic lens is Qk, the effective length of the quadrupole electrostatic lens in the ion beam direction is Ql, the convex curvature on the input end face of the magnetic field is ρ', and the convex curvature on the output end face is ρ''. 30°≦φm≦50° 0.4≦re/rm≦0.8 0.35≦Qk^2Qlre≦1.0 rm/ρ′+rm/ρ″<0 Features: Double convergence mass spectrometer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10085185A JPS61259449A (en) | 1985-05-13 | 1985-05-13 | Double convergence mass spectrograph |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10085185A JPS61259449A (en) | 1985-05-13 | 1985-05-13 | Double convergence mass spectrograph |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61259449A true JPS61259449A (en) | 1986-11-17 |
| JPH0357574B2 JPH0357574B2 (en) | 1991-09-02 |
Family
ID=14284819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10085185A Granted JPS61259449A (en) | 1985-05-13 | 1985-05-13 | Double convergence mass spectrograph |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61259449A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02270256A (en) * | 1989-04-11 | 1990-11-05 | Jeol Ltd | Simultaneous detection type pass analyzing device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS568981A (en) * | 1979-07-03 | 1981-01-29 | Hitachi Ltd | Selection system for balancing connected network |
-
1985
- 1985-05-13 JP JP10085185A patent/JPS61259449A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS568981A (en) * | 1979-07-03 | 1981-01-29 | Hitachi Ltd | Selection system for balancing connected network |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02270256A (en) * | 1989-04-11 | 1990-11-05 | Jeol Ltd | Simultaneous detection type pass analyzing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0357574B2 (en) | 1991-09-02 |
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